JPS61113155A - Photomagnetic recording medium - Google Patents
Photomagnetic recording mediumInfo
- Publication number
- JPS61113155A JPS61113155A JP23434684A JP23434684A JPS61113155A JP S61113155 A JPS61113155 A JP S61113155A JP 23434684 A JP23434684 A JP 23434684A JP 23434684 A JP23434684 A JP 23434684A JP S61113155 A JPS61113155 A JP S61113155A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- film
- corrosion resistance
- alloy
- gdo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
Landscapes
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の分野)
本発明は、光磁気メモリー、磁気記録、表示素子などに
用いられ、磁気カー効果あるいはファラデー効果などの
磁気光学効果を用いて読み出すことのできる光磁気記録
媒体に関するもので、特に耐腐食性を向上させた磁性薄
膜記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of the Invention) The present invention relates to a magneto-optical device which is used in magneto-optical memory, magnetic recording, display elements, etc. and which can be read out using magneto-optic effects such as the magnetic Kerr effect or the Faraday effect. The present invention relates to recording media, and particularly to magnetic thin film recording media with improved corrosion resistance.
(従来技術)
従来、光磁気記録媒体としてはMnB1. MnCuB
1等の他結晶91111. GdCo、 GdFe、
TbFe。(Prior Art) Conventionally, as a magneto-optical recording medium, MnB1. MnCuB
Other crystals of 1st class 91111. GdCo, GdFe,
TbFe.
DyFe、 GdTbFe、 TbDyFe等の非晶j
sg、GdIG等の単結晶薄膜等が知られている。Amorphous materials such as DyFe, GdTbFe, TbDyFe, etc.
Single crystal thin films such as sg and GdIG are known.
これらの薄膜のうち、大面積の薄膜を室温近傍の温度で
製作する製膜性、信号を小さな光熱エネルギーで書き込
むための書き込み効率、3「)き込まれた信号をS/N
比よく読み出すための読み出し効率等を勘案し、最近で
は前記非晶質薄膜が光磁気記録媒体として優れていると
考えられている。特にGdTbFeは、カー回転角も大
きく、150″C前後のキューリ一点を持つから光磁気
記録媒体としては最適である。Among these thin films, there is the film-forming ability of producing a large-area thin film at a temperature close to room temperature, the writing efficiency of writing signals with small photothermal energy, and the S/N ratio of the written signal.
In consideration of readout efficiency and the like, the amorphous thin film has recently been considered to be excellent as a magneto-optical recording medium. In particular, GdTbFe has a large Kerr rotation angle and has a single Curie point of around 150''C, making it optimal as a magneto-optical recording medium.
更に我々は、カー回転角を向上させる目的で研究した結
束、GdTbFeCoがカー回転角が充分に太きく、S
/N比の良い読み出しがr+f能な光磁気記録媒体であ
ることを見い出した。Furthermore, we have found that GdTbFeCo, a bond that we have researched for the purpose of improving the Kerr rotation angle, has a sufficiently large Kerr rotation angle and S
It has been found that the present invention is a magneto-optical recording medium capable of r+f reading with a good /N ratio.
しかしながら、GdTbFeあるいはGdTbFeC。However, GdTbFe or GdTbFeC.
をはじめとする非晶質磁性体の特徴として、耐腐食性が
悪い事−挙げられる。即ち、大気、水蒸気に触れると、
磁気特性が低下するだけでなく、最終的には完全に酸化
して透明化してしまう。One of the characteristics of amorphous magnetic materials, including , is that they have poor corrosion resistance. In other words, when it comes into contact with the atmosphere or water vapor,
Not only will its magnetic properties deteriorate, but it will eventually oxidize completely and become transparent.
その為に、従来から記録層の上に保護層を設けたり、更
に不活性ガスにより封じ込めたディスク状記録媒体が提
案されている。To this end, disk-shaped recording media have been proposed in which a protective layer is provided on the recording layer or the recording layer is further sealed with an inert gas.
(発明の概要)
本発明の目的は、情報の記録、再生に最適の磁気特性を
有し、かつ、耐腐食性に優れた光磁気記録媒体を提供す
ることにある。(Summary of the Invention) An object of the present invention is to provide a magneto-optical recording medium that has optimal magnetic properties for recording and reproducing information and has excellent corrosion resistance.
本発明の上記目的は、以下の組成から成り、膜面に垂直
方向に磁化容易軸を持つ非晶質磁性合金膜を有する光磁
気記録媒体によって達成される。The above object of the present invention is achieved by a magneto-optical recording medium having an amorphous magnetic alloy film having the following composition and having an axis of easy magnetization perpendicular to the film surface.
((GdxTJ−X) P (Fe、Co1−y) 1
−p) q(NizCrl、) 1−q
但し、 0≦ X≦0.9
0.2≦y≦1.0
0.05≦2≦10
0.1 ≦ P ≦ 05
o、oot ≦ t−q ≦ 0.35木発す1の
光磁気記録媒体は、記録層として膜面に市直力向に磁化
容易軸を持つ非晶質磁性合金膜を有し。((GdxTJ-X) P (Fe, Co1-y) 1
-p) q(NizCrl,) 1-q However, 0≦X≦0.9 0.2≦y≦1.0 0.05≦2≦10 0.1≦P≦05 o,oot≦t-q ≦ 0.35 The magneto-optical recording medium of No. 1 has, as a recording layer, an amorphous magnetic alloy film having an axis of easy magnetization in the direction of normal force on the film surface.
情報の高密度な記録が可能である0本発明の記録媒体に
情報を記録する場合には、所定方向に一様に磁化された
前記合金膜に情報信号によって変調された放射線ビーム
を照射する。そして、照射部をキューリ一温度以りに加
熱し、次いで冷却することにより磁化方向の反転した記
録ビyトの連続として情報信号が記録される。また、こ
のように記録された情報信号を読み出す場合には、+m
m会合金膜直線偏光高速を入射させ、磁気光学効果によ
って前記情報に突ってその偏光方向に変調を受けた前記
光束を検出する。When recording information on the recording medium of the present invention, which is capable of high-density recording of information, the alloy film, which is uniformly magnetized in a predetermined direction, is irradiated with a radiation beam modulated by an information signal. Then, by heating the irradiation section to a temperature higher than one Curie temperature and then cooling it, an information signal is recorded as a series of recording bits with reversed magnetization directions. Moreover, when reading out the information signal recorded in this way, +m
A high-speed linearly polarized light beam is made incident on the m-alloy gold film, and the light flux modulated in the polarization direction by the information is detected by the magneto-optic effect.
本発明において、前記非晶質磁性合金膜は以下の組成を
示す。In the present invention, the amorphous magnetic alloy film has the following composition.
((G d’xTb 1−X) P (、F e yc
Q l−y) l −pl q(N+2crl−2)
l−q
ここでO≦X≦0.9即ちGdはGdおよびTbの総量
に対し、θ〜90 atomic%の範囲とする必要が
ある。((G d'xTb 1-X) P (, Fe yc
Q l-y) l -pl q(N+2crl-2)
l-q Here, O≦X≦0.9, that is, Gd needs to be in the range of θ to 90 atomic% with respect to the total amount of Gd and Tb.
Gdが9Q ltomic%を超えると保磁力が小ざく
なり、*小な記録ビットが安定に存在しにくい。When Gd exceeds 9Q ltomic%, the coercive force becomes small, making it difficult for *small recording bits to exist stably.
また、キューリ一温度が高くなる為、成膜条件の厳しい
補償温度書き込みを使用せざるを得なくなる。また、0
.2≦y≦1.0即ち、CoはFe及びCoの総量に対
し、 O〜80 atomic%の範囲とする必要が
ある。 Coが80 atomic%を超えると、や
はりキューリ一温度が高くなり、信号の書き込みが難し
くなる。このような記録感度の面から特に、 0.35
≦y≦1.0 即ち、 Co の楡は65 atom
ic%以下であることが望ましい。Furthermore, since the Curie temperature increases, it is necessary to use compensation temperature writing with strict film forming conditions. Also, 0
.. 2≦y≦1.0, that is, Co needs to be in the range of O to 80 atomic% with respect to the total amount of Fe and Co. When Co exceeds 80 atomic%, the Curie temperature also increases, making it difficult to write signals. In particular, from the standpoint of recording sensitivity, 0.35
≦y≦1.0 That is, Co elm is 65 atoms
It is desirable that it is below ic%.
又、本発明の光磁気記録媒体が膜面に垂直な磁化容易軸
を有するためには、a移金属(Fe、Co)と希土類金
ffl (Gd、Tb)が適当な組成比で存在しなくて
はならない、従って0.15P≦0.5即ち。In addition, in order for the magneto-optical recording medium of the present invention to have an axis of easy magnetization perpendicular to the film surface, a-transfer metals (Fe, Co) and rare earth gold ffl (Gd, Tb) must be present in an appropriate composition ratio. Therefore, 0.15P≦0.5, that is.
F @ 、CO* G d + T b (7)
Q ’B L対し、 Gd と Tb とを合わせ
た物が10〜50 atomic%の範囲に存在するこ
とが必要とされる。この範囲外では磁化容易軸は膜面に
平行な方向となり、金属膜は(K直磁化19とはなり得
ない、更に磁気特性の安定化を考えると、Gd8よびT
bの1正はFe。F @ , CO* G d + T b (7)
The sum of Gd and Tb is required to be present in a range of 10 to 50 atomic% with respect to Q'BL. Outside this range, the axis of easy magnetization is parallel to the film surface, and the metal film cannot have (K direct magnetization 19. Furthermore, considering the stabilization of magnetic properties, Gd8 and T
The positive one of b is Fe.
Co、 Gd、 Tbの総)−に対し15〜30 at
omic%とする (0,15≦ p≦0.3)ことが
望ましい。total of Co, Gd, Tb) - 15 to 30 at
It is desirable to set it to omic% (0,15≦p≦0.3).
本発明において耐腐食性を向上させるためには、0.0
01≦l−q≦0.35即ち、磁性合金の総量に対し、
Ni とCrとを合わせた猜がO1l〜35 atom
ic%の範囲に存在する必要がある。In order to improve corrosion resistance in the present invention, 0.0
01≦l-q≦0.35, that is, with respect to the total amount of magnetic alloy,
A combination of Ni and Cr is O1l ~ 35 atoms
ic% range.
これはNi及びCrが0.1 atomic%より少な
いと十分に耐腐食性を向上させることが出来ず、また3
5 atocnic%を超えると磁気特性に影響か出て
、垂直磁化膜が得られにくいためである。This is because if Ni and Cr are less than 0.1 atomic%, corrosion resistance cannot be sufficiently improved, and 3
This is because if it exceeds 5 atocnic%, the magnetic properties will be affected and it will be difficult to obtain a perpendicularly magnetized film.
tた、Ni (7) ;IiハNi トCr ト’k
合h セタ&i1 rLに対し、5−100 atom
ic%ノ範囲でなくてはならない (O,OS≦Z≦1
.0)、ただし、 Niの量が多くなりすぎるとNi
の強磁性により合金の磁化容易軸が膜面に平行な方向に
向き易い。tta, Ni (7) ;IihaNi トCr ト'k
For the combination h seta & i1 rL, 5-100 atoms
Must be in the range of ic% (O, OS≦Z≦1
.. 0), However, if the amount of Ni becomes too large, Ni
Due to its ferromagnetism, the axis of easy magnetization of the alloy tends to be oriented parallel to the film surface.
その為、Ni 単独の星を考えた場合には 合金のの総
量に対し30 atomic%以下となることが望まし
い、従って、好ましいNi の礒は、NiとCr とを
合わせた量に対し20〜90 atomic%の範囲
である(0.2≦Z≦0.9)、更に、耐腐食性に関し
てはNiの閂が、Ni とCrとを合せた量に対し、6
0〜80 atoonic%の範囲(0,6≦Z≦0.
8)で良好な結果が得られた。Therefore, when considering a single Ni star, it is desirable that the amount of Ni is 30 atomic% or less based on the total amount of the alloy. Therefore, the preferable amount of Ni is 20 to 90% based on the total amount of Ni and Cr. atomic% range (0.2≦Z≦0.9).Furthermore, regarding corrosion resistance, the Ni bar is 6% compared to the combined amount of Ni and Cr.
Range of 0 to 80 atoonic% (0,6≦Z≦0.
8) gave good results.
以上の説明から、特に好ましい材料を化学組成で表わす
と、 GdTbFeNiCr、 TbFeCoNi
Cr。From the above explanation, the chemical compositions of particularly preferable materials are: GdTbFeNiCr, TbFeCoNi
Cr.
GdTbFeCoNLCrとなる。 TbFeNiC
rも考えられるが、キューリ一温度が100〜120℃
と低い為、多少熱的f#響を受は易い、GdTbFeN
(Crは。It becomes GdTbFeCoNLCr. TbFeNiC
r is also considered, but cucumber temperature is 100-120℃
GdTbFeN is somewhat susceptible to thermal f# effects due to its low
(Cr is.
通力なキューリ一温度(150〜200℃)を持ち、カ
ー回転角も比較的太きく (0,25〜0.27度)
、保磁力も大きいため微小な記録ビットを形成するる高
密度記録に適している。また、 TbFeCoNiC
rはキューリ一温度も適当でカー回転角が0.3度と大
さい、 GdTbFeCoNiCrは0.35〜0.4
5度とカー回転角が更に大きく、信号の読み出し特性に
優れた材料である。It has a strong cucumber temperature (150 to 200 degrees Celsius) and a relatively wide Kerr rotation angle (0.25 to 0.27 degrees).
Since it has a large coercive force, it is suitable for high-density recording that forms minute recording bits. Also, TbFeCoNiC
r has an appropriate Curie temperature and a large Kerr rotation angle of 0.3 degrees; GdTbFeCoNiCr is 0.35 to 0.4
It has a larger Kerr rotation angle of 5 degrees and is a material with excellent signal readout characteristics.
(実施例1)
高周波スパッタ装置において、水晶振動子を用いた膜厚
計の水晶振動子板を基板とし、第1のターケントとして
4イノチφのFe七に、5mm角のGd、Tb月を均一
に並へたものと、第2のターケントとして4イノチφの
40%Cr−残部N1合金を使用した。チャンへ−内を
1.5XlO−5Pa以下になるまで真空排気した後、
Arガスを4×10−I P aまで導入し、A空排気
系のメインバルブを操作することにより、Ar圧を3P
aにした。(Example 1) In a high-frequency sputtering device, a crystal oscillator plate of a film thickness meter using a quartz crystal oscillator was used as a substrate, and a 5 mm square Gd, Tb moon was uniformly spread on Fe 7 of 4 inches φ as the first tarquent. A 40% Cr-balance N1 alloy with a diameter of 4 ins was used as the second targent. After evacuating the chamber to below 1.5XlO-5Pa,
By introducing Ar gas up to 4×10-I Pa and operating the main valve of the A air exhaust system, the Ar pressure was reduced to 3P.
I made it a.
高周波’+IL&Iより第1のターゲットはスパッタ心
力250Wと一定とし、第2のターゲットはスパッタ’
clE力を変えた2源同時スパッタにより下記の種々の
組成の厚さQ、2p、rn ノGdTbFeNiCr
1111を作製した。From the high frequency '+IL&I, the first target has a constant sputtering force of 250W, and the second target has a sputtering force of 250W.
Thickness Q, 2p, rn of various compositions as shown below were obtained by simultaneous two-source sputtering with different CLE forces.
1111 was produced.
試料ニー1゜
((G do、s T bo、s )0.21 F e
o、7a lo、ss (N io、a Cro、4)
0.05試料l−2゜
((G do、s T bo、s )0.21 F e
o、rs )o、ao (N io、s Cro、<
)o、+。Sample knee 1° ((G do, s T bo, s ) 0.21 Fe
o, 7a lo, ss (N io, a Cro, 4)
0.05 sample l-2° ((G do, s T bo, s ) 0.21 Fe
o, rs ) o, ao (N io, s Cro, <
) o, +.
試料l−3゜
((G do、s T bo、s )0.21 F e
o、7s )0.85 (N io、s Cro、<
)o、 +s試料1−4;
((G do、s T bo、s )0.21 F e
o、7s lo、ao (N io、s Cro、a
)0.20また同様の装置で、 Cr を含まない、
下記組成の合金膜を作製した。Sample l-3゜((G do, s T bo, s )0.21 Fe
o, 7s ) 0.85 (N io, s Cro, <
) o, +s Sample 1-4; ((G do, s T bo, s )0.21 Fe
o,7s lo,ao (N io,s Cro,a
)0.20 Also similar equipment, Cr-free,
An alloy film having the following composition was produced.
試料1−5 ; ((Gdo、s Tbo、s )0
.21 Feo、7s 10.97 Nio、oaこれ
らの膜はX線回折の結果非晶質膜であることがわかった
。Sample 1-5; ((Gdo, s Tbo, s ) 0
.. 21 Feo, 7s 10.97 Nio, oa These films were found to be amorphous films as a result of X-ray diffraction.
上記構成の合金膜を80℃、85%RHの恒温恒湿槽に
入れて耐腐食試験を試みた結果を第1図に示す。The alloy film having the above structure was placed in a constant temperature and humidity chamber at 80° C. and 85% RH, and a corrosion resistance test was conducted. The results are shown in FIG.
第1図は、縦軸に水晶振動子による膜厚計を利用して計
A11l した媒体のiTffm増加分を任意尺度で示
し。In FIG. 1, the vertical axis shows, on an arbitrary scale, the increase in iTffm of the medium measured using a film thickness meter using a crystal oscillator.
横軸に0数 叩ち恒温恒1!!槽中での放置時間を取っ
たもので、!ILmが増加する程腐食が進んだことを示
している。ここで符号は各々の試料番号と同一とした。Number 0 on the horizontal axis, constant temperature constant 1! ! It took some time to leave it in the tank! It is shown that the corrosion progressed as ILm increased. Here, the code is the same as each sample number.
また比較例として従来の組成の光磁気記録媒体を同一の
条件で1lIF#腐食試験を行い、夫々17はCdTb
Feの例 18はGdTbFeCr ノ例を示す、Nl
8よびCrの入っていないGdTbFe膜では1日経過
後では、はとんど金属光沢がなくなり腐食されてしまっ
たが、NiおよびC’rの都が多くなるにつれて、重量
増加分、即ち酸化の度合が小さく、耐腐食性が向−ヒし
たことがわかった。また、 GdTbFeCr膜より
も耐腐食性に優れていることがわかった。In addition, as a comparative example, a 1lIF# corrosion test was conducted on a magneto-optical recording medium with a conventional composition under the same conditions, and 17 was CdTb.
Example of Fe 18 shows an example of GdTbFeCr, Nl
The GdTbFe film that does not contain 8 or Cr loses its metallic luster after one day and is corroded, but as the amount of Ni and C'r increases, the weight increase, that is, the degree of oxidation, increases. It was found that the corrosion resistance was improved. It was also found that the film has better corrosion resistance than the GdTbFeCr film.
更ニ、 GdTbFeNiCr plJはNlおよび
Criが多くなっても読み出し効率に関係するカー回転
角の減少率は小さく、試料1−4において約1896で
あった。Furthermore, in GdTbFeNiCr plJ, even if Nl and Cri were increased, the rate of decrease in the Kerr rotation angle, which is related to readout efficiency, was small, and was about 1896 in Samples 1-4.
(実施例2)
実施例1において第2のターゲットに20%Cr−残部
Ni合金を使用し、他は実施例1と同様にして下記の種
h f)組成の厚さ0.2gm (1) GdTbFe
N1CrIIQを作製した。(Example 2) In Example 1, a 20% Cr-balance Ni alloy was used for the second target, and the other conditions were the same as in Example 1. The following species h f) Composition thickness 0.2 gm (1) GdTbFe
N1CrIIQ was produced.
試料2−1:
((G do、s T bo、5)0.21 F eo
、7910.95 (N io、a Cro、2)0.
05試ネ+2−2;
((G do、5T bo、s )(1,21F eo
、t9+0.90 (N i o、a Cro、2)o
、t。Sample 2-1: ((G do, s T bo, 5) 0.21 F eo
, 7910.95 (N io, a Cro, 2) 0.
05 trial +2-2; ((G do, 5T bo, s) (1,21F eo
, t9+0.90 (N i o, a Cro, 2) o
, t.
試料2=3;
((Gdo、5 Tb(1,5)0.21 FeO,?
910.85 (N io、a CrO,2)6.15
試料2−4゜
((G do、s T bo、s )0.21 F e
o、v91o、go (N i O,8Cro、2)0
.20これらの膜はX線回折を行ったところ非晶質であ
った。Sample 2 = 3; ((Gdo, 5 Tb(1,5)0.21 FeO,?
910.85 (Nio,aCrO,2)6.15
Sample 2-4° ((G do, s T bo, s ) 0.21 Fe
o, v91o, go (N i O, 8Cro, 2) 0
.. 20 These films were found to be amorphous when subjected to X-ray diffraction.
上記構成のGdTbFeNiCr lりを実施例1と同
じ80℃、85%RHの恒温恒湿槽に入れて耐腐食試験
を試みた結果を第2図に示す、第2図において、符号は
試料番号と同一の符号を附し、第1図と同し比較例およ
び試料1−5の結果も合わせて示した。Figure 2 shows the results of a corrosion resistance test in which the GdTbFeNiCr sample having the above configuration was placed in the same temperature and humidity chamber at 80°C and 85% RH as in Example 1. The results of the comparative example and samples 1-5 are also shown with the same reference numerals as in FIG. 1.
本実施例も実施例1と同様にGdTbFeあるいはGd
TbFeCrよりも更に耐腐食性が向上していることが
わかった。更に読み出し効率を表わすカー回転角の減少
率は実施例1よりもさらに小さく、試料2−4において
約lθ%であった。In this example, as in Example 1, GdTbFe or Gd
It was found that the corrosion resistance was further improved than that of TbFeCr. Furthermore, the rate of decrease in the Kerr rotation angle, which represents readout efficiency, was even smaller than in Example 1, and was approximately lθ% in Sample 2-4.
(実施例3)
実施例1において第1のターゲ−/ )に30%co−
残部Feの上に5mon角の大きさの50%Gd−残部
Tb片を均一に並べたものを使用し、第2のターゲット
に40%Cr−残部Ni合金を使用して、実施例1と同
様に下記の種々の組成の厚さく12℃mのGdTbFe
CoNiCr 膜を作製した。(Example 3) In Example 1, 30% co-
Same as Example 1, using 50%Gd-balance Tb pieces of 5mon square size evenly arranged on the balance Fe, and using 40%Cr-balance Ni alloy as the second target. GdTbFe with a thickness of 12°C with various compositions as shown below.
A CoNiCr film was fabricated.
試料3−1:
((GdO,5TbO,5)0.22 Fed、?
C00,3)0.7810.95(N iQ、9 Cr
Q、4)Q、Q5試料3−2;
((G do、s T bo、5)o22F eo7C
00,3)0.7810.90(N i o、s Cr
o、4)o、 t。Sample 3-1: ((GdO,5TbO,5)0.22 Fed,?
C00, 3) 0.7810.95 (N iQ, 9 Cr
Q, 4) Q, Q5 sample 3-2; ((G do, s T bo, 5) o22F eo7C
00,3) 0.7810.90(Nio,sCr
o, 4) o, t.
試#43−3゜
((Gdo、5 T bO,5)0.22 F eQ
、7 CO(1,3)Q、78)(1,85(N iO
,6Crt)、4)t)、)5試村3−4;
((G do、s T bo、s)o、22F eo、
7C00,3)0.7810.80(N i o、s
Cro、4)o、2o’これらのn9はX線回折の結果
非晶質であった。Trial #43-3゜((Gdo, 5 T bO, 5) 0.22 F eQ
,7 CO(1,3)Q,78)(1,85(N iO
, 6Crt), 4) t),) 5 test village 3-4; ((G do, s T bo, s) o, 22F eo,
7C00,3) 0.7810.80(Nio,s
Cro, 4)o, 2o' These n9s were found to be amorphous as a result of X-ray diffraction.
」記構数の膜を夫に例1と同様に80℃、85%RHの
恒温恒湿槽に入れて耐腐食試験を行った結果を第31d
に示す、第3図において、符号は試料番号と同一の符号
を附し、第1図と同じ比較例、および試料1−5の結果
、更に19としテGdTbFeC。A corrosion resistance test was carried out by placing the membranes with the same number in a constant temperature and humidity chamber at 80°C and 85% RH in the same manner as in Example 1.
In FIG. 3 shown in FIG. 3, the same reference numerals as the sample numbers are given, and the results of the same comparative example and samples 1-5 as in FIG.
より成る光磁気記録媒体の同一条件下での耐腐食試験の
結果を示す。The results of a corrosion resistance test under the same conditions for a magneto-optical recording medium made of
GdTbFeCoNiCrの膜はGdTbFeCo ノ
IIQに対して耐腐食性が向」ニジており、また、
GdTbFe。The GdTbFeCoNiCr film has better corrosion resistance than GdTbFeCo IIQ, and
GdTbFe.
GdTbFeCr 7の11LX!よりも耐腐食性にf
Uれていることがわかった。また、カー回転角の減少−
Vは試料3−4において約12%であった。11LX of GdTbFeCr 7! More corrosion resistant than f
I found out that it was wrong. Also, the decrease in Kerr rotation angle −
V was about 12% in sample 3-4.
(実施例4)
実施例3において第2のターゲットに20%Cr−残部
Ni合金を使用し、他は実施例1と同様にして下記の種
々の厚さ0.2 #LmのGdTbFeCoNiCr咬
を作製した。(Example 4) In Example 3, a 20% Cr-balance Ni alloy was used for the second target, and the other conditions were the same as in Example 1, to produce the following various GdTbFeCoNiCr pieces with a thickness of 0.2 #Lm. did.
試料4−1;
f(G do、5T bo、s)o、22(F eo、
7Coo、a)o、7a)o、5s(N iO,B c
rO,2)0.(15試料4−2;
i(G do、s T bo、s)o、22(F eo
、7C00,3)0.7810.90(N t O,8
Cr、)、2)+)、+(1試料4−3;
!(G do、5T bo、s)o、22(F eo7
C80,3)0.78+0.85(N t o、a C
ro、2)o、+s試料4−4;
+(G do、5 T bo、5)0.22 (’F
e O,7C00,3)Q、?810.80(N i
Q、9 CrQ、2)Q、2Qこれらの膜はX線回折の
結果非晶質であった。Sample 4-1; f(G do, 5T bo, s) o, 22(F eo,
7Coo, a) o, 7a) o, 5s(N iO, B c
rO,2)0. (15 sample 4-2; i (G do, s T bo, s) o, 22 (F eo
,7C00,3)0.7810.90(N t O,8
Cr, ), 2) +), + (1 sample 4-3; ! (G do, 5T bo, s) o, 22 (F eo7
C80,3) 0.78+0.85(N t o, a C
ro, 2) o, +s sample 4-4; + (G do, 5 T bo, 5) 0.22 ('F
e O,7C00,3)Q,? 810.80 (N i
Q, 9 CrQ, 2) Q, 2Q These films were found to be amorphous as a result of X-ray diffraction.
上記構成の膜を実施例1と同様に80℃、85%RHの
恒温恒湿槽に入れて耐腐食性試験を行った結果を第4図
に示す、第4図において、符号は試ネ1番号と同一の符
号を附し、第3図と回じ比較例および試料1〜5の結果
を合わせて示した。本実施例によッテ、 GdTbF
eCoNiCr IK!t?N iとCrとの比をNi
/Cr = 8/2にしたものは、実施例3よりも耐久
性が増していることがわかった。また、カー回転角の減
少率は実施例3よりさらに小さく、試Q L4−4にお
いて約7%であった。The membrane with the above structure was placed in a constant temperature and humidity chamber at 80°C and 85% RH in the same manner as in Example 1, and a corrosion resistance test was conducted. The results are shown in Figure 4. The same reference numerals as the numbers are given, and the results of the comparative example and samples 1 to 5 are shown in FIG. 3. According to this example, GdTbF
eCoNiCr IK! T? The ratio of Ni to Cr is Ni
It was found that the product with /Cr = 8/2 had increased durability compared to Example 3. Furthermore, the rate of decrease in the Kerr rotation angle was even smaller than in Example 3, and was about 7% in Test Q L4-4.
(実施例5)
高周波スパッタ装置において、水晶振動子を用いた膜厚
計の水晶振動子板を基板とし、第1のターゲットとして
4インチφの30%Co−残部Faの板上に、5mm角
のTb片を均一に並べたものと。(Example 5) In a high-frequency sputtering device, a crystal resonator plate of a film thickness meter using a crystal resonator was used as a substrate, and a 5 mm square plate was placed on a 4 inch φ 30% Co-balance Fa plate as a first target. Tb pieces arranged uniformly.
第2のターゲットとして40%Cr〜残nN+合金を使
用した。チャンバー内を1.5XlO−5Pa以下にな
るまで真空排気した後、Arガスを4X I 0−IP
aまで4人し、真゛乍排気系のメインバルブを操作する
ことにより、Ar圧を3Paにした。この時、基板側に
rf′心源より入力し、[:J己バイアス電圧が80ボ
ルトになる様にした。この様にしてド記の種々の組成の
nさ0.24m tf) GdFeCoNiCr 1l
I2を作製した。A 40% Cr to balance nN+ alloy was used as the second target. After evacuating the chamber to 1.5XlO-5Pa or less, Ar gas was evacuated to 4X I0-IP.
The Ar pressure was set to 3 Pa by operating the main valve of the true exhaust system with four people working up to a. At this time, input was made from the RF source to the substrate side, and the bias voltage was set to 80 volts. In this way, various compositions of GdFeCoNiCr (n=0.24 m tf)
I2 was produced.
試料5−1゜
fT bo、+8(F eo、7C00,3)0.11
21 o、as (N iO,[i c r、)、4
)0.05試#4s−z。Sample 5-1゜fT bo, +8 (F eo, 7C00,3) 0.11
21 o, as (N iO, [ic r,), 4
) 0.05 test #4s-z.
(T bOl(B (F e(1,7C00,3)0.
8210.90 (N iO,e CrO,4)0.
10試料5−3:
(T bo、+a (F eo、7Coo、3)0.8
210.85 (N io、e Cro、< )0.
15試料5−4;
(T bO,4a (F e(+、7 Cog、3 )
0.821 Q、80 (N io、6 CrO,4)
0.20また。同様の装置で、Crを含まない下記組成
の合金膜を作製した。(T bOl(B (F e(1,7C00,3)0.
8210.90 (N iO, e CrO, 4) 0.
10 Sample 5-3: (T bo, +a (F eo, 7Coo, 3) 0.8
210.85 (N io, e Cro, < )0.
15 Sample 5-4; (T bO, 4a (F e (+, 7 Cog, 3)
0.821 Q, 80 (N io, 6 CrO, 4)
0.20 again. Using a similar apparatus, an alloy film containing no Cr and having the following composition was produced.
試$45−5゜
IT ba、+a (F eo、7COQ、3)0.8
21 o、s7N io、93これらの膜はX線回折の
結果、非晶質であった。Trial $45-5゜IT ba, +a (F eo, 7COQ, 3) 0.8
21 o, s7N io, 93 These films were found to be amorphous as a result of X-ray diffraction.
上記構成の合金膜を第1実施例と同じ80℃、85%R
Hの恒温恒湿槽に入れて耐腐食試験を試みた結果を第5
図に示す、ここで符号は各々の試料番号と同一した。ま
た実施例1と同じ比較例と更に20としてTbFeCo
の例を合わせて示した。The alloy film with the above structure was heated at 80°C and 85% R as in the first example.
The results of a corrosion resistance test placed in a constant temperature and humidity chamber of
The numbers shown in the figure are the same as the respective sample numbers. In addition, TbFeCo was used as a comparative example as in Example 1 and as 20.
An example is also shown.
本実施例により、 TbFeCoNiCr膜は、Ni
及びCrの入っていないT b F e Co rl
Qに比べ耐腐食硅か格段に向上していることがわかった
。また従来のGdTbFe、 GdTbFeCr等のI
IAより耐腐食性に優れていることがわかった。更に、
TbFeCoNiCr lipは、N1t−+よびCr
の星が多くなっても読出効率に関係するカー回転角の減
少率は小さく、試料5−4において1.灼10%であっ
た。According to this example, the TbFeCoNiCr film is made of Ni
and Cr-free T b Fe Corl
It was found that the corrosion resistance of silicon was significantly improved compared to Q. In addition, conventional I of GdTbFe, GdTbFeCr, etc.
It was found that it has better corrosion resistance than IA. Furthermore,
TbFeCoNiCr lip contains N1t-+ and Cr
Even if the number of stars increases, the rate of decrease in the Kerr rotation angle, which is related to readout efficiency, is small; in sample 5-4, the rate of decrease is 1. The burn rate was 10%.
(実施例6)
実施例5と同様に製膜したが、ここでは自己バイアス電
圧が零にし、ド記のHさ0.24 mの種々の組成(7
) TbFaCoNiCr nQを作成した。(Example 6) Films were formed in the same manner as in Example 5, but here the self-bias voltage was set to zero, and various compositions (7
) TbFaCoNiCr nQ was prepared.
試料6−1゜
fT bO,+8 (F eo、7 C00,3)+)
、82 )0.85 (N jO,8Cro、4 ’)
0.+)5試N6−2゜
(T bo、+a (F eo7Coo、3)0.82
io、so (N io、e Cro、a )o、t
。Sample 6-1゜fT bO, +8 (F eo, 7 C00,3)+)
,82)0.85 (N jO,8Cro,4')
0. +) 5 trials N6-2゜(T bo, +a (F eo7Coo, 3) 0.82
io, so (N io, e Cro, a) o, t
.
試料6−3゜
(T bo、+8 (F eo、7 CQo、3 )O
,8210,85(N i(1,6CrQ、4)cl、
+5試料6−4;
1Tbo、+a (F ao、7C00,3)o、a2
1o、so (N io、s Cro、4)0.20こ
れらの膜はX線回折の結果非晶質であった。Sample 6-3° (Tbo, +8 (Feo, 7 CQo, 3)O
,8210,85(N i(1,6CrQ,4)cl,
+5 sample 6-4; 1Tbo, +a (Fao, 7C00,3)o, a2
1o, so (N io, s Cro, 4) 0.20 These films were found to be amorphous as a result of X-ray diffraction.
h、χllりを実施例1と同様に80℃、85%の恒温
恒湿槽に入れて1耐、腐食性試験を行ったh〜果を第6
図に11<す、ここでも試料番壮と同一の符号を附し、
第5図と同し比較例および試料5−5の結果を合わせて
示した。As in Example 1, the samples were placed in a constant temperature and humidity chamber at 80°C and 85% and subjected to one resistance and corrosion test.
In the figure, 11 is given the same code as the sample number.
Same as FIG. 5, the results of the comparative example and sample 5-5 are also shown.
本実施例でもTbFeCoNiCrの膜はGdTbFe
、。In this example as well, the TbFeCoNiCr film is GdTbFe.
,.
GdTbFeCr、 TbFeCo等の膜よりも耐腐食
性に優れていることがわかった。It was found that this film has better corrosion resistance than films such as GdTbFeCr and TbFeCo.
また、カー回転角の減少率は試料6−4において、10
日後で約13%であった。また。In addition, the decreasing rate of Kerr rotation angle was 10 in sample 6-4.
It was about 13% after days. Also.
本実施例は製膜時にバイアス電圧を零としたので、顕著
な柱状構成が現われ、実施例5と比へて密度が小さくな
り、J1if食がはやかった。これから、バイアス電圧
を印加して製Hりしたほうが、耐、腐食性か向上するこ
とがわかった。In this example, since the bias voltage was set to zero during film formation, a remarkable columnar structure appeared, the density was lower than in Example 5, and the J1if eclipse was faster. From this, it was found that the resistance and corrosion resistance were improved by applying a bias voltage.
(実施例7)
実施例6において第2のターゲットに20%Cr−残部
Ni合金を使用し、あとは全く同様に製膜した。(Example 7) A film was formed in exactly the same manner as in Example 6 except that a 20% Cr-balance Ni alloy was used as the second target.
この様にして下記の厚さ0.2μmの種々の組成のTb
FeCoNiCr膜を作成した。In this way, Tb of various compositions with a thickness of 0.2 μm as shown below
A FeCoNiCr film was created.
試料7−1:
fTbo、+7(F eo、7C00,3)0.831
0−95 (N io、a CrO2)0.05試料7
−2゜
(Tbo、+7(F ao、7C00,3)0.831
0.90 (N iO,8c r(1,2)0.10
試村7−3:
fT bo、+7(F eo、7CQo、3 )Q、+
1310.85 (N io、a Cro、2)0.
15試$47−4 ;
tT bo、17(F eo、7C00,3)0.83
io、ao (N io、a Cr(1,2)0.
20こ丸らの膜はX線回折の結果、すべて非晶質であっ
た。Sample 7-1: fTbo, +7 (Feo, 7C00,3) 0.831
0-95 (N io, a CrO2) 0.05 sample 7
-2゜(Tbo, +7(Fao, 7C00,3)0.831
0.90 (N iO,8c r(1,2)0.10
Shimura 7-3: fTbo, +7 (Feo, 7CQo, 3) Q, +
1310.85 (N io, a Cro, 2) 0.
15 trials $47-4; tT bo, 17 (F eo, 7C00,3) 0.83
io, ao (N io, a Cr(1,2)0.
As a result of X-ray diffraction, all of Komaru et al.'s films were amorphous.
上記AI′を成の膜を実施例1と同様に85℃、85%
RHの恒温恒湿槽に入れて耐腐食試験を行った。その結
+1jを第7 [7jに小す、ここでも試料番号と−1
−の符号を付し 第5図と回し比較例および試料5−5
の結果を合わせて小した。The above AI' film was heated at 85°C and 85% in the same manner as in Example 1.
A corrosion resistance test was conducted by placing it in a constant temperature and humidity chamber at RH. As a result, +1j is reduced to the 7th [7j, where again the sample number and -1
A - symbol is attached to Fig. 5 and comparative example and sample 5-5.
The results were combined and reduced.
(実施例でもTbFeCoNiCr ty)膜はGdT
bFe 。(TbFeCoNiCr ty in the example) The film is GdT
bFe.
TbFaCo 、 GdTbFeCr ”F (7)
tlQよりも#腐食性に(3れていることがわかった。TbFaCo, GdTbFeCr”F (7)
It was found to be more corrosive than tlQ.
また、カー回転角の減少率は試料7−4において 10
14間経、liS後で約8%であった。In addition, the decreasing rate of Kerr rotation angle was 10 in sample 7-4.
After 14 days, it was about 8% after liS.
(実施例8)
1°1.“1周波スパッタ装置において 3インチ角の
白板ガラスを基板とし、第1のターゲットとして直径4
インチのFe上に5mm角のGd、Tb、Co。(Example 8) 1°1. “In a single-frequency sputtering system, the substrate is a 3-inch square white glass plate, and the first target is a 4-inch diameter
5 mm square Gd, Tb, Co on inch inch Fe.
片を均一に並べたものを、また第2のターゲットとして
直径4インチのNiを用いた。A uniform array of pieces and a 4 inch diameter Ni target were used as a second target.
装置内を1.5Xlo−5Pa以下の真空としたのち、
Arガスを4XIO−IPaまで導入し、真空排気系の
メインバルブを操作することによってAr圧を3Paと
した。高周波電源により、第1のターゲットはスパッタ
電力250Wで一定とし、第2のターゲットのスパッタ
電力を変えて、2M同時ヌパツタにより下記の種々の組
成GdTbFeCaNI膜を基板上に作成した。After making the inside of the device a vacuum of 1.5Xlo-5Pa or less,
Ar gas was introduced to 4XIO-IPa, and the Ar pressure was set to 3 Pa by operating the main valve of the evacuation system. Using a high-frequency power source, the sputtering power of the first target was kept constant at 250 W, and the sputtering power of the second target was changed to form GdTbFeCaNI films with the following various compositions on the substrate by 2M simultaneous sputtering.
試料8−工;
(Gdo、s (Tbo、s) 0.21 (Feo、
a Coo、t) 0.79 )o、sa N 1G、
003試料8−2;
(Gdo、s (Tbo、s) 0.21 CFea、
s Coo、r) 0.78 )o、se N io、
o+試料8−3;
(Gdo、s (T bo、s) 0.21 (Fso
、s COO,I) 0.79 )o、ss N Io
、o5試料8−4;
(Gdo、5(Tbo、s) 0.21 (Feo、
s Coo、+) o、7s )o、so Nio、+
試料8−5:
(Gdo、s (Tbo、s) 0.21 (Fe
o、a Coo、t) 0.7910.85 N io
、+5試料8−6;
(Gdo、s (Tbo、s) 0.21 (Feo
、s Coo、+) 0.7E110.80 N io
、2上記i7) GdTbFeCoNi pf2と、
GdTbFaCo H’A (比較例)とを 55 ”
C、75%の恒I&!恒湿層中で耐腐食試験に付した。Sample 8-E; (Gdo, s (Tbo, s) 0.21 (Feo,
a Coo, t) 0.79) o, sa N 1G,
003 sample 8-2; (Gdo, s (Tbo, s) 0.21 CFea,
s Coo, r) 0.78) o, se N io,
o+Sample 8-3; (Gdo, s (T bo, s) 0.21 (Fso
, s COO, I) 0.79 ) o, ss N Io
, o5 sample 8-4; (Gdo, 5 (Tbo, s) 0.21 (Feo,
s Coo, +) o, 7s) o, so Nio, +
Sample 8-5: (Gdo,s (Tbo,s) 0.21 (Fe
o, a Coo, t) 0.7910.85 N io
, +5 sample 8-6; (Gdo, s (Tbo, s) 0.21 (Feo
, s Coo, +) 0.7E110.80 N io
, 2 above i7) GdTbFeCoNi pf2,
GdTbFaCo H'A (comparative example) and 55"
C, 75% constant I&! Corrosion resistance test was carried out in a constant humidity layer.
結果をW4a図に示した。The results are shown in Figure W4a.
第8図は縦軸に保持力の初期イーに対する比を任意尺度
で不し、横軸に経過時間をとったもので。In Figure 8, the vertical axis shows the ratio of the holding force to the initial E on an arbitrary scale, and the horizontal axis shows the elapsed time.
保磁力の減少は腐食の進行を示している。各々の試料の
データは、試料番号と同一の符号で示し。A decrease in coercive force indicates progress of corrosion. Data for each sample is indicated by the same code as the sample number.
21は比較の為、Niを添加しないGdTbFeCo膜
の従来例を示す。For comparison, reference numeral 21 shows a conventional example of a GdTbFeCo film to which no Ni is added.
第8図から明らかなように、NLを含有しないGdTb
FeCo Hは約200時間で保持力のIIl著な低下
が認められた。 GdTbFeCoのNi含有量が増す
につれて保磁力の減少は小さく、IT1腐食性が増す、
また非晶′!Lai性膜は比較的低い温度で結晶化など
の4Ii造変化を起こしやすく、光磁気材料としての特
性が損なわれることがあるが、Niの添加により結晶化
温度が1昇し、熱的安定性も向上した。As is clear from Fig. 8, GdTb containing no NL
For FeCo H, a significant decrease in holding power was observed after about 200 hours. As the Ni content of GdTbFeCo increases, the coercive force decreases less and IT1 corrosivity increases.
Amorphous again! Lai-based films tend to undergo 4Ii structural changes such as crystallization at relatively low temperatures, and their properties as magneto-optical materials may be impaired, but the addition of Ni raises the crystallization temperature by 1, improving thermal stability. has also improved.
(実施例9)
実施例1において第1のターゲット上に並べるGd 、
Tb片の枚数を変えた以外は実施例1と同様にして下記
の種々の組成のGdTbFeNiCr膜を作製した0次
にこれらの膜と、比較例として同様に作製されたGdT
bFe膜に実施例1と同様の耐腐食性試験を行なった。(Example 9) Gd arranged on the first target in Example 1,
GdTbFeNiCr films with various compositions as shown below were prepared in the same manner as in Example 1 except that the number of Tb pieces was changed.
The bFe film was subjected to the same corrosion resistance test as in Example 1.
この試験による本実施例の4日後の重量増加分を、Gd
TbFe IIlにおける4日後の重量増加分を100
としたときの比咬値として、下記組成と共にまとめて記
す。The weight increase after 4 days of this example according to this test was determined by Gd
Weight increase after 4 days in TbFe IIl is 100
The ratio bite value when
組 成 毛髪増加分試料9−
1;
((GdO,05TbQ、95)0.21 Feo、
7slo、5o(Nio、5Cro、a)o、to
55試料9−2;
((GdO,1OTb0.90)0.21 Fao、
7s1o、5o(Nio、eCro、4)o、Io
50試料9−3:
((GdO,90Tbo、lo)Q、21 Fe(1
,711(1,90(Niq、6CrO,4)0.1(
150試料9−4;
1(Gdo、5oTbo、5o)o、Io FeO,
9010,90(Ni0.8CrQ、4)0.10
a。Composition Hair increase sample 9-
1; ((GdO, 05TbQ, 95) 0.21 Feo,
7slo, 5o (Nio, 5Cro, a) o, to
55 sample 9-2; ((GdO,1OTb0.90)0.21 Fao,
7s1o, 5o (Nio, eCro, 4)o, Io
50 sample 9-3: ((GdO,90Tbo,lo)Q,21Fe(1
,711(1,90(Niq,6CrO,4)0.1(
150 sample 9-4; 1 (Gdo, 5oTbo, 5o)o, Io FeO,
9010,90(Ni0.8CrQ,4)0.10
a.
試料9−5;
((GdO,50TbQ、50)0.15 Feo、y
r)o、ao(Nio、5Cro、4)o、ro 4
5試料9−6;
((Gd0.50Tb0.50)0.25 FeG、
751o、9o(NiO,B Cro、4ン (1,
+11 50試料9−7;
((Gdo、5oTbo、5o)o、3o FaO,?
010.90(?’1G、8cr0.4)0.10 5
0試料9−8:
((Gd0.50TbO,5G)0.35 Feo、a
slo、5o(Nio、5Cro、4)o、to 5
5(実施例10)
実施例1において、第2のターゲットに夫々9g%Cr
−残部Ni合金、80%Cr−残部O
Ni合金、5%Cr−残部Ni合金を使用し、他は実施
例1と同様にして下記の種々の組成のGdTbFeNi
Cr1liを作製した。これらの膜に実施例1と同様の
耐腐食性試験を行ない、結果を実施例9と同様に示した
。Sample 9-5; ((GdO, 50TbQ, 50) 0.15 Feo, y
r) o, ao (Nio, 5Cro, 4) o, ro 4
5 sample 9-6; ((Gd0.50Tb0.50)0.25 FeG,
751o, 9o (NiO, B Cro, 4n (1,
+11 50 sample 9-7; ((Gdo, 5oTbo, 5o)o, 3o FaO,?
010.90 (?'1G, 8cr0.4) 0.10 5
0 sample 9-8: ((Gd0.50TbO,5G)0.35 Feo, a
slo, 5o (Nio, 5Cro, 4)o, to 5
5 (Example 10) In Example 1, 9 g% Cr was added to each of the second targets.
- Balance Ni alloy, 80% Cr - Balance O Ni alloy, 5% Cr - Balance Ni alloy were used, and the rest was the same as in Example 1 to prepare GdTbFeNi with the following various compositions.
Cr1li was produced. These films were subjected to the same corrosion resistance test as in Example 1, and the results were shown in the same manner as in Example 9.
組 成 重量増加分試料1
0−1;
[(GdO,50TbO,5G) 0.21 Feo、
79io、ao (N io、osc ro、ss)
o、io 60試料10−2;
+(GdO,50TbO,5G) 0.21 FeQ、
?91o、eo (NiQ、20Cro、80) 0.
1055試料10−3 ;
((Gd0.50TbO,50) Q、21 F eo
、791o、so (N io、soc ro、to)
o、to 45(実施例11)
実施例1において第1のターゲットに30%C〇−残部
Fe合金を使用し、その上に並べるGd 、Tb片の枚
数を変え、他は実施例1と同様にして下記の種々+7)
組成のGdTbFeCoNiCr Illを作製した0
次にこれらの膜と、比較例として同様に作製されたGd
TbFeCo IIS[に、実施例1と同様の耐腐食性
試験を行なった。この試験による本実施例4日後の玉量
増加分を、 GdTbFeCo IQにおける4日後の
!1!量増加分を100としたときの比較値として、下
記組成と共にまとめて記す。Composition Weight increase sample 1
0-1; [(GdO, 50TbO, 5G) 0.21 Feo,
79io, ao (N io, osc ro, ss)
o, io 60 sample 10-2; + (GdO, 50TbO, 5G) 0.21 FeQ,
? 91o, eo (NiQ, 20Cro, 80) 0.
1055 sample 10-3; ((Gd0.50TbO,50) Q, 21 F eo
, 791o, so (N io, soc ro, to)
o, to 45 (Example 11) In Example 1, a 30% C〇-balance Fe alloy was used as the first target, and the number of Gd and Tb pieces arranged on it was changed, but the rest was the same as Example 1. The following various +7)
GdTbFeCoNiCr Ill with composition 0
Next, these films and a similarly prepared Gd film as a comparative example
TbFeCo IIS was subjected to the same corrosion resistance test as in Example 1. The increase in ball amount after 4 days of this example in this test is as follows: 4 days after GdTbFeCo IQ! 1! As a comparison value when the increase in amount is set as 100, the following compositions are summarized.
111 成 I増加分試料
11−1゜
((Gdo、os Tbo、ss )0.22 (Fe
o、7o CQo、30 )0.781o、s。111 I increase sample 11-1° ((Gdo, os Tbo, ss) 0.22 (Fe
o, 7o CQo, 30 ) 0.781o, s.
(Nio、so Cro、io )o、to 35試料
11−2゜
((Gdo、io Tbo、so、)o、22(Feo
、7o COo、30 )0.78 )0.110(N
io、ao Cro、4o)o、io 30試料11−
3゜
((Gdo、so Tbo、to )0.22 (Fe
o、7o COo、30 )0.78 )o、s。(Nio, so Cro, io) o, to 35 samples 11-2° ((Gdo, io Tbo, so,) o, 22 (Feo
, 7o COo, 30 ) 0.78 ) 0.110 (N
io, ao Cro, 4o) o, io 30 sample 11-
3゜((Gdo, so Tbo, to)0.22 (Fe
o, 7o COo, 30) 0.78) o, s.
(Nio、80Cry、4g )(14(130試料1
1−4゜
((Gdo、so Tbo、so )o、to (Fe
o、7o COo、30 )o、so )o、s。(Nio, 80Cry, 4g) (14 (130 samples 1
1-4゜((Gdo, so Tbo, so) o, to (Fe
o, 7o COo, 30) o, so ) o, s.
(NiO,80CrO,40)0.1025試料11−
5;
((Gdo、so Tbo、so )Q、15 (
Feg、7g coo、30 )o、as lo、s。(NiO, 80CrO, 40) 0.1025 sample 11-
5; ((Gdo, so Tbo, so) Q, 15 (
Feg, 7g coo, 30) o, as lo, s.
(NiO,80CrO,40)0.10 25試料11
−6;
((Gdo、so Tbo、so )0.25 (Fe
o、7o COo、30 )0.75 )o−s。(NiO, 80CrO, 40) 0.10 25 samples 11
-6; ((Gdo, so Tbo, so)0.25 (Fe
o, 7o COo, 30) 0.75) o-s.
(NiO,80CrO,40)0.10 30試料11
−7゜
((Gdo、so Tbo、so )0.30 (Fl
lo、70 COo、3G )0.701o、s。(NiO, 80CrO, 40) 0.10 30 samples 11
-7゜((Gdo, so Tbo, so)0.30 (Fl
lo, 70 COo, 3G) 0.701o, s.
(Ni6,80Cr0.4g)1)、1(130試料1
1−8゜
1(Gdo、so Tbo、so )0.35 (Fe
o、7o COo、3G )o、ss )o、s。(Ni6,80Cr0.4g) 1), 1 (130 sample 1
1-8゜1 (Gdo, so Tbo, so)0.35 (Fe
o, 7o COo, 3G ) o, ss ) o, s.
(Nio、eo Cro、4o )o、io 35(
実施例12)
実施例1における第1のターゲットに種々の組成のFe
Co合金を使用し、他は実施例1と同様にして下記種々
のGdTbFeCoNiCr 11%を作製した。これ
らの膜に実施例1と同様の耐腐食性試験を行ない、結果
を実施例11と同様に示した。(Nio, eo Cro, 4o)o, io 35(
Example 12) Fe of various compositions was used as the first target in Example 1.
The following various GdTbFeCoNiCr 11% samples were prepared in the same manner as in Example 1 except that a Co alloy was used. These films were subjected to the same corrosion resistance test as in Example 1, and the results were shown in the same manner as in Example 11.
組 成 侶埴増加分試料12
−1゜
((GdO,50Tb0.5G)0.22 (Feo
、5sCoo、os) 0.78) o、9゜(NiO
,60CrO,40)0.10 35試料12−2;
((G do、soT bo、so) 0.22 (F
eo、11oc oo、to) o、7a) o、s
o。Composition Meibori increase sample 12
-1゜((GdO,50Tb0.5G)0.22 (Feo
, 5sCoo, os) 0.78) o, 9° (NiO
,60CrO,40) 0.10 35 sample 12-2; ((G do, soT bo, so) 0.22 (F
eo, 11oc oo, to) o, 7a) o, s
o.
(Ni6,80Cr(1,40)0.10 35試料1
2−31
((GdO,50TbO,50) 0.22 (F”0
.80CO0,2G) 0.78) 0.90(NiO
,80Cr0.4G)0.10 30試料12−4 。(Ni6,80Cr(1,40)0.10 35 sample 1
2-31 ((GdO,50TbO,50) 0.22 (F”0
.. 80CO0,2G) 0.78) 0.90(NiO
, 80Cr0.4G) 0.10 30 Sample 12-4.
+(G dO,50T bo、50) 0.22 (F
eo、soc 00.40) 0.78) 0.90
(Nio、5oCro、to)o、io 30試料1
2−5 。+(G dO, 50T bo, 50) 0.22 (F
eo, soc 00.40) 0.78) 0.90
(Nio, 5oCro, to)o,io 30 sample 1
2-5.
i(G do、soT bo、so) 0.22 (F
1!0.50C00,50) 0.78i o、a。i(G do, soT bo, so) 0.22 (F
1!0.50C00,50) 0.78i o, a.
(Nio、eoCro、4o)o、io 25試料1
2−6 。(Nio, eoCro, 4o) o, io 25 sample 1
2-6.
((G do、soT bo、so) 0−22 (F
eo、3sc 00.85) 0.7810.90(
N’0.80C40,40)0.10 20試料12−
7;
((GdQ、50Tb0.5G)0.22 (Feo
、2oCoo、go) o、7al o、s。((G do, soT bo, so) 0-22 (F
eo, 3sc 00.85) 0.7810.90(
N'0.80C40,40) 0.10 20 samples 12-
7; ((GdQ, 50Tb0.5G)0.22 (Feo
, 2oCoo, go) o, 7al o, s.
(N盲o、so Cro、ao )o、io l
5(実施例13)
実施例1において第1のターゲットに30%Co−残部
Fe合金を用い、第2のターゲットに夫々9昏%Cr−
残部Ni合金、80%Cr−残部Ni合金、養%Cr−
残部Ni合金100%Niを使用し、他は実施例1と同
様にして下記の種々ノ組成のGdTbFeNiCr H
オよびGdTbFeNi膜を作製した。これらの膜に実
施例1と同様の耐腐食性試験を行ない、結果を実施例1
1と同様に示した。(N blind o, so Cro, ao) o, io l
5 (Example 13) In Example 1, a 30% Co-balance Fe alloy was used for the first target, and a 9% Cr-balanced alloy was used for the second targets.
Balance Ni alloy, 80% Cr- Balance Ni alloy, %Cr-
GdTbFeNiCrH with the following various compositions was prepared in the same manner as in Example 1 except that the remaining Ni alloy was 100% Ni.
and GdTbFeNi films were fabricated. These films were subjected to the same corrosion resistance test as in Example 1, and the results were summarized in Example 1.
Shown in the same manner as 1.
組 I& 玉量増加分試料1
3−1゜
((G dQ、50T bo、50 )0.22 (F
eo、70c 00.30 )0.781o、s。Group I & ball amount increase sample 1
3-1゜((G dQ, 50T bo, 50) 0.22 (F
eo, 70c 00.30) 0.781o, s.
(Nio、os Cro、ss )o、io 40試
料13−2 ;
+(G dO,50T bo、so )0.22 (F
eo、70c 00.30 )0.78 ][1,9
0(Nio、2oCro、ao)o、to 35試料
13−3゜
f(G do、5oTbo、so )0.22 (F
eo、?Oc 00.30 )Q、781o、s。(Nio, os Cro, ss) o, io 40 sample 13-2; + (G dO, 50T bo, so) 0.22 (F
eo, 70c 00.30 ) 0.78 ] [1,9
0 (Nio, 2oCro, ao) o, to 35 sample 13-3°f (G do, 5oTbo, so) 0.22 (F
eo,? Oc 00.30) Q, 781o, s.
(Nio、5oCro、io)o、io 25試料1
3−4;
((G do;soT bo、so )0.22 (F
eo、7oc 00.30 )0.7810.9ON
io、io 60
(実施例14)
実施例5において第1のターゲット上に並べるT b
Bの枚数を変えた以外は実施例5と同様にして下記の種
々の組成のTbFeCoNiCr膜を作製した0次にこ
れらの膜と、比較例として同様に作製されたTbFeC
o pfJに、実施例1と同様の耐腐食性試験を行なっ
た。この試験によると未実施例40後の重量増加分を、
TbFeCo !1gにおける4日後の@蓋増加分を1
00としたときの比咬値として、下記組成と共にまとめ
て記す。(Nio, 5oCro, io) o, io 25 sample 1
3-4; ((G do; so T bo, so )0.22 (F
eo, 7oc 00.30) 0.7810.9ON
io, io 60 (Example 14) T b arranged on the first target in Example 5
TbFeCoNiCr films with various compositions as shown below were prepared in the same manner as in Example 5 except that the number of B sheets was changed.
o pfJ was subjected to the same corrosion resistance test as in Example 1. According to this test, the weight increase after unexamined example 40 was
TbFeCo! 1g @ lid increase after 4 days 1
The ratio bite value when set to 00 is summarized together with the composition below.
試料14−1;
(T bo、io (F eO,?oc 00.30
)o、sol O,90(N io、eoc ro、4
o )o、to 30試料14−2゜
(T bo、+s (F eo、7oc 00.30
)o、ssl o、so (N io、soCro、i
o )o、to 30試料!4−3;
(T bO,25(F eo、70c 00.3G )
0.7510.90 (N io、eoc rO,40
)0.10 40試料14−4 。Sample 14-1; (T bo,io (F eO,?oc 00.30
) o, sol O, 90 (N io, eoc ro, 4
o ) o, to 30 samples 14-2° (T bo, +s (F eo, 7oc 00.30
) o, ssl o, so (N io, soCro, i
o ) o, to 30 samples! 4-3; (T bO, 25 (F eo, 70c 00.3G)
0.7510.90 (N io, eoc rO, 40
) 0.10 40 samples 14-4.
(T bo、3o (F eo、7oc 00.3Q
)o、7o) o、so (N io、soc ro、
to )o、to 40試料14−5゜
(T bo、3s (F eo、7oc oo、3o
)o、ss) o、so (N io、soc ro、
4o )o、to 45(実施例15)
実施例5において第1のターゲットに種々の組成のFe
Co合金とTb片を使用し、若しくはFe上にTb片と
5mm角のCo片を並べたものを使用し、他は実施例5
と同様にして下記の種々のAl1成のTbFeCoNi
Cr膜を作製した。これらの膜に実施例1と同様の耐腐
食性試験を行ない、結果を実施例14と同様に示した。(T bo, 3o (F eo, 7oc 00.3Q
)o, 7o) o, so (N io, soc ro,
to ) o, to 40 samples 14-5° (T bo, 3s (F eo, 7oc oo, 3o
) o, ss) o, so (N io, soc ro,
4o) o, to 45 (Example 15) In Example 5, Fe of various compositions was used as the first target.
Using a Co alloy and a Tb piece, or using a Tb piece and a 5 mm square Co piece arranged on Fe, the rest is Example 5.
Similarly, the following various Al1 composition TbFeCoNi
A Cr film was produced. These films were subjected to the same corrosion resistance test as in Example 1, and the results were shown in the same manner as in Example 14.
試料15−1゜
(T bo、+7(F eo、ssCoo、o+ )0
.831 o、so (N io、soc ro、io
)o、io 45試料15−2;
fT bo、+7(F eO,90c QO,IO)0
.831 o、so (N iQ、80c rO,40
)0.10 40試料15−3 。Sample 15-1° (Tbo, +7 (Feo, ssCoo, o+)0
.. 831 o, so (N io, soc ro, io
) o, io 45 sample 15-2; fT bo, +7 (F eO, 90c QO, IO) 0
.. 831 o, so (N iQ, 80c rO, 40
) 0.10 40 samples 15-3.
(T bo、+7(F eo、soc 00.20 )
0.831 o、so (N io、soCro、4o
)o、io 35試料15−4;
(T bo、+7(F eo、soc 00.40 )
0.83i o、so (N io、soCro、4o
)o、io 35試料15−5 。(Tbo, +7 (Feo, soc 00.20)
0.831 o, so (N io, soCro, 4o
) o, io 35 sample 15-4; (T bo, +7 (F eo, soc 00.40)
0.83i o, so (N io, soCro, 4o
) o, io 35 sample 15-5.
(T bo、+7(F eo、soCoo、so )o
、es1 o、so (N io、soCro、4o
)o、io 30試料15−6゜
(T bo、 l? (F eo、3sCoo、es
)o、es1 o、so (N io、soc ro、
4o )o、io 25試料15−7゜
(TbO1+7 (F eo、2oc 00.80 )
0.831 o、so (N io、eoc ro、4
o )o、to 25(実施例16)
実施例5において、第2のターゲットに夫々96%Cr
−残1iffiNi合金、80%Cr−残部O
Ni合金、奏%Cr−残部Ni合金を使用し、他は実施
例5と同様にして下記の種々の組成のTbFeCoNi
Cr IIQを作製した。これらの膜に実施例1と同様
の耐腐食性試験を行ない、結果を実施例14と同様に示
した。(T bo, +7 (F eo, soCoo, so )o
, es1 o, so (N io, soCro, 4o
) o, io 30 samples 15-6° (T bo, l? (F eo, 3sCoo, es
) o, es1 o, so (N io, soc ro,
4o) o, io 25 samples 15-7° (TbO1+7 (Feo, 2oc 00.80)
0.831 o, so (N io, eoc ro, 4
o) o, to 25 (Example 16) In Example 5, 96% Cr was added to the second target, respectively.
- Remaining 1iffiNi alloy, 80% Cr-remaining O Ni alloy, and using %Cr-remaining Ni alloy, and in the same manner as in Example 5, TbFeCoNi with the following various compositions were used.
Cr IIQ was produced. These films were subjected to the same corrosion resistance test as in Example 1, and the results were shown in the same manner as in Example 14.
IT bo、 +7 (F eo、7oc 00.30
)0.83) 0.90 (N io、osc ro
、as )o、io 45試料16−2 。IT bo, +7 (F eo, 7oc 00.30
)0.83) 0.90 (N io, osc ro
, as) o, io 45 sample 16-2.
IT bo、 +7(F eo、7oc 00.30
)0.8310.90 (N io、2oc ro、g
o )o、io 40試Ml 6−3 ;
(T bo、17(F eo、7oc 00.30 )
0.83+ 0.90 (N io、aoCro、io
)o、to 40本発明に係る光磁気記録媒体を、
ガラス、金属。IT bo, +7(Feo, 7oc 00.30
) 0.8310.90 (N io, 2oc ro, g
o) o, io 40 trials Ml 6-3; (T bo, 17 (F eo, 7oc 00.30)
0.83+ 0.90 (N io, aoCro, io
) o, to 40 The magneto-optical recording medium according to the present invention,
glass, metal.
プラスチック等の基板に実施例のスパッター法或いは真
空蒸着法等で積層するに際し、該記録媒体上に周知の保
護層、或いは保fi層を兼ねた反射防止層や断熱層等を
設ければ、更に耐腐食性は向上する。又、従来知られて
いる様な、不活性ガスを閉じ込めたエアーサンドウィッ
チ型構成にしても、耐腐食性が向上することは言うまで
もない。When laminating on a substrate such as plastic by the sputtering method or vacuum evaporation method of the embodiment, if a well-known protective layer, an antireflection layer that also serves as an anti-reflection layer, a heat insulating layer, etc. are provided on the recording medium, further Corrosion resistance is improved. Furthermore, it goes without saying that the corrosion resistance can be improved even if the conventionally known air sandwich type structure in which an inert gas is confined is used.
(発明の効果)
以上説明したように、本発明は従来の光磁気記録媒体に
おいて、耐腐食性を格段に向上させる効果を有する。(Effects of the Invention) As explained above, the present invention has the effect of significantly improving corrosion resistance in conventional magneto-optical recording media.
第1 M及び第2図は夫// GdTbFeNiCr
pfJより成る本発明の実施例の耐腐食性試験の結果を
示す図。
第3図及び第4図は夫h GdTbFeCoNiCr
nQより成る本発明の実施例の耐腐食性試験の結果を示
す図。
:A5図、:11J6図及び第7図は夫* TbFeC
oN1C:r膜より成る本発明の実施例の耐腐食性試験
の結果を示す図。
第8図はGdTbFeCoNi 114Jより成る本発
明の実施例の耐腐食性試験の結果を示す図である。1st M and 2nd figure are husband // GdTbFeNiCr
FIG. 3 is a diagram showing the results of a corrosion resistance test of an example of the present invention made of pfJ. Figures 3 and 4 show husband hGdTbFeCoNiCr
FIG. 3 is a diagram showing the results of a corrosion resistance test of an example of the present invention made of nQ. :A5 figure, :11J6 figure and figure 7 are Hu*TbFeC
FIG. 3 is a diagram showing the results of a corrosion resistance test of an example of the present invention made of an oN1C:r film. FIG. 8 is a diagram showing the results of a corrosion resistance test of an example of the present invention made of GdTbFeCoNi 114J.
Claims (1)
金膜を有する光磁気記録媒体において、前記合金膜が、 {(Gd_xTb_1_−_x)_p(Fe_yCo_
1_−_y)_1_−_p}_q(Ni_zCr_1_
−_z)_1_−_q但し、0≦x≦0.9 0.2≦y≦1.0 0.05<z<1.0 0.1≦p<0.5 0.001≦1−q≦0.35 で表わされることを特徴とする光磁気記録媒体。(1) In a magneto-optical recording medium having an amorphous magnetic alloy film having an axis of easy magnetization perpendicular to the film surface, the alloy film has the following structure: {(Gd_xTb_1_-_x)_p(Fe_yCo_
1_-_y)_1_-_p}_q(Ni_zCr_1_
-_z)_1_-_qHowever, 0≦x≦0.9 0.2≦y≦1.0 0.05<z<1.0 0.1≦p<0.5 0.001≦1-q≦ 0.35.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23434684A JPS61113155A (en) | 1984-11-07 | 1984-11-07 | Photomagnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23434684A JPS61113155A (en) | 1984-11-07 | 1984-11-07 | Photomagnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61113155A true JPS61113155A (en) | 1986-05-31 |
Family
ID=16969553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23434684A Pending JPS61113155A (en) | 1984-11-07 | 1984-11-07 | Photomagnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61113155A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61172237A (en) * | 1985-01-28 | 1986-08-02 | Kyocera Corp | Photoelectromagnetic recording element |
US4751142A (en) * | 1985-09-18 | 1988-06-14 | Kyocera Corporation | Magneto-optical recording element |
US4950556A (en) * | 1987-10-26 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Magneto-optic recording medium |
US5502893A (en) * | 1992-10-09 | 1996-04-02 | International Business Machines Corporation | Method of making a printing wiring board |
-
1984
- 1984-11-07 JP JP23434684A patent/JPS61113155A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61172237A (en) * | 1985-01-28 | 1986-08-02 | Kyocera Corp | Photoelectromagnetic recording element |
US4751142A (en) * | 1985-09-18 | 1988-06-14 | Kyocera Corporation | Magneto-optical recording element |
US4950556A (en) * | 1987-10-26 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Magneto-optic recording medium |
US5502893A (en) * | 1992-10-09 | 1996-04-02 | International Business Machines Corporation | Method of making a printing wiring board |
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