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JPS6157804A - Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge - Google Patents

Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge

Info

Publication number
JPS6157804A
JPS6157804A JP18000784A JP18000784A JPS6157804A JP S6157804 A JPS6157804 A JP S6157804A JP 18000784 A JP18000784 A JP 18000784A JP 18000784 A JP18000784 A JP 18000784A JP S6157804 A JPS6157804 A JP S6157804A
Authority
JP
Japan
Prior art keywords
ray
optical axis
shutter
axis
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18000784A
Other languages
Japanese (ja)
Other versions
JPH0316605B2 (en
Inventor
Hiroshi Sakata
浩 坂田
Yoshio Uto
羽東 良夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP18000784A priority Critical patent/JPS6157804A/en
Publication of JPS6157804A publication Critical patent/JPS6157804A/en
Publication of JPH0316605B2 publication Critical patent/JPH0316605B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/26Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To align the X-ray axis to the optical axis accuratly by photographing a XY sample table by a TV camera and setting the cursor of a display body at the boundary line of an optical-axis aligning body, and then opening a shutter and computing and displaying secondary data from the optical-axis aligning body. CONSTITUTION:Primary X rays radiated by an X-ray source 1 reach the XY sampel table 11 through a collimator 4 whtn the shutter 2 is opened, and are photographed by th TV camera 5 through a mirror 3 in the closed state and projected on the display body 8. The sample talbe 11 is moved to align the boundary line of the otpical axis aligning body 10 to the cursor 9 of the display body 8. Then, the shutter 2 is released, and then the primary X rays reach the optical axis aligning body 10, so that generated secondary X rays are detected by a secondary X-ray detector 6. The detected primary data are converted by a CPU7 into secondary data, which are display on the display body 8, so that the difference between the X-ray axis of the collimator and the optical axis of the TV camera is read on the display body 8. Thus, the X-ray axis is aligned to the optical axis.

Description

【発明の詳細な説明】 a 産業上の利用分野 本発明は螢光X線微小部膜厚計に関し、コリメータのX
線軸とテレビカメラの光軸との差を調べる、光軸とX線
軸の一致機構に関するものであ2.)。
[Detailed Description of the Invention] a. Field of Industrial Application The present invention relates to a fluorescent X-ray microscopic film thickness meter.
This is related to the matching mechanism of the optical axis and the X-ray axis, which examines the difference between the line axis and the optical axis of the television camera.2. ).

b 従来技術 アルミと真ちゅう全はぎ合わせた冶具を用い、これ全試
料台の移動方向と直角に置き、試料台をわずかずつ移動
させながらその都度X線強度を測定し、測定位置とX線
強度とのj、1ffl係を方tilt紙に作図すること
によって、光軸ずれを調べていた。
b. Conventional technology Using a jig made entirely of aluminum and brass, the jig is placed perpendicular to the moving direction of the sample stage, and the X-ray intensity is measured each time while moving the sample stage slightly, and the relationship between the measurement position and the X-ray intensity is calculated. The optical axis misalignment was investigated by drawing the diagrams on tilt paper.

C解決しようとする問題点 ア 特定の冶具がないと軸合せができない。CThe problem to be solved A. Axis alignment cannot be performed without a specific jig.

イ 試料台を手動で動かすため操作が煩雑で、精度があ
まり良くない。
b) The sample stage is moved manually, which makes the operation complicated and the accuracy is not very good.

ウ 方眼紙に作図する手間が必要であり、目視確認がで
きない。
C. It requires time and effort to draw on graph paper, and visual confirmation is not possible.

d 問題点?解決するための手段 X線を発生するだめのX線源と、このX線源からのX線
ビーム?案内するため移動自在なシャッタに設けられた
コリメーlと、前記シャッタに固定されシャッタが移動
することによってコリメーで     夕に代vシ光軸
上に位置するように設けられたミラーと、前記X線源力
・らのxmビームが照射される試料全載置するだめのX
Y試料台と、このXY試料台の面上に設けられ二次X線
を発生する材料と二次X線を発生しない材料と〃)らな
る光軸合わせ体と、前記XY試料台の試料力為ら発生す
る二次X線?検出するため前記XY試料台の近傍位置に
配設された二次X線検出器と、前記シャッタの近傍に設
けられ前記ミラー全弁して前記試料台の面上を観察する
ためのテレビカメラと、このテレビカメラに接続させり
表示体と、この表示体に形成されたカーソルと、前記シ
ャッタを開状態に保持し前記光軸合わせ体からの二次X
線を前記二次X線検出器で検出した一次データ?二次デ
ータに変換する演算に行うためのcp’o装置から成る
構成である。
d Problem? How to solve the problem What is the X-ray source that generates X-rays and the X-ray beam from this X-ray source? A collimator is provided on a movable shutter to guide the X-ray beam, a mirror is fixed to the shutter and is positioned on the optical axis of the collimator when the shutter moves, and X for placing all the samples that will be irradiated with the XM beam of Genki et al.
A Y sample stand, an optical axis aligning body provided on the surface of the XY sample stand and consisting of a material that generates secondary X-rays and a material that does not generate secondary X-rays, and a sample force of the XY sample stand. Secondary X-rays generated from scratch? a secondary X-ray detector disposed near the XY sample stage for detection; a television camera disposed near the shutter for observing the surface of the sample stage with the mirror fully closed; , a display body connected to the television camera, a cursor formed on the display body, and a secondary X from the optical axis aligning body while keeping the shutter open.
Primary data detected by the secondary X-ray detector? This configuration consists of a cp'o device for performing calculations to convert into secondary data.

e 作用 前記シャッタ?閉状態に保持してテレビカメラによりX
Y試料台?撮影し、光軸合わせ体の境界線と表示体のカ
ーソルとを合わせた後、シャッタ?開状態にし、前記光
軸合わせ体力箋らの前記二次データ?表示体に表示して
、コリメータのX線軸とテレビカメラの光軸との差?表
示体上で読み取る。
e the shutter mentioned above? Hold it closed and take an X shot with a TV camera.
Y sample stand? After taking a picture and aligning the boundary line of the optical axis alignment object with the cursor on the display object, release the shutter. Open state, align the optical axis, and check the secondary data on the physical fitness record. What is the difference between the collimator's X-ray axis and the television camera's optical axis? Read on display.

f 実細例 図面と共にこの発明による螢光X線微小部膜厚計のX線
軸と光軸との一致機構について説明すを。
f. The mechanism for aligning the X-ray axis and the optical axis of the fluorescent X-ray microscopic film thickness meter according to the present invention will be explained with reference to detailed drawings.

第1図においてX線源1から発射されに一次X線は、シ
ャッタ2が開状態の時にはコリメータ4を通ってXY試
料台11に到達するが、シャッタ2が閉状態ではさえぎ
られる。この時光軸上にはコリメータ4に代わってミラ
ー3が配置され、XY試料台11の表面はミラー3に介
してテレビカメラ5により撮彰され、表示体8に投影さ
れる。
In FIG. 1, primary X-rays emitted from an X-ray source 1 pass through a collimator 4 and reach an XY sample stage 11 when the shutter 2 is open, but are blocked when the shutter 2 is closed. At this time, a mirror 3 is placed on the optical axis in place of the collimator 4, and the surface of the XY sample stage 11 is photographed by a television camera 5 through the mirror 3 and projected onto a display 8.

ここでXY試料台11を移動させて光軸合わせ体10の
境界線を表示体80カーソル9に合わせ、し1為るのち
にシャッタ2?開状態にする。この状態でX線源またら
の一次X線はコリメータ4を通って光線合わせ体10に
到達し、発生した二次X線は二次X線検出器乙によって
検出される。ここでXY試料台全OPD装置7の制御に
よって移動させ、発生する二次X線の変化を測定する。
Here, move the XY sample stage 11 to align the boundary line of the optical axis alignment body 10 with the cursor 9 of the display body 80, and then press the shutter 2? Open. In this state, the primary X-rays from the X-ray sources pass through the collimator 4 and reach the beam combination body 10, and the generated secondary X-rays are detected by the secondary X-ray detector B. Here, the entire XY sample stage is moved under the control of the OPD device 7, and changes in the generated secondary X-rays are measured.

この時、測定位置と二次X線強度との関係は、第2図の
如きものとなる。この−次デー1ycpuitt7で処
理することにニジ、第3図に示す二次データが得られる
。第3圀においてピークの頂点≠3、光軸合せ体の境界
線に相当する。二次データが得られたらOPT+装置7
の制御によって、XY試料台11全移動する前の位置に
もどし、シャッタ2を閉状態にしてXY試料台11の映
像を表示体8に投影させる。この時、光軸合わせ体10
の境界線はカーソル9と合っている。この画面に、前r
l化二次データ(第3図)を重ねて表示することに、【
す、X線軸と光軸との差?目視確認することができる。
At this time, the relationship between the measurement position and the secondary X-ray intensity is as shown in FIG. By processing this secondary data 1ycput7, secondary data shown in FIG. 3 is obtained. In the third region, the apex of the peak≠3 corresponds to the boundary line of the optical axis alignment body. Once secondary data is obtained, OPT + device 7
Under this control, the XY sample stage 11 is returned to the position before it was fully moved, the shutter 2 is closed, and the image of the XY sample stage 11 is projected onto the display 8. At this time, the optical axis alignment body 10
The boundary line is aligned with cursor 9. On this screen,
In order to display the secondary data (Fig. 3) in an overlapping manner, [
What is the difference between the X-ray axis and the optical axis? Can be visually confirmed.

−例を第4図に示す。この例では二次データの灯点が左
にずれていることから、コリメー4のX軸が右にずれて
いることが明ら〃1である。
- An example is shown in FIG. In this example, since the light point of the secondary data is shifted to the left, it is clear (1) that the X axis of the collimator 4 is shifted to the right.

g 効果 本発明は以上のような構成と作用と?備えて丸・シ、O
PD装置によるXY試料台制御およびデータ処理を行っ
ているため、特別な冶具?必要とせず、迅速かつ正確に
X線軸と光軸と?一致させることのできるものである。
g Effect Does the present invention have the above-described structure and operation? Ready for Maru Shi, O
Since the XY sample stage is controlled and data processed by the PD device, a special jig is required. Quickly and accurately connect the X-ray axis and optical axis without the need for It is something that can be matched.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は装置構成図である。第2図は光軸合せ体力ゑら
の二次X線について、その測定位置と二次X線の強度と
の関係を表わしπものであり、第3図は第2図の一次デ
ータfcPT3装置で処理し穴二次データである。第4
図は二次データと光軸合せ体面面と?重ねて表示体に表
示した一例である。 1はX線源、2はシャツl、6はミラー、4はコリメー
タ、5はテレビカメラ、6は二次X線検出器、7は0P
tll装置、8は表示体、9はカーソル、10は光軸合
せ体、11はXY試料台である。 以上 出願人 セイコー電子工業法式会社 *nす;Wx 、xで−==7
FIG. 1 is a diagram showing the configuration of the apparatus. Figure 2 shows the relationship between the measurement position and the intensity of the secondary X-rays, and Figure 3 shows the primary data of the fcPT3 device shown in Figure 2. This is processed hole secondary data. Fourth
Is the figure secondary data and optical axis alignment body surface? This is an example of overlapping display on a display body. 1 is an X-ray source, 2 is a shirt, 6 is a mirror, 4 is a collimator, 5 is a television camera, 6 is a secondary X-ray detector, 7 is 0P
tll device, 8 a display, 9 a cursor, 10 an optical axis aligner, and 11 an XY sample stage. Applicant: Seiko Electronics Industry Law Company *n; Wx, x==7

Claims (1)

【特許請求の範囲】[Claims] X線を発生するためのX線源と、このX線源からのX線
ビームを案内するため移動自在なシャッタに設けられた
コリメータと、前記シャッタに固定されシャッタが移動
することによつてコリメータに代わつて光軸上に位置す
るよう設けられたミラーと、前記X線源からのX線ビー
ムが照射される試料を載置するためのXY試料台と、こ
のXY試料台の面上に設けられ二次X線を発生する材料
と二次X線を発生しない材料とからなる光軸合わせ体と
、前記XY試料台の試料から発生する二次X線を検出す
るため前記XY試料台の近傍位置に配置された二次X線
検出器と、前記シャッタの近傍に設けられ前記ミラーを
介して前記試料台の面上を観察するためのテレビカメラ
と、このテレビカメラに接続された表示体と、この表示
体に形成されたカーソルと、前記シャッタを開状態に保
持し前記光軸合わせ体からの二次X線を前記二次X線検
出器で検出した一次データを二次データに変換する演算
を行うためのCPU装置とを備え、前記シャッタを閉状
態に保持してテレビカメラによりXY試料台を撮影し光
軸合わせ体の境界線と表示体のカーソルとを合わせた後
、シャッタを開状態にし、前記光軸合わせ体からの前記
二次データを表示体に表示してコリメータのX線軸とテ
レビカメラの光軸との差を表示体上で読みとることがで
きるように構成したことを特徴とする光軸−X線軸の一
致機構。
An X-ray source for generating X-rays, a collimator provided on a movable shutter for guiding the X-ray beam from the X-ray source, and a collimator fixed to the shutter and moved by the shutter. a mirror provided to be positioned on the optical axis instead of the X-ray source, an XY sample stage for placing a sample to be irradiated with the X-ray beam from the X-ray source, and a mirror provided on the surface of the XY sample stage. an optical axis aligning body made of a material that generates secondary X-rays and a material that does not generate secondary X-rays; a secondary X-ray detector disposed at a position, a television camera provided near the shutter for observing the surface of the sample stage through the mirror, and a display connected to the television camera; , the cursor formed on the display body and the shutter are held open, and the secondary X-rays from the optical axis alignment body are detected by the secondary X-ray detector, and the primary data is converted into secondary data. and a CPU device for performing calculations, the shutter is held in a closed state, the XY sample stage is photographed by a television camera, and the boundary line of the optical axis alignment body and the cursor on the display body are aligned, and then the shutter is opened. the secondary data from the optical axis alignment body is displayed on a display body so that the difference between the X-ray axis of the collimator and the optical axis of the television camera can be read on the display body. A mechanism for aligning the optical axis and the X-ray axis.
JP18000784A 1984-08-29 1984-08-29 Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge Granted JPS6157804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18000784A JPS6157804A (en) 1984-08-29 1984-08-29 Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18000784A JPS6157804A (en) 1984-08-29 1984-08-29 Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge

Publications (2)

Publication Number Publication Date
JPS6157804A true JPS6157804A (en) 1986-03-24
JPH0316605B2 JPH0316605B2 (en) 1991-03-06

Family

ID=16075820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18000784A Granted JPS6157804A (en) 1984-08-29 1984-08-29 Aligning mechanism for optical axis and x-ray axis of fluorescent x-ray fine part thickness gauge

Country Status (1)

Country Link
JP (1) JPS6157804A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010017543A1 (en) 2010-06-23 2011-12-29 Surgiceye Gmbh Apparatus and method for combined optical and nuclear image acquisition
WO2014038404A1 (en) * 2012-09-04 2014-03-13 シャープ株式会社 Offset correction sample and film thickness measuring apparatus
WO2014038406A1 (en) * 2012-09-04 2014-03-13 シャープ株式会社 Film thickness measuring apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010017543A1 (en) 2010-06-23 2011-12-29 Surgiceye Gmbh Apparatus and method for combined optical and nuclear image acquisition
WO2014038404A1 (en) * 2012-09-04 2014-03-13 シャープ株式会社 Offset correction sample and film thickness measuring apparatus
WO2014038406A1 (en) * 2012-09-04 2014-03-13 シャープ株式会社 Film thickness measuring apparatus
JP2014048275A (en) * 2012-09-04 2014-03-17 Sharp Corp Off-set quantity calibration sample and film thickness measurement device
JP2014048274A (en) * 2012-09-04 2014-03-17 Sharp Corp Film thickness measurement device

Also Published As

Publication number Publication date
JPH0316605B2 (en) 1991-03-06

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