JPS6136360A - Electrically conductive high polymer film having improved transparency and production thereof - Google Patents
Electrically conductive high polymer film having improved transparency and production thereofInfo
- Publication number
- JPS6136360A JPS6136360A JP59155605A JP15560584A JPS6136360A JP S6136360 A JPS6136360 A JP S6136360A JP 59155605 A JP59155605 A JP 59155605A JP 15560584 A JP15560584 A JP 15560584A JP S6136360 A JPS6136360 A JP S6136360A
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- polymer film
- electrode
- high polymer
- conductive
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- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
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- Compositions Of Macromolecular Compounds (AREA)
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、改良された透明性の良い導電性高分子フィル
ム及びその製造力@に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an improved conductive polymer film with good transparency and its manufacturing capability.
ある種の芳香族化合物は電鮮質會添加した溶剤中[!解
させ、電解酸化を行うことにより、導電性の高分子フィ
ルム全電極基板上に形成させることができる。このよう
な芳香族化合物としてはビロール類、チオフェン類等の
複素環式化合物、アズレン、ピレン%11フェニレン等
の多環芳香族化合物が知られている〔例えばJ。Certain aromatic compounds can be found in solvents added to electrolyte materials [! A conductive polymer film can be formed on all electrode substrates by electrolytic oxidation. As such aromatic compounds, heterocyclic compounds such as viroles and thiophenes, and polycyclic aromatic compounds such as azulene and pyrene%11 phenylene are known [for example, J.
バーボン(J、 Bargon )、8.モーマッド(
8,Moh−maM )、R,J、クオルトマ7 (R
j、 Waltman )、IBM ジャーナル オ
プ リサーチ エンドデベロップメント(IBM Jo
urnalof Re5earch& Develop
ment )第27巻 第4号 第330頁(1985
年ン参照〕。Bourbon (J, Bargon), 8. Momad (
8, Moh-maM), R,J, Qualtoma7 (R
J, Waltman), IBM Journal Op Research End Development (IBM Jo
urnalof Research & Develop
ment) Volume 27, Issue 4, Page 330 (1985
(See 2013).
しかしながら、従来の電極基板上に直接電解酸化して形
成し良導電性高分子フィルムは以下のような欠点があつ
几。However, conventional highly conductive polymer films formed by direct electrolytic oxidation on electrode substrates have the following drawbacks.
(1) フィルムの機械的な強度が弱い九め、特に薄
膜状態では基板上でも、また、フィルムとして単離した
状態でも破れやすく取扱いが困難であった。(1) The mechanical strength of the film is weak, and especially in a thin film state, it is easily torn and difficult to handle, both on a substrate and when isolated as a film.
(2ン 電気伝導度を制御することが困難であった。(2) It was difficult to control the electrical conductivity.
(3) フィルムの成形性に劣っていた。(3) The moldability of the film was poor.
(4) 可視光の透過率が著しく低かった。(4) Transmittance of visible light was extremely low.
これらの欠点を除去するため、本発明者等は、既に新し
い導電性フィルムとその製造方法全開発した(特願昭5
8−186991号、同58−213201号、同58
−213205号、同58−213204号)。すなわ
ち、電解重合による導電性高分子フィルムは通常電極基
板金、アセトニトリル等の有機溶媒中に電解重合用モノ
マーとなる芳香族系化合物と通電させるための電解質と
金浴解させた浴液中に、対向電極と共に入れ、両電極間
に通電させることにより形成される。この際、電極基板
を絶縁性の高分子フィルムでコーティングすれば、当然
通電できず導電性フィルム強度く形成されない。しかし
ながら、本発明者等は電極基板上に各種の高分子フィル
ムを塗布し、これtS解させることのない適切な電解反
応溶液を組合せることによVtt解反応が通常の電極上
と同様に進むこと全見出した。この方法音用いることに
より、フィルム強度、均−性等が改良され7を種々の導
電性高分子フィルムを得ることができ、ま几電気伝導度
の制御も可能である。In order to eliminate these drawbacks, the present inventors have already developed a new conductive film and its manufacturing method (Japanese Patent Application No.
No. 8-186991, No. 58-213201, No. 58
-213205, 58-213204). In other words, a conductive polymer film produced by electrolytic polymerization usually consists of gold as an electrode substrate, an aromatic compound serving as a monomer for electrolytic polymerization in an organic solvent such as acetonitrile, an electrolyte for conducting electricity, and a bath solution dissolved in a gold bath. It is formed by inserting it together with a counter electrode and applying electricity between both electrodes. At this time, if the electrode substrate is coated with an insulating polymer film, it will naturally not be possible to conduct electricity and a strong conductive film will not be formed. However, the present inventors applied various polymer films on the electrode substrate and combined them with an appropriate electrolytic reaction solution that does not cause tS decomposition, so that the Vtt decomposition reaction proceeds in the same way as on ordinary electrodes. I found out everything. By using this method, various conductive polymer films with improved film strength, uniformity, etc. can be obtained, and electrical conductivity can also be controlled.
′また、この方法で絶縁性の高分子フィルム全導電化す
る際、電解重合時間?短くすると、電気伝導度は余り高
くできないが、高い透光率金有する半導性フィルムが得
られる。これらのフィルムは高透過率帯電防止用フィル
ム等の産業上有益な利用が期待できる。'Also, when making an insulating polymer film fully conductive using this method, what is the electrolytic polymerization time? If the length is short, the electrical conductivity cannot be very high, but a semiconductive film with high light transmittance can be obtained. These films can be expected to have industrially useful uses such as high transmittance antistatic films.
しかし20μm以上の実用的な膜厚になると、m解重合
時間が短い場合は、電極面に接触しているフィルム面の
み導電性になり、フィルム全体全導電性にできず、高透
過率半導体フィルムとして使用する際に問題が多い。However, when the film thickness reaches a practical value of 20 μm or more, if the depolymerization time is short, only the film surface that is in contact with the electrode surface becomes conductive, and the entire film cannot be fully conductive, resulting in a high transmittance semiconductor film. There are many problems when using it as
他方、このような膜厚で反対面まで導電性を伺与しよつ
とすると、電解重合時間を長くせざるt得す、したがっ
て透光率が低下してくる。On the other hand, if one attempts to impart conductivity to the opposite surface with such a film thickness, the electrolytic polymerization time must be lengthened, resulting in a decrease in light transmittance.
本発明は前記従来技術の問題点を解決するためになされ
たものであり、その目的は透明性に優れた導電性高分子
フィルム及びその製造方法全提供することにある。The present invention has been made to solve the problems of the prior art, and its purpose is to provide a conductive polymer film with excellent transparency and a complete method for manufacturing the same.
本発明を概説すれば、本発明の第1の発明は透明性に優
れ良導電性高分子フィルムに関する発明であって、高分
子フィルム中に芳香族化合物の電解重合体が複合された
導電性高分子フィルムにおいて、規則的な細線状の高導
電性部位金有すること全特徴とする。To summarize the present invention, the first invention relates to a highly conductive polymer film with excellent transparency. The molecular film is characterized by having regular, thin, highly conductive moieties.
そして、本発明の第2の発明は、透明性に優れ良導電性
高分子フィルムの製造方法に関する極上で芳香族化合物
の電解重合全行5工程、及び電解重合後のフィルムを該
電極からはく離する工程の各工程を包含することを特徴
とする。The second invention of the present invention relates to a method for producing a polymer film with excellent transparency and good conductivity, which includes all 5 steps of electrolytic polymerization of an aromatic compound and peeling off the film after electrolytic polymerization from the electrode. It is characterized by including each step of the process.
高分子フィルム全密着した電極上で、芳香族化合物の電
解重合を行い、高分子フィルムと芳香族化合物の電解重
合体が複合化され良導電性高分子フィルムk 4J 6
際に、電極の端部や欠陥のある部分で電流の集中が起り
、電解重合がより早く進行し、フィルムの電気伝導度に
著しい不均一が生じる。Electrolytic polymerization of the aromatic compound is performed on the electrode with the polymer film fully adhered, and the polymer film and the electrolytic polymer of the aromatic compound are combined to form a highly conductive polymer film K 4J 6
In this case, current concentration occurs at the edges or defective areas of the electrode, causing electropolymerization to proceed faster and causing significant non-uniformity in the electrical conductivity of the film.
本発明者等は、この現象全利用し、このような電流の集
中が生じやすい部分を電極上に規則的に設けることによ
p1光透過率の高い導電性高分子フィルムが得られるこ
とを見出し几。The present inventors have discovered that a conductive polymer film with high p1 light transmittance can be obtained by making full use of this phenomenon and regularly providing areas on the electrode where such current concentration tends to occur.几.
以下、本発明全添付図面に基づいて具体的に説明する。Hereinafter, the present invention will be specifically explained based on all the accompanying drawings.
第1図は、本発明の製造方法の1例の工程図である。第
1図において符号1μ電極、2はバタン化され几絶縁体
、5は絶縁性高分子フィルム、4は導電化された高分子
フィルム全意味する。また、第2図に本発明による規則
的な細線状の導通部位?もつ電極バタン01例の概要図
である。まず、第1図に本発明で使用する電極の代表的
製造例金示す。低抵抗の電極1の表面に、細い線状のギ
ャップを残すようにしてバタン化し几絶縁体2全設は皮
ものであり、この表面に高分子フィルムt−m布する。FIG. 1 is a process diagram of one example of the manufacturing method of the present invention. In FIG. 1, the reference numeral 1μ electrode, 2 a battened insulator, 5 an insulating polymer film, and 4 all electrically conductive polymer films. Also, FIG. 2 shows regular thin line-shaped conductive parts according to the present invention. It is a schematic diagram of an example of an electrode button 01. First, FIG. 1 shows a typical manufacturing example of the electrode used in the present invention. A thin linear gap is left on the surface of the low-resistance electrode 1, and the whole insulator 2 is made of leather, and a polymer film tm is placed on this surface.
このような電極上で芳香族化合物の電解重合を行うと、
細線ギャップ部に電流が集中して電解重合が進行し、フ
ィルム表WJKまで導電パスが形成てれる。これと同時
に横方向にもわずかに電解重合が進行する。シ九がって
適当な重合時間で電解重合上停止することにより、細線
ギヤラグ近傍部は高導電性で深く着色するものの、ギャ
ップの中間部は、低導電性であるが光透過率を高くでき
る。このため、フィルム全体としては相当の光透過性全
確保でき、とりわけ、これを用いて静電気防止用の透明
フィルム’ell造する際には、内部の物体全十分目視
できる。光透過率は電解重合条件以外に、a線ギャップ
部の幅と、そのピッチ間隔を制御することによっても、
変化させることができる。この間隔は、導電化する膜厚
も考慮に入れて適正化する必要がある。When electropolymerization of aromatic compounds is performed on such an electrode,
Electric current is concentrated in the thin wire gap portion, electrolytic polymerization progresses, and a conductive path is formed up to the film surface WJK. At the same time, electrolytic polymerization slightly progresses in the lateral direction as well. By stopping electrolytic polymerization at an appropriate polymerization time, the area near the thin wire gear lug becomes highly conductive and deeply colored, but the middle area of the gap has low conductivity but high light transmittance. . Therefore, the film as a whole can have a considerable degree of light transmittance, and in particular, when it is used to make a transparent film for preventing static electricity, all objects inside can be clearly seen. In addition to the electropolymerization conditions, the light transmittance can also be controlled by controlling the width of the a-line gap and its pitch interval.
It can be changed. This interval needs to be optimized taking into account the thickness of the film to be made conductive.
フィルム面内の電気伝導度と光透過率を均一にするには
、細線ギャップ部全均−に規則的に設けることが必要で
、このためには、第2図のような六角形のハチの巣形や
、六角形のよりな構造に配置するのが有効である。In order to make the electrical conductivity and light transmittance uniform in the plane of the film, it is necessary to provide thin wire gaps evenly and regularly throughout the film. It is effective to arrange them in a nest-shaped or hexagonal structure.
電流の集中を起させる細線状ギャップとしては10μm
以下、特に5μm以下が有効である。他方、ギャップ間
のピッチμ、導電性にする高分子フィルムの膜厚#後が
望ましく、少なくとも20μm以上にしないと十分な光
透過率を示さない場合が多い。The thin linear gap that causes current concentration is 10 μm.
Below, a thickness of 5 μm or less is particularly effective. On the other hand, the pitch μ between the gaps and the thickness # of the conductive polymer film are desirable, and sufficient light transmittance is often not exhibited unless the pitch is at least 20 μm.
このような電極は、適当な導体面上に通常のホトリソグ
ラフィ技術を適用して作製できる。Such electrodes can be fabricated on a suitable conductive surface using conventional photolithography techniques.
電極表面の材質としては、金、白金、パラジウム等の貴
金属あるいは酸化スズ、酸化インジウム等の導電性金属
酸化物、あるいは、クロム、ニッケル、ステンレス等の
卑金属あるいはこれら?組合せたものが使用できる。The material for the electrode surface is noble metals such as gold, platinum, and palladium, conductive metal oxides such as tin oxide and indium oxide, or base metals such as chromium, nickel, and stainless steel. A combination can be used.
また、電極導体面に細線状のギャップを設けるための絶
縁体としては、レジスト材そのものが使用できるが、フ
ィルムの作製、引きはがしを繰返すiとレジストバタン
かはがれやすいため、繰返しの使用に耐えない。この九
め、密着力を高<t、7tSiOや8103 等の絶
縁性酸化物、Si、N、 、BN等の窒化物を使用した
方が望ましい。In addition, the resist material itself can be used as an insulator to create a thin line-shaped gap on the electrode conductor surface, but it cannot withstand repeated use because it easily peels off when the film is repeatedly made and peeled off. . Ninth, it is preferable to use an insulating oxide such as SiO or 8103, or a nitride such as Si, N, BN, etc., with a high adhesion strength <t>7t.
細線状の導通部位を形成するには、このようなパタン全
盲するホトマスクを用い、レジスト層ニハタン全転写し
、これt基にリフトオフ又はエツチングにより絶縁体で
バタンを形成する。In order to form a thin line-shaped conductive portion, a photomask that completely blinds such a pattern is used to completely transfer the resist layer, and a batten is formed using an insulator on this base by lift-off or etching.
2.0μn@以下のギャップ全形成するKは電子ビーム
露光やXlj転写技術を使用すればよい。Electron beam exposure or Xlj transfer technology may be used for K to completely form a gap of 2.0 .mu.n@ or less.
本発明で導電性にできる高分子フィルムとしてはポリ塩
化ビニル系樹脂、すなわち、ポリ塩化ビニル及び塩化ビ
ニルと各種ビニルエステル類、ビニルエーテル類、アク
リル酸及びそのエステル類、メタクリル酸及びそのエス
テル類、マレイン酸及びそのエステル類、フマル酸及び
そのエステル類、無水マレイン酸、スチレンを始めとす
る芳香族ビニル化合物、ノ・ロゲン化ビニリデン化合物
、アクリロニトリル、メタクリロニトリル、プロピレン
等のモノマーとの共重合体が使用で′f!る。′また、
塩化ビニリデンと各檀ビニルエステル、ビニルエーテル
、アクリロニトリル、メタクリロニトリル、塩化ビニル
等の共重合体、また、ポリエチレン及びエチレンと上記
各種モノマーとの共重合体も使用できる。Examples of polymer films that can be made conductive in the present invention include polyvinyl chloride resins, that is, polyvinyl chloride, vinyl chloride and various vinyl esters, vinyl ethers, acrylic acid and its esters, methacrylic acid and its esters, maleic acid, etc. Copolymers with monomers such as acids and their esters, fumaric acid and its esters, maleic anhydride, aromatic vinyl compounds including styrene, vinylidene compounds, acrylonitrile, methacrylonitrile, propylene, etc. Use 'f! Ru. 'Also,
Copolymers of vinylidene chloride and various vinyl esters, vinyl ethers, acrylonitrile, methacrylonitrile, vinyl chloride, etc., as well as copolymers of polyethylene and ethylene with the above-mentioned various monomers, can also be used.
また用途により、ポリフッ化ビニリデン、ポリフッ化ビ
ニル、ポリカーボネート類、各種ナイロン類、ポリエチ
レンテレフタレート、ポリエーテルイミド、ポリスルホ
ン、ポリイミド類、各種ゴム類も使用できる。Depending on the purpose, polyvinylidene fluoride, polyvinyl fluoride, polycarbonates, various nylons, polyethylene terephthalate, polyetherimide, polysulfone, polyimides, and various rubbers can also be used.
更に以上の樹脂に可塑剤、熱、安定剤、滑剤、紫外線吸
収剤、防鍾剤、顔料、染料、界面活性剤等全配合したフ
ィルムも使用できる。Furthermore, a film containing all of the above resins including a plasticizer, heat stabilizer, lubricant, ultraviolet absorber, anti-corrosion agent, pigment, dye, surfactant, etc. can also be used.
また、電解重合できる芳香族化合物としては、ビロール
、5−メチルビロール、N−/?ルビロール、チオフェ
ン、6−メチルチオフェン、フラン、フェノール、チオ
フェノール、セレノフェン、テルロフェン、ビフェニル
、アズレン、p−1−フェニル、0−ターフェニル、p
−クォータフェニル、2−ヒドロキシピフェニル、ジフ
ェニルスルフィド、2−(α−チェニル)チオフェン、
2−(α−チェニルンフラン、2−(2−ピロリル)ビ
ロール、2−(2−ピロリル)チオフェン、2−フェニ
ルチオフェン、α−チェニルフェニルエーテル、β−フ
リル−α−チェニルセレニド、2−(2−ピロリル)セ
レノフェン、2−(2−セレニエニル)テルロフェン、
N−ビニルカルバゾール、N−エチニルカルバゾール、
メチルアズレン、ピレン等の芳香族化合物が使用できる
。ま友、芳香族化合物ではないが各種置換ブタジェン化
合物も使用できる。Further, aromatic compounds that can be electrolytically polymerized include virol, 5-methylvirol, N-/? rubirol, thiophene, 6-methylthiophene, furan, phenol, thiophenol, selenophene, tellurophene, biphenyl, azulene, p-1-phenyl, 0-terphenyl, p
-quarterphenyl, 2-hydroxypiphenyl, diphenyl sulfide, 2-(α-chenyl)thiophene,
2-(α-chenylumfuran, 2-(2-pyrrolyl)virol, 2-(2-pyrrolyl)thiophene, 2-phenylthiophene, α-chenylphenyl ether, β-furyl-α-chenylselenide, 2-( 2-pyrrolyl) selenophene, 2-(2-selenienyl) tellurophene,
N-vinylcarbazole, N-ethynylcarbazole,
Aromatic compounds such as methyl azulene and pyrene can be used. Also, various substituted butadiene compounds, although not aromatic compounds, can also be used.
また、電解重合時の電解質としては有機第4級アンモニ
ウム塩、無機塩、プロトン散及びエステル等種々の化合
物が使用できる。溶剤としてはアセトニトリル系のもの
全通常使用するプζ芳香族化合物の電解重合が可能で、
適当な電解質を溶解させるものであれば選択できる。Furthermore, various compounds such as organic quaternary ammonium salts, inorganic salts, proton powders, and esters can be used as electrolytes during electrolytic polymerization. As a solvent, all acetonitrile-based solvents can be used for electrolytic polymerization of aromatic compounds.
Any material can be selected as long as it dissolves an appropriate electrolyte.
以下、本発BA全実施例により更に具体的に説明するが
、本発明は高分子フィルム材、電解重合する芳香族化合
物の種類、フィルムの構造等全変化することにより無限
の組合せがある。したがって本発明はこれら実施例に限
定されない。The present invention will be explained in more detail with reference to all the examples of the BA of the present invention, but the present invention has infinite combinations by changing the polymer film material, the type of aromatic compound to be electrolytically polymerized, the structure of the film, etc. Therefore, the present invention is not limited to these examples.
実施例1
表面抵抗10Ω/−のネサガラス基板を電極として用い
た。この上にホトレジストムZ−1550J(シプレー
社製) i 1.2μmの厚さにスピンコードし、第2
図のような形状で2μmの線幅、18μmの間隔のバタ
ンをもつホトマスクを用いて、密着露光でバタンを転写
した。Yシストを現俸後、5Ioy熱蒸着でα25μm
厚に蒸着し、アセトン中でリフトオフすることによりネ
サガラス基板面を約2μm幅のギャップを残して810
で絶縁化した。Example 1 A Nesa glass substrate with a surface resistance of 10 Ω/- was used as an electrode. On top of this, photoresist Z-1550J (manufactured by Shipley) was spin-coded to a thickness of 1.2 μm, and a second
Using a photomask having a shape as shown in the figure with battens having a line width of 2 μm and an interval of 18 μm, the battens were transferred by contact exposure. After preparing Y cyst, α25 μm was obtained by thermal evaporation of 5Ioy.
By evaporating it to a thick thickness and lifting it off in acetone, the surface of the Nesa glass substrate was 810 mm thick, leaving a gap of approximately 2 μm width.
Insulated with.
この上にポリフッ化ビニリデンのN、N−ジメチルホル
ムアミド溶液tキャストし、厚さ20μmのポリフッ化
ビニリデンフィルムを形成した。A solution of polyvinylidene fluoride in N,N-dimethylformamide was cast on this to form a polyvinylidene fluoride film having a thickness of 20 μm.
他方、電解重合溶液として、ビロール(1,2モル/l
)、テトラエチルアンモニウムテトラフルオロポレート
(α5モル/l ) t−tむアセトニトリル−エチル
アルコール(2:1)溶液を調製した。On the other hand, as an electrolytic polymerization solution, virol (1.2 mol/l
), tetraethylammonium tetrafluoroporate (α5 mol/l) and acetonitrile-ethyl alcohol (2:1) solution was prepared.
この溶液中に前記フィルム付電極を浸漬し、白金メツシ
ュ全対向電極として5vで2分間ビロールの電解重合金
行った。The electrode with the film was immersed in this solution, and electrolytic polymerization of virol was carried out at 5 V for 2 minutes using the platinum mesh as an electrode facing all sides.
電解重合後、フィルムは電極より容易にはく離でき、フ
ィルムの抵抗と600nmでの光透過率を測定したとこ
ろ表1のような結果が得られた。After electropolymerization, the film could be easily peeled off from the electrode, and the resistance and light transmittance at 600 nm of the film were measured, and the results shown in Table 1 were obtained.
表 1
111 電極面に接した面金裏面、その反対面を表面
とする。また、口は1画角
を意味する。(以下同じ)
!!1から明らかなように、低い面抵抗と高い光透過率
?あわせもつ導電性高分子フィルムが得られ、また、フ
ィルムの膜厚方向に本導電性全有していた。Table 1 111 The back side of the metal plate in contact with the electrode surface, and the opposite side is the front side. Furthermore, a mouth means one angle of view. (same as below) ! ! As is clear from 1, low sheet resistance and high light transmittance? An electrically conductive polymer film with excellent properties was obtained, and the entire film had electrical conductivity in the thickness direction.
実施例2
実施例1で用い几電極と同一の電極を用い、ポリ塩化ビ
ニルのテトラヒドロフラン−メチルエテルケトン混合溶
液を中ヤストレ、厚さ55μm のフィルムを形成し几
。Example 2 Using the same electrode as that used in Example 1, a mixed solution of polyvinyl chloride in tetrahydrofuran-methyl ether ketone was mixed to form a film with a thickness of 55 μm.
このフィルム付基板を、白金/ツシュ対向電極と共にチ
オフェン(1モル/1)、テトラエテルアンモニウムバ
ークロレート(+lL5モル/l ) ffi含trア
セトニトリル−ニトロベンゼン(1:1)溶液に浸漬し
、2分間aovでチオフェンの電解重合を行った。この
フィルムは、電極基板より容易にはく離でき、電気伝導
度と光透過率(600nm)t″求めたところ、表2の
ような結果が得られ几。This film-coated substrate was immersed together with a platinum/Tsch counter electrode in a solution of thiophene (1 mol/1), tetraethelammonium barchlorate (+lL 5 mol/l), ffi-containing tr acetonitrile-nitrobenzene (1:1), and a 2-minute a.o.v. Electrolytic polymerization of thiophene was carried out. This film could be easily peeled off from the electrode substrate, and when the electrical conductivity and light transmittance (600 nm) t'' were determined, the results shown in Table 2 were obtained.
表 2
表2から明らかなように、55μmの比較的厚いフィル
ムでも両面だけでなく膜厚方向にも導電性を有し、高い
光透過率のフィルムが得られた。Table 2 As is clear from Table 2, even a relatively thick film of 55 μm had conductivity not only on both sides but also in the film thickness direction, and a film with high light transmittance was obtained.
以上説明したように、本発明に従って、規則的な細線状
の導通部位を有する電極上に高分子フィルム全密着させ
て、芳香族化合物の電解重合を行うと、細線状の導通部
位に接した高分子フィルム部から速かに導電性の電解重
合体が生成し、フィルム全体を導電性にする。こうして
得られたフィルム扛細線部に接した部分は、深い着色が
みられるものの電解重合条件全適正に設定することによ
り全体としては光透過率の高いフィルムが得られる利点
がある。このよつな光透過率の高い導電性フィルムは静
電気防止用包装フィルム、入出力機器用透明導電性フィ
ルム等の産業上の有益な利用分野がある。As explained above, according to the present invention, when an aromatic compound is electrolytically polymerized with a polymer film in full contact with an electrode having regular thin line conductive sites, the polymer film in contact with the thin line conductive sites is A conductive electrolytic polymer is quickly generated from the molecular film portion, making the entire film conductive. Although the portions of the film thus obtained that are in contact with the thin lines are deeply colored, there is an advantage that a film with high light transmittance can be obtained as a whole by appropriately setting the electrolytic polymerization conditions. This conductive film with high light transmittance has useful industrial fields of use, such as antistatic packaging films and transparent conductive films for input/output devices.
第1図は本発明の製造方法の1例の工程図、第2図は本
発明による規則的な細線状の導通部位にもつ電極パタン
の1例の概要図である。
1:電極、2:バタン化された絶縁体、5:絶縁性高分
子フィルム、4:導電化された高分子フィルムFIG. 1 is a process diagram of an example of the manufacturing method of the present invention, and FIG. 2 is a schematic diagram of an example of an electrode pattern having regular thin line-shaped conducting portions according to the present invention. 1: Electrode, 2: Battered insulator, 5: Insulating polymer film, 4: Conductive polymer film
Claims (1)
合された導電性高分子フィルムにおいて、規則的な細線
状の高導電性部位を有することを特徴とする透明性に優
れた導電性高分子フィルム。 2、規則的な細線状の導通部位を有する電極上に高分子
フィルムを密着させる工程、該フィルム付電極上で芳香
族化合物の電解重合を行う工程、及び電解重合後のフィ
ルムを該電極からはく離する工程の各工程を包含するこ
とを特徴とする透明性に優れた導電性高分子フィルムの
製造方法。[Claims] 1. A conductive polymer film in which an electrolytic polymer of an aromatic compound is composited in a polymer film, which is characterized by having highly conductive sites in the form of regular thin lines. A conductive polymer film with excellent properties. 2. A step of closely adhering a polymer film onto an electrode having regular thin line conductive parts, a step of electrolytically polymerizing an aromatic compound on the electrode with the film, and peeling off the electrolytically polymerized film from the electrode. 1. A method for producing a conductive polymer film with excellent transparency, the method comprising the steps of:
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59155605A JPS6136360A (en) | 1984-07-27 | 1984-07-27 | Electrically conductive high polymer film having improved transparency and production thereof |
US06/736,491 US4608129A (en) | 1984-05-22 | 1985-05-21 | Polymer film with conductive pattern and method of manufacturing the same |
EP19850303589 EP0162706B1 (en) | 1984-05-22 | 1985-05-21 | Polymer film with conductive pattern and method of manufacturing the same |
DE8585303589T DE3581835D1 (en) | 1984-05-22 | 1985-05-21 | POLYMERIZED PLASTIC FILM WITH A CONDUCTIVE PATTERN AND METHOD FOR PRODUCING THE SAME. |
KR1019850003528A KR900003155B1 (en) | 1984-05-22 | 1985-05-22 | Polymer film with conductive pattern and method of manufacturing the same |
CA000482107A CA1243736A (en) | 1984-05-22 | 1985-05-22 | Polymer film with conductive pattern and method of manufacturing the same |
US07/243,242 US4898766A (en) | 1984-05-22 | 1988-09-08 | Polymer film with conductive pattern and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59155605A JPS6136360A (en) | 1984-07-27 | 1984-07-27 | Electrically conductive high polymer film having improved transparency and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6136360A true JPS6136360A (en) | 1986-02-21 |
Family
ID=15609675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59155605A Pending JPS6136360A (en) | 1984-05-22 | 1984-07-27 | Electrically conductive high polymer film having improved transparency and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6136360A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010500729A (en) * | 2006-08-16 | 2010-01-07 | サン−ゴバン グラス フランス | Transparent electrode |
-
1984
- 1984-07-27 JP JP59155605A patent/JPS6136360A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010500729A (en) * | 2006-08-16 | 2010-01-07 | サン−ゴバン グラス フランス | Transparent electrode |
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