JPS61190137U

JPS61190137U -

Info

Publication number: JPS61190137U
Application number: JP7559285U
Authority: JP
Priority date: 1985-05-21
Filing date: 1985-05-21
Publication date: 1986-11-27

Description

[Brief explanation of drawings]

図面は本考案の一実施例を示したもので、第１
図は全体の概略説明図、第２図は一部切欠の要部
の正面図、第３図は一部切欠の要部の側面図であ
る。１…プラズマ処理装置、２…供給側のプールス
テージ、３…搬出側のプールステージ、４…本体
、５…チヤンバー、６…チヤンバードア、１２…
レール、１３…搬送装置、１４…搬送機ヘツド、
Ｌ…上下チヤンバードアの間隔。 The drawing shows one embodiment of the present invention.
The figure is a schematic explanatory view of the whole, FIG. 2 is a front view of the main part with a partial cutout, and FIG. 3 is a side view of the main part with a partial cutout. DESCRIPTION OF SYMBOLS 1... Plasma processing apparatus, 2... Supply side pool stage, 3... Export side pool stage, 4... Main body, 5... Chamber, 6... Chamber door, 12...
Rail, 13...Transportation device, 14...Transportation machine head,
L... Distance between upper and lower chamber doors.

補正昭６０．６．１９考案の名称を次のように補正する。考案の名称ウエハー搬送機構を備えたプラ
ズマ処理装置実用新案登録請求の範囲、図面の簡単な説明を
次のように補正する。Amendment June 19, 1980 The name of the invention is amended as follows. Title of the invention: Plasma processing apparatus equipped with a wafer transport mechanism The scope of the utility model registration claims and the brief description of the drawings are amended as follows.

【実用新案登録請求の範囲】チヤンバードアを有するチヤンバーを上下に備
えた複数台のプラズマ処理装置が直列に接続され
た装置において、ウエハー搬送装置の搬送機ヘツ
ドが、上記各プラズマ処理装置における上下のチ
ヤンバードアの間をこれらチヤンバードアと非接
触の状態で往復移動が可能となつている構成を特
徴とするウエハー搬送機構を備えたプラズマ処理
装置。[Claims for Utility Model Registration] In an apparatus in which a plurality of plasma processing apparatuses each having upper and lower chambers each having a chamber door are connected in series, the transfer machine head of the wafer transfer apparatus is connected to the upper and lower chamber doors of each plasma processing apparatus. A plasma processing apparatus equipped with a wafer transport mechanism characterized by a configuration that allows reciprocating movement between the chamber doors and the chamber door in a non-contact state.

【図面の簡単な説明】図面は本考案の一実施例を示したもので、第１
図は全体の概略説明図、第２図は一部切欠の要部
の正面図、第３図は一部切欠の要部の平面図、第
４図は一部切欠の要部の側面図である。１…プラズマ処理装置、２…供給側のプールス
テージ、３…搬出側のプールステージ、４…本体
、５…チヤンバー、６…チヤンバードア、１２…
レール、１３…搬送装置、１６…搬送機ヘツド、
Ｌ…上下チヤンバードアの間隔。[Brief Description of the Drawings] The drawings show one embodiment of the present invention.
The figure is a schematic illustration of the whole, Figure 2 is a front view of the main part with a partial cutout, Figure 3 is a plan view of the main part with a partial cutout, and Figure 4 is a side view of the main part with a partial cutout. be. DESCRIPTION OF SYMBOLS 1... Plasma processing apparatus, 2... Supply side pool stage, 3... Export side pool stage, 4... Main body, 5... Chamber, 6... Chamber door, 12...
Rail, 13...Transportation device, 16...Transportation machine head,
L... Distance between upper and lower chamber doors.

Claims

[Scope of utility model registration request]

In an apparatus in which a plurality of plasma processing apparatuses each having upper and lower chambers having chamber doors are connected in series, the transfer machine head of the wafer transfer apparatus moves between the upper and lower chamber doors of each plasma processing apparatus without making contact with these chamber doors. A plasma processing apparatus equipped with a wafer transport mechanism characterized by a configuration capable of reciprocating movement in a state of .