JPS6055691A - Conductive pattern forming unit of circuit board - Google Patents
Conductive pattern forming unit of circuit boardInfo
- Publication number
- JPS6055691A JPS6055691A JP16564283A JP16564283A JPS6055691A JP S6055691 A JPS6055691 A JP S6055691A JP 16564283 A JP16564283 A JP 16564283A JP 16564283 A JP16564283 A JP 16564283A JP S6055691 A JPS6055691 A JP S6055691A
- Authority
- JP
- Japan
- Prior art keywords
- conductive pattern
- resin
- circuit board
- aluminum
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Reinforced Plastic Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Structure Of Printed Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は回路基板の導電パターン形成法に関するもので
あり、その目的は導電部分と絶縁部分が同一平面上にあ
り、平滑な鏡面状の表面を有する回路基板を提供するこ
とにある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a conductive pattern on a circuit board, and its purpose is to provide a circuit board having a conductive part and an insulating part on the same plane and a smooth mirror-like surface. There is a particular thing.
従来、回路基板の導電パターンの形成方法に関しては多
数の提案がなされている。たとえば、図面において、第
1図(a )に示すように、紙−フェノール樹脂やガラ
ス繊維−エポキシ樹脂よりなる電気絶縁基板3の上に有
機系接着剤2を塗布し、銅等の金属i1を接着するか、
あるいは第1図(b)に示すように、ガラスrjAH−
ジアリルフタレート樹脂プリプレグよりなる電気絶縁基
板3に銅等の金属箔1を熱圧成形して該プリプレグの硬
化と金属箔の接着を同時に行なうか等があり、いずれに
しても、いわゆる銅張積層板を製造したのち、不要部分
の金属箔をエツチング等で除去する方法がある。また、
他方、金属箔の不要部分を除去するのではなく、必要部
分にのみ銅等の金属をメッキ等により析出さ口て、導電
パターンを形成させようとする方法もある。Conventionally, many proposals have been made regarding methods of forming conductive patterns on circuit boards. For example, as shown in FIG. 1(a), an organic adhesive 2 is applied onto an electrically insulating substrate 3 made of paper-phenol resin or glass fiber-epoxy resin, and a metal i1 such as copper is applied. Glue or
Alternatively, as shown in FIG. 1(b), glass rjAH-
There is a method of hot-pressing forming a metal foil 1 of copper or the like onto an electrically insulating substrate 3 made of diallyl phthalate resin prepreg, and curing the prepreg and adhering the metal foil at the same time. After manufacturing the metal foil, there is a method of removing unnecessary parts of the metal foil by etching or the like. Also,
On the other hand, there is also a method in which, instead of removing unnecessary parts of the metal foil, a metal such as copper is deposited by plating only on the necessary parts to form a conductive pattern.
しかしながら、これらの方法で得られた回路基板は、い
ずれも第2図に示すように、電気絶縁基板3の上に導電
パターン4が突出しに形になっており、導電部分と絶縁
部分が同−甲面トにあるように1−ることは不可能であ
る。However, as shown in FIG. 2, the circuit boards obtained by these methods all have a conductive pattern 4 protruding from an electrically insulating substrate 3, and the conductive portion and the insulating portion are the same. It is impossible to do 1- as shown in G.
これを可11LにJるために、離型板に印刷法により導
電パターンを形成させたのち、電気絶縁14板1に反転
貼着する方法、その他種々のlII!案がイ【されてい
るが、印刷法では使用しうる)#市(II +A ll
に制限があり、抵抗値の低い回路を組むこと(3L極め
て困難でもあり、また印刷膜II、Iからみて、人きh
電流を流すには一般に14((即があるぽかりでなく、
微細なパターンを10ること1)困IIであった。In order to reduce the size to about 11L, a conductive pattern is formed on a release plate by a printing method, and then it is inverted and pasted onto an electrically insulating plate 1, and various other methods are used. The draft is ii [but can be used in the printing law) #city (II +A ll
There is a limit to the resistance value, and it is extremely difficult to build a circuit with low resistance (3L), and from the viewpoint of printed films II and I,
In general, to flow a current, it takes 14 ((There is no immediate difference,
1) It was difficult to create 10 fine patterns.
本te l!II f’+等は181[の点を考慮し、
銅張積層数のりぐれた特徴を生かしつつ、導電部分と絶
H部分h< li■1− 甲面りにあり、平滑な鏡面状
の表面をIiする回路基板を得るために種々検81の結
束、新規(1導電パターンの形成法を完成【〕、広畦間
の用途をもつ回路基板を製造すること1こ成功しI、二
。Book phone! II f'+ etc. consider the point 181 [,
In order to obtain a circuit board that takes advantage of the excellent features of the number of copper-clad laminated layers and has a conductive part and an absolutely H part h < li ■ 1- on the back side, and a smooth mirror-like surface, 81 tests were carried out. , Completed a new conductive pattern formation method [1], and succeeded in manufacturing a circuit board with wide-area applications.
リ−なわ15、木ツを明は、アルミニウム基材上に電着
させた銅層の不要部分を除去して導電パターンを形成さ
せる工程、該導電パターンを電気絶縁基板上に該パター
ン面が該絶縁基板と接するように積層して熱圧成形によ
り積層体をうる■稈、該積層体中のアルミニウム基材を
アルカリ処理により溶解除去する工程、よりなることを
特徴とする導電部分と絶縁部分とが同一平面上にある回
路基板の導電パターン形成法である。Leenawa 15, Akira Kitsuo, is a process of removing unnecessary parts of a copper layer electrodeposited on an aluminum base material to form a conductive pattern, and depositing the conductive pattern on an electrically insulating substrate so that the pattern surface is A conductive part and an insulating part, characterized in that the conductive part and the insulating part are laminated so as to be in contact with an insulating substrate and a laminate is obtained by thermoforming, and the process of dissolving and removing the aluminum base material in the laminate by an alkali treatment. This is a method for forming conductive patterns on circuit boards that are on the same plane.
以下図面によって本発明を説明する。第3図<a )〜
第4図は本発明の一実施態様を示す。第3図(a )は
アルミニウム基材5の上に銅層6を電着させたものであ
る(以下これをアルミ付銅箔という)。銅とアルミニウ
ムは強固に結合しており、電着て銅層を形成させている
ため、界面の平滑性が良好である。The present invention will be explained below with reference to the drawings. Figure 3<a)~
FIG. 4 shows one embodiment of the invention. FIG. 3(a) shows a copper layer 6 electrodeposited on an aluminum base material 5 (hereinafter referred to as aluminum-coated copper foil). Since copper and aluminum are strongly bonded and the copper layer is formed by electrodeposition, the interface has good smoothness.
銅層6の表面は電気絶縁基板との接着強度を増すために
、適当な処理を施しておいてもよい。第3図(b)は、
周知の種々の方法により、アルミニウム基材5の上に、
銅層の不要3一
部分をアルミニウムを侵さない■ツヂング液等で除いで
、導電パターン4を形成させたものである。第3図(C
)は、電気絶縁性の熱硬化111樹脂J:/ζ1,1.
熱可塑性樹脂からなる電気絶縁14板3ど第;1図(1
))の導電パターンを積層して熱圧成形した状態を示し
、アルミニウム基材5の十に形成された導電パターン4
(よ電気絶縁基板に埋め込まれている。第3図(0)の
アルミニウム基材5をアルカリからイする)ノルミニラ
ム丁ツチング液で除去したものが第4図であり、導電パ
ターン4は電気絶縁3.を板3に即め込まれており、導
電部分と絶縁部分がli’+l一平面トにあり、平滑な
鏡面状の表面を有づる回路基板となっている。The surface of the copper layer 6 may be subjected to an appropriate treatment in order to increase the adhesive strength with the electrically insulating substrate. Figure 3(b) shows
On the aluminum base material 5 by various well-known methods,
A conductive pattern 4 is formed by removing an unnecessary part 3 of the copper layer with a tweezing solution that does not attack aluminum. Figure 3 (C
) is an electrically insulating thermosetting 111 resin J:/ζ1,1.
14 electrically insulating plates made of thermoplastic resin;
)) The conductive patterns 4 formed on the aluminum base material 5 are shown laminated and hot-pressed.
(It is embedded in an electrically insulating substrate. The aluminum base material 5 in FIG. 3 (0) is removed from an alkali.) The conductive pattern 4 is removed with a Norminum cutting solution as shown in FIG. .. is embedded in the board 3, the conductive part and the insulating part lie on the same plane (li'+l), and the circuit board has a smooth mirror-like surface.
さらに本発明にJ:れば、銅層を用いる単なる導通路の
みでG、Lなく、第5図に示すように、アルミニウム基
材5の十に形成された導電パターン4の必要41部分に
、抵抗体素子7を印刷等の方法にJ:り組みこんだのち
、上記のように電気絶縁基板と積層して熱圧成形後、ア
4−
ルミニウム基材を除去すれば、第6図に示すように、導
電部分、抵抗体等の素子部分および絶縁部分がすべて同
一平面上にある回路基板を製造することができるのであ
る。Furthermore, according to the present invention, a mere conductive path using a copper layer is used instead of G and L, and as shown in FIG. After assembling the resistor element 7 by printing or other methods, it is laminated with an electrically insulating substrate as described above, hot-press molded, and the aluminum base material is removed, as shown in Fig. 6. In this way, it is possible to manufacture a circuit board in which a conductive part, an element part such as a resistor, and an insulating part are all on the same plane.
アルミ付i箔のアルミニウム基材の厚さは、取扱いおよ
び導電パターン成形後のアルミニウムの除去の容易さを
考慮して選べばよいが、30〜100μ程度が本発明に
おいては最も使いやすい。銅層の厚さは回路基板の使用
目的によって決まる。2.54 WのICのピン間に3
本の線を通すような微細なパターンを形成させるには、
たとえば5μのような薄い銅層を用いる方が、エツチン
グによるアンダーカットが少いなどの有利な点があるの
に対し、大電流を流すような目的には、さらに厚い銅層
が有利となる。The thickness of the aluminum base material of the aluminum-coated i-foil may be selected in consideration of ease of handling and removal of aluminum after forming the conductive pattern, but a thickness of about 30 to 100 μm is most convenient for use in the present invention. The thickness of the copper layer depends on the intended use of the circuit board. 3 between the pins of a 2.54 W IC
In order to form a fine pattern that allows the lines of a book to pass through,
For example, while using a thinner copper layer, such as 5μ, has advantages such as less undercut due to etching, a thicker copper layer is advantageous for purposes such as passing large currents.
アルミ付銅箔に導電パターンを形成させるには周知の方
法を種々適用できる。!ことえば、該銅層上にアルミニ
ウム基材を侵さないために、溶剤可溶型のレジスト剤を
均一に塗布し、仮−1−コアー後、パターンマスクを通
して紫外線を照q・1し、不弱のレジスト剤を現像処理
にJ、り除去りる。次いで、たとえば過硫酸アンtミニ
ウ11溶817からなるエツチング液に漬け、非1ノジ
スh部分の銅層を溶解させた後、レジスト剤を剥1ll
Il[)−C1導電パターンを形成させる。Various known methods can be applied to form a conductive pattern on aluminum-coated copper foil. ! For example, in order not to attack the aluminum base material, a solvent-soluble resist agent is uniformly applied on the copper layer, and after provisional core-1, ultraviolet rays are irradiated through a pattern mask to remove the weak The resist agent is removed during the development process. Then, after dipping in an etching solution consisting of, for example, persulfate antamine 11 solution 817 to dissolve the copper layer in the non-nozzle portion, the resist agent is removed by 1 liter.
Form an Il[)-C1 conductive pattern.
゛「u気絶縁量板に用いる(イ利どじで、上で得た導電
パターンを埋め込むためには、電気絶縁11Iの熱硬化
111樹脂または熱可咽性樹脂を用いるのがli利であ
る。これらの樹脂としては、従来硬質およびフレキシブ
ルプリント配線基板の絶縁材料おJ、び回路の支持体と
して用いられているl)のaらば耐アルカリ性のものは
1べて使用Jることができる。積層板として用いる場合
は、フーrノール樹脂−紙、エポキシ樹脂−ガラスフ1
]ス、エポキシ樹脂−紙、l−ボー1−シ樹脂−ガラス
紙、■ポキシ樹脂−合成繊1I11り「1ス、不飽和ポ
リエステル−ガラスマット、不飽和ポリエステル−合成
!l維不織布、ジアリルフタレート樹脂−ガラスクロス
、ジアリルイソフタレート樹脂−ガラスクロス。In order to embed the conductive pattern obtained above, it is advantageous to use thermosetting 111 resin or thermoplastic resin of electrical insulation 11I. As these resins, all of the alkali-resistant resins listed in item (1), which have been conventionally used as insulating materials for rigid and flexible printed wiring boards and circuit supports, can be used. When used as a laminate, fluorocarbon resin-paper, epoxy resin-glass film 1
] Su, Epoxy resin-Paper, L-Bo 1-C Resin-Glass paper, ■Poxy resin-Synthetic fiber 1I11 Ri, Unsaturated polyester-Glass mat, Unsaturated polyester-Synthetic!l fiber non-woven fabric, diallyl phthalate Resin-glass cloth, diallyl isophthalate resin-glass cloth.
ジアリルテレフタレート樹脂−万ラスクロス等が例示で
きる。積層板中の樹脂含量は40〜70重量部%の範囲
が適当である。また、電気絶縁基板の樹脂として、本出
願人が新規に開発したテレフタル酸ジアリルエステル共
重合樹脂を用いると、該樹脂自体が電気特性、耐熱性、
高温耐湿性、曲げ強さ等に優れる仙、耐衝撃性にも優れ
るという特性をもつので好都合である。Examples include diallyl terephthalate resin - Ten Thousand Las Cross. The resin content in the laminate is suitably in the range of 40 to 70 parts by weight. In addition, when a terephthalic acid diallyl ester copolymer resin newly developed by the applicant is used as the resin for the electrically insulating substrate, the resin itself has electrical properties, heat resistance,
It is advantageous because it has excellent properties such as high temperature and humidity resistance, bending strength, and impact resistance.
上記テレフタル酸ジアリルエステル共重合樹脂とは、テ
レフタル酸ジアリルエステルと芳香族炭化水素とを有機
過酸化物、アゾ化合物の存在下に重合して得られた共重
体をいい、本発明においては、以下に述べるようなテレ
フタル酸ジアリルエステル共車合体が電気絶縁基板に使
用される樹脂として好ましい。即ち、次式(I)
7−
但し、上式(I)中、R1及びR2は、それぞれ水素原
子及び低級アルキル基J:りなる群から選ばれIご基を
示し、1−1〜3の整数である。The above-mentioned terephthalic acid diallyl ester copolymer resin refers to a copolymer obtained by polymerizing terephthalic acid diallyl ester and an aromatic hydrocarbon in the presence of an organic peroxide and an azo compound. A terephthalic acid diallyl ester copolymer as described in 1 is preferable as the resin used for the electrically insulating substrate. That is, the following formula (I) 7- However, in the above formula (I), R1 and R2 are respectively a hydrogen atom and a lower alkyl group J: I represents a group selected from the following group, and 1-1 to 3. is an integer.
で表わされるベンジル位に少なくとも1個の水素原子を
有する芳香族炭化水素と次式(II)り・
で表わされるテレフタル酸ジアリルエステルとの共重合
樹脂であって、(a)8式(I)七ツマー1li位の末
端に式(I)モノマー単位と炭素−炭素結合した構造を
有する。更に、(b)、該共重合樹脂の式(I)モノマ
ー単位のアリル基で形成された炭素−炭素結合分8−
子鎖部分の該式(I)モノマー単位の数3〜11個、好
ましくは3〜10個であるという構造的特徴を有する共
重合樹脂である。更に、以下に挙げるような諸性質をも
つ共重合樹脂が望ましい。A copolymer resin of an aromatic hydrocarbon having at least one hydrogen atom at the benzyl position represented by the following formula (II) and a terephthalic acid diallyl ester represented by the following formula (II), wherein (a) 8 formula (I) It has a structure in which a monomer unit of formula (I) and a carbon-carbon bond are formed at the end of the 1li position of the heptadmer. Furthermore, (b), the carbon-carbon bond formed by the allyl group of the formula (I) monomer unit of the copolymer resin; is a copolymer resin having a structural feature of 3 to 10 pieces. Furthermore, copolymer resins having the following properties are desirable.
(C)ライス(Wijs)法測定によるヨウ素価40〜
85゜
(d)30℃における真比重が1.20〜1.25゜(
e)軟化範囲 約50〜約120℃。(C) Iodine value 40~ by Rice (Wijs) method measurement
85° (d) True specific gravity at 30°C is 1.20 to 1.25° (
e) Softening range: about 50 to about 120°C.
(r)so重量%メチルエチルケトン溶液粘匿80〜3
00cps (30℃)。(r)so wt% methyl ethyl ketone solution viscosity 80~3
00cps (30℃).
(0)GPC(ゲル・パーミェーション・クロマトグラ
フィー)法で測定したポリ
スチレン換算数平均分子量(llln >が4000〜
10000、重量平均分子量(FIW )が70000
〜200000で、1つpnと8wとの比FIW /R
nで表わした分子量分布が10〜40゜
(h )ブラベンダープラストグラフで測定【ノたブラ
ベンダー溶融粘度が250〜2600m・0で、プ「I
I?ツシング時間が5−6!1分。(0) Polystyrene equivalent number average molecular weight (llln > 4000 ~ 4000) measured by GPC (gel permeation chromatography) method
10,000, weight average molecular weight (FIW) is 70,000
~200000, ratio of 1 pn to 8w FIW /R
The molecular weight distribution expressed in n is 10 to 40 degrees (h).Measured using a Brabender plastograph.
I? Twisting time is 5-6!1 minutes.
なilj、1. fi+:デ1ツノタル耐ジアリルエス
テル共重合樹脂の製法等の詳紳1は、本出願人の先の出
願に係る特願flit Fi 7 180981号に記
載1ノでいる。Nailj, 1. fi+:Details of the manufacturing method of the anti-dialyl ester copolymer resin are described in Japanese Patent Application No. flit Fi 7 180981 filed earlier by the present applicant.
本発明において、1−記テレフタル酸ジアリルエステル
J先車合樹脂を、紙、ガラスクロス、ガラスマツ1へ、
ガラス不織布、合成IINクロス、合成繊軒1不織イ1
1等と組合せて、耐衝撃性、イの他の111質に1ぐれ
た電気絶縁基板として用いることがCきる。該ハ重合樹
脂は、他の樹1111、たどえぽジアリルフタレート樹
脂や不飽和ポリニスプル樹1114等で変性して用いる
ことt)勿論可111;である。そのほか、ポリビスマ
レイミド、13 ”l’レジン、トリアジン樹脂、レジ
ンM/]−ボ:1−シ樹脂等も同様に用いることがて゛
きる。In the present invention, 1- terephthalic acid diallyl ester J-prepared resin is applied to paper, glass cloth, glass pine 1,
Glass non-woven fabric, synthetic IIN cloth, synthetic fiber eaves 1 non-woven fabric 1
In combination with No. 1, it can be used as an electrically insulating substrate with impact resistance superior to the other 111 materials. (c) Of course, the polymer resin may be used after being modified with other trees 1111, such as Tadoepo diallyl phthalate resin or unsaturated polynispur tree 1114. In addition, polybismaleimide, 13''l' resin, triazine resin, resin M/]-V:1-C resin, etc. can be used similarly.
。した、B+にフレ:1−シブルな回路基板が必要イT
場合番、1、ポリ土ステル、塩化ビニル樹脂、エポキシ
樹脂、ガラス積層板、フッ素系共重合体、ポリスルホン
、上記のテレフタル酸ジアリルエステル共重合樹脂−ガ
ラス繊維または合成mH積層板等のプラスチックシー1
−もしくはフィルムを使用することができる。あるいは
積層板のみではなく、成形材料を用いて電気絶縁基板と
することもできる。. 1-Flexible circuit board is required for B+.
Case number, 1, polyester, vinyl chloride resin, epoxy resin, glass laminate, fluorine-based copolymer, polysulfone, terephthalic acid diallyl ester copolymer resin-glass fiber or synthetic mH laminate, etc. plastic sheet 1
- Alternatively, a film can be used. Alternatively, it is also possible to use not only a laminate but also a molding material to form an electrically insulating substrate.
アルミ付銅箔上に形成させた導電パターンのパターン面
と上記の各種電気絶縁基板から選んだ材料とが接するよ
うに積層して、熱圧成形すれば第3図(C)に示すよう
なアルミニウム基材をもった回路基板が得られる。成形
条件は、電気絶縁基板に用いられる樹脂によって適当に
選べばよいが、通常、温僚100〜190℃、圧力5〜
1000均/dの範囲にある。If the patterned surface of the conductive pattern formed on the aluminum-coated copper foil and the material selected from the various electrical insulating substrates mentioned above are laminated so that they are in contact with each other, and then hot-press molded, an aluminum product as shown in Figure 3 (C) can be obtained. A circuit board with a base material is obtained. The molding conditions may be selected appropriately depending on the resin used for the electrically insulating substrate, but usually the temperature is 100 to 190°C and the pressure is 5 to 100°C.
It is in the range of 1000 yen/d.
アルミニウム基材を除去するためには、アルカリ溶液、
例えば水酸化ナトリウム5(1(1/!、グルコン酸ナ
トリウム1g/β等のエツチング液を用いて、エツチン
グすればよい。アルミニウム層を除いた後、水洗し、2
0%過硫11−
酸アンモニウムなどの弱い鋼重しツチング剤に浸して表
向の汚れを除けば、第4図または第6図に示Jような1
1j1路U板を得ることができる。回路の表面保護とは
/vだ付性を保持させるために、>l電パターンには金
、スズ・ニッケル、スズ・鉛、スズメッキなどを行って
もJ、い。To remove the aluminum base material, alkaline solution,
For example, etching may be performed using an etching solution such as sodium hydroxide 5 (1 (1/!), sodium gluconate 1 g/β, etc. After removing the aluminum layer, washing with water,
0% persulfur 11- If the surface dirt is removed by soaking the steel in a weak steel weighting agent such as ammonium acid, it will look like 1 shown in Figure 4 or Figure 6.
A 1j1-way U plate can be obtained. What is circuit surface protection? In order to maintain the adhesion properties, electrical patterns may be plated with gold, tin/nickel, tin/lead, tin, etc.
本発明のli払を右動に利用すれば、片面おJζび両面
に導電パターンをもつ回路基板のほか、多層抜を製3’
l!Iりることも可能である。By utilizing the present invention for right-hand movement, in addition to circuit boards with conductive patterns on one side and both sides, multi-layer blanks can be manufactured.
l! It is also possible to do so.
本発明の方法によれば、アルミ付銅箔のまま、予めlノ
ジスト!を布、JJI!像、エツチング等の各工程の処
理を行うことができるため、有機物を成分どしで含む電
気絶縁基板が、エツチング液その他の化学薬品、水分、
熱等に曝されることが少く、損傷を受1〕にくいという
利点があり、1法安定性にすぐれた高精度の回路基板が
1iIられることも重要な特徴の一つである。According to the method of the present invention, the aluminum-coated copper foil can be sprayed in advance! Cloth, JJI! Since each process such as imaging and etching can be performed, electrically insulating substrates containing various organic substances can be treated with etching solutions and other chemicals, moisture, etc.
It has the advantage of being less exposed to heat, etc. and less susceptible to damage, and one of its important features is that it is a highly accurate circuit board with excellent single-method stability.
このようにして4町Iられた回路基板は、導電12一
部分と絶縁部分が同一平面−[にあり、平滑な鏡面状の
表面を有するものであり、従って回路基板上を摺動する
ような用途には特に適している。電気絶縁基板に耐摩耗
剤等を配合して、耐摩耗性を向上させておけばさらに右
利である。The circuit board prepared in this way has a conductive part and an insulating part on the same plane, and has a smooth mirror-like surface, so it is suitable for applications such as sliding on the circuit board. It is especially suitable for It would be even more beneficial if an anti-wear agent or the like was added to the electrically insulating substrate to improve its wear resistance.
本発明の方法によって得られる回路基板の用途としては
、すぐれた高性能のプリント配線基板として使用しうる
のは勿論、そのほか例をあげるならば、多極型のコネク
ター、抵抗体等を組み込めば、各種複合素子、ポテンシ
ョメーター、エンコーダー、センサー等に、小型モータ
ーのフンミコチーターやカーボン電極を組み込めば、電
源供給回路となるなど、表面の平滑性による摺動性を生
かす多数の分野がある。The circuit board obtained by the method of the present invention can of course be used as an excellent high-performance printed wiring board, but other examples include multi-polar connectors, resistors, etc. There are many fields where the sliding properties of the smooth surface can be utilized, such as by incorporating the small motor Funmiko Cheetah and carbon electrodes into various composite elements, potentiometers, encoders, sensors, etc., to create power supply circuits.
以上説明したように、本発明の特徴は実施の態様を含め
十分明らかであるが、上記テレフタル酸ジアリルエステ
ル共重合樹脂を含む熱硬化性樹脂を電気絶縁基板として
用いる例を示し、さらにfir I、 < i、IJ明
する。しかしながらこれに限定されイ1いのは、以上の
説明から明らかである。As explained above, the features of the present invention are sufficiently clear including the embodiments, but an example is shown in which a thermosetting resin containing the above terephthalic acid diallyl ester copolymer resin is used as an electrically insulating substrate, and furthermore, fir I, < i, IJ clear. However, it is clear from the above description that the present invention is not limited to this.
テレフタル酸ジアリルエステル共重合樹脂の製造
タービン闘式可変式撹拌機、モノマー及び触媒供給用二
重管式供給ノズル、チッ素パージ[1、リーク弁、リン
プリング口、温麿計及び圧力露1を備えた内1¥60O
n+、内容積1201のジ17ケツト(4’ S IJ
S 304製重合槽を使用した1、ジノマー及び触媒
供給用二重管式供給ノズルは重合層の胴部の液面下に取
り付け、重合槽にはいる萌からは外管の内径を1.5n
とし、供給配管中でのHit留時開時間きるだけ短くし
た。ノズルの閉塞に備えて、このようなノズルを3個設
置した。1jンプリングロも重合槽の胴部に設置し、手
合反応中内圧を利用して、液相のサンプルが採取できる
ようにした。チッ素パーシロには油回転式真空ポンプと
チッ素ボンベを接続し、必要に応じて切替えられるよう
にした。Production of terephthalic acid diallyl ester copolymer resin Turbine type variable stirrer, double pipe type supply nozzle for monomer and catalyst supply, nitrogen purge [1, leak valve, limp ring port, temperature gauge and pressure dew 1] ¥160 out of what I prepared
n+, internal volume 1201 di-17 (4' S IJ
Using a polymerization tank made of S 304 1. The double pipe supply nozzle for supplying dinomer and catalyst is installed below the liquid level in the body of the polymerization layer, and the inner diameter of the outer pipe is 1.5n from the moe entering the polymerization tank.
The opening time during hit distillation in the supply piping was made as short as possible. Three such nozzles were installed in preparation for nozzle blockage. A 1j sampler was also installed in the body of the polymerization tank, so that samples of the liquid phase could be collected using the internal pressure during the reaction. An oil rotary vacuum pump and a nitrogen cylinder were connected to the nitrogen persilo, allowing them to be switched as needed.
上記重合層に、後掲表1に示したようにキシレン60I
C11を仕込み、常温で、真空ポンプで減圧にし、チッ
素ガスで常圧に戻す操作を3回繰返して槽内の空気をチ
ッ素で置換したのち、再び減圧にし、重合槽を密閉した
。撹拌機を起動して240P P Mで撹拌しながら、
ジャケットにスチームを通じて、温度140℃に昇温し
た。In the above polymerization layer, xylene 60I was added as shown in Table 1 below.
C11 was charged, the pressure was reduced with a vacuum pump at room temperature, and the pressure was returned to normal pressure with nitrogen gas. After the air in the tank was replaced with nitrogen by repeating the operation three times, the pressure was reduced again and the polymerization tank was sealed. Start the stirrer and stir at 240PPM,
Steam was passed through the jacket and the temperature was raised to 140°C.
撹拌速度を上げて720PPMとし、二重管式ノズルの
外管からテレフタル酸ジアリルエステルを所定の速度で
、また同時に過酸化ジー tert−ブチル(DTBP
O)とキシレンをモル比0.5:1となるように予め混
合しておいたものを所定の速度で、吐出圧70kg/a
I?のポンプで重合槽へ供給した。この間、重合槽の温
度は140℃を保つようにスチームを調節した。なお供
給すべき式(I)テレフタル酸ジアリルエステル(DA
T)は15℃に、過酸化ジーtert−ブチルとキシレ
ンの混合物は515−
℃にぞれfれ冷却し、重合槽へ至る配管はそれぞれ保冷
1ノだ。Φ合槽圧力は0.3〜2−/cjQであっIこ
。The stirring speed was increased to 720 PPM, and terephthalic acid diallyl ester was added from the outer tube of the double tube nozzle at a predetermined rate, and di-tert-butyl peroxide (DTBP) was added at the same time.
O) and xylene were mixed in advance at a molar ratio of 0.5:1, and the mixture was discharged at a predetermined speed at a discharge pressure of 70 kg/a.
I? was supplied to the polymerization tank using a pump. During this time, the steam was adjusted so that the temperature of the polymerization tank was maintained at 140°C. Furthermore, the formula (I) terephthalic acid diallyl ester (DA
T) was cooled to 15°C, and the mixture of di-tert-butyl peroxide and xylene was cooled to 515°C, and the piping leading to the polymerization tank was kept cool. The combined tank pressure is 0.3~2-/cjQ.
所定闇のテレフタル酸ジアリルエステル、キシレン、過
酸化ジーtert−ブチルの供給が終了覆れば、スチー
ムをどめ、撹拌速度を下げで24OR+−)Mと1ハジ
ヤケツトに冷却水を通1ノで冷M L 1こ。常温イ1
近まで冷却したのち、リーク弁を1711 LJて、常
圧に戻し、重合反応を辱塞 7 t、7こ 1゜
重合反応はリンプリング口から適宜サンプルを採取しC
1屈折率、及びGPCで反応を追 跡 【ノ Iこ 。When the supply of terephthalic acid diallyl ester, xylene, and di-tert-butyl peroxide has been completed at the specified temperature, stop the steam, reduce the stirring speed, and cool the mixture by passing cooling water through the 24OR+-) M and 1 housing jackets. M L 1ko. Room temperature 1
After cooling to a temperature close to 1711 LJ, the leak valve was returned to normal pressure to block the polymerization reaction.
1. Track the reaction using refractive index and GPC.
テIノフタル酸シフlリル]−ステル、キシレン及び過
酸化ジーt e +’ t−ブチルの供給速度と供給用
を接掲表1に示した。The feed rates and usage of cyfuryl]-ster, xylene, and di-t e +' t-butyl peroxide are shown in Table 1 below.
一1ニで得られた重合反応液を、薄膜式蒸発器を用いて
、揮発分を留去し、蒸発残分中の未反応キシレンの、共
重合樹脂と未反応テレフタル酸ジアリルエステルの合計
に対する比率16−
を、重量で0.3:1とし、次いで蒸発残分を、供給し
たテレフタル酸ジアリルエステルの、重量で5倍のメタ
ノールを仕込んだ撹拌槽に滴下しながら撹拌し、共重合
樹脂を析出させた。析出した共重合樹脂を同量のメタノ
ールでよく洗い、ろ過、乾燥、粉砕して粉末状の共重合
樹脂を得た。The volatile content of the polymerization reaction solution obtained in Step 1 and 1 is distilled off using a thin film evaporator, and the amount of unreacted xylene in the evaporation residue is calculated based on the total of the copolymer resin and unreacted diallyl terephthalate. The ratio 16- was set to 0.3:1 by weight, and then the evaporated residue was dropped into a stirring tank containing methanol in an amount 5 times the weight of the supplied diallyl terephthalate while stirring, and the copolymer resin was stirred. It was precipitated. The precipitated copolymer resin was thoroughly washed with the same amount of methanol, filtered, dried, and pulverized to obtain a powdered copolymer resin.
共重合樹脂の収率及び物性を表1に示した。Table 1 shows the yield and physical properties of the copolymer resin.
表 1
上記表1において
(1)は、ゲルパーミェーションクロマトグラ7法によ
るポリスチレン換樟測定値で、ウォーターズ社製r 1
50CGPC,I装置を用いた。Table 1 In Table 1 above, (1) is the measured value of polystyrene exchanged camphor by gel permeation chromatography method 7.
A 50CGPC,I apparatus was used.
(2)は、メトシー社製lPF61J光透過式自動融点
測定装置を用いた。For (2), a light transmission automatic melting point measuring device manufactured by Metsy Co., Ltd. 1PF61J was used.
(3)は、ブラベンダー社(独)製のブラベンダープラ
ストグラフによる測定値。(3) is a value measured using a Brabender Plastograph manufactured by Brabender (Germany).
混線室容崩50cc、ロータ型式W 50 +−1、試
料50g+ステアリン酸亜鉛0.5g 、混練室温度1
30℃、ロータ回転数22PPMで混練抵抗が5000
+a−gに達するまで行い、記録紙のトルク曲線から、
トルク最低値をブラベンダー溶融粘度とし、試料投入終
了時から5000 m−gまでの時間をプロセッシング
時間とした。Mixing chamber volume 50cc, rotor type W 50 +-1, sample 50g + zinc stearate 0.5g, kneading chamber temperature 1
Kneading resistance is 5000 at 30℃ and rotor rotation speed 22PPM.
Continue until +a-g is reached, and from the torque curve of the recording paper,
The lowest torque value was defined as the Brabender melt viscosity, and the time from the end of sample loading to 5000 mg was defined as the processing time.
実施例
くアルミ付銅箔上の導電パターン形成〉三井金属鉱業(
株)製rUTc箔40E 9J19−
に溶剤iり溶1’lのレジメ]〜剤を均一に塗布し、乾
燥後パターンマスクを通して紫外線を照射したのIう、
不要の1ノジスト剤を溶剤で除去した。次いで過硫酸ア
ンモニウム溶液からなるエツチング液に浸し、非レジス
ト部分の銅層を溶解さl/、:後、1ノジスト剤を剥離
した。Example: Conductive pattern formation on aluminum-coated copper foil〉Mitsui Metal Mining Co., Ltd.
Co., Ltd. rUTc foil 40E 9J19- was uniformly coated with 1'l of solvent, and after drying, ultraviolet rays were irradiated through a pattern mask.
The unnecessary Nozist agent was removed with a solvent. Next, the copper layer in the non-resist area was dissolved by immersing it in an etching solution consisting of ammonium persulfate solution, and then the nosist agent was removed.
〈電気絶縁L4枚の調製〉
前記製造のテレフタル酸ジアリルエステル」L重合樹脂
80infi部、不飽和ポリエ小出ル20重吊部、過酸
化ジクミル2重量部、メチルエチルケトン100小出部
を混合して含浸ワニスをつくり、これに、メタクリルシ
ラン処理した平織ガラスクロス(坪m 202o/ t
)に含浸し、室温乾燥後さらに80℃で30分間乾燥
し、プリプレグを1!tた。プリプレグ中の樹脂含量は
4 !i 、 !i重量%であった。ここに、用いた不
飽和ポリニスデルは無水フタル@ 0.5モル、無水7
1121%11005モルおよびプロピレングリ二1−
ル1モルを溶融法にJ:り脱水縮合した酸価28.0、
軟化温度80℃のポリエステルである。<Preparation of 4 sheets of electrical insulation L> Diallyl terephthalic acid ester produced above was mixed and impregnated with 80 infi parts of L polymer resin, 20 parts of unsaturated polyester, 2 parts by weight of dicumyl peroxide, and 100 parts of methyl ethyl ketone. A varnish was made and a plain weave glass cloth treated with methacrylic silane (202 o/t)
), dried at room temperature and further dried at 80°C for 30 minutes to form a prepreg of 1! It was. The resin content in the prepreg is 4! i,! i% by weight. Here, the unsaturated polynisdel used was anhydrous phthalate @ 0.5 mol, anhydrous 7
1121% 11005 mol and propylene glycine 1-
Acid value 28.0 obtained by dehydration condensation of 1 mole of
It is a polyester with a softening temperature of 80°C.
20−
く回路基板の成形〉
アルミ付銅箔上の導電パターンのパターン面を上記電気
絶縁基板プリプレグと接するようにして積層した。該プ
リプレグは6枚を使用した。熱盤温度165℃、圧力5
0kq / cotで30分間成形し、積層体を得た。20- Molding of circuit board> The patterned surface of the conductive pattern on the aluminum-coated copper foil was laminated so that it was in contact with the electrically insulating substrate prepreg. Six prepregs were used. Heat plate temperature 165℃, pressure 5
Molding was carried out for 30 minutes at 0 kq/cot to obtain a laminate.
〈アルミニウム基材の除去〉
水酸化ナトリウム50(1/(11グルコン酸ナトリウ
ム1g/!からなるエツチング液に、温度10℃で上記
積層体を浸してアルミニウム層を除去し、十分水洗後2
0%過硫酸アンモニウム溶液に10秒間浸して洗浄し、
回路基板を得た。得られた回路基板は、導電部分と絶縁
部分が同一平面上にあり、平滑な鏡面状の表面を有して
いた。<Removal of aluminum base material> The above laminate was immersed in an etching solution consisting of 50 (1/(11) sodium gluconate 1 g/! at a temperature of 10°C to remove the aluminum layer, and after thorough washing with water,
Clean by soaking in 0% ammonium persulfate solution for 10 seconds,
I got a circuit board. The obtained circuit board had a conductive part and an insulating part on the same plane, and had a smooth mirror-like surface.
第1図(a)及び第1図(b)は従来の金属箔張積層板
の断面図、第2図は従来の回路基板の断面図、第3図(
a )〜第3図(0)及び第4図は本発明の一実施例を
示すもので、第3図(a )〜第3図(C)は各工程断
面図、第4図はトリ路u板の断面図、第5図及び第6図
は本発明の他の実施例を示し、第5図は工程断面図、第
6図は回路基板の断面図である。
1:金 属 箔 2:接 着 剤
3:電気絶縁基1k 4:導電パターン5ニアルミニウ
ム基材 6:銅 層
7:低抵抗索了
出願人 大阪曹達株式会社
代理人 弁理士 間予 透
23−
瀉 3 T’!l (1:l) コi 3 11 (t
)ネ41力 箋 ダ7m
名 乙 1コFigures 1(a) and 1(b) are cross-sectional views of a conventional metal foil-clad laminate, Figure 2 is a cross-sectional view of a conventional circuit board, and Figure 3 (
Figures 3(a) to 3(0) and 4 show one embodiment of the present invention. Figures 3(a) to 3(C) are sectional views of each process, and Figure 4 is a tri-section diagram. A sectional view of the U plate, FIGS. 5 and 6 show other embodiments of the present invention, FIG. 5 is a sectional view of the process, and FIG. 6 is a sectional view of the circuit board. 1: Metal foil 2: Adhesive 3: Electrical insulating base 1k 4: Conductive pattern 5 Nialuminum base material 6: Copper layer 7: Low resistance Applicant Osaka Soda Co., Ltd. Agent Patent attorney Toru Mayo 23- 3 T'! l (1:l) Koi 3 11 (t
) Ne 41 Power Note Da 7m Name Otsu 1ko
Claims (1)
して導電パターンを形成させる工程、該導電パターンを
電気絶縁基板上に該パターン面が該絶縁基板と接するよ
うに積層して熱圧成形により積層体をうる■稈、該積層
体中のアルミニウム基材をアルカリ処理により溶解除去
する工程、よりなることを特徴とする導電部分と絶縁部
分とが同一平面上にある回路基板の導電パターン形成法
。Step of forming a conductive pattern by removing unnecessary portions of the copper layer electrodeposited on the aluminum substrate, laminating the conductive pattern on an electrically insulating substrate so that the pattern surface is in contact with the insulating substrate, and forming the conductive pattern under hot pressure. Formation of a conductive pattern on a circuit board in which conductive parts and insulating parts are on the same plane, characterized by the following steps: a step of preparing a laminate by dissolving and removing the aluminum base material in the laminate by an alkali treatment. Law.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16564283A JPS6055691A (en) | 1983-09-07 | 1983-09-07 | Conductive pattern forming unit of circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16564283A JPS6055691A (en) | 1983-09-07 | 1983-09-07 | Conductive pattern forming unit of circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6055691A true JPS6055691A (en) | 1985-03-30 |
JPH0135512B2 JPH0135512B2 (en) | 1989-07-25 |
Family
ID=15816238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16564283A Granted JPS6055691A (en) | 1983-09-07 | 1983-09-07 | Conductive pattern forming unit of circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6055691A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60164392A (en) * | 1984-02-07 | 1985-08-27 | 日本電産コパル株式会社 | Method of forming circuit board |
JPS642388A (en) * | 1987-06-25 | 1989-01-06 | Ibiden Co Ltd | Printed wiring board for ic card |
US6871396B2 (en) | 2000-02-09 | 2005-03-29 | Matsushita Electric Industrial Co., Ltd. | Transfer material for wiring substrate |
KR100605454B1 (en) * | 2000-02-09 | 2006-07-28 | 마쯔시다덴기산교 가부시키가이샤 | Transcription material and manufacturing method thereof, and wiring board manufactured by using transcription material |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5291172A (en) * | 1976-01-23 | 1977-08-01 | Synthane Taylor Corp | Electric circuit carrier and method of producing same |
JPS5772396A (en) * | 1980-10-24 | 1982-05-06 | Shin Kobe Electric Machinery | Method of fabricating printed circuit board |
-
1983
- 1983-09-07 JP JP16564283A patent/JPS6055691A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5291172A (en) * | 1976-01-23 | 1977-08-01 | Synthane Taylor Corp | Electric circuit carrier and method of producing same |
JPS5772396A (en) * | 1980-10-24 | 1982-05-06 | Shin Kobe Electric Machinery | Method of fabricating printed circuit board |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60164392A (en) * | 1984-02-07 | 1985-08-27 | 日本電産コパル株式会社 | Method of forming circuit board |
JPS642388A (en) * | 1987-06-25 | 1989-01-06 | Ibiden Co Ltd | Printed wiring board for ic card |
US6871396B2 (en) | 2000-02-09 | 2005-03-29 | Matsushita Electric Industrial Co., Ltd. | Transfer material for wiring substrate |
EP1482543A3 (en) * | 2000-02-09 | 2005-06-08 | Matsushita Electric Industrial Co., Ltd. | Transfer material, method for producing the same and wiring substrate produced by using the same |
US6936774B2 (en) | 2000-02-09 | 2005-08-30 | Matsushita Electric Industrial Co., Ltd. | Wiring substrate produced by transfer material method |
KR100605454B1 (en) * | 2000-02-09 | 2006-07-28 | 마쯔시다덴기산교 가부시키가이샤 | Transcription material and manufacturing method thereof, and wiring board manufactured by using transcription material |
US7888789B2 (en) | 2000-02-09 | 2011-02-15 | Panasonic Corporation | Transfer material used for producing a wiring substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0135512B2 (en) | 1989-07-25 |
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