JPS649459A - Method for correcting white defect of photomask - Google Patents
Method for correcting white defect of photomaskInfo
- Publication number
- JPS649459A JPS649459A JP16471287A JP16471287A JPS649459A JP S649459 A JPS649459 A JP S649459A JP 16471287 A JP16471287 A JP 16471287A JP 16471287 A JP16471287 A JP 16471287A JP S649459 A JPS649459 A JP S649459A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mask
- exposed
- defect
- metallic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To prevent the generation of a black defect by covering a correcting metallic film formed on a white defect part selectively with an etching resistant mask, then etching away the exposed metallic film. CONSTITUTION:A mask pattern 2 consisting of metal such as Cr is formed on a substrate 1 to detect the white defective part 4. After a photoresist film 5 is then formed over the entire surface, the defective part 4 is selectively exposed and the exposed film 5' is removed by development. The metallic film consisting of Cr, etc., is in succession deposited over the entire surface and further, the film 7 on the defect 4 is selectively covered by the etching resistant mask 8. The same material as the material of the pattern 2 is usable for the mask 8. The exposed metallic film 7' is then removed by, for example, chemical etching and the film 7' is dissolved by which the cause for generating the black defect is eliminated. The film 5 and the mask 8 are removed in the final and the correction is completed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16471287A JPS649459A (en) | 1987-07-01 | 1987-07-01 | Method for correcting white defect of photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16471287A JPS649459A (en) | 1987-07-01 | 1987-07-01 | Method for correcting white defect of photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS649459A true JPS649459A (en) | 1989-01-12 |
Family
ID=15798452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16471287A Pending JPS649459A (en) | 1987-07-01 | 1987-07-01 | Method for correcting white defect of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS649459A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106569387A (en) * | 2015-10-09 | 2017-04-19 | 中芯国际集成电路制造(北京)有限公司 | Mask and repair method thereof |
-
1987
- 1987-07-01 JP JP16471287A patent/JPS649459A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106569387A (en) * | 2015-10-09 | 2017-04-19 | 中芯国际集成电路制造(北京)有限公司 | Mask and repair method thereof |
| CN106569387B (en) * | 2015-10-09 | 2021-03-23 | 中芯国际集成电路制造(北京)有限公司 | Photomask and repairing method thereof |
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