JPS6041522A - Method and apparatus for purifying gaseous mixture - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is directed to an adsorption reactor in which raw gas flows through the adsorbent layer while adsorbing a portion of the two gas components, and one or more gas components are transferred to the adsorbent layer. The present invention relates to a method and apparatus for purifying a gas mixture, raw gas 2, by conventional pressure change adsorption techniques, exiting from the end of the raw gas stream and splitting the raw gas stream into a product gas and a residual gas stream.

It is known from the prior art to purify or separate gas mixtures and to use cyclic pressure change adsorption techniques on KUli adhesives. The process can be carried out economically in the temperature range of about -20 to +40°C, since it is within this temperature range that the best relationship between adsorption capacity and selectivity exists. be.

If the average working temperature is outside the above-mentioned temperature range or is in the limit range, a large amount of adsorbent layer is required.

Therefore, the energy demands of all equipment that do not work at optimal temperatures are enormous, and this also occurs, for example, even in already partly high temperature differences between day and night, and even more so, for example, at about 60 °C in the tropics and in the Arctic. Approximately -8
This is especially true for gas purification in extreme climate zones such as 0°C.

It is known to thermally insulate pressure change devices operating in extreme climatic conditions. However, only a partial effect is achieved when applied to f'L, since the gas to be adsorbed is generally present at ambient temperatures that are significantly outside the optimal temperature range. It is from. It is for this reason that the invention, in the general form described above, firstly relates to technical means of cooling or heating the adsorption reactor with the aid of an additional heat exchange medium, instead of using insulation means. This is because the compression energy required for other than the energy required for is also much smaller. This method, of course, in combination with thermal insulation, and quite specifically, involves an adsorption reactor surrounded by a heat exchanger, thermally insulated and surrounded by a thermally insulating seal, and an intermediate chamber surrounded by a residual gas. 2 and/or improved by washing with a production gas stream. This is because, by means of the latter measure, a portion of the heat or cooling energy introduced for preheating/precooling can still be used later.

SUMMARY OF THE INVENTION It is an object of the invention to provide a method and a device of the type mentioned at the outset, which eliminates the above-mentioned disadvantages and in which the amount of adsorbent and the compression energy for the raw gas mixture to be separated are as low as possible. It was to do.

Means for Solving the Problems According to the first aspect of the present invention, the above-mentioned problem is solved by adjusting the temperature of the adsorption reactor to a temperature of -20 to +40°C using a heat exchange medium. According to the second invention, the temperature of the adsorption reactor is maintained in the temperature range from -20 to +40 °C by means of a heat exchange medium and a part of the gas stream is The solution is to allow the flow to flow through a hollow chamber formed between an adsorption reactor and an insulating shield surrounding the reactor.

Further regarding the apparatus, in an apparatus of the type described, the reactor has a cooling coil embedded in a thermally insulating layer, which coil is connected to a conduit and is located in an insulating shield together with a hollow chamber surrounding the reactor. This is solved by placing the An advantageous embodiment of the device is set out in claim 4.
ing.

Examples When producing nitrogen from air, KFI, e.g. working temperature 20
For a desired nitrogen purity of 999% and 17 pearls and a production gas of 2300 m/h, an adsorbent layer of 10.5 m"75♂ is required. Air demand [1200 g/h. should achieve the same nitrogen production rate under the same pressure conditions S @ vc B, is almost twice as large (
16.8 m3) is required and the air demand is approximately 1845 m'/h. P at bed temperature 20℃
Total energy for SA equipment = demand 1d 194 KW
However, the floor temperature for the air is 310 K at ○℃.
1. Cool the adsorption vessel and incoming air to 20°C: i
To achieve g+, energy consumption is 24KWlcf.
iru. Therefore, if gas purification is carried out at 20°C instead of 40°C, an energy gain of about 100 KW can be achieved.
That will happen.

In the following, further advantages and embodiments of the invention will be explained in more detail with reference to a disadvantageous embodiment shown in the drawing.

The drawing schematically shows an apparatus for the purification of a mixture of raw moths and moths using conventional pressure change adsorption techniques. This outfit
It consists of a 7-meter pressure change device, of which only two reactors 1 and connecting conduits 2 to 4 are shown. The reactor is surrounded by a corrugated tube 5 embedded in a thermally insulating layer 10, which is connected to a cooling/heating device 6. Cooling equipment is required in the tropics and heating equipment is required in the Arctic. The flexible tube and thermal insulation layer are constructed based on thermal engineering.

Via the conduit 2, the compressor 7 compensates the working pressure.
The air is first cooled to 15° C. in a heat exchanger 8 and introduced in a circulating manner into one of the two reactors. The produced nitrogen leaves the pressure change device via conduit 3, while about 20
A hollow chamber 11 formed between the thermally insulating layer 10 of the reactor 1 and the thermally insulating layer 10 of the reactor 1 is passed through the conduit to the residual gas having
flows into.

[Brief explanation of the drawing]

The drawing is a schematic system diagram of one embodiment of the purification apparatus of the present invention. J...Reactor, 2~Cow...Conduit, b...Cooling serpentine pipe,
6...Cold: IJ/heating device, 7...Compress gloss, 81. . Heat exchanger, 9... Heat insulating shield, 1o... Thermal insulation layer, 11... Hollow chamber Continued from page 1 @ Inventor Bernhard Schudt Tritzker 0 Inventor Karl Kutz-Plau Federal Republic of Germany Bottorp Nibelungenveke 2

Claims (1)

[Scope of Claims] l An adsorbent layer in a Vi deposition reactor is configured to allow raw gas to flow through it without adsorbing a portion of the gas components, and to allow one or more gas components to flow out from the end of the adsorbent layer and to In a method for purifying raw gas, a gas mixture, by conventional pressure change adsorption techniques in which the gas stream is split into a product gas and a residual gas stream,
Adjust the temperature of the adsorption reactor to 120 to 10 O by using a heat exchange medium.
Method 2 for purifying a gaseous mixture, characterized in that it is maintained in a temperature range of In the process of purifying the raw gas mixture by conventional pressure change adsorption techniques, which exit from the end of the adsorbent bed and decompose the raw gas stream into a product gas stream and a residual gas stream, the temperature of the adsorption reactor is A hollow space formed between the adsorption reactor and the heat-insulating shield surrounding the reactor is maintained at a temperature range of -20 to +40°C using a heat exchange medium and a part of the Ganu flow is absorbed. A method for purifying a gas mixture, characterized in that it flows through a chamber. 3. The adsorbent layer in the adsorption reactor is made to flow through the gas gaff while adsorbing a portion of the gas component, and one or more gas components flow out from the end of the adsorbent layer, and a raw gas stream is produced and the remainder is In an apparatus for purifying a gas mixture, raw gas, by conventional pressure change adsorption techniques, the reactor (1) has a thermally insulating layer (10) and a cooling coil (5) embedded in the thermal insulation layer (10). characterized in that the serpentine tube is connected to the conduits (2, 3, 4-) and arranged in a heat insulating seal (9) together with the hollow chamber (11) surrounding the reactor (1). 4. A compressor [7] outside the T heat shield (9).
4. The device according to claim 3, wherein a heat exchanger [8] and a cooling/heating device (6) are arranged.