JPS6473071A - Continuous vacuum deposition device - Google Patents
Continuous vacuum deposition deviceInfo
- Publication number
- JPS6473071A JPS6473071A JP22844587A JP22844587A JPS6473071A JP S6473071 A JPS6473071 A JP S6473071A JP 22844587 A JP22844587 A JP 22844587A JP 22844587 A JP22844587 A JP 22844587A JP S6473071 A JPS6473071 A JP S6473071A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vacuum deposition
- vacuum
- sealing
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To deposit a metal by evaporation continuously on a long-sized traveling substrate at a high equipment operating rate by providing plural sealing parts consisting of sheet rolls and casings before and behind a vacuum deposition chamber at the time of depositing the metal by vacuum evaporation on the surface of the above-mentioned substrate. CONSTITUTION:While the long-sized traveling substrate such as paper or film is run in an arrow direction, the substrate is wound around a winding roll 6 in the vacuum deposition chamber 1 and the vapor 11 of the molten metal 9 in a crucible 8 provided in the lower part of the chamber is stuck as a vapor deposited film on the surface of the substrate 3. The substrate 3 enters a vacuum sealing device consisting of the plural differential pressure chambers 18 constituted of a pair of the sealing rolls 15, partition walls 30 and the casing 16. The substrate passes again through the vacuum sealing device 17 consisting of the plural differential pressure chambers 18 having the similar construction after the vapor deposition of the metallic film thereon and is taken out into the atm. While the traveling substrate 1 is wound around one of the sealing rolls, the substrate travels and since the vacuum deposition is thereby continuously executed, the working rate of the vacuum deposition device is extremely higher than the working rate of a batch system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22844587A JPS6473071A (en) | 1987-09-14 | 1987-09-14 | Continuous vacuum deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22844587A JPS6473071A (en) | 1987-09-14 | 1987-09-14 | Continuous vacuum deposition device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6473071A true JPS6473071A (en) | 1989-03-17 |
Family
ID=16876604
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22844587A Pending JPS6473071A (en) | 1987-09-14 | 1987-09-14 | Continuous vacuum deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6473071A (en) |
-
1987
- 1987-09-14 JP JP22844587A patent/JPS6473071A/en active Pending
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