JPS646530B2 - - Google Patents
Info
- Publication number
- JPS646530B2 JPS646530B2 JP773581A JP773581A JPS646530B2 JP S646530 B2 JPS646530 B2 JP S646530B2 JP 773581 A JP773581 A JP 773581A JP 773581 A JP773581 A JP 773581A JP S646530 B2 JPS646530 B2 JP S646530B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- metal
- electrodes
- porcelain
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 25
- 238000007747 plating Methods 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 239000003985 ceramic capacitor Substances 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910000679 solder Inorganic materials 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- -1 platinum group compound Chemical class 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 238000007772 electroless plating Methods 0.000 claims description 4
- 229910052573 porcelain Inorganic materials 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 239000002966 varnish Substances 0.000 claims description 3
- 239000003990 capacitor Substances 0.000 claims description 2
- 239000010953 base metal Substances 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
本発明は製造容易、安価にしてかつ諸特性の安
定した磁器コンデンサの電極形成方法に関するも
のである。
従来から磁器コンデンサの電極形成として焼付
銀電極法が一般的であつたが、近年の貴金属材料
の高騰に伴ない、各種のメツキ方法が開発されつ
つある。公知の方法として、塩化第1錫浴―塩化
パラジウム浴の感応―活性化処理による無電解メ
ツキ法があるが、この方法では素体全周面上に金
属が形成され易く、対向容量電極を形成するため
に素体周側面の皮膜を除去する必要がある。この
場合は沿面耐電圧距離は素体の厚みで決定し、素
体の厚みを余り薄くできないと同時に、外周研摩
により素体のエツジ部に金属が付着・残存するな
どの沿面汚染により電界の集中で絶縁破壊が起こ
り易いものであつた。さらにこの方法では電極材
料および関連材料の種類、取付方法によつて引張
強度の低下、電気特性(特に寿命試験による特性
劣化)等が著しく劣化し、信頼性の点からも磁器
の電極部に縁を設けることが設計上必要であつ
た。局部メツキ法としては素体の全面を活性化し
た後、電極形成領域にレジストを取り付け、更に
外周部をエツチングし、その部分の活性を除去す
る。次にレジストを取り除いた後メツキにより金
属層を形成する方法、他に真空蒸着法、フオトエ
ツチング法等種々の方法があるが、いずれも磁器
コンデンサの電極として満足する結果が得られな
い。即ち、従来から知られている方法では電極と
しての諸特性が充分でなく、またコンデンサの形
状は種々あり、量産性を考慮した場合困難であつ
た。
本発明は上記のような従来と異なる新しい方法
によつて、磁器コンデンサの必要箇所に容易に電
極を形成でき、特にメツキ下地の金属材料および
形成方法に特徴を有するものである。即ち、本発
明は磁器素材の電極形成箇所にパラジウム、白金
等の白金族化合物あるいは金属粉を有機ワニスに
分散したペーストを塗布し、熱処理を施こすこと
により素体面にメツキ下地の活性金属を析出さ
せ、無電解ニツケルまたは銅メツキを行い、その
後電解錫または半田メツキにより金属電極を形成
することを特徴とする磁器コンデンサの電極形成
方法である。本発明によつて、従来のメツキ方法
に比べ接着強度、電気特性等優秀な特性が得ら
れ、また焼付銀電極法と比較しても遜色のない特
性を得るものである。
以下、本発明の実施例および限定理由について
述べる。まず、磁器素体については材料の種類に
よつて素体表面を機械的加工あるいは酸による化
学的処理によつて粗くし、素体と金属との接着強
度を増した。ペーストの作成方法としては、エチ
ルセルローズ、酢酸セルローズ、ブチルゴム、ポ
リビニルブチラール、フエノール樹脂等の樹脂を
カルビトール、ターピネオル、セロソルブ、アル
コール等の有機溶剤に溶解した有機ワニスに白金
族化合物あるいは金属粉を均一に分散させた。ペ
ーストの金属含有量は請求の範囲に限定される
が、その理由は0.03重量%未満では充分な活性が
得られず、また5重量%を越えるとメツキ処理後
の素体と金属との接着が弱くなり、かつコスト的
にも利点がない。第1表はペーストの金属(塩化
パラジウム)含有量を変えた場合の無電解ニツケ
ルメツキの析出状態と、その後電解錫メツキを行
いリード線を半田付した引張り強度の実施例であ
る。
The present invention relates to a method for forming electrodes of a ceramic capacitor that is easy to manufacture, inexpensive, and has stable characteristics. Conventionally, the baked silver electrode method has been common for forming electrodes of ceramic capacitors, but as the prices of precious metal materials have soared in recent years, various plating methods are being developed. As a known method, there is an electroless plating method using a sensitive activation treatment in a tinnous chloride bath and a palladium chloride bath, but with this method, metal is likely to be formed on the entire circumferential surface of the element body, and it is difficult to form a counter capacitance electrode. In order to do this, it is necessary to remove the film on the side surface of the element body. In this case, the creepage withstand voltage distance is determined by the thickness of the element, and at the same time, the thickness of the element cannot be made too thin, and at the same time, the electric field is concentrated due to creepage contamination such as metal adhering or remaining on the edge of the element due to peripheral polishing. dielectric breakdown was likely to occur. Furthermore, with this method, depending on the type of electrode material and related materials and the mounting method, there is a significant reduction in tensile strength and electrical properties (particularly property deterioration due to life tests). It was necessary in the design to provide this. In the local plating method, after activating the entire surface of the element body, a resist is attached to the electrode formation area, and the outer periphery is further etched to remove the activation of that part. Next, there are various methods such as removing the resist and then forming a metal layer by plating, vacuum evaporation method, photo etching method, etc., but none of them yields satisfactory results for electrodes of ceramic capacitors. That is, the conventionally known methods do not have sufficient properties as electrodes, and there are various shapes of capacitors, making it difficult to mass-produce them. The present invention allows electrodes to be easily formed at required locations on a ceramic capacitor by a new method different from the conventional method as described above, and is particularly characterized by the metal material of the plating base and the method for forming the electrode. That is, the present invention applies a paste in which a platinum group compound such as palladium or platinum or metal powder is dispersed in an organic varnish to the electrode formation portion of a porcelain material, and heat-treats it to deposit active metals as a plating base on the surface of the ceramic material. This is a method for forming electrodes of a ceramic capacitor, which is characterized in that metal electrodes are formed by electroless nickel or copper plating, followed by electrolytic tin or solder plating. The present invention provides superior properties such as adhesive strength and electrical properties compared to conventional plating methods, and also provides comparable properties compared to baked silver electrode methods. Examples of the present invention and reasons for limitations will be described below. First, depending on the type of material, the surface of the porcelain element was roughened by mechanical processing or chemical treatment with acid to increase the adhesive strength between the element and the metal. To create a paste, a platinum group compound or metal powder is uniformly added to an organic varnish made by dissolving a resin such as ethyl cellulose, cellulose acetate, butyl rubber, polyvinyl butyral, or phenolic resin in an organic solvent such as carbitol, terpineol, cellosolve, or alcohol. dispersed into. The metal content of the paste is limited to the claimed range, but the reason is that if it is less than 0.03% by weight, sufficient activity cannot be obtained, and if it exceeds 5% by weight, the adhesion between the base body and the metal after plating treatment will be impaired. It becomes weak and there is no advantage in terms of cost. Table 1 shows examples of the deposition state of electroless nickel plating when the metal (palladium chloride) content of the paste was changed, and the tensile strength after electrolytic tin plating and lead wires were soldered.
【表】【table】
【表】
またペーストに関して、印刷精度を向上させる
ためにフイラ成分として不溶性のかつ熱処理温度
内で完全に飛散する有機、無機物質を添加するこ
とも可能である。次に、ペーストの熱処理温度は
請求の範囲に限定されるが、その理由は420℃よ
り低い温度ではペースト中の樹脂分あるいはフイ
ラ成分が完全に飛散せずメツキの析出が充分でな
く、920℃より高い温度では析出粒子が半融状態
となり、活性が低下する。第2表は熱処理温度を
変えた場合の無電解ニツケルメツキの析出状態
と、その後電解錫メツキを行いリード線を半田付
した引張り強度の実施例である。[Table] Regarding the paste, in order to improve printing accuracy, it is also possible to add organic or inorganic substances as filler components that are insoluble and completely scatter within the heat treatment temperature. Next, the heat treatment temperature of the paste is limited to the claimed range, but the reason is that at temperatures lower than 420°C, the resin or filler components in the paste will not be completely dispersed and the plating will not be sufficiently precipitated. At higher temperatures, the precipitated particles become semi-molten and the activity decreases. Table 2 shows examples of the precipitation state of electroless nickel plating when the heat treatment temperature was changed and the tensile strength after electrolytic tin plating and lead wires were soldered.
【表】
また、第3表は公知のメツキ方法と銀焼付法に
よる引張り強度の比較例である。[Table] Table 3 is a comparative example of tensile strength obtained by a known plating method and a silver baking method.
【表】
ニツケルメツキ浴としては硫酸ニツケルに錯化
剤として有機酸ナトリウム塩、還元剤として次亜
リン酸ナトリウム(またはヒドラジン、ボラザン
化合物等)を含む溶液で、また銅メツキ浴として
は硫酸銅にロツシエル塩、苛性ソーダ、ホルマリ
ンを含む溶液を用い、回転バレル式メツキ槽で無
電解メツキを行つた。さらに、錫または半田の電
解メツキを行い、磁器コンデンサの電極を形成し
た。ここで、2度メツキを行う理由は最初のニツ
ケルあるいは銅の無電解メツキで電極としての機
能は充分満足されるが、空気により酸化を受けや
すい欠点を防止し、半田付着性を向上させる目的
で錫あるいは半田の電解メツキを行うものであ
る。第4表はそれぞれ100個の試料を空気中に放
置し、経時変化による半田未付着数を示したもの
である。[Table] A nickel plating bath is a solution containing nickel sulfate, organic acid sodium salt as a complexing agent, and sodium hypophosphite (or hydrazine, borazane compound, etc.) as a reducing agent, and a copper plating bath is a solution containing copper sulfate and Rothsiel. Electroless plating was performed in a rotating barrel plating tank using a solution containing salt, caustic soda, and formalin. Furthermore, electrolytic plating with tin or solder was performed to form electrodes for a ceramic capacitor. The reason for plating twice is that although the first electroless plating of nickel or copper sufficiently functions as an electrode, the purpose is to prevent defects that are easily oxidized by air and to improve solder adhesion. It performs electrolytic plating of tin or solder. Table 4 shows the number of unattached solders over time when 100 samples were left in the air.
【表】【table】
【表】
第5表は電気特性ならびに寿命試験における本
発明の実施例と比較例である。No.1〜4について
はメツキの下地のペースト、熱処理条件は一定の
もとに行つた。No.5は塩化第1錫浴―塩化パラジ
ウム浴の感応―活性化後、素体全面にメツキを施
こし周辺部を研削した試料であり、寿命試験の劣
化と共に第3表からわかるように引張り強度も低
い結果であつた。No.6は従来から一般的に用いら
れている焼付銀電極の比較例であり、寿命試験に
おいて本発明による電極形成法が優れた値を得て
いる。[Table] Table 5 shows examples and comparative examples of the present invention in electrical characteristics and life tests. For Nos. 1 to 4, the base paste for plating and the heat treatment conditions were kept constant. No. 5 is a sample in which the entire surface of the element body was plated and the peripheral area was ground after activation in a tinnous chloride bath and a palladium chloride bath. The strength was also low. No. 6 is a comparative example of a baked silver electrode that has been commonly used in the past, and the electrode forming method according to the present invention obtained excellent values in the life test.
【表】
以上のように、本発明は従来の焼付銀電極に比
べて、安価で特性的にも良好な量産化に適した産
業価値の高い、従来まで困難とされていた無電解
メツキ法により磁器コンデンサの電極形成方法を
提供するものであり、その実用的価値は大なるも
のである。[Table] As described above, the present invention is cheaper and has better characteristics than conventional baked silver electrodes, has high industrial value, and is suitable for mass production. The present invention provides a method for forming electrodes of ceramic capacitors, and its practical value is great.
Claims (1)
分散させ、金属成分として0.03〜5.0重量%を含
むペーストを印刷法、吹付法等により磁器素体に
塗布し、420〜920℃の温度範囲で熱処理を行い下
地金属を取付け、ニツケルまたは銅の無電解メツ
キを行い、その上に錫または半田の電解メツキを
行うことにより金属電極を形成することを特徴と
する磁器コンデンサの電極形成方法。 2 機械的あるいは化学的方法により磁器素体表
面を粗くすることを特徴とする特許請求の範囲第
1項に記載の磁器コンデンサの電極形成方法。[Scope of Claims] 1 A platinum group compound or metal powder is dispersed in an organic varnish, and a paste containing 0.03 to 5.0% by weight as a metal component is applied to a porcelain body by a printing method, a spraying method, etc., and heated at 420 to 920°C. Electrode formation for a porcelain capacitor, characterized in that metal electrodes are formed by performing heat treatment in a temperature range of , attaching a base metal, electroless plating with nickel or copper, and electrolytically plating tin or solder thereon. Method. 2. The method for forming electrodes of a ceramic capacitor according to claim 1, characterized in that the surface of the ceramic body is roughened by a mechanical or chemical method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP773581A JPS57121212A (en) | 1981-01-20 | 1981-01-20 | Method of forming electrode for porcelain capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP773581A JPS57121212A (en) | 1981-01-20 | 1981-01-20 | Method of forming electrode for porcelain capacitor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57121212A JPS57121212A (en) | 1982-07-28 |
JPS646530B2 true JPS646530B2 (en) | 1989-02-03 |
Family
ID=11673954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP773581A Granted JPS57121212A (en) | 1981-01-20 | 1981-01-20 | Method of forming electrode for porcelain capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57121212A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0284701A (en) * | 1989-08-24 | 1990-03-26 | Nippon Denso Co Ltd | Formation of electrode of positive temperature coefficient porcelain semiconductor |
KR20130037485A (en) * | 2011-10-06 | 2013-04-16 | 삼성전기주식회사 | Multilayered ceramic capacitor, and method for manufacturing the same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54157296A (en) * | 1978-06-02 | 1979-12-12 | Tdk Corp | Electrode structure and the manufacturing method |
-
1981
- 1981-01-20 JP JP773581A patent/JPS57121212A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57121212A (en) | 1982-07-28 |
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