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JPS60189327U - Liquefied gas dripping device - Google Patents

Liquefied gas dripping device

Info

Publication number
JPS60189327U
JPS60189327U JP7888984U JP7888984U JPS60189327U JP S60189327 U JPS60189327 U JP S60189327U JP 7888984 U JP7888984 U JP 7888984U JP 7888984 U JP7888984 U JP 7888984U JP S60189327 U JPS60189327 U JP S60189327U
Authority
JP
Japan
Prior art keywords
plate
annular contact
liquefied gas
annular
contact portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7888984U
Other languages
Japanese (ja)
Other versions
JPH0230024Y2 (en
Inventor
和雄 藤田
高橋 利秋
松江 洋司
井元 忠行
Original Assignee
昭和電工株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 昭和電工株式会社 filed Critical 昭和電工株式会社
Priority to JP7888984U priority Critical patent/JPS60189327U/en
Publication of JPS60189327U publication Critical patent/JPS60189327U/en
Application granted granted Critical
Publication of JPH0230024Y2 publication Critical patent/JPH0230024Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図a、 bは、本考案に係る液化ガス
滴下装置の一実施例を示すもので、第1図は、装置の縦
断面図、第2図aは固定盤の上面平面図、第2図すは回
転盤の下面平面図、第3図 □は、装置の使用方法の例
を示す略図である。 1・・・容器、2・・・胴部、3・・・蓋部フランジ1
、−3a   −・・・リリーラ弁、4・・・底部フラ
ンジ、5・・・パツキン、6・・・固定盤、7・・・ビ
ス、□8・・・パツキン、9・・・円形凹部、10・・
・回転盤、11・・・円環状接触部、12・・・キー、
13・・・回転軸、14・・・グランドパツキン部材、
15・・・キー、16・・・大歯車、17・・・小歯車
、18・・・錘、19・・・排出孔、20・・・排出ノ
ズル、21・・・導入孔、22・・・セラミック、被膜
、A・・・液化ガス滴下装置(装置)、B・・・中心軸
線。
1 and 2a and 2b show an embodiment of the liquefied gas dripping device according to the present invention, FIG. 1 is a longitudinal sectional view of the device, and FIG. 2a is a top plan view of the fixed plate. Figure 2 is a bottom plan view of the rotary disk, and Figure 3 □ is a schematic diagram showing an example of how to use the device. 1... Container, 2... Body, 3... Lid flange 1
, -3a -... Reeler valve, 4... Bottom flange, 5... Packing, 6... Fixed plate, 7... Screw, □8... Packing, 9... Circular recess, 10...
・Rotary disk, 11... annular contact part, 12... key,
13...Rotating shaft, 14...Gland packing member,
15... Key, 16... Large gear, 17... Small gear, 18... Weight, 19... Discharge hole, 20... Discharge nozzle, 21... Introduction hole, 22...・Ceramic, coating, A...Liquefied gas dripping device (device), B...Central axis line.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 密閉容器内底面に固定された固定盤と、この固定盤の上
面に下面が摺動自在に接触し、その接触部が所定の幅の
円環状となっている回転盤と、この回転盤を上記円環状
接触部の中心軸線を中心として回転駆動する駆動機構と
、上記回転盤の上面に載置され、上記円環状接触部の面
圧を調整する錘りと、上記中心軸線から半径方向所定距
離の上−配置定盤の円環状接触部に穿設され、ノズルを
介して上記容器外部と連通ずる排出孔と、上記中心軸線
から半径方向の距離が上記、排出孔と同じ円周上の回転
盤に上下に貫通して穿設された導入孔とを具備してなり
、上記円環状接触部の少なくとも一方の面がセラミック
スコーテングされている−ことを特徴とする液化ガス滴
下装置。
A stationary plate fixed to the inner bottom surface of the sealed container, a rotary plate whose lower surface is slidably in contact with the upper surface of the stationary plate, and the contact part is annular with a predetermined width; a drive mechanism that rotates around the center axis of the annular contact portion; a weight that is placed on the top surface of the rotary disk to adjust the surface pressure of the annular contact portion; and a predetermined distance in the radial direction from the center axis. A discharge hole bored in the annular contact part of the top-disposed surface plate and communicating with the outside of the container via a nozzle; 1. A liquefied gas dripping device comprising: an introduction hole formed vertically through a plate; and at least one surface of the annular contact portion is coated with ceramic.
JP7888984U 1984-05-29 1984-05-29 Liquefied gas dripping device Granted JPS60189327U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7888984U JPS60189327U (en) 1984-05-29 1984-05-29 Liquefied gas dripping device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7888984U JPS60189327U (en) 1984-05-29 1984-05-29 Liquefied gas dripping device

Publications (2)

Publication Number Publication Date
JPS60189327U true JPS60189327U (en) 1985-12-14
JPH0230024Y2 JPH0230024Y2 (en) 1990-08-13

Family

ID=30623288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7888984U Granted JPS60189327U (en) 1984-05-29 1984-05-29 Liquefied gas dripping device

Country Status (1)

Country Link
JP (1) JPS60189327U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011111161A (en) * 2009-11-24 2011-06-09 Ctc:Kk Liquid dripping apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011111161A (en) * 2009-11-24 2011-06-09 Ctc:Kk Liquid dripping apparatus

Also Published As

Publication number Publication date
JPH0230024Y2 (en) 1990-08-13

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