JPS6488448A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS6488448A JPS6488448A JP62245498A JP24549887A JPS6488448A JP S6488448 A JPS6488448 A JP S6488448A JP 62245498 A JP62245498 A JP 62245498A JP 24549887 A JP24549887 A JP 24549887A JP S6488448 A JPS6488448 A JP S6488448A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- composition
- substd
- rie
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE:To improve the RIE of the titled composition against oxygen, and to enable the alkaline development of said composition by incorporating a polysiloxane having a specified structural unit in the titled composition, as an essential component. CONSTITUTION:The composition contains the polysiloxane having the structural unit shown by formula I, as the essential component. In formula I, R1 is 1-10C an optionally substd. alkyl group, an optionally substd. aryl group, etc., at least one of R2-R6 groups is a substd. aryl group shown by formula II, a residual group of said group is hydrogen or halogen atom., etc. In formula II, R7 is a group shown by formula III or IV, etc., R8 is 1-10C an optionally substd. alkyl group or hydroxy group, etc. Thus, the excellent durability of the titled composition against the oxygen plasma (the RIE against oxygen) is obtd., and the alkaline development of said composition is possible.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245498A JPS6488448A (en) | 1987-09-29 | 1987-09-29 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245498A JPS6488448A (en) | 1987-09-29 | 1987-09-29 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6488448A true JPS6488448A (en) | 1989-04-03 |
Family
ID=17134563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62245498A Pending JPS6488448A (en) | 1987-09-29 | 1987-09-29 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6488448A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11873587B2 (en) | 2019-03-28 | 2024-01-16 | Southern Mills, Inc. | Flame resistant fabrics |
US11891731B2 (en) | 2021-08-10 | 2024-02-06 | Southern Mills, Inc. | Flame resistant fabrics |
-
1987
- 1987-09-29 JP JP62245498A patent/JPS6488448A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11873587B2 (en) | 2019-03-28 | 2024-01-16 | Southern Mills, Inc. | Flame resistant fabrics |
US11891731B2 (en) | 2021-08-10 | 2024-02-06 | Southern Mills, Inc. | Flame resistant fabrics |
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