JPS6450577A - Manufacture of superconducting thin film - Google Patents
Manufacture of superconducting thin filmInfo
- Publication number
- JPS6450577A JPS6450577A JP62208630A JP20863087A JPS6450577A JP S6450577 A JPS6450577 A JP S6450577A JP 62208630 A JP62208630 A JP 62208630A JP 20863087 A JP20863087 A JP 20863087A JP S6450577 A JPS6450577 A JP S6450577A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- cuo
- target
- shall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 6
- 239000007789 gas Substances 0.000 abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000002156 mixing Methods 0.000 abstract 2
- 229910052786 argon Inorganic materials 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 239000000395 magnesium oxide Substances 0.000 abstract 1
- 238000001755 magnetron sputter deposition Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 239000002887 superconductor Substances 0.000 abstract 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
PURPOSE:To enable a superconducting thin film of low permittivity to be formed in parallel with a substrate surface by a method wherein a Y2O3-BaO-CuO superconductor is filmed meeting the specific requirements for filming speed and gas pressure and using MaO cleaved in a face 100 as the substrate. CONSTITUTION:A thin film of Y2O3-BaO-CuO oxide is formed on a magnesia single crystal substrate cleaved in a face 100 at the filming speed not exceeding 20Angstrom /min and the gas pressure exceeding 40mT to orient the crystalline direction in low electric resistance in parallel with the substrate. For example, said thin film is formed by RF magnetron sputtering process while a target is composed of T0.4Ba0.6CuO3-delta. The applicable target is manufactured by blending and mixing specified amount of Y3O3, BaCO3, CuO as materials and after baking them at 900 deg.C for 12 hours in the air, crushed and mixed with one another again to be pressed down at the pressure of 200kg/cm<2>. Furthermore, the sputtering gas shall be mixed with 90% argon and 10% oxygen; the distance between the substrate and the target shall be 8cm; and the substrate temperature shall be 600 deg.C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62208630A JPS6450577A (en) | 1987-08-21 | 1987-08-21 | Manufacture of superconducting thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62208630A JPS6450577A (en) | 1987-08-21 | 1987-08-21 | Manufacture of superconducting thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6450577A true JPS6450577A (en) | 1989-02-27 |
Family
ID=16559407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62208630A Pending JPS6450577A (en) | 1987-08-21 | 1987-08-21 | Manufacture of superconducting thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6450577A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01188662A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JPH01188665A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JPH01188663A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JP2003124534A (en) * | 2001-10-12 | 2003-04-25 | Fujitsu Ltd | High-temperature superconductor film and its forming method, and superconducting element |
-
1987
- 1987-08-21 JP JP62208630A patent/JPS6450577A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01188662A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JPH01188665A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JPH01188663A (en) * | 1988-01-22 | 1989-07-27 | Sumitomo Electric Ind Ltd | Production of superconducting thin film |
| JP2003124534A (en) * | 2001-10-12 | 2003-04-25 | Fujitsu Ltd | High-temperature superconductor film and its forming method, and superconducting element |
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