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JPS61266241A - Surface treating method of copper - Google Patents

Surface treating method of copper

Info

Publication number
JPS61266241A
JPS61266241A JP10911185A JP10911185A JPS61266241A JP S61266241 A JPS61266241 A JP S61266241A JP 10911185 A JP10911185 A JP 10911185A JP 10911185 A JP10911185 A JP 10911185A JP S61266241 A JPS61266241 A JP S61266241A
Authority
JP
Japan
Prior art keywords
copper
film
resin
hydrochloric acid
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10911185A
Other languages
Japanese (ja)
Inventor
鈴木 芳博
和嶋 元世
奈良原 俊和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10911185A priority Critical patent/JPS61266241A/en
Publication of JPS61266241A publication Critical patent/JPS61266241A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

Landscapes

  • Laminated Bodies (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は銅とレジンとの複合材料に係り、特に銅の腐食
作用を抑制し、かつ銅とレジンとの接着性を高めるのに
好適な銅の表面処理法に関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a composite material of copper and resin, and in particular, copper is suitable for suppressing the corrosive effect of copper and improving the adhesion between copper and resin. Concerning surface treatment methods.

〔発明の背景〕[Background of the invention]

多層プリント板用の基材には現在エポキシレジンが多く
使用されている。多層プリント板のエポキシレジンと銅
配線との接着性を高めるため、英−太:プリント配線用
材料と加工技術、(株)シーエムシー、p76〜p81
(昭56年)に記載されてるように通常は銅配線の表面
に酸化膜を形成する処理をしている。しかし、レジンの
材質の種類を変えた場合、常に十分な接着力が得られる
とは限らず、レジンの種類に応じて、酸化膜の形成条件
も変えなければならない。すなわち、基板に対して半導
体の実装密度を高めるべく、配線の高密度化が求められ
、それに伴ない、基板のレジン材質もより寸法精度のす
ぐれたものとしてポリイミド系のものが使用されるよう
になってきている。このポリイミド樹脂と銅配線との接
着力を高めるための銅配線の処理法としては亜塩素酸を
酸化剤とし、リン酸イオンを含むアルカリ性の液を用い
、銅配線上に銅の酸化物を形成させる方法がある。この
方法を実施した結果、接着特性に関し、1.0kg/■
以上の高いビール強度を示す銅の表面処理法があること
がわかった。しかし、一方で酸化膜を用いる限り、酸に
接するような雰囲気下では酸化膜が溶解し、接着特性が
低下することがわかった。このため、酸化膜を用いなく
、しかもビール強度の高い値を示す処理法として、銅表
面を電気的に還元処理する方法について検討した。
Currently, epoxy resins are often used as base materials for multilayer printed boards. In order to improve the adhesion between epoxy resin and copper wiring of multilayer printed boards, Eita: Printed wiring materials and processing technology, CMC Co., Ltd., p76-p81.
As described in (1981), a process is usually performed to form an oxide film on the surface of the copper wiring. However, when the type of resin material is changed, it is not always possible to obtain sufficient adhesive strength, and the conditions for forming the oxide film must also be changed depending on the type of resin. In other words, in order to increase the packaging density of semiconductors on the board, higher wiring density is required, and as a result, polyimide-based resin materials are being used for the board with better dimensional accuracy. It has become to. In order to improve the adhesive strength between this polyimide resin and copper wiring, the copper wiring treatment method uses chlorous acid as an oxidizing agent and an alkaline solution containing phosphate ions to form copper oxide on the copper wiring. There is a way to do it. As a result of implementing this method, the adhesive properties were 1.0 kg/■
It has been found that there is a method for surface treatment of copper that exhibits the above-mentioned high beer strength. However, on the other hand, it has been found that as long as an oxide film is used, the oxide film dissolves in an atmosphere where it comes into contact with acid, and the adhesive properties deteriorate. For this reason, we investigated a method of electrically reducing the copper surface as a treatment method that does not use an oxide film and also provides a high beer strength value.

その結果、ビールの高い値を示し、かつ耐酸性に対して
もすぐれた特性を有する処理条件があることがわかった
。しかし、得られた還元処理膜は電流密度の分布などに
より、試料間または試料面内においてバラツキがあり、
ビール強度が常に高い値を有するとは限らなかった。
As a result, it was found that there are processing conditions that give beer a high value and also have excellent acid resistance properties. However, the obtained reduction-treated film has variations between samples or within the sample plane due to current density distribution, etc.
Beer strength did not always have high values.

なお、銅配線と樹脂との接着特性を高める方法として、
銅配線の表面をエツチングにより粗化処理した後、シラ
ン系のカップリング剤を用い、銅配線の表面をカップリ
ング剤の膜でコーティングした後、銅配線と樹脂とを接
着させる方法が示されており、これにより接着力が向上
することが報告されている(特許公報:昭54−349
07 )。
In addition, as a method to improve the adhesive properties between copper wiring and resin,
A method is shown in which the surface of the copper wiring is roughened by etching, the surface of the copper wiring is coated with a film of the coupling agent using a silane-based coupling agent, and then the copper wiring and the resin are bonded. It has been reported that this improves adhesive strength (Patent Publication: 1983-349).
07).

しかし、耐酸性については、必らずしも十分なものが得
られていない。
However, sufficient acid resistance has not always been obtained.

〔発明の目的〕[Purpose of the invention]

本発明の目的は樹脂との接着特性に関し、バラツキが少
なく、常に安定した接着力を有し、かつ耐塩酸性にもす
ぐれた銅の表面処理法を提供することにある。
An object of the present invention is to provide a method for surface treatment of copper that has little variation in adhesive properties with resin, always has stable adhesive strength, and has excellent hydrochloric acid resistance.

〔発明の概要〕[Summary of the invention]

レジンに対する銅の接着力を高くする方法としては、銅
の表面を著しく粗化させることにより(凹凸の大きさ:
〉6μm)、可能である。しかし、絶縁置板上に微細な
銅配線を形成しようとすると、銅表面の粗度は制約を受
ける。そのため、表面の粗度を6μmよりも小さく、抑
えた状態で常に、バラツキが少なく、高接着特性を示し
、しかも耐塩酸性にすぐれた銅表面処理膜を形成するた
めに、銅表面の酸化膜を形成した後、電気的に還元する
。その後、銅の腐食抑制剤として用いられている複素環
中に窒素を含む有機化合物の皮膜を還元膜の表面上に塗
布したところ、接着特性が一段と向上し、耐塩酸性もよ
り向上することがわかった。
One way to increase the adhesion of copper to resin is to significantly roughen the surface of the copper (size of unevenness:
>6 μm), possible. However, when attempting to form fine copper wiring on an insulating board, the roughness of the copper surface is subject to restrictions. Therefore, in order to form a copper surface treatment film that always has little variation, exhibits high adhesion properties, and has excellent hydrochloric acid resistance while keeping the surface roughness to less than 6 μm, we have developed an oxide film on the copper surface. After formation, it is electrically reduced. Subsequently, when a film of an organic compound containing nitrogen in a heterocycle, which is used as a corrosion inhibitor for copper, was applied to the surface of the reduced film, it was found that the adhesive properties were further improved and the hydrochloric acid resistance was further improved. Ta.

〔発明の実施例〕[Embodiments of the invention]

実施例1 厚さ70μmの鋼箔の表面を、蒸留水IQあたり。 Example 1 The surface of a 70 μm thick steel foil was soaked in distilled water IQ.

NaCQo、      5Qg NaaPo、       20g N a OH10g を溶解させた液により、酸化し、鋼箔表面上に銅の酸化
物を含む皮膜を形成する。この皮膜をアルカリ性の水溶
液中で電気的に還元した後、1,2゜3−ベンゾトリア
ゾールをIQあたり10−”mojl溶解した液に浸漬
し、乾燥し、ポリイミドのプリプレグを用い、圧力15
kg/cm″の下で、170’C,lh加熱し、接着し
た。ポリイミド樹脂に対する銅箔のビール強度は1.4
  kg/c鳳であり、接着特性は良好であった。また
、耐塩酸性については、第1図に示す多層板を作成し、
ドリルで孔あけした後、塩酸17.5%の液に1h浸漬
し、スルーホールの側面からの銅箔とポリイミド樹脂界
面への塩酸による浸込み幅を測定した。その結果、塩酸
浸込みは認められず、耐塩酸性は良好であった。
The steel foil is oxidized with a solution containing 20 g of NaCQo, 5Qg NaaPo, and 10 g of NaOH to form a film containing copper oxide on the surface of the steel foil. After electrically reducing this film in an alkaline aqueous solution, it was immersed in a solution containing 10-" mojl of 1,2°3-benzotriazole per IQ, dried, and coated with a polyimide prepreg under a pressure of 15
kg/cm'' at 170'C for 1h and bonded. The beer strength of copper foil against polyimide resin is 1.4.
kg/c, and the adhesive properties were good. Regarding hydrochloric acid resistance, we created a multilayer board as shown in Figure 1.
After drilling a hole, it was immersed in a 17.5% hydrochloric acid solution for 1 hour, and the width of penetration of the hydrochloric acid into the interface between the copper foil and the polyimide resin from the side of the through hole was measured. As a result, no penetration of hydrochloric acid was observed, and the hydrochloric acid resistance was good.

実施例2 実施例1における1、2,3−ベンゾトリアゾールの代
りにピロール、ジベンゾピロール、ピラゾール、2,1
−ベンゾピラゾール、チアゾール。
Example 2 Pyrrole, dibenzopyrrole, pyrazole, 2,1 instead of 1,2,3-benzotriazole in Example 1
-Benzopyrazole, thiazole.

2−アミノチアゾール、ベンゾチアゾール、2−アミノ
ベンゾチアゾール、イミダゾール、2−アミノイミダゾ
ール、ベンゾイミダゾール、2−アミノベンゾイミダゾ
ール、1,2.3−トリアゾール、2,1,3−トリア
ゾール、1,2.4−トリアゾール、4,1,2.−ト
リアゾール、3−アミノ1,2.4トリアゾール、アル
キル−1゜2.3ベンゾトリアゾール、ナフト−1,2
,8−トリアゾール、アルキルナフト−1,2,3トリ
アゾール、3−メルカプト−1,2,4−トリアゾール
、■−メチルー2−メルカプトイミダゾール、メルカプ
トベンゾチアゾール、チオ尿素。
2-aminothiazole, benzothiazole, 2-aminobenzothiazole, imidazole, 2-aminoimidazole, benzimidazole, 2-aminobenzimidazole, 1,2.3-triazole, 2,1,3-triazole, 1,2. 4-triazole, 4,1,2. -triazole, 3-amino 1,2.4 triazole, alkyl-1゜2.3 benzotriazole, naphtho-1,2
, 8-triazole, alkylnaphtho-1,2,3-triazole, 3-mercapto-1,2,4-triazole, ■-methyl-2-mercaptoimidazole, mercaptobenzothiazole, thiourea.

エチレンチオ尿素、トリメチレンチオ尿素、フエニレン
チオ尿素をそれぞれ単独にあるいは組合せて用いてもビ
ール強度および耐塩酸性に対して同様な効果が認められ
た。
Similar effects on beer strength and hydrochloric acid resistance were observed when ethylenethiourea, trimethylenethiourea, and phenylenethiourea were used individually or in combination.

実施例3 実施例1におけるポリイミド樹脂の代りに、エポキシ樹
脂を用いたところ、ビール強度が1.5kg / ct
aであり、塩酸浸み込みは2μm以下であり、いずれも
良好な特性を示した。
Example 3 When an epoxy resin was used instead of the polyimide resin in Example 1, the beer strength was 1.5 kg/ct.
a, and the hydrochloric acid penetration was 2 μm or less, showing good characteristics in both cases.

比較例1 実施例1において、銅配線上に形成した酸化膜を還元し
た後の1.2.3−ベンゾトリアゾールを含む液に基板
を浸漬する工程を省略した。他は実施例1と同じ条件で
実施した。その結果、ビール強度が1.1  kg/c
m、塩酸浸込み量は2μmであり、実施例1の接着特性
および耐塩酸性に比べ、いずれも特性が悪かった。
Comparative Example 1 In Example 1, the step of immersing the substrate in a solution containing 1,2,3-benzotriazole after reducing the oxide film formed on the copper wiring was omitted. The other conditions were the same as in Example 1. As a result, the beer strength was 1.1 kg/c.
m, the amount of hydrochloric acid penetration was 2 μm, and both the adhesive properties and hydrochloric acid resistance of Example 1 were poor.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、ポリイミド樹脂あるいはエポキシ樹脂
に対して接着特性がすぐれ、かつ耐塩酸性にすぐれた特
性を有する銅の表面処理膜を作成できるので、多層プリ
ント板用の銅の表面処理に効果がある。
According to the present invention, it is possible to create a copper surface treatment film that has excellent adhesive properties to polyimide resins or epoxy resins and has excellent hydrochloric acid resistance, so it is effective in surface treatment of copper for multilayer printed boards. be.

【図面の簡単な説明】[Brief explanation of drawings]

図は塩酸浸み込み量評価用の多層板の断面図である。 1・・・電解還元膜、2・・・銅箔、3・・・ポリイミ
ドまたはエポキシ樹脂、4・・・複素環中に窒素を含む
有機化合物、5・・・スルホール。
The figure is a cross-sectional view of a multilayer board for evaluating the amount of hydrochloric acid seepage. DESCRIPTION OF SYMBOLS 1... Electrolytic reduction membrane, 2... Copper foil, 3... Polyimide or epoxy resin, 4... Organic compound containing nitrogen in the heterocycle, 5... Throughhole.

Claims (1)

【特許請求の範囲】 1、銅上に複素環中に窒素を含む有機化合物の皮膜を形
成し、この皮膜を介して銅とレジンとを接着させること
を特徴とした銅の表面処理法。 2、プリント配線板の内層回路銅として銅の表面が金属
銅、酸化物を含む金属層および酸化膜層のうちの少なく
とも1種類以上で構成されていることを特徴とした特許
請求の範囲第1項記載の銅の表面処理法。 3、酸化物を含む金属層の金属層が電気的もしくは化学
的もしくはこれらを併用して還元されたことを特徴とす
る特許請求の範囲第2項記載の銅の表面処理法。
[Scope of Claims] 1. A method for surface treatment of copper, which comprises forming a film of an organic compound containing nitrogen in a heterocyclic ring on copper, and adhering the copper and resin through this film. 2. Claim 1, characterized in that the surface of the copper as the inner layer circuit copper of the printed wiring board is composed of at least one of metal copper, a metal layer containing an oxide, and an oxide film layer. Copper surface treatment method described in section. 3. The copper surface treatment method according to claim 2, wherein the metal layer containing an oxide is electrically or chemically reduced or a combination thereof.
JP10911185A 1985-05-21 1985-05-21 Surface treating method of copper Pending JPS61266241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10911185A JPS61266241A (en) 1985-05-21 1985-05-21 Surface treating method of copper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10911185A JPS61266241A (en) 1985-05-21 1985-05-21 Surface treating method of copper

Publications (1)

Publication Number Publication Date
JPS61266241A true JPS61266241A (en) 1986-11-25

Family

ID=14501839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10911185A Pending JPS61266241A (en) 1985-05-21 1985-05-21 Surface treating method of copper

Country Status (1)

Country Link
JP (1) JPS61266241A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996017503A1 (en) * 1994-12-01 1996-06-06 Ibiden Co., Ltd. Multilayer printed wiring board and process for producing the same
EP0893947A1 (en) * 1997-07-24 1999-01-27 MEC CO., Ltd. Method for surface treatment of copper or copper alloys
US6733886B2 (en) 2001-04-25 2004-05-11 Mec Company Ltd. Laminate and method of manufacturing the same
JP2005086071A (en) * 2003-09-10 2005-03-31 Hitachi Chem Co Ltd Multi-layer wiring board, semiconductor chip mounting board, semiconductor package, and manufacturing method thereof
JP2011517324A (en) * 2008-03-07 2011-06-02 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Non-etching and non-resist adhesive composition and processing method of processed parts
JP2012216759A (en) * 2010-11-05 2012-11-08 Fujifilm Corp Printed wiring board manufacturing method and printed wiring board
KR20170032275A (en) 2014-07-14 2017-03-22 도다 고교 가부시끼가이샤 Method for producing conductive coating film, and conductive coating film
JP2022009114A (en) * 2019-02-26 2022-01-14 ベジ 佐々木 Substrate, electronic component, and mounting device
JP2023029271A (en) * 2021-08-20 2023-03-03 柏群科技有限公司 Surface binder and substrate surface treating method
WO2024116581A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board
WO2024116579A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board
WO2024116580A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996017503A1 (en) * 1994-12-01 1996-06-06 Ibiden Co., Ltd. Multilayer printed wiring board and process for producing the same
US5827604A (en) * 1994-12-01 1998-10-27 Ibiden Co., Ltd. Multilayer printed circuit board and method of producing the same
EP0893947A1 (en) * 1997-07-24 1999-01-27 MEC CO., Ltd. Method for surface treatment of copper or copper alloys
US6733886B2 (en) 2001-04-25 2004-05-11 Mec Company Ltd. Laminate and method of manufacturing the same
EP2259665A1 (en) 2001-04-25 2010-12-08 Mec Company Ltd. Solution for surface treatment
JP2005086071A (en) * 2003-09-10 2005-03-31 Hitachi Chem Co Ltd Multi-layer wiring board, semiconductor chip mounting board, semiconductor package, and manufacturing method thereof
JP2011517324A (en) * 2008-03-07 2011-06-02 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング Non-etching and non-resist adhesive composition and processing method of processed parts
US8945298B2 (en) 2008-03-07 2015-02-03 Atotech Deutschland Gmbh Non-etching non-resist adhesion composition and method of preparing a work piece
JP2012216759A (en) * 2010-11-05 2012-11-08 Fujifilm Corp Printed wiring board manufacturing method and printed wiring board
KR20170032275A (en) 2014-07-14 2017-03-22 도다 고교 가부시끼가이샤 Method for producing conductive coating film, and conductive coating film
JP2022009114A (en) * 2019-02-26 2022-01-14 ベジ 佐々木 Substrate, electronic component, and mounting device
JP2023029271A (en) * 2021-08-20 2023-03-03 柏群科技有限公司 Surface binder and substrate surface treating method
WO2024116581A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board
WO2024116579A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board
WO2024116580A1 (en) * 2022-11-29 2024-06-06 Jx金属株式会社 Surface-treated copper foil, copper-cladded laminate plate, and printed wiring board

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