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JPS60117714A - Detecting device of rotational position of susceptor in vapor growth apparatus - Google Patents

Detecting device of rotational position of susceptor in vapor growth apparatus

Info

Publication number
JPS60117714A
JPS60117714A JP22628483A JP22628483A JPS60117714A JP S60117714 A JPS60117714 A JP S60117714A JP 22628483 A JP22628483 A JP 22628483A JP 22628483 A JP22628483 A JP 22628483A JP S60117714 A JPS60117714 A JP S60117714A
Authority
JP
Japan
Prior art keywords
susceptor
rotational position
index
light source
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22628483A
Other languages
Japanese (ja)
Inventor
Kichizo Komiyama
吉三 小宮山
Hideo Fujie
藤江 秀雄
Kotei Iwata
岩田 公弟
Nobuo Kashiwagi
伸夫 柏木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP22628483A priority Critical patent/JPS60117714A/en
Publication of JPS60117714A publication Critical patent/JPS60117714A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optical Transform (AREA)

Abstract

PURPOSE:To enable the reduction of a time required for detection and the accurate detection of a rotational position, by setting a light source and a detecting means outside a reactor so that the rotational position of a susceptor can be detected from a separate position, and by preventing thereby the light source and the detecting means from being affected adversely by a heat or a reactive gas. CONSTITUTION:An index 15 for detecting a rotational position, such as an indented portion, is provided on the outer peripheral surface of a susceptor 4. Outside the susceptor 4, a light source 16 is provided at a position separated at a prescribed distance from the susceptor 4 so that it is positioned outside a reactor when a bell-jar when a bell-jar 3 is closed, and thus a light is then applied on the outer peripheral surface of the susceptor 4. A detecting means 19 comprising a condenser lens 17 detecting reflected light from the index 15, an optical sensor 18, etc. is provided outside the susceptor 4. The light source 16 and the detecting means 19 are disposed so that a light from the light source 16 may fall on the index 15 and the reflected light from the index 15 may be detected by the detected means 19 when the index 15 provided on the outer peripheral surface of the susceptor 4 arrives at a prescribed rotational position.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、気相成長装置のサセプタ上へウエハを自動的
に搬出入するなどのために、サセプタの回転位置を検出
する装置に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a device for detecting the rotational position of a susceptor for automatically loading and unloading a wafer onto the susceptor of a vapor phase growth apparatus. be.

〔従来技術〕[Prior art]

従来、この種のサセプタの回転位置検出装置として、サ
セプタのウェハ載置に隣接した位置のサセプタ上面に座
ぐり、穴または切欠き等の指標を設け、これをセンサで
検知してサセプタを所定回は高温に加熱され、さらにサ
セプタの上方にはベルジャがあるため、前記のようにサ
セプタの上面に座ぐシ、穴または切欠き等の指標を設け
た場合、その指標の検出装置の設置が困難である。なお
Conventionally, as this type of susceptor rotational position detection device, an index such as a counterbore, a hole, or a notch is provided on the top surface of the susceptor at a position adjacent to the wafer placement on the susceptor, and a sensor detects this index to rotate the susceptor a predetermined number of times. Because the susceptor is heated to a high temperature and there is a bell jar above the susceptor, it is difficult to install a detection device for the indicator when a hole, hole, cutout, or other indicator is provided on the top of the susceptor as described above. It is. In addition.

検出装置をウェハ搬送用のアームなどに設け、ベルジャ
を開いたところで前記アームをサセプタ上へ繰“り出し
て前記指標を検出することは可能であるが、この場合で
も検出装置が高温のサセプタとベルジャ間に入らなけれ
ばならない。
It is possible to install a detection device on a wafer transfer arm, etc., and then extend the arm over the susceptor when the bell jar is opened to detect the index. I have to get into the bell room.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、サセプタの回転位置を検出する装置を
サセプタから離れた反応炉外に位置させ、サセプタの回
転位置を容易にかつ的確に検出することにちる。
An object of the present invention is to locate a device for detecting the rotational position of the susceptor outside the reactor, away from the susceptor, and to easily and accurately detect the rotational position of the susceptor.

〔発明の構成〕[Structure of the invention]

かかる目的を達成するための本発明は、回転可能に設け
られたサセプタの外周面上に設けられた回転位置検出用
の指標と、前記サセプタの外方にあってサセプタの外周
面に光を照射する光源と。
To achieve such an object, the present invention includes an index for detecting a rotational position provided on the outer circumferential surface of a rotatably provided susceptor, and an indicator located outside the susceptor that irradiates light onto the outer circumferential surface of the susceptor. with a light source.

同じくサセプタの外方にあって前記光源からの光によっ
て前記指標が所定の回転位置に達したことを検知する検
知手段とからなる気相成長装置におけるサセプタの回転
位置検出装置にある。
The present invention also provides a rotational position detection device for a susceptor in a vapor phase growth apparatus, which includes a detection means located outside the susceptor and configured to detect when the indicator reaches a predetermined rotational position using light from the light source.

〔実施例〕〔Example〕

以下本発明の一実施例を示す第1図ないし第2図につい
て説明する。第1図において、1はフレーム、2はペー
スグレート、3H−<ルジャで、このベルジャ3をペー
スプレート2に対して閉じることにより反応炉を形成す
るようになっている。
1 and 2 showing one embodiment of the present invention will be explained below. In FIG. 1, 1 is a frame, 2 is a pace plate, and 3H-<Luja. By closing this bell jar 3 to a pace plate 2, a reactor is formed.

4はサセプタで、上面にウェハ5を第2図に示すように
多数載置するよう罠なっている。このサセプタ4は、耐
熱、耐蝕性に優れかつ機械的強度にも優れたSi、N4
などの材料で作られたサセプタ支え6を介して回転軸7
に取付けられている。なお、サセプタ4とサセプタ支え
6との間およびサセプタ支6と回転軸7との間は、回転
止めどン8.9などにより一体的に回転するように固定
されている。回転軸7は、ギヤ1o、11などの回転伝
達機構を介してDCモータ12により回転を与えられる
ようになっている。なお、13は高周波加熱用コイル、
14はコイルカバーである。
Reference numeral 4 denotes a susceptor, on which a large number of wafers 5 can be placed as shown in FIG. This susceptor 4 is made of Si, N4, which has excellent heat resistance, corrosion resistance, and mechanical strength.
The rotating shaft 7 is connected to the susceptor support 6 made of materials such as
installed on. Note that the spaces between the susceptor 4 and the susceptor support 6 and between the susceptor support 6 and the rotating shaft 7 are fixed by rotation stoppers 8.9 or the like so that they rotate integrally. The rotating shaft 7 is configured to be rotated by a DC motor 12 via a rotation transmission mechanism such as gears 1o and 11. In addition, 13 is a high frequency heating coil,
14 is a coil cover.

前記サセプタ4の外周面上には、第2図に示すように凹
凸などの回転位置検出用の指標15が設けである。また
、サセプタ4の外方には、ベルジャ3を閉じたとき反応
炉の外になるようにサセプタ4から所定圧離隔てた位置
に光源16が設けられ、サセプタ4の外周面に光を照射
するようになっている。なお、前記光はレーザ光を含み
、光源16にはレーサ発振器を含む。また、サセプタ4
の外方には、光源16と同様に前記指標15がらの反射
光を検知する集光レンズ17、光センサ18などからな
る検知手段19が設けられている。
On the outer peripheral surface of the susceptor 4, as shown in FIG. 2, an index 15 for detecting the rotational position, such as an unevenness, is provided. Further, a light source 16 is provided outside the susceptor 4 at a position spaced apart from the susceptor 4 by a predetermined pressure so that it is outside the reactor when the bell jar 3 is closed, and irradiates light onto the outer peripheral surface of the susceptor 4. It looks like this. Note that the light includes a laser beam, and the light source 16 includes a laser oscillator. Also, susceptor 4
Detecting means 19, which is comprised of a condensing lens 17, an optical sensor 18, etc., which detects the reflected light from the index 15, like the light source 16, is provided outside.

前記光源16と検知手段19は、サセプタ4の外周面上
に設けられた指標15が、所定の回転位置に達したとき
、光源16がら指標15に当り、指標15からの反射光
が検知手段19によって検知されるように配置される。
The light source 16 and the detection means 19 are arranged so that when the index 15 provided on the outer peripheral surface of the susceptor 4 reaches a predetermined rotational position, the light source 16 hits the index 15 and the reflected light from the index 15 is transmitted to the detection means 19. arranged to be detected by.

サセプタ4にすするウニ・−5の配列は、前記指標15
を原点(回転方向の原点)として、該原点からの角度と
サセプタ4の中心からの距離とによって定められ、それ
らの位置にウニ・−5を受け入れるウニ/S用ザグリ2
0が設けられている。
The arrangement of the sea urchins -5 to be fed to the susceptor 4 is the index 15
The sea urchin/S counterbore 2 is defined by the angle from the origin and the distance from the center of the susceptor 4, and receives the sea urchin-5 at those positions.
0 is set.

次いで本装置の作用について説明する。ベルジャ3は、
気相成長のシーケンス中は下降しておシ、サセプタ4は
反応炉内で連続回転し、サセプタ4のウェー用ザグリ2
0に置かれたウニノー5に気相成長が行なわれる。この
とき、光源16、検知手段19はベルジャ3の外にあり
、このベルジャ3は一般に冷却されているため、熱によ
る悪影響を受けず、もちろん反応ガスやエツチングガス
等にも接触しないので、これらのガスによる悪影響も受
けない。
Next, the operation of this device will be explained. Bellja 3 is
During the vapor phase growth sequence, the susceptor 4 is lowered and continuously rotates in the reactor, and the wafer counterbore 2 of the susceptor 4 is
Vapor phase growth is performed on Uni-No 5 placed at 0. At this time, the light source 16 and the detection means 19 are located outside the bell jar 3, and since the bell jar 3 is generally cooled, it is not adversely affected by heat, and of course does not come into contact with reaction gases, etching gases, etc. It is not affected by the harmful effects of gas.

気相成長のための一連のシーケンスが正常に終了すると
、ベルジャ3はそのシーケンスの終了信号によって自動
的に第1図に示すように上昇し、サセプタ4は外から見
える状態になる。そこで。
When a series of sequences for vapor phase growth are successfully completed, the belljar 3 automatically rises as shown in FIG. 1 in response to the sequence end signal, and the susceptor 4 becomes visible from the outside. Therefore.

″回転しているサセプタ4の外周面に光源16から光を
照射する。サセプタ4の回転によりその外周面に設けた
指標15に前記光が照射され、その反射光が検知手段1
9の集光レンズ17全経て光センサ18に捕えられ、回
転位置検出信号が出されると、DCモータ12の回転を
停止させる。このサセプタ4の停止位置が回転方向の原
点となり、ウェハ用ザグリ20のうちの第1番目が図示
しないウェー・自動搬出入装置のウェーチャック部に対
応する位置に正確に停止される。なお、前記停止位置を
原点とせず、この停止位置捷たは回転位置検出信号の発
生時点からDCモータ12に所定パルスを供給したとこ
ろでサセプタ4を停止させるようにし、ここを原点とし
てもよい。前記のように第1番目のウェハ用ザグリ20
の位置付けができたところで、そこに置かれている気相
成長されたウニ・〜5全自動搬出人装置で取出す。次い
で、第2番目のウェー用ザグリ20が前記ウェハチャッ
ク部に対応するように、第1番目と第2番目のウェハ用
ザグリ20.20の間のサセプタ回転芦に応シたパルス
数をパルスモータ12に供給し1ザセグタ4を所定量回
転させ、との第2番目のウェハ用ザグリ2oに置かれて
いるウェハ5の搬はを行なう。以下同様にして第3、番
4・・・番目のウェハ用ザグリ2oに置かれているウェ
ハ5の搬出を終了したならば、空になったウェハ用ザグ
リ20を前記と同様にウェハチャック部に順次位置付け
して該ウェハ用ザグリ2oに未処理ウェハを搬入し、こ
の搬入終了信号によってベルジャ3舌再び閉じ、気相成
長を行なう。
``Light is irradiated from the light source 16 onto the outer circumferential surface of the rotating susceptor 4. As the susceptor 4 rotates, the indicator 15 provided on the outer circumferential surface is irradiated with the light, and the reflected light is reflected by the detection means 1.
When the light is captured by the optical sensor 18 through the entire condenser lens 17 of 9 and a rotational position detection signal is output, the rotation of the DC motor 12 is stopped. The stopping position of the susceptor 4 becomes the origin of the rotation direction, and the first of the wafer counterbores 20 is accurately stopped at a position corresponding to a wafer chuck section of an automatic wafer loading/unloading device (not shown). Note that instead of using the stop position as the origin, the susceptor 4 may be stopped at a point where a predetermined pulse is supplied to the DC motor 12 from the time when the stop position is changed or the rotational position detection signal is generated, and this may be used as the origin. As mentioned above, the first wafer counterbore 20
Once the sea urchins have been positioned, the vapor-grown sea urchins placed there are taken out using a fully automated unloading device. Next, the number of pulses corresponding to the rotation of the susceptor between the first and second wafer counterbores 20 and 20 is controlled by the pulse motor so that the second wafer counterbore 20 corresponds to the wafer chuck section. The wafer 5 placed in the second wafer counterbore 2o is transferred by rotating the first segment 4 by a predetermined amount. After completing the unloading of the wafers 5 placed in the third, fourth, etc. wafer counterbore 2o in the same manner, the empty wafer counterbore 20 is placed in the wafer chuck section in the same manner as above. Unprocessed wafers are sequentially positioned and loaded into the wafer counterbore 2o, and in response to this loading end signal, the bell jar 3 is closed again to perform vapor phase growth.

なお、ウェハ5の搬出と搬入は、前記のように分離せず
、各ウェハ用ザグリ2o毎に搬出と搬入を交互に行なっ
てもよい。−I8た5回転位置検出用の指標15は、1
つとは限らず、サセプタ4の外周面上に複数個設け、D
Cモータ12がらの指令によるウェハ用ザグリ2oの位
置付は誤差の累積を途中で補正するようにしてもよい。
Note that the wafers 5 may be carried out and carried in alternately for each wafer counterbore 2o without being carried out separately as described above. -I85 The index 15 for detecting the rotational position is 1
However, a plurality of D
The positioning of the wafer counterbore 2o by commands from the C motor 12 may be performed so that accumulated errors are corrected midway through.

第3図は、本発明の他の実施例を示すもので、光源21
から通常の光をサセプタ4の外周面に照l 射し、かつ
その照射方向を前記光によって指標15が影(暗部)を
形成するようにし、この影による明暗部をテレビカメラ
による検知手段22で検知するようにしたものである。
FIG. 3 shows another embodiment of the present invention, in which the light source 21
The outer circumferential surface of the susceptor 4 is irradiated with normal light, and the direction of the irradiation is such that the light forms a shadow (dark area) on the index 15, and the bright and dark areas caused by this shadow are detected by the detection means 22 using a television camera. It is designed to be detected.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によれば、光源や検知手段を反
応炉外に置いて離れた位置からサセプタの回転位置を検
出することができ、光源や検知手段が熱や反応ガスなど
の悪影響を受けないと共に。
As described above, according to the present invention, the rotational position of the susceptor can be detected from a distance by placing the light source and the detection means outside the reactor, and the light source and the detection means are free from adverse effects such as heat and reaction gas. Along with not accepting it.

これらを固定して設置できるので、検出時間の短よ 縮とNシ正確な回転位置検出ができ、さらにサセプタに
は反応物質が堆積するが、これによる影響もほとんどな
く、確実に検出することができる。
Since these can be installed in a fixed manner, detection time can be shortened and rotational position can be detected accurately.Furthermore, although reactants accumulate on the susceptor, there is almost no effect from this, and reliable detection can be achieved. can.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す概要断面図、第2図は
第1図のII−II線による断面図、第3図は本発明の
他の実施例を示す部分平面図である。 2・・・ベースグレート、3・ベルジャ、4・・・サセ
プタ+ 5・・・ウェハ、6・・・サセグタ支え、 7
・・回転軸、8.9・・回転止めビン、12・・DCモ
ータ、13・・高周波加熱コイル、15・・指標、16
.21 ・光源、19.22・・・検知手段。 出願人 東芝機械株式会社 手続補正書(自発) 1.事件の表示 昭和58年特許願第226284号 2、発明の名称 気相成長装置におけるサセプタの回転位置検出装置 3、補正をする者 特許出願人 〒104 住 所 東京都中央区銀座4丁目2番11号名 称 (
345)東芝機械株式会社
FIG. 1 is a schematic sectional view showing one embodiment of the present invention, FIG. 2 is a sectional view taken along line II-II in FIG. 1, and FIG. 3 is a partial plan view showing another embodiment of the present invention. . 2...Base grating, 3.Bell jar, 4...Susceptor + 5...Wafer, 6...Susceptor support, 7
・・Rotation axis, 8.9・・Rotation stopper, 12・・DC motor, 13・High frequency heating coil, 15・・Indicator, 16
.. 21 - Light source, 19.22... Detection means. Applicant: Toshiba Machine Co., Ltd. Procedural amendment (voluntary) 1. Description of the case 1982 Patent Application No. 226284 2, Name of the invention: Susceptor rotational position detection device in a vapor phase growth apparatus 3, Person making the amendment Patent applicant Address: 4-2-11 Ginza, Chuo-ku, Tokyo 104 Title name (
345) Toshiba Machine Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 1、回転可能に設けられたサセプタの外周面上に設けら
れた回転位置検出用の指標と、前記サセプタの外方にあ
ってサセプタの外周面に光を照射する光源と、同じくサ
セプタの外方にあって前記光源からの光によって前記指
標が所定の回転位置に達したことを検知する検知手段と
からなる気相成長装置におけるサセプタの回転位置検出
装置。
1. An index for detecting a rotational position provided on the outer circumferential surface of a rotatably provided susceptor; a light source located outside the susceptor that irradiates light onto the outer circumferential surface of the susceptor; A rotational position detection device for a susceptor in a vapor phase growth apparatus, comprising a detection means for detecting that the index has reached a predetermined rotational position by light from the light source.
JP22628483A 1983-11-30 1983-11-30 Detecting device of rotational position of susceptor in vapor growth apparatus Pending JPS60117714A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22628483A JPS60117714A (en) 1983-11-30 1983-11-30 Detecting device of rotational position of susceptor in vapor growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22628483A JPS60117714A (en) 1983-11-30 1983-11-30 Detecting device of rotational position of susceptor in vapor growth apparatus

Publications (1)

Publication Number Publication Date
JPS60117714A true JPS60117714A (en) 1985-06-25

Family

ID=16842798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22628483A Pending JPS60117714A (en) 1983-11-30 1983-11-30 Detecting device of rotational position of susceptor in vapor growth apparatus

Country Status (1)

Country Link
JP (1) JPS60117714A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982986A (en) * 1995-02-03 1999-11-09 Applied Materials, Inc. Apparatus and method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber
WO2006011169A1 (en) * 2004-07-30 2006-02-02 Lpe Spa Epitaxial reactor with susceptor controlled positioning

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982986A (en) * 1995-02-03 1999-11-09 Applied Materials, Inc. Apparatus and method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber
US6222991B1 (en) * 1995-02-03 2001-04-24 Applied Materials Inc. Method for rotationally aligning and degassing semiconductor substrate within single vacuum chamber
WO2006011169A1 (en) * 2004-07-30 2006-02-02 Lpe Spa Epitaxial reactor with susceptor controlled positioning
JP2008508710A (en) * 2004-07-30 2008-03-21 エルピーイー ソシエタ ペル アチオニ Epitaxial reactor with position-controlled susceptor

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