JPS60154435A - Housing of extra high pressure mercury lamp - Google Patents
Housing of extra high pressure mercury lampInfo
- Publication number
- JPS60154435A JPS60154435A JP1118084A JP1118084A JPS60154435A JP S60154435 A JPS60154435 A JP S60154435A JP 1118084 A JP1118084 A JP 1118084A JP 1118084 A JP1118084 A JP 1118084A JP S60154435 A JPS60154435 A JP S60154435A
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- base
- pressure mercury
- cover
- mercury lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
Landscapes
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は半導体装i#的の製造工程において、紫外線を
照#−1する装)1のための超高圧水銀ランプ用ハウジ
ングに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a housing for an ultra-high pressure mercury lamp for a device (1) that irradiates ultraviolet rays in the manufacturing process of semiconductor devices (1).
半導体装伍・を製造するためには、微細なパターンを7
Ft足の位置に正確に形成する′必要がめシ、この様な
パターンは一般に、フォトリソグラフィによりて形成さ
れる。In order to manufacture semiconductor devices, seven fine patterns are required.
Such a pattern, which needs to be formed precisely at the position of the Ft foot, is generally formed by photolithography.
フォトリソグラフィは通常、以下の方法で行なわれる。Photolithography is typically performed in the following manner.
パターンを形成すべきシリコンウェハーやフォトマスク
用メタルプレート給の基板上に感光性のフォトレジスト
を塗布し、ベーク後、この7オトレジストを密y#露光
、グロキシミティ露光、プロジェクシ冒ン露光勢の方法
によって露光する、。A photosensitive photoresist is applied onto a silicon wafer or a substrate supplied with a metal plate for a photomask on which a pattern is to be formed, and after baking, this photoresist is subjected to dense y# exposure, gloximity exposure, and projection exposure method. Exposure by,.
次に上記7オトレジストな9像すると、基板上にレジス
トパターンが形成されて所望部分の基析が給出するので
、この部分をエツチングしてハ「望のパターンを形成す
るのである。Next, when the above-mentioned 7-photoresist is imaged, a resist pattern is formed on the substrate and a desired portion of the substrate is supplied, so that this portion is etched to form a desired pattern.
ここで、上F各相・露光方法のための露光装置はいずれ
も光源として知波長の出力が大きい超高圧水銀ランプを
通常用いている。Here, the exposure apparatuses for each of the upper F phases and the exposure method usually use an ultra-high pressure mercury lamp having a large output at a known wavelength as a light source.
第1図に代表、的な超高圧水銀ランプを用いた光学系を
示す。第1図において超高圧水銀ランプ11(以下ラン
プと略す)は通常、陰極側を上に陽禄側を下にして保持
され、超高圧水銀ランプ点灯装置からランプ両端の口金
12.13を辿して印加される1気エネルギーにより点
灯される。ランプから発した光束はりフレフタ−14で
反射されてコールドミラー15に集光し、コールドミラ
ーによって必要な波長だけか反射されてレンズあるい酸
ミラーに進み、フォトレジストを露光する4、リフレク
タ−から反射した光束はランプに集光しない様に、リフ
レクタ−の形状が設計されている。Figure 1 shows a typical optical system using an ultra-high pressure mercury lamp. In Fig. 1, an ultra-high pressure mercury lamp 11 (hereinafter abbreviated as lamp) is normally held with the cathode side up and the anode side down, and the lamps 12 and 13 at both ends of the lamp are traced from the ultra-high pressure mercury lamp lighting device. It is lit by 1 ki energy applied to the lamp. The light beam emitted from the lamp is reflected by the reflector 14 and focused on the cold mirror 15. Only the required wavelength is reflected by the cold mirror, and then passes to the lens or acid mirror to expose the photoresist. 4. From the reflector The shape of the reflector is designed so that the reflected light does not converge on the lamp.
ところが、ランプをゆがんで取付けたり、リフレクタ−
にキズあるいは歪があったシすると、シンプ和に陽ia
−旬!1の口金13に光束の一部が集光して熱せられる
。ランプ点灯中は%極間の参千〜−万℃のアーク放電に
よシ、ランプ自体が熱せられて罫シ、口金も必要温度に
なっていないとアーク放電か安定しないか口金の温度が
集光等で、一定温度以上になってしまうと口金内部の外
極と口金の接合部が溶りて接触不良となシシンプが点灯
しなかったシ、ガラスに歪か生じて、クラック発生畑ら
にはランプ爆発となる。ランプが爆発すると高価なりフ
レフタ−、コールドミラー等が破壊されるはかシでなく
ランプ中に封入されている水銀が飛散して雰囲気を汚染
する等の不都合があった。However, sometimes the lamps are installed in a distorted manner, and the reflectors are
If there is a scratch or distortion on the
- Season! A part of the luminous flux is focused on the base 13 of No. 1 and heated. When the lamp is lit, an arc discharge of 30,000 to -10,000 degrees Celsius occurs between the poles, and the lamp itself gets heated, and if the base is not at the required temperature, the temperature of the base may become unstable or the temperature of the base may be too high. If the temperature exceeds a certain level due to light, etc., the joint between the outer electrode inside the cap and the cap will melt, resulting in poor contact, causing the display not to light up, and causing distortion in the glass, causing cracks to occur. will result in a lamp explosion. When the lamp explodes, it is not only expensive and destroys the frefter, cold mirror, etc., but also has the disadvantage that the mercury sealed in the lamp scatters and pollutes the atmosphere.
本発明は上記の様な厳しい条件で、超高圧水銀ランプを
点灯する場合でも、安定して点灯せ(7める超高圧水銀
ランプ用ハウジングを徒供するものである。The present invention provides a housing for an ultra-high-pressure mercury lamp that allows stable lighting even when the ultra-high-pressure mercury lamp is lit under the above-mentioned severe conditions.
すなわち、本発明の物像は超高圧水銀ランプの口金をカ
バーで覆い、カバーの一部から排朱して排気温度を検出
し排気温度に応じて排受隻を調節する機格を設けた超高
圧水銀ランプ用ハウジングにある。That is, the object of the present invention is an ultra-high-pressure mercury lamp that covers the base of an ultra-high pressure mercury lamp with a cover, detects the exhaust temperature by discharging red from a part of the cover, and adjusts the exhaust receiving vessel according to the exhaust temperature. Located in the housing for high pressure mercury lamps.
以下、図面を参朋して本努萌を詳細に1明する。Hereinafter, this work will be explained in detail with reference to the drawings.
第2図は、本発明の実施例を示す要部原理図でア乏。図
において、ランプ21の陽極側の口金nをカバー28で
0.5〜lQmmの透間をあけて覆い、カバーの一部か
ら排気する。排気温度はセンサー25によって検知され
排気温度に応じてコントロー 9−27 K j 、
*i、ir*°[111F1526f#0″。FIG. 2 is a diagram showing the principal part of an embodiment of the present invention. In the figure, the base n on the anode side of the lamp 21 is covered with a cover 28 with a gap of 0.5 to 1Q mm, and air is exhausted from a part of the cover. The exhaust temperature is detected by the sensor 25 and the controller 9-27 Kj,
*i,ir*°[111F1526f#0″.
調節する。新気I制御は例えは、ダンパーを自動的に開
閉することによシ行なう。ランプ点灯初期の口金1温度
が低いと!あるいは光学系ランプに異常がなく口金、感
度が適正値でおるときは、排気1を最小に絞シ、ランプ
が過冷却のために動作、不安外にならないようにする1
、光学系の歪から、光束の一部がランプに集光して口金
23の温kが上昇した場合、排気温度の上昇に応じて排
気量を大きくシ、口金湯度がランプの発熱による適正飴
度以上eこならない様にする。口篭の異常過熱を抑える
ことによ如、口金部の接触不良やガラスの歪を防ぐこと
ができ、ランプは常に安定して動作する。Adjust. Fresh air I control is performed, for example, by automatically opening and closing a damper. If the base 1 temperature is low at the beginning of lamp lighting! Alternatively, when there is no abnormality in the optical system lamp and the base and sensitivity are at appropriate values, turn down the exhaust 1 to the minimum to prevent the lamp from operating or becoming unstable due to overcooling.
If a part of the luminous flux is focused on the lamp due to distortion of the optical system and the temperature of the base 23 increases, the exhaust volume is increased in accordance with the rise in exhaust temperature, and the temperature of the base hot water is adjusted to an appropriate level due to the heat generated by the lamp. Make sure not to exceed the candy level. By suppressing abnormal overheating of the cap, poor contact at the cap and distortion of the glass can be prevented, and the lamp always operates stably.
以上の様に本発明によれは、ランプの状態に応じて排負
i角を調節、すなわち蒸気となっている水銀を冷すこと
なくランプ冷却を調節できるので猟にランプを最適な状
態で点灯することができ、光学系の調整不備やり7レク
ターに欠陥があっても安全にランプを点灯できるはかシ
でなく、装部の大きさの問題でランプハウジングか十分
力容積を確保できない場合であっても本方法を用いて対
応すればラングハウジングを従妹のものと比べて無理な
く小さくできる様になった。As described above, according to the present invention, the exhaust angle can be adjusted according to the condition of the lamp, that is, the lamp cooling can be adjusted without cooling the mercury in the form of vapor, so the lamp can be lit in the optimal condition for hunting. However, it is not possible to safely light the lamp even if the optical system is incorrectly adjusted or the rector is defective, and it may not be possible to safely light the lamp due to the size of the lamp housing. Even if this happens, if we use this method, we can easily make the rung housing smaller than its cousin.
第1図は従来の代表的な超高圧水銀ランプの光学系であ
シ、第2図は本発明の実施例を示す要部原理図である。
へ
11.21・・・・・・超高圧水銀ランプ、12.13
,22゜23・・・・・・口金、14,24・・・・・
・リフレフクー、15・・・・・・コール□ドミ2−1
25・・・・・・センサー、26・・・・・・排気量制
御部、27・・・・・・コントローラー、28−噛伊・
・・カバー0
カ l 閉
27
馬2関FIG. 1 shows the optical system of a typical conventional ultra-high pressure mercury lamp, and FIG. 2 is a principle diagram of the main parts showing an embodiment of the present invention. 11.21... Ultra-high pressure mercury lamp, 12.13
,22゜23...Base,14,24...
・Ref Refuku, 15... Call □ Domi 2-1
25...Sensor, 26...Displacement control section, 27...Controller, 28-Kamii・
...Cover 0 Ka l Closed 27 Horse 2 Seki
Claims (1)
を入れるハウジングにおいて、超高圧水銀ランプの口金
を咎う部材と、骸部材から排気する機構と、排気混層を
検知する検知部材と、俳句温度に応じて排気負・を調節
する9檜とを具えることを特徴とする超高圧水銀ランプ
用ハウジング。A housing that houses an ultra-high-pressure mercury lamp with a strong flow line spectrum in the ultraviolet region includes a member that holds the base of the ultra-high-pressure mercury lamp, a mechanism that exhausts air from the skeleton member, a detection member that detects the mixed layer of exhaust gas, and a member that detects the haiku temperature. 9. A housing for an ultra-high pressure mercury lamp, characterized in that the housing is equipped with a cylindrical tube that adjusts the negative exhaust gas accordingly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1118084A JPS60154435A (en) | 1984-01-24 | 1984-01-24 | Housing of extra high pressure mercury lamp |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1118084A JPS60154435A (en) | 1984-01-24 | 1984-01-24 | Housing of extra high pressure mercury lamp |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60154435A true JPS60154435A (en) | 1985-08-14 |
Family
ID=11770862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1118084A Pending JPS60154435A (en) | 1984-01-24 | 1984-01-24 | Housing of extra high pressure mercury lamp |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60154435A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0495397U (en) * | 1991-01-17 | 1992-08-18 | ||
JP2008262910A (en) * | 2007-04-12 | 2008-10-30 | Nikon Corp | Discharge lamp, connecting cable, light-source device, and exposure device |
JP2010199091A (en) * | 2006-09-01 | 2010-09-09 | Nikon Corp | Discharge lamp |
-
1984
- 1984-01-24 JP JP1118084A patent/JPS60154435A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0495397U (en) * | 1991-01-17 | 1992-08-18 | ||
JP2514369Y2 (en) * | 1991-01-17 | 1996-10-16 | 石川島播磨重工業株式会社 | Underground low temperature tank |
JP2010199091A (en) * | 2006-09-01 | 2010-09-09 | Nikon Corp | Discharge lamp |
JP2010232183A (en) * | 2006-09-01 | 2010-10-14 | Nikon Corp | Discharge lamp |
JP2010245048A (en) * | 2006-09-01 | 2010-10-28 | Nikon Corp | Installation method and removing method of discharge lamp |
US8531093B2 (en) | 2006-09-01 | 2013-09-10 | Nikon Corporation | Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method |
US8704431B2 (en) | 2006-09-01 | 2014-04-22 | Nikon Corporation | Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method |
JP2017107883A (en) * | 2006-09-01 | 2017-06-15 | 株式会社ニコン | Discharge lamp, light source device, exposure device, and manufacturing method of exposure device |
JP2008262910A (en) * | 2007-04-12 | 2008-10-30 | Nikon Corp | Discharge lamp, connecting cable, light-source device, and exposure device |
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