JPS61231162A - Gold-colored outer ornament parts - Google Patents
Gold-colored outer ornament partsInfo
- Publication number
- JPS61231162A JPS61231162A JP60069384A JP6938485A JPS61231162A JP S61231162 A JPS61231162 A JP S61231162A JP 60069384 A JP60069384 A JP 60069384A JP 6938485 A JP6938485 A JP 6938485A JP S61231162 A JPS61231162 A JP S61231162A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- alloy
- gold
- phase
- mainly composed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B37/00—Cases
- G04B37/22—Materials or processes of manufacturing pocket watch or wrist watch cases
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐食性、耐磨耗性に優れた金色の外装部品に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a gold-colored exterior component with excellent corrosion resistance and abrasion resistance.
従来金又は金合金メッキを施した携帯時計用外装部品の
色調、外観、耐食性を維持しながら、耐磨耗性、耐擦傷
性を向上させる手段として、特公昭58−50320の
様に通常の金又は金合金による仕上げメッキの下に硬度
と耐磨耗性の優れた硬質メッキを施す方法、又は特公昭
59−26664又は、US特許4252862 、特
公昭58−153776、又はUS特許4415421
の様に、金又は金合金による仕上げメッキの下に、イオ
ンプレーティング等による硬質金色系の金属窒化物又は
金属炭化物等を形成しておく方法又はこれらの混合被膜
をコーティングする方法等が提案されている。As a means of improving abrasion resistance and scratch resistance while maintaining the color tone, appearance, and corrosion resistance of conventional gold or gold alloy plated exterior parts for mobile watches, ordinary gold plated Or a method of applying hard plating with excellent hardness and wear resistance under finish plating with gold alloy, or Japanese Patent Publication No. 59-26664, US Pat. No. 4,252,862, Japanese Patent Publication No. 58-153776, or US Pat.
A method has been proposed in which a hard golden metal nitride or metal carbide is formed by ion plating etc. under the final plating with gold or gold alloy, or a method is coated with a mixed film of these. ing.
〔発明が解決しようとしている問題点〕前述の従来技術
の中で、湿式メッキの組合せのみによる方法では、硬度
、耐磨耗性、耐擦傷性に限界がある。又金属窒化物又は
金属炭化物に金又は金合金との組合せ技術においては、
■ 窒化物、炭化物と金又は金合金の間の密着性不良の
問題
■ 上記密着性確保のための、PVD法による金又は金
合金形成による全回収歩留シネ良の問題
■ PVD法による金又は金合金形成時の色調コントロ
ール酸の問題
を有している。[Problems to be Solved by the Invention] Among the above-mentioned conventional techniques, methods based only on a combination of wet plating have limitations in hardness, abrasion resistance, and scratch resistance. In addition, in the technology of combining metal nitrides or metal carbides with gold or gold alloys, ■ Problems with poor adhesion between nitrides or carbides and gold or gold alloys. Or the problem of total recovery yield and cine quality due to gold alloy formation. ■ There is a problem of color tone control acid when forming gold or gold alloy by PVD method.
そこで本発明の目的とする所は、金又は金合金による最
終表面被膜の下部に耐磨耗性、耐食性が優れるTiN被
膜を基地に対して密着性良く形成させ、この上に密着性
良くかつ耐食性の高い導電性被膜を一定の厚み以下で形
成し、この被膜上に従来からの金又は金合金の湿式メッ
キ被膜を形成可能とさせ、外観、色調、全回収歩留りを
従来の金又は金合金メッキ展品と同等以上に維持させ得
る事である。Therefore, the object of the present invention is to form a TiN coating with excellent abrasion resistance and corrosion resistance on the base under the final surface coating of gold or gold alloy, and to form a TiN coating with good adhesion and corrosion resistance on the base. A highly conductive film is formed below a certain thickness, and a conventional wet plating film of gold or gold alloy can be formed on this film, and the appearance, color tone, and overall recovery yield are better than that of conventional gold or gold alloy plating. This means that it can be maintained to the same level or better than the exhibited items.
又実用携帯後、金又は金合金層の一部が磨耗消失後も下
地硬質層により、それ以上の磨耗を防止可能とさせるこ
とで、この部分の色むらによる外観上の不具合を最少限
におさえんとするものである。In addition, even after a part of the gold or gold alloy layer has worn off after being put into practical use, the hard base layer can prevent further wear, thereby minimizing the appearance defects caused by color unevenness in this part. This is what we do.
本発明の金色外装部品は、TiとNの平衡状態図上のα
相を主体とした成分からなる第一層と、α相、ε相、δ
相の中から選ばれる2種以上の相の混合物を主体とした
第二層と、δ相を主体とした第三層と、δ相と純金属又
はその合金及びその金属窒化物を主体とした混合サーメ
ット層からなる第四層と、上記と同一組成の純金属又は
その合金を主体とした第五層と、金又は金合金を主体と
した第六層とからなる、金色被覆層が表面の一部又は全
体に形成されている事を特徴とする。The golden exterior part of the present invention has α on the equilibrium state diagram of Ti and N.
The first layer consists mainly of phase, α phase, ε phase, and δ phase.
A second layer mainly composed of a mixture of two or more phases selected from among the phases, a third layer mainly composed of a δ phase, and a δ phase and a pure metal or an alloy thereof and a metal nitride thereof. A golden coating layer on the surface consists of a fourth layer consisting of a mixed cermet layer, a fifth layer consisting mainly of pure metal or its alloy with the same composition as above, and a sixth layer consisting mainly of gold or gold alloy. It is characterized by being formed in part or in whole.
本発明の金色外装部品は、装飾部材なら何にでも適用で
き、携帯時計のケース部材、バンド、ライターケース、
眼鏡フレーム、ネクタイピン、指輪等に効果的であり、
その素地材質は、ステンレス鋼、Ni基合金、Co基合
金、黄銅、洋白等の銅基合金、亜鉛合金、アルミニウム
合金、セラミックス、耐熱性プラスチックス等測等限定
されない。The golden exterior part of the present invention can be applied to any decorative member, such as a case member of a mobile watch, a band, a lighter case,
Effective for eyeglass frames, tie clips, rings, etc.
The base material is not limited to stainless steel, Ni-based alloy, Co-based alloy, brass, copper-based alloy such as nickel silver, zinc alloy, aluminum alloy, ceramics, heat-resistant plastic, etc.
なお本発明でいうα相、ε相、δ相等は一般に知られて
いるが特に文献McGRAW−BOOKCoMPANY
発行の”HANSEN
CoNSTITUTION of BINARYA
LLOYS″の990頁を参照すればよい。Incidentally, the α phase, ε phase, δ phase, etc. referred to in the present invention are generally known, but in particular, they are described in the document McGRAW-BOOKCoMPANY.
Published by “HANSEN CoNSTITUTION of BINARYA”
Please refer to page 990 of ``LLOYS''.
例えば、イオンプレーティング処理温度の上限に近い6
00℃時点では白色系のα相は重量比で約5%までのN
を含み、白色系のε相は同約9チまでのNを含み、また
δ相は同約12チ以上のNを含む相であり、このδ相が
金色を示す事が知られている。またそれぞれの相の境界
部分にα+ε相、ε+δ相、さらに高温になればα+δ
相、α+β相、β相も存在する事が知られている。For example, 6 near the upper limit of the ion plating treatment temperature.
At 00°C, the white α phase contains up to about 5% N by weight.
It is known that the white ε phase contains up to about 9 H of N, and the δ phase contains about 12 H or more of N, and that this δ phase exhibits a golden color. In addition, at the boundary between each phase, α + ε phase, ε + δ phase, and α + δ phase at higher temperatures.
It is known that there are also α+β phase and β phase.
N2ガス中のTiのクオンプレーテイングにおいては、
Tiの蒸発量に対する流入N2ガス量の比率が0に近い
状態から増加するにつれて、α相→ε相→δ相と変化す
る事になり、かつバイアス電圧、加熱温度等の条件の変
化によりα相→δ相の変化の可能性もある。In quant plating of Ti in N2 gas,
As the ratio of the amount of inflowing N2 gas to the amount of Ti evaporation increases from a state close to 0, it will change from α phase → ε phase → δ phase, and due to changes in conditions such as bias voltage and heating temperature, α phase will change. →There is also a possibility of a change in the δ phase.
更に本発明の特徴を代表的な製造ステップに沿いながら
詳述すると、(第1図の被膜形成概念図を参照、以下(
)内は第1図の記号と対応させる)〔作用〕
■ イオンプレーティングによる下地硬質被膜について
特開昭50−159057と類似のTiN系の金色被膜
形成にあたシ、本発明は、第一層(1)として不活性ガ
ス中又はわずかにN2ガスの混入した不活性ガス中(B
1)でイオンプレーティングにてTiを蒸発させて(C
I)Ti被膜を形成し、第二層(2)としては、特公昭
53−19325゜US特許3900592.特公昭5
6−21068゜特開昭56−62961.実公昭59
−58442又はUS特許4226082の概念で示さ
れているところのN濃度を徐々に増加させる方法とせず
、前記不活性ガス(B1)の流入量を減らしくB2)T
iN−形成に必要なN2ガス量の20〜80%の範囲の
流入で一定とし被膜中のN濃度を一定に維持させる(B
6)事をまず第一の特徴とする。Further, the features of the present invention will be explained in detail along the typical manufacturing steps (see the conceptual diagram of film formation in Figure 1, below (
( ) corresponds to the symbol in Fig. 1) [Function] ■ Regarding the base hard coating by ion plating, the present invention is directed to the formation of a TiN-based golden coating similar to that of JP-A-50-159057. Layer (1) is formed in an inert gas or in an inert gas slightly mixed with N2 gas (B
In step 1), Ti is evaporated by ion plating (C
I) A Ti film is formed, and the second layer (2) is disclosed in Japanese Patent Publication No. 53-19325° US Pat. No. 3,900,592. Tokuko Showa 5
6-21068° Japanese Patent Publication No. 56-62961. Jitsuko 59
-58442 or US Pat. No. 4,226,082, but instead of gradually increasing the N concentration, the inflow amount of the inert gas (B1) is reduced B2)T
The N concentration in the film is maintained constant at a constant inflow of 20 to 80% of the amount of N2 gas required for iN- formation (B
6) Make things the first characteristic.
これは第二層(2)の色調を徐々に変化させない事と、
処理時の操作の作業性の改善、品質バラツキの要因排除
、色調コントロールを容易にさせる点を目的とする。イ
オンプレーティングで上記ガス量雰囲気の場合、αとε
、δの三相の中の少くとも二相は形成される。さらに本
発明は第三層(3)形成時にArガスを止め(BS)N
2ガスを増加しくB6)て、δ1主体の金色の窒化チタ
ン層を得る。This is because the color tone of the second layer (2) does not gradually change,
The purpose is to improve workability during processing, eliminate factors that cause quality variations, and facilitate color tone control. In the case of ion plating with the above gas amount atmosphere, α and ε
, at least two of the three phases of δ are formed. Furthermore, in the present invention, when forming the third layer (3), Ar gas is stopped (BS) and N
2 gas B6) to obtain a gold-colored titanium nitride layer consisting mainly of δ1.
■ 金又は金合金被膜について
本発明は金又は金合金被膜の形成を全回収歩留り、色調
、鏡面光沢性、耐食性等従来から充分市場実績のある湿
式メッキで行う事を可能にした点を特徴とし、このだめ
の導電性金属被膜の密着性□の良好な成形を重要な特徴
とする。■ Regarding gold or gold alloy coatings, the present invention is characterized in that it is possible to form gold or gold alloy coatings by wet plating, which has been well proven in the market in terms of total recovery yield, color tone, specular gloss, and corrosion resistance. The important feature is good adhesion of the conductive metal coating in this case.
この導電性被膜として、外観品質重視の観点から、不良
導体の混入又は露出の極力少ない純金属又は純金属合金
層を有する必要があり、かつこの被膜は下地第三層(3
)との高い密着性を有し、かつ高い耐食性と湿式メッキ
性が良好である点が必要である。From the viewpoint of emphasizing appearance quality, this conductive film must have a pure metal or pure metal alloy layer with as little contamination or exposure of defective conductors as possible, and this film must be a third base layer (3).
), as well as high corrosion resistance and good wet plating properties.
TiN被膜上への純金属層の形成における密着性確保に
ついて、例えばUS特許4415421又は特開昭58
−153776の様なイオンプレーティング+スパッタ
リング的な考え方での方法及び装置が提案されている。Regarding ensuring adhesion in forming a pure metal layer on a TiN film, for example, US Pat.
-153776, a method and apparatus based on the idea of ion plating + sputtering have been proposed.
本発明においては、まず第三層(3)形成の最終工程に
おいて、第四層(4)目として純金属又はその合金を、
同一バッチ内、同一雰囲気(N2ガス(B6)中で、ガ
ス流量のみ蒸発量に応じて増減させる)中でTiとは別
の蒸発源からTiの蒸発量もやや減じて(3) T i
と同時に蒸発させて形成させ一定時間後純金属又はその
合金を蒸発しつづけ(C2)ながら、Tiの蒸発を止め
(C5)、等四層(4)が形成されさらに純金属又はそ
の合金の蒸発量をやや増加(C6)させる。これと同時
又はややタイミングを早めて雰囲気ガス(B2)を、反
応性ガスから不活性ガスへ切シ換える(3311 )。In the present invention, first, in the final step of forming the third layer (3), a pure metal or an alloy thereof is used as the fourth layer (4).
Within the same batch and in the same atmosphere (in N2 gas (B6), only the gas flow rate is increased or decreased according to the evaporation amount), the amount of evaporation of Ti is also slightly reduced from an evaporation source different from Ti (3) Ti
After a certain period of time, the pure metal or its alloy is continuously evaporated (C2), and the evaporation of Ti is stopped (C5), and four layers (4) are formed, and then the pure metal or its alloy is evaporated. Increase the amount slightly (C6). At the same time or at a slightly earlier timing, the atmospheric gas (B2) is switched from a reactive gas to an inert gas (3311).
不活性ガスへの完全置換(3312)後純金属又はその
合金の蒸発中止(C7)までの間に第五層(15)とし
ての純金属又はその合金層が得られる。A pure metal or alloy thereof layer as the fifth layer (15) is obtained after the complete substitution with the inert gas (3312) and until the evaporation of the pure metal or its alloy is stopped (C7).
この被膜の構成で、第三層(3)と第四層(4)とはT
i及びNが共通に存在する事によシ、密着性が良好とな
る。第四層と第五層とは金属又はその合金が共通に存在
する事及びそれによる導電性の大巾向上による強固な密
着性が得られる。In this coating structure, the third layer (3) and the fourth layer (4) are T
The common presence of i and N provides good adhesion. The fourth layer and the fifth layer have strong adhesion due to the presence of a metal or an alloy thereof in common and the greatly improved conductivity caused by this.
第六層は、上記第五層をベースとして通常の湿式メッキ
工程を経て例えば、24に、 A11−Ni−In系、
Au−Ni系、 Au−(:u−pd系、Au−Cu系
。The sixth layer is formed by using the fifth layer as a base and applying a normal wet plating process to, for example, A11-Ni-In based layer 24.
Au-Ni system, Au-(:u-pd system, Au-Cu system.
Au−Cu−Cd系等従来携帯時計用外装部品用として
使用されているすべて及び今後開発され得るすべての金
又は金合金の湿式メッキを施す事ができる。また金回収
率、色調、外観等の制約が無視でき得る商品、グレード
の場合には、当然この金又は金合金層の形成はスパッタ
リング、蒸着イオンプレーティング等湿式以外の方法を
用いてもさしつかえない。かつこの場合でも前記第五層
は、第六層の密着性向上に同様な効果を与えるものであ
る。第六層は、金又は金合金層であれば、湿式メッキと
湿式メッキ以外の表面処理との組合せによシ多層になっ
ても良い。Wet plating can be performed with all gold or gold alloys that have been conventionally used for exterior parts of portable watches, such as Au-Cu-Cd, and all gold or gold alloys that may be developed in the future. In addition, in the case of products and grades where restrictions such as gold recovery rate, color tone, appearance, etc. can be ignored, methods other than wet methods such as sputtering, vapor deposition ion plating, etc. can be used to form the gold or gold alloy layer. . Also in this case, the fifth layer has the same effect on improving the adhesion of the sixth layer. As long as the sixth layer is a gold or gold alloy layer, it may be multilayered by a combination of wet plating and surface treatment other than wet plating.
密着性向上の目的で第七層被膜形成後のペース素材の再
結晶温度以下での熱処理も効果大である。For the purpose of improving adhesion, heat treatment at a temperature below the recrystallization temperature of the paste material after the formation of the seventh layer film is also highly effective.
更に若干説明を付加すれば次の通りである。A little more explanation is as follows.
■ 被膜中の純金属層又はその合金層及び関連する被膜
について
第五層は第六層の良好な密着性と鏡面光沢性、及び耐食
性向上をねらいとしているが、これらの要求に耐えられ
る金属組成は純Pd 、純C09pd−C,O合金、p
d−Ni合金又はCo−Ni 合金が最適である。これ
らの合金はすべて全率固溶の組合せであるが、Niを含
む合金の場合耐食性が劣るため、Pd−Ni中のNi量
は90チまでとし、Co−Ni中のNi量は80チまで
とする。Pd−C0合金は全率固溶でありかつ、どの組
成でも耐食性良好なため組成は限定しない。■ Regarding the pure metal layer or its alloy layer in the coating and related coatings, the fifth layer aims to improve the adhesion, specular gloss, and corrosion resistance of the sixth layer, but the metal composition must be able to withstand these requirements. are pure Pd, pure C09pd-C,O alloy, p
A d-Ni alloy or a Co-Ni alloy is optimal. These alloys are all solid solution combinations, but alloys containing Ni have poor corrosion resistance, so the amount of Ni in Pd-Ni is limited to 90 and the amount of Ni in Co-Ni is limited to 80. shall be. The composition of the Pd-C0 alloy is not limited because it is a solid solution and has good corrosion resistance in any composition.
さらに第四層のTi、N及び金属窒化物以外の純金属又
は合金部分については、第五層の成分比に準する事が、
製造上は有利である。しかし、第四層、第五層の金属又
は合金比を異ならせる組み合せでもよい。Furthermore, regarding the pure metal or alloy part other than Ti, N, and metal nitride in the fourth layer, it is possible to follow the composition ratio of the fifth layer.
It is advantageous in manufacturing. However, a combination in which the fourth and fifth layers have different metal or alloy ratios may be used.
■ 被膜厚みの制約について
第四層は第三層と第五層との密着性確保の目的だが、約
30λ以下だとその効果が少く、約200OAを超える
と第三層との色調差が大となる。■Restrictions on film thickness The purpose of the fourth layer is to ensure adhesion between the third and fifth layers, but if it is less than about 30λ, its effect will be small, and if it exceeds about 200OA, there will be a large difference in color tone from the third layer. becomes.
第五層は第六層の密着性向上の目的であるが。The purpose of the fifth layer is to improve the adhesion of the sixth layer.
不活性ガス中でのイオンプレーティング被膜のため硬度
は高くない。このため約500OAまで付けても実用上
問題とならない。ただし、約30A以下の場合、その後
の湿式メッキ等で色むら又はカブリ、又は密着不良が発
生し易い。Hardness is not high because the coating is ion plated in an inert gas. Therefore, there is no practical problem even if the current is applied up to about 500 OA. However, if the current is about 30 A or less, color unevenness, fogging, or poor adhesion is likely to occur during subsequent wet plating.
■ サーメット部分の金属成分比について第四層のTi
pNt金属窒化物以外の純金属成分又は合金成分は、特
に第五層以降の密着性に好影響を与えるが、重量比で3
チ以下では密着性に与える効果が少なく、50チ以上で
はTiN系の金色を示さず、実用携帯後の不具合を生じ
る。■ Regarding the metal component ratio of the cermet part, the Ti of the fourth layer
Pure metal components or alloy components other than pNt metal nitride have a favorable effect on the adhesion, especially in the fifth layer and beyond, but the weight ratio is 3.
If it is less than 50 cm, there is little effect on adhesion, and if it is more than 50 cm, it will not exhibit the golden color of TiN, causing problems after being used in practical use.
以下実施例に従って本発明の詳細な説明する。The present invention will be described in detail below with reference to Examples.
〔実施例−1〕
SUS 304材にて携帯時計用ケース250個を製造
し、この内200個を有機洗浄後イオンプレーティング
装置に配置する。5 X 10”TorrのArガス雰
囲気中で450Vのバイアス電圧にてボンバードを行い
、5 x 10” Torrのアルゴンガス雰囲気中で
、30vのバイアス電圧にて電子ビーム500Aにより
蒸発させたTiによるTi被膜を形成した(第一層形成
)。形成開始から5分径Tiは引きつづき蒸発させなが
ら、同一真空範囲でArガスの一部をN2ガスに置換し
、N2ガス流量55 cc/minで3分間保持(第二
層形成)、その後N2ガス流量110 cc/minと
し、Arガス流入を止め、3分間処理した(第三層形成
)。さらに同一雰囲気で抵抗加熱源からPdを180A
で蒸発させ、Ti側の電子ビームを28OAとし、1分
間保持後(第四層形成)Ti蒸発源にシャッターをし、
電子ビームを0としてTiの蒸発を止め、Pdを22O
Aで蒸発させ同時にN2ガス流入を止め、アルゴンガス
に切り換えて5.Ox10 Torr 、1.5m
1nとしてpdの被膜を形成した(第五層形成)。この
内50個についてはPdNII″f!:ヘースに、Au
−flush後、Au−Ni−In系の22.5に被膜
1.9μを湿式メッキにて施した。又別の50個につい
て同様にAu−Cu −pd系の21に被膜2.1μを
湿式メッキにて施した。[Example-1] 250 portable watch cases were manufactured from SUS 304 material, and 200 of them were placed in an ion plating device after organic cleaning. Bombarded at a bias voltage of 450 V in an Ar gas atmosphere of 5 x 10" Torr, and evaporated by Ti with an electron beam of 500 A at a bias voltage of 30 V in an Ar gas atmosphere of 5 x 10" Torr. was formed (first layer formation). While continuing to evaporate the 5 minute diameter Ti from the start of formation, part of the Ar gas was replaced with N2 gas in the same vacuum range, held at a N2 gas flow rate of 55 cc/min for 3 minutes (second layer formation), and then N2 The gas flow rate was set to 110 cc/min, the flow of Ar gas was stopped, and the process was performed for 3 minutes (third layer formation). Furthermore, in the same atmosphere, Pd was heated at 180A from a resistance heating source.
The electron beam on the Ti side was set to 28 OA, and after holding for 1 minute (fourth layer formation), the Ti evaporation source was shuttered.
The electron beam was set to 0 to stop the evaporation of Ti, and the Pd was
Evaporate with A and at the same time stop the N2 gas inflow and switch to argon gas.5. Ox10 Torr, 1.5m
A pd film was formed as 1n (fifth layer formation). For 50 of these, PdNII″f!: Hess, Au
- After flushing, a coating of 1.9μ was applied to Au-Ni-In-based 22.5 by wet plating. In addition, another 50 pieces were similarly coated with a coating of 2.1 μm on Au-Cu-PD type No. 21 by wet plating.
又別の50個について、4%Ni−Au合金をターゲッ
トにしてスパッタリングにて、2.1μの被膜を得、引
きつづき水雰囲気で500℃、2hrの熱処理を行った
。残シの50個Pd上シ品はそのままとした。さらにイ
オンプレーティングしてないケース50個について、内
25個については2μのAu−Ni−In合金の湿式メ
ッキ、残25個については4μの同一湿式メッキ品を用
意した。Another 50 pieces were subjected to sputtering using a 4% Ni--Au alloy as a target to obtain a film of 2.1 μm, followed by heat treatment at 500° C. for 2 hours in a water atmosphere. The remaining 50 Pd products were left as they were. Furthermore, of the 50 cases that were not ion plated, 25 of them were wet-plated with a 2μ Au-Ni-In alloy, and the remaining 25 were the same wet-plated products with a thickness of 4μ.
これら6種類のサンプルについて、人工汗、人工海水、
耐磨耗試験、折り曲げ試験、耐磨耗試験後の耐食試験、
腐食試験後の折り曲げ密着試験等を実施した結果本発明
品は、ステンレスペースで湿式メッキのみのものに比べ
大巾に良好な結果が出たと同時に、Pd被膜のみのもの
についても、人工汗による変色は発生したものの他の特
性については、良好な品質を示した。For these six types of samples, artificial sweat, artificial seawater,
Abrasion resistance test, bending test, corrosion resistance test after abrasion resistance test,
As a result of conducting bending adhesion tests after the corrosion test, the product of the present invention showed much better results than the product with stainless steel paste and only wet plating, and at the same time, the product with only Pd film did not discolor due to artificial sweat. However, other characteristics showed good quality.
〔実施例−2〕
SUS 304板 4011x 4011x 5Hのサ
ンプル500板を基板とし、実施例−1の第四層。[Example-2] A sample 500 plate of SUS 304 plate 4011x 4011x 5H was used as the substrate, and the fourth layer of Example-1.
第五層を形成する金属として、純Pd 、純Co 。The metals forming the fifth layer are pure Pd and pure Co.
Pd−50チCo合金、pd−70チNi合金。Pd-50chi Co alloy, pd-70chi Ni alloy.
Co−6QチNi合金、純Niを蒸発源とし、その他の
条件を実施例−1と同一としてそれぞれ50個づつイオ
ンプレーティングした。さらに全数湿式メッキにてAu
−Ni−In被膜1μを施し、それぞれ25個づつ、人
工汗、40℃の耐食試験と、25℃の硝酸湯気試験を行
なった。この結果pd−Ni系のものとco−Ni
系のものに第五層から一部腐食及び変色の発生するもの
が有り、純Ni系のものは全数腐食、変色発生となった
。Co-6Q-Ni alloy and pure Ni were used as evaporation sources, and 50 ions of each were ion-plated under the same conditions as in Example-1. In addition, all parts are wet plated with Au.
-Ni-In coating of 1 μm was applied, and 25 pieces of each were subjected to an artificial sweat test, a corrosion resistance test at 40°C, and a nitric acid steam test at 25°C. As a result, pd-Ni and co-Ni
In some cases, corrosion and discoloration occurred in some parts of the fifth layer, and in all pure Ni-based cases, corrosion and discoloration occurred in the fifth layer.
pd−Ni系、Co−Ni 系の腐食又は変色の発生
したサンプルについて、第五層の分析を行なった結果、
サンプルの変色又は腐食発生部分のNi分がリッチにな
っている事が明確となった。特にサンプルの中で蒸発源
に対し、付き回シの悪い部分はCo、又はPdに対しN
iリッチとなり、特にCoに対してはNiは80%まで
、Pdに対して90チまでが耐食性の面から限界である
事が明らかとなった。As a result of analyzing the fifth layer of pd-Ni and Co-Ni samples with corrosion or discoloration,
It became clear that the discolored or corroded parts of the sample were rich in Ni content. In particular, parts of the sample that have poor repulsion with respect to the evaporation source are Co, or N with respect to Pd.
It has become clear that the limit for corrosion resistance is 80% Ni for Co and 90% for Pd.
また残25個ずつのサンプルについて、耐磨耗試験、折
シ曲げ試験、耐磨耗試験後の耐食試験。In addition, the remaining 25 samples were subjected to an abrasion resistance test, a folding test, and a corrosion resistance test after the abrasion resistance test.
耐食試験後の折シ曲げ密着試験等を実施した結果純pd
、純Co、Pd−Co系のサンプルはすべての試験に
良好な結果を示し、pd−Ni系、Co−Ni系のもの
の一部及び純Ni系のものは、耐磨耗試験後の耐食性、
耐食性試験後の折り曲げ密着試験において良好でなく、
その他の試験のみ良好な結果を示した。この場合の不良
内容は前記人工汗、及び硝酸湯気試験の結果とほぼ同一
であった。After conducting the corrosion resistance test, the bending adhesion test etc. resulted in pure PD.
, pure Co, and Pd-Co-based samples showed good results in all tests, and some of the pd-Ni-based, Co-Ni-based, and pure Ni-based samples showed good corrosion resistance and
It did not perform well in the bending adhesion test after the corrosion resistance test.
Only other tests showed good results. The defects in this case were almost the same as the results of the artificial sweat and nitric acid steam tests.
〔実施例−5〕 第2図に示す如< SUS 504材にて、80.。[Example-5] As shown in Fig. 2, 80. .
X40mX3mtの板100枚を用意しくa)、これの
長手方向の1/2の長さで仰角10°で折り曲げ(この
折り曲げ部をAとする)(b)、これに実施例1と同一
条件で第一層から第五層をFの方向からイオンプレーテ
ィング処理しくC)、イオンプレーテインク処理後サン
プルの折シ曲げ部を元にもどしくd)、フラットな板と
して湿式メッキにてAu−Ni−In メッキ4μを
施した(el。これら100枚のサンプルを上記折シ曲
げ部に対して直角に交る方向でサンプルを折り曲げ(折
り曲げ部Bとする)げ)被膜の密着試験を行なった。こ
の結果折り曲げ部Aの内側相当部分を中心に被膜が剥離
した。この剥離部が第2図QC部になる。なおこの部分
を含む第2図は)で示すEの範囲は金メツキ上り(e)
工程終了時でカプリが発生していた。剥離部分の基部側
には金属Pdの検出がほとんどなく剥離した被膜側から
はPdとTiの混合物が検出されるかTiが全く検出さ
れないため第三層と第五層間での剥離と断定できかつ、
第2図り部で示す方向にそって被膜厚みをTEM−XM
A超薄切片法400000倍によシ測定解析の結果第四
層が推定値約30A以下の範囲で密着不良が発生し安い
事がわかった。また湿式メッキカプリ発生部分も同様な
調査の結果、第五層厚みが推定値約60A以下の部分で
発生している事が判明し、湿式メッキ被膜の光沢性が損
なわれていることが明らかとなった。Prepare 100 sheets of x40m x 3mt a), bend it by half the length in the longitudinal direction at an elevation angle of 10° (this bent part is designated as A) (b), and bend it under the same conditions as Example 1. The first to fifth layers are subjected to ion plating treatment from the direction of F (C), after the ion plate ink treatment, the folded part of the sample is returned to its original position (d), and then wet plating is applied to the Au- Ni-In plating of 4μ was applied (el. These 100 samples were bent in a direction perpendicular to the above-mentioned folded part (refer to the folded part B)), and a film adhesion test was conducted. . As a result, the coating mainly peeled off from the inner portion of the bent portion A. This peeled part becomes part QC in FIG. In addition, in Figure 2, which includes this part, the range of E indicated by ) is gold-plated (e).
Capri occurred at the end of the process. There is almost no metal Pd detected on the base side of the peeled part, and a mixture of Pd and Ti or no Ti is detected on the peeled coating side, so it cannot be concluded that the peeling is between the third and fifth layers. ,
TEM-XM the coating thickness along the direction shown in the second diagram.
As a result of measurement and analysis using the ultra-thin section method A, it was found that poor adhesion occurred in the range below the estimated value of approximately 30A, and the cost was low. In addition, as a result of a similar investigation of wet plating capri occurrence areas, it was found that capri occurred in areas where the thickness of the fifth layer was less than the estimated value of approximately 60A, and it was clear that the gloss of the wet plating film was impaired. became.
〔実施例−4〕
実施例−2と同一サンプルで実施例−1と同様な工程で
イオンプレーティングし、第四層成形時間のみ延長し、
そのままサンプリングした結果、第四層の厚み約200
0A以上では被膜が茶褐色となシ、かつ鏡面光沢性も低
下する事が判明した。[Example-4] The same sample as Example-2 was ion-plated in the same process as Example-1, but only the fourth layer molding time was extended,
As a result of sampling as it is, the thickness of the fourth layer is approximately 200 mm.
It was found that at 0A or higher, the coating became brownish and the specular gloss decreased.
〔実施例−5〕
SUS 504材にて執有タイプのケースを120個製
造し、実施例−1と同様な被膜を形成させ、先部分の最
も被膜厚みの厚い部分の第五層の厚4900λ、520
0A、5500Aのねらいでバランかせて、それぞれ2
0ケずつ試作した。これに湿式メッキでAu−Cu−C
d メッキ2μを形成し、跣先部分の耐磨耗試験を牛皮
にて実施した折、5200A以上のねらいのサンプルは
いずれも 先から軌上面部分が白色で見立ち易く、かつ
、6ケ月間の実用携帯試験でも同様な結果となった。[Example-5] 120 proprietary type cases were manufactured using SUS 504 material, and the same coating as in Example-1 was formed, and the thickness of the fifth layer at the thickest part of the tip was 4900λ. , 520
Balance with the aim of 0A and 5500A, 2 each
We made 0 prototypes. This is wet plated with Au-Cu-C.
d When a 2μ plating was formed and an abrasion resistance test was conducted on the heel part using cowhide, all samples aimed at 5200A or more showed that the raceway surface was white from the tip and was easily visible, and Similar results were obtained in the practical mobile test.
なお5200Aねらいのサンプルの第五層の厚みは約5
10OAであった。The thickness of the fifth layer of the sample aimed at 5200A is approximately 5.
It was 10OA.
〔実施例−6〕
第四層形成時点で、Ti及びPdの蒸発量及びN2ガス
、アセチレンガスのバランスを各種バランかせた結果、
Pd量が重量比で50チを越えた場合、被膜の色調は白
色となシかつ、Hv1200と硬く、実用携帯上の問題
点となった。また3%以下の場合、第四層と第五層の間
にで密着不良が多発した。[Example-6] At the time of forming the fourth layer, the evaporation amount of Ti and Pd and the balance of N2 gas and acetylene gas were varied.
When the amount of Pd exceeded 50 inches by weight, the color of the film was not white and it was hard with Hv1200, which was a problem in practical use. In addition, when it was 3% or less, poor adhesion occurred frequently between the fourth and fifth layers.
以上の如く本発明によれば、製造しやすく、安価で、金
又は金合金による最終表面被膜の下部に耐磨耗性、耐食
性が優れるTiN被膜を基地に対して密着性良く形成さ
せ、この上に密着性良くかつ耐食性が高く、かつ硬度の
高い金属窒化物等の混入のない導電性被膜を一定の厚み
以下で形成し、この被膜上に従来からの金又は金合金の
湿式メッキ被膜を形成可能とさせ、外観、色調、全回収
歩留りを従来の金又は金合金メッキ製品と同等以上に維
持させ得る事ができた。第六層の金(合金)層及び第五
層のMet層が磨耗した場合にも黄金色を呈する窒化チ
タン層の第四層が現出するため外観上、黄金色が損なわ
れない。As described above, according to the present invention, a TiN coating that is easy to manufacture, inexpensive, and has excellent wear resistance and corrosion resistance is formed under the final surface coating of gold or gold alloy with good adhesion to the base. A conductive film with good adhesion, high corrosion resistance, and no contamination of metal nitrides with high hardness is formed to a certain thickness or less, and a conventional wet plating film of gold or gold alloy is formed on this film. We were able to maintain the appearance, color tone, and overall recovery yield at or above the same level as conventional gold or gold alloy plated products. Even when the sixth gold (alloy) layer and the fifth Met layer are worn away, the fourth layer of titanium nitride layer exhibiting a golden color appears, so the golden color is not impaired in appearance.
又実用携帯後、金又は金合金厚の一部が磨耗消失後も下
地硬質層により、それ以上の磨耗を防止可能とさせるこ
とができたものである。Further, even after a portion of the gold or gold alloy thickness has worn off after being put into practical use, the underlying hard layer can prevent further wear.
第1図は本発明におけるイオンプレーティング時の蒸発
物質と蒸発量及び流入ガスと流入量の変化による第一層
から第六層までの被膜形成の概念図。
1・・・・・・第一層(α相主体)
2・・・・・・第二層(α相、ε相、σ相の2種以上の
混合物主体)
3・・・・・・第三層(α相主体)
4・・・・・・第四層(δ相、金属、金属窒化物主体)
5・・・・・・第五層(金属主体)
M・・・・・・素地材料
第2図は実施例−3における密着性試験の工程概念図。
A・・・・・・第1回折シ曲げ部
B・・・・・・第2回折り曲げ部
C・・・・・・被膜剥離部
D・・・・・・被膜厚み測定部
E・・・・・・金メッキ上シでのカプリ発生範囲以上FIG. 1 is a conceptual diagram of film formation from the first layer to the sixth layer due to changes in evaporated substances, evaporation amounts, inflow gases, and inflow amounts during ion plating in the present invention. 1... First layer (mainly α phase) 2... Second layer (mainly a mixture of two or more of α phase, ε phase, and σ phase) 3... Second layer 3 layers (mainly α phase) 4...Fourth layer (mainly δ phase, metal, metal nitride)
5...Fifth layer (mainly metal) M...Base material Figure 2 is a conceptual diagram of the process of adhesion test in Example-3. A...First diffraction bending part B...Second bending part C...Coating peeling part D...Coating thickness measurement part E...・・・Exceeding the capri occurrence range on gold plated surface
Claims (9)
からなる第一層と、α相、ε相、δ相の中から選ばれる
2種以上の相の混合物を主体とした第二層と、δ相を主
体とした第三層と、δ相と純金属又はその合金及びその
金属窒化物を主体とした混合サーメット層からなる第四
層と、上記と同一組成の純金属又はその合金を主体とし
た第五層と、金又は金合金を主体とした第六層とからな
る、金色被覆層が表面の一部又は全体に形成されている
事を特徴とする金色外装部品。(1) The first layer consists mainly of the α phase on the Ti and N equilibrium phase diagram, and the mixture of two or more phases selected from the α phase, ε phase, and δ phase. a second layer, a third layer mainly composed of δ phase, a fourth layer consisting of a mixed cermet layer mainly composed of δ phase and pure metal or its alloy and metal nitride, and pure metal with the same composition as above. A gold-colored exterior component characterized in that a gold-colored coating layer is formed on a part or the entire surface, consisting of a fifth layer mainly composed of gold or an alloy thereof, and a sixth layer mainly composed of gold or a gold alloy. .
でイオンプレーティング法で形成されている特許請求の
範囲第1項に記載の金色外装部品。(2) The golden exterior component according to claim 1, wherein at least the first layer to the fifth layer are formed by an ion plating method within the same batch.
pd又は重量比で90%までのTiを含むPd−Ni合
金が主体である特許請求の範囲第1項記載の金色外装部
品。(3) The gold color according to claim 1, wherein the pure metal or its alloy portion of the fourth layer and the fifth layer are mainly pure PD or a Pd-Ni alloy containing up to 90% Ti by weight. Exterior parts.
o又はPd−Co合金が主体である特許請求の範囲第1
項記載の金色外装部品。(4) The pure metal or its alloy part in the fourth layer and the pure C in the sixth layer
Claim 1 in which O or Pd-Co alloy is the main component
Golden exterior parts listed in section.
量比で80%までのNiを含むNi−Co合金が主体で
ある特許請求の範囲第1項記載の金色外装部品。(5) The golden exterior component according to claim 1, wherein the fourth layer of pure metal or its alloy portion and the fifth layer are mainly composed of a Ni--Co alloy containing up to 80% Ni by weight.
50%以下である特許請求の範囲第1項記載の金色外装
部品。(6) The golden exterior component according to claim 1, wherein the fourth layer contains a pure metal or an alloy thereof in a weight ratio of 3% to 50%.
の範囲である特許請求の範囲第1項記載の金色外装部品
。(7) The golden exterior component according to claim 1, wherein the thickness of the fourth layer is in the range of about 30 Å or more and about 2000 Å or less.
の範囲である特許請求の範囲第1項記載の金色外装部品
。(8) The golden exterior component according to claim 1, wherein the thickness of the fifth layer is in the range of about 30 Å or more and about 5000 Å or less.
金、Au−Cu−Pd合金、Au−Cu−Cd合金、A
u−Cu合金又はAu−Cu−Ag合金の湿式メッキで
それぞれ形成された層である特許請求の範囲第1項記載
の金色外装部品。(9) The sixth layer is Au-Ni-In alloy, Au-Ni alloy, Au-Cu-Pd alloy, Au-Cu-Cd alloy, A
The golden exterior component according to claim 1, which is a layer formed by wet plating of a u-Cu alloy or an Au-Cu-Ag alloy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60069384A JPS61231162A (en) | 1985-04-02 | 1985-04-02 | Gold-colored outer ornament parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60069384A JPS61231162A (en) | 1985-04-02 | 1985-04-02 | Gold-colored outer ornament parts |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61231162A true JPS61231162A (en) | 1986-10-15 |
JPH0210859B2 JPH0210859B2 (en) | 1990-03-09 |
Family
ID=13401032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60069384A Granted JPS61231162A (en) | 1985-04-02 | 1985-04-02 | Gold-colored outer ornament parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61231162A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011256424A (en) * | 2010-06-08 | 2011-12-22 | Citizen Holdings Co Ltd | Hard decorative member |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104477A (en) * | 1979-01-29 | 1980-08-09 | Citizen Watch Co Ltd | White exterior parts |
-
1985
- 1985-04-02 JP JP60069384A patent/JPS61231162A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104477A (en) * | 1979-01-29 | 1980-08-09 | Citizen Watch Co Ltd | White exterior parts |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011256424A (en) * | 2010-06-08 | 2011-12-22 | Citizen Holdings Co Ltd | Hard decorative member |
Also Published As
Publication number | Publication date |
---|---|
JPH0210859B2 (en) | 1990-03-09 |
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