JPS60231469A - Thermally hydrostatic press formation for soft ferrite - Google Patents
Thermally hydrostatic press formation for soft ferriteInfo
- Publication number
- JPS60231469A JPS60231469A JP59087472A JP8747284A JPS60231469A JP S60231469 A JPS60231469 A JP S60231469A JP 59087472 A JP59087472 A JP 59087472A JP 8747284 A JP8747284 A JP 8747284A JP S60231469 A JPS60231469 A JP S60231469A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- temperature
- hot isostatic
- cooling
- soft ferrite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Magnetic Ceramics (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
産業分野
この発明は、1−7η系、Nじ−Zn系等のソフトフェ
ライトの熱間静水圧プレス成形方法の改良に係り、大型
のソフトフエライ1−の処理時に多発づる被処理品のク
ラックや割れを防止した熱間静水圧プレス成形方法に関
する。Detailed Description of the Invention: Industrial Field The present invention relates to an improvement in a method for hot isostatic press forming of soft ferrites such as 1-7η series and Ndi-Zn series. The present invention relates to a hot isostatic press molding method that prevents cracks and splits in a processed product from occurring frequently.
背景技術
近年、ソフトフェライトを高密度化する方法に、熱間静
水圧プレス(以下、HI Pどしいう)成形方法が多用
されており、磁気ヘッド用を始めとする電了部昂材料が
製造されている。BACKGROUND ART In recent years, hot isostatic pressing (hereinafter referred to as HIP) molding method has been widely used as a method to increase the density of soft ferrite, and Denryobe Ko Materials has been manufacturing it for use in magnetic heads and other applications. has been done.
通常、HI P処理条件は、温度、圧力、保持時間等で
あり、かかる条件により被処理物の性能。Normally, HIP processing conditions include temperature, pressure, holding time, etc., and the performance of the processed object depends on these conditions.
特性等は決定されるが、例えば、同一材質であっても、
寸法が異なると、上記の条件以外に、昇温速度、降温速
度の条件も重要になってくる。Although the characteristics etc. are determined, for example, even if the materials are the same,
If the dimensions are different, in addition to the above conditions, conditions such as temperature increase rate and temperature decrease rate become important.
一般に、磁気ヘッド用に使用されるソフトフェライトは
、10mmX 10mmX 5mmの小寸法のものから
、75mm X 75mm X 10mmの大寸法のも
のが製造され、寸法9組成に応じた種々の条件が選定さ
れているが、HI F’条件は、雰囲気ガスにアルゴン
や窒素ガスが用いられ、温度1000℃〜1400℃、
圧力50(lkq/cm2〜2000kg/ctn2.
0.5〜5時間である。In general, soft ferrite used for magnetic heads is manufactured from small sizes of 10 mm x 10 mm x 5 mm to large sizes of 75 mm x 75 mm x 10 mm, and various conditions are selected depending on the size and composition. However, under HIF' conditions, argon or nitrogen gas is used as the atmospheric gas, and the temperature is 1000°C to 1400°C.
Pressure 50 (lkq/cm2 to 2000kg/ctn2.
It is 0.5 to 5 hours.
また、昇温、降温速度は、第2図に示す)−1I P温
度・圧力・時間のパターン図から明らかなように、HI
’P装置内で、300℃/hr−600℃/hrの条
件でおこなわれている。In addition, the temperature increase and temperature decrease rates are shown in Figure 2).
The process is carried out in the 'P apparatus under conditions of 300°C/hr-600°C/hr.
ところが、上記条件で、50mm以上X50mm以上×
10mmg、上の大寸法からなるソフトフェライト被処
理物をHI P処理すると、被処理物の内外部に湿度差
を生じ、熱膨張差に基づく熱歪となって、所謂、熱ショ
ックによるクラックや割れが発生し、製品歩留が著しく
低下する問題があった。However, under the above conditions, 50 mm or more x 50 mm or more x
When a soft ferrite object with a large size of 10 mm or more is subjected to HIP treatment, a humidity difference is created between the inside and outside of the object, resulting in thermal distortion due to the difference in thermal expansion, resulting in cracks and cracks due to so-called thermal shock. There was a problem in that this caused a significant drop in product yield.
発明の目的
この発明は、Mn−Zn系、Nj−Zn系等のソフトフ
ェライ1〜、特に大型寸法のソフトフェライトの熱間静
水圧プレス成形時にお番プる熱ショックによる被処理品
のクラックや割れを、防止できる熱間静水圧プレス成形
方法を目的としている。Purpose of the Invention The present invention aims to solve the problem of cracks in the processed product due to thermal shock that occurs during hot isostatic press molding of soft ferrites such as Mn-Zn type and Nj-Zn type, especially large size soft ferrites. The objective is a hot isostatic press molding method that can prevent cracking.
発明の構成と効果
この発明は、現在、磁気ヘッド用として使用されるソフ
トフェライトの最大寸法である、75mmX75mmX
10mm寸法のものについても熱ショックによる割れ等
を生じないHIP処理条件について種々検討した結果、
+−t i p処理温度前後の昇温、降温速度を特定し
、HI P処理後の特定の降温時に減圧し、HI P装
置より取り出して冷却室にて冷却することにより、熱シ
ョックによる削れ等が発生せず、HI P装置の効率的
利用が可能なことを知見したものである。Structure and Effects of the Invention The present invention is directed to the maximum size of soft ferrite currently used for magnetic heads, which is 75 mm x 75 mm x
As a result of various studies on HIP processing conditions that do not cause cracks due to thermal shock even for 10 mm size products, we found that
By specifying the rate of temperature rise and temperature drop before and after the +-t ip treatment temperature, reducing the pressure at a specific temperature drop after HIP treatment, taking it out of the HIP device and cooling it in a cooling room, it is possible to prevent scratches due to thermal shock. It was discovered that this did not occur and that the HIP equipment could be used efficiently.
すなわち、この発明は、密度95%以上のソフトフェラ
イトの一次焼結体を下記順序で熱間静水圧プレス成形す
ることを特徴どするソフトフェライトの熱間静水圧プレ
ス成形方法である。That is, the present invention is a method for hot isostatic press forming of soft ferrite, which is characterized by hot isostatically press forming a primary sintered body of soft ferrite having a density of 95% or more in the following order.
■上記焼結体を100℃/hr〜170℃/hrの昇温
速度で1000℃〜1400℃に臂温する。(2) The above sintered body is heated to 1000°C to 1400°C at a heating rate of 100°C/hr to 170°C/hr.
■昇温後、温度1000℃〜1400℃、圧力500k
M cm2〜2000ka/ cm2.0.5〜5時間
の条件で熱間静水圧プレス処理づる。■After heating up, temperature 1000℃~1400℃, pressure 500k
Hot isostatic press treatment under conditions of M cm2 to 2000 ka/cm2.0.5 to 5 hours.
■熱間静水圧プレス処理後、
100℃/hr〜170℃/hrの冷却速度で冷却中、
600℃〜900℃で0.5〜3時間保持し、かつ圧力
を大気圧まで低減する。■After hot isostatic pressing, cooling at a cooling rate of 100℃/hr to 170℃/hr,
Hold at 600°C to 900°C for 0.5 to 3 hours and reduce pressure to atmospheric pressure.
■減圧後、熱間静水圧プレス装置より取り出し、不活性
ガスを充填した冷却室で100℃以下まで冷却する。(2) After depressurizing, take out from the hot isostatic press and cool to below 100°C in a cooling chamber filled with inert gas.
この発明は、上記の■・〜■の手段により、磁気ヘッド
用として使用されるソフトフェライトの最大寸法である
、75mm X 75mm X 10mm寸法はもちろ
ん、全ての寸法のものでも、熱ショックによる割れやク
ラックを発生させることなく HI P処理でき、さら
には、HIP処理時間が短縮でき、また、1」IP処理
後の被処理物の冷却過程の大半を他の冷却室で行なうた
め、HIP装置内に装填した被処理物の装置占有時間が
短縮でき、次の被処理物の装填が直ちにでき、HIP装
置の効率的使用が可能となる利点がある。This invention uses the above-mentioned means (1) to (2) to prevent cracking due to thermal shock, not only in the maximum dimensions of 75 mm x 75 mm x 10 mm, which are the maximum dimensions of soft ferrite used for magnetic heads, but also in all sizes. HIP processing can be performed without creating cracks, and furthermore, the HIP processing time can be shortened. In addition, since most of the cooling process of the processed object after 1" IP processing is performed in another cooling chamber, there is no space in the HIP equipment. This has the advantage that the time occupied by the device for loaded objects to be processed can be shortened, the next object to be processed can be loaded immediately, and the HIP device can be used efficiently.
発明の限定理由
以下に、この発明におけるH I P温度、圧力、時間
、貸温速度、降温速度、降温途中での保持湿度及び時間
等の処理条件を限定した理由を説明する。Reasons for Limiting the Invention The reasons for limiting the processing conditions of the present invention, such as HIP temperature, pressure, time, heating rate, cooling rate, and retention humidity and time during cooling, will be explained below.
この発明において、−次焼結体の密度が95%未満では
、HI P処理後に被処理物の高密度化が得られず、特
性が劣化するので、95%以上の一次焼結体の密度が必
要である。In this invention, if the density of the primary sintered body is less than 95%, the object to be processed cannot be densified after HIP treatment and its properties will deteriorate. is necessary.
)−1I P処理温度は、1000℃未満では被処理物
の高密度が得られず、また、1400℃を越えると被処
理物の結晶が異常に粗大化して、特性を劣化させるので
、1000℃・〜1400°Cとり=る。)-1I P treatment temperature is 1000°C because if it is less than 1000°C, high density of the processed material cannot be obtained, and if it exceeds 1400°C, the crystals of the processed material will become abnormally coarse and the properties will deteriorate.・~1400°C = ru.
トI11〕圧力は、500kiJ未満では被処理物の高
密度化が冑られず、また、2000Mを越えると、1−
1 I P装置の能力を増大さぼる必要があるだけでな
く、高密度化の効果が飽和するため好ましくなく、1」
I P圧力は50〇−d〜2000ki−Jとする。[I11] If the pressure is less than 500 kiJ, the densification of the material to be processed will not be achieved, and if it exceeds 2000 M, the pressure will be 1-
1 Not only is it necessary to increase the capacity of the IP device, but it is also undesirable because the effect of high density saturates.
The IP pressure is 500-d to 2000 ki-J.
昇温速度、降温速度が1.170°C/hrを越えると
、60mm X 60mm X 10mmより大きな寸
法の被処理物には、熱ショックによる割れを発生し、ま
た、1(10℃/hr未渦の速度ではHIP処理に長時
間を要い量産的でないので好ましくなく、100℃/h
r〜170℃/hrとする。If the temperature increase rate or temperature decrease rate exceeds 1.170°C/hr, cracks will occur in workpieces larger than 60mm x 60mm x 10mm due to thermal shock, and The speed of vortex is not preferable because it takes a long time for HIP treatment and is not suitable for mass production.
r~170°C/hr.
降温途中での保持湿度は、600℃未満では]」IP処
理時間短縮効果が少なく、900’Cを越えると1−I
IPI置内の圧力を大気圧に低下させた際に、HI P
装置の耐圧容器自体の温度が200’C以上となり、好
ましくないため、600℃・〜900℃とする。The retained humidity during cooling is less than 600°C, the effect of shortening IP processing time is small, and when it exceeds 900°C, 1-I
When the pressure inside the IPI equipment is lowered to atmospheric pressure, the HI P
Since the temperature of the pressure-resistant container itself of the apparatus is 200'C or higher, which is not preferable, the temperature is set at 600°C to 900°C.
HIPIP装置力を大気圧に減圧する際の保持時間が0
.5時間未満では、大気圧に減圧した際にガスの断熱膨
張により被処理物を急冷し、熱ショックによる割れを発
生ずるので好ましくない。また、3時間を越えるとI」
I P装置内の圧力を大気圧に下げる意味がなくなるの
で好ましくない。Holding time when reducing HIPIP device power to atmospheric pressure is 0
.. If the time is less than 5 hours, it is not preferable because when the pressure is reduced to atmospheric pressure, the object to be treated will be rapidly cooled due to adiabatic expansion of the gas, and cracks will occur due to thermal shock. Also, if it exceeds 3 hours, I
This is not preferable because there is no point in lowering the pressure inside the IP device to atmospheric pressure.
また、不活性ガスを充填した冷却室で100℃以下まで
冷却するのは、100℃を越える温度では室外に取り出
した際に割れを生じるので好ましくないためである。Further, it is not preferable to cool the product to 100° C. or lower in a cooling chamber filled with inert gas, since a temperature exceeding 100° C. will cause cracking when taken out outdoors.
図面に基づ〈発明の開示
第1図はこの発明によるH I P処理方法を示す時間
と圧力、温度との関係のグラフであり、第3図はHIP
IP装置面説明図である。Based on the Drawings <Disclosure of the Invention Figure 1 is a graph of the relationship between time, pressure, and temperature showing the HIP treatment method according to the present invention, and Figure 3 is a graph of the relationship between HIP treatment method according to the present invention.
FIG. 2 is an explanatory diagram of an IP device.
)(IP装置は、基台(1)の中央部に、密度95%以
上の一次焼結体からなる被処理物(2)を載置し、被処
理物(2)を被包する如く、ヒータ(3)を内蔵した断
熱筒(4)を、基台(1)上に載置し、さらに、これら
全体を被包する如く基台(1)上に耐圧容器(5)を載
置して密封する。耐圧容器(5)には容器内に不活性圧
力媒体を導入するためのガス供給孔(6)が設けである
。) (The IP apparatus places a workpiece (2) made of a primary sintered body with a density of 95% or more in the center of a base (1), and encloses the workpiece (2). A heat insulating cylinder (4) containing a built-in heater (3) is placed on the base (1), and a pressure-resistant container (5) is placed on the base (1) so as to cover the whole. The pressure vessel (5) is provided with a gas supply hole (6) for introducing an inert pressure medium into the vessel.
上記のトIIP装置において、ガス供給孔(6)よりア
ルゴンガスあるいは窒素ガスを供給しながら、ヒータ(
3)で被処理物(2を昇温する。寸なわら、■被処理物
(2)をioo℃/hr〜11O℃/hrの昇温速度で
1000℃〜1400℃に昇温する。In the above IIP device, while supplying argon gas or nitrogen gas from the gas supply hole (6), the heater (
In step 3), the temperature of the object to be treated (2) is raised. In other words, (1) The object to be treated (2) is heated to 1000° C. to 1400° C. at a temperature increase rate of ioo° C./hr to 110° C./hr.
■昇温後、温度1ooo℃〜1400’C,圧力500
kg/cm2〜2000ko/c!02.0.5〜5時
間の条件で熱間静水圧プレス処理する。■ After heating up, temperature 1ooo℃~1400'C, pressure 500
kg/cm2~2000ko/c! 02. Hot isostatic pressing for 0.5 to 5 hours.
■熱間静水圧プレス処理後、100℃/hr〜170’
C/hrの冷却速度で冷却途中、soo’c〜900°
Cで0.5−−3時間保持し、耐圧容器(5)のガス供
給孔(6)よりガス排気して、耐圧容器(5)内圧力を
大気圧まで低減する。■After hot isostatic press treatment, 100℃/hr~170'
During cooling at a cooling rate of C/hr, soo'c ~ 900°
C for 0.5 to 3 hours, and then exhaust the gas from the gas supply hole (6) of the pressure vessel (5) to reduce the internal pressure of the pressure vessel (5) to atmospheric pressure.
■減圧後、被処理物(2)を基台(1)に載置し断熱筒
(4)で覆ったまま取り出しく第3図す図)、不活性ガ
ス尋人孔を有する冷却容器(7)を基台(1)土に載置
し不活性ガスを充填した冷却ステーションで(第3図C
図)、被処理物(2)を100℃以下まで冷却する。■After depressurizing, place the object (2) on the base (1) and take it out while covering it with the heat insulating tube (4) (Figure 3), cooling container (7) with an inert gas hole. ) is placed on the base (1) soil and filled with inert gas (Fig. 3C).
Figure), the object to be treated (2) is cooled to 100°C or less.
被処理物(2)を取り出した耐圧容器(5)は100℃
以下となっているので、他の被処理物(2)と断熱筒(
4)を載置した基台(1)を挿入しH,IP処理するこ
とにより、HIP処理時間の短縮と連続HIP処理でき
、HIPIP装置率的な利用が可能となる。The pressure container (5) from which the object to be processed (2) was taken out is kept at 100°C.
As shown below, the other workpiece (2) and the heat insulating cylinder (
By inserting the base (1) on which 4) is placed and performing H, IP processing, the HIP processing time can be shortened, continuous HIP processing can be performed, and the HIP device can be efficiently used.
実施例
FeaOa 、MnCO3,ZnOをそれぞれ、53.
6−Eル%。Example FeaOa, MnCO3, and ZnO were each 53.
6-El%.
32.6モル%、 13.8モル%となるように秤量し
、ボールミルにて十分に混合した後、空気中で900℃
の仮焼結を行ない、ざらにボールミルで粉砕し、平均粒
径1.0廟の原料粉末を得た。They were weighed to be 32.6 mol% and 13.8 mol%, mixed thoroughly in a ball mill, and then heated at 900°C in air.
The powder was pre-sintered and roughly ground in a ball mill to obtain a raw material powder with an average particle size of 1.0 mm.
ついで原料粉末にバインダーとしてPVAを1wt%添
加し、造粒後に金型に入れ、2000kvJの圧力で成
型した。Next, 1 wt % of PVA was added as a binder to the raw material powder, and after granulation, it was placed in a mold and molded at a pressure of 2000 kvJ.
成型体の寸法(mm)は、30x 30x 12.59
x 59X12.84X 84X 12の3種で、各々
焼結後製品寸法(岨) 、25x25x10.50X
50X 1o、75X 75X 10のものである。The dimensions of the molded body (mm) are 30x 30x 12.59
There are 3 types: x 59 x 12.84
50X 1o, 75X 75X 10.
この成形体を2%酸素含有窒素ガス雰囲気中で、125
0℃、3時間の焼結を施し、純窒素中で冷却処理した。This molded body was heated to 125% in a nitrogen gas atmosphere containing 2% oxygen.
Sintering was performed at 0° C. for 3 hours, followed by cooling treatment in pure nitrogen.
この−次焼結体の密度は第1表に示ずとおりである。The density of this secondary sintered body is as shown in Table 1.
ついで上記焼結体を、)−11P装置で、第1表に示づ
゛、1]IP条件、昇渇速度、降温速度、降温時の保持
温度及び時間で、従来方法並びにこの発明方法でそれぞ
れHIP処理した。処理後の各焼結体の割れ個数を調べ
、)−1I P処理時間とともに第1表に示す。The above sintered body was then processed using the conventional method and the method of the present invention in a )-11P apparatus under the following conditions as shown in Table 1: HIP treated. The number of cracks in each sintered body after the treatment was investigated and is shown in Table 1 along with the -1IP treatment time.
第1表から明らかなように、75mmX 75mmX
10mm4法の場合は、昇温速瓜及び降温速度が170
℃/hr以下である必要があり、この速度を越えると熱
ショックにより割れが発生する。As is clear from Table 1, 75mmX 75mmX
In the case of the 10mm4 method, the heating rate and cooling rate are 170
The speed must be below .degree. C./hr; if this speed is exceeded, cracking will occur due to thermal shock.
この発明方法では、昇温並びにlli’!温速度が従来
より遅いが、HIP処理後の降温途中で取り出して冷却
室で別個に冷却するため、処理時間の短縮が可能で、従
来の300℃/hrの昇温及び降温速度での処理時間と
同等以下となり、−回のI」IP処理におCブる装置の
占有時間が従来より短く、装置を効率よく使用でき、7
5mm X 75n+m X 10mmの大型焼結体で
も割れを発生させることなく +−1I P処理できる
。In the method of this invention, temperature increase and lli'! Although the heating rate is slower than before, the processing time can be shortened because it is taken out during cooling after HIP processing and cooled separately in a cooling room, and the processing time is shorter than the conventional processing time of 300°C/hr. The device occupancy time for IP processing is shorter than before, and the device can be used more efficiently.
Even large sintered bodies of 5mm x 75n+m x 10mm can be subjected to +-1 IP treatment without cracking.
以下余白Margin below
【図面の簡単な説明】
第1図はこの発明によるI−1I P処理方法を示f時
間と圧力、温度どの関係のグラフであり、第3図はl−
1I P装置の断面説明図である。第2図は従来のトI
IP処理方法を示づ時間と圧力、温度との関係のグラフ
である。
1・・・基台、2・・・被処理物、3・・・ヒータ、4
・・・断熱筒、5・・・耐圧容器、6・・・ガス供給孔
、7・・・冷却容器。
出願人 住友特殊金属株式会社
第1@
8告 U副 (hrl
(a)
′1fJ2図
第3図 ′@閂(h′)
(b) (c)[BRIEF DESCRIPTION OF THE DRAWINGS] Fig. 1 shows the I-1I P treatment method according to the present invention, and is a graph of the relationship between time, pressure, and temperature, and Fig. 3 shows the I-1I P treatment method according to the present invention.
FIG. 1 is a cross-sectional explanatory diagram of the 1I IP device. Figure 2 shows the conventional
It is a graph showing the relationship between time, pressure, and temperature, showing the IP processing method. 1... Base, 2... Processed object, 3... Heater, 4
. . . Insulating tube, 5. Pressure resistant container, 6. Gas supply hole, 7. Cooling container. Applicant: Sumitomo Special Metals Co., Ltd. No. 1 @ 8 Sub U (hrl (a) '1fJ2 Figure 3 '@Kut (h') (b) (c)
Claims (1)
下記順序で熱間静水圧プレス成形することを特徴とづる
ソフトフェライトの熱間静水圧プレス成形方法。 ■上記焼結体をioo°C/hr−170℃/hrの昇
温速度で1000℃〜1400℃に昇温する。 ■昇温後、温度1000℃〜1400℃、圧力500k
Mcm2〜2000kMcm2.0.5〜5時間の条件
で熱間静水圧プレス処理する。 ■熱間静水圧プレス処理後、 100℃/hr〜170℃/hrの冷却速度で冷却中、
e o o ’c〜900℃で0.5〜3時間保持し、
かつ圧力を大気圧まで低減する。 ■減圧後、熱間静水圧プレス装置J、り取り出し、不活
性ガスを充填した冷却室で100℃以下まで冷却する。[Claims] 1. A hot isostatic press forming method for soft ferrite, which comprises hot isostatically press forming a primary sintered body of soft ferrite having a density of 95% or more in the following order. (2) The temperature of the sintered body is raised to 1000°C to 1400°C at a heating rate of ioo°C/hr-170°C/hr. ■After heating up, temperature 1000℃~1400℃, pressure 500k
Hot isostatic pressing is carried out under conditions of Mcm2 to 2000 kmMcm2.0.5 to 5 hours. ■After hot isostatic pressing, cooling at a cooling rate of 100℃/hr to 170℃/hr,
Hold at e o o'c ~ 900 °C for 0.5 to 3 hours,
and reduce the pressure to atmospheric pressure. (2) After depressurizing, take out the product from the hot isostatic press machine J and cool it to below 100°C in a cooling chamber filled with inert gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59087472A JPS60231469A (en) | 1984-04-27 | 1984-04-27 | Thermally hydrostatic press formation for soft ferrite |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59087472A JPS60231469A (en) | 1984-04-27 | 1984-04-27 | Thermally hydrostatic press formation for soft ferrite |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60231469A true JPS60231469A (en) | 1985-11-18 |
JPS649267B2 JPS649267B2 (en) | 1989-02-16 |
Family
ID=13915851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59087472A Granted JPS60231469A (en) | 1984-04-27 | 1984-04-27 | Thermally hydrostatic press formation for soft ferrite |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60231469A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009143784A (en) * | 2007-12-17 | 2009-07-02 | Kobe Steel Ltd | Method for producing magnetite bulk material |
WO2014122865A1 (en) * | 2013-02-08 | 2014-08-14 | 信越化学工業株式会社 | Light transmitting metal oxide sintered body manufacturing method and light transmitting metal oxide sintered body |
-
1984
- 1984-04-27 JP JP59087472A patent/JPS60231469A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009143784A (en) * | 2007-12-17 | 2009-07-02 | Kobe Steel Ltd | Method for producing magnetite bulk material |
WO2014122865A1 (en) * | 2013-02-08 | 2014-08-14 | 信越化学工業株式会社 | Light transmitting metal oxide sintered body manufacturing method and light transmitting metal oxide sintered body |
CN104968633A (en) * | 2013-02-08 | 2015-10-07 | 信越化学工业株式会社 | Light transmitting metal oxide sintered body manufacturing method and light transmitting metal oxide sintered body |
JP6015780B2 (en) * | 2013-02-08 | 2016-10-26 | 信越化学工業株式会社 | Method for producing translucent metal oxide sintered body |
US9604853B2 (en) | 2013-02-08 | 2017-03-28 | Shin-Etsu Chemical Co., Ltd. | Light transmitting metal oxide sintered body manufacturing method and light transmitting metal oxide sintered body |
Also Published As
Publication number | Publication date |
---|---|
JPS649267B2 (en) | 1989-02-16 |
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