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JPS5399770A - Soft x-ray transfer mask - Google Patents

Soft x-ray transfer mask

Info

Publication number
JPS5399770A
JPS5399770A JP1298577A JP1298577A JPS5399770A JP S5399770 A JPS5399770 A JP S5399770A JP 1298577 A JP1298577 A JP 1298577A JP 1298577 A JP1298577 A JP 1298577A JP S5399770 A JPS5399770 A JP S5399770A
Authority
JP
Japan
Prior art keywords
soft
transfer mask
ray transfer
ray
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1298577A
Other languages
Japanese (ja)
Inventor
Kayao Takemoto
Masaru Miyazaki
Satoru Nakayama
Toshiki Kadota
Katsumi Suzuki
Takanao Shiratori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Hitachi Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
Fujitsu Ltd
Hitachi Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Hitachi Ltd, NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd filed Critical Fujitsu Ltd
Priority to JP1298577A priority Critical patent/JPS5399770A/en
Publication of JPS5399770A publication Critical patent/JPS5399770A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To perform the mask matching by the visible rays and through the hole on Si substrate 24.
COPYRIGHT: (C)1978,JPO&Japio
JP1298577A 1977-02-10 1977-02-10 Soft x-ray transfer mask Pending JPS5399770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1298577A JPS5399770A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1298577A JPS5399770A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Publications (1)

Publication Number Publication Date
JPS5399770A true JPS5399770A (en) 1978-08-31

Family

ID=11820487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1298577A Pending JPS5399770A (en) 1977-02-10 1977-02-10 Soft x-ray transfer mask

Country Status (1)

Country Link
JP (1) JPS5399770A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6365621A (en) * 1986-09-05 1988-03-24 Nec Corp Mask for x-ray exposure
JPS63104327A (en) * 1986-10-20 1988-05-09 Mitsubishi Electric Corp X-ray mask and manufacture thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5342678A (en) * 1976-09-30 1978-04-18 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure method
JPS5375772A (en) * 1976-12-16 1978-07-05 Fujitsu Ltd Forming method of positioning mark

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5342678A (en) * 1976-09-30 1978-04-18 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure method
JPS5375772A (en) * 1976-12-16 1978-07-05 Fujitsu Ltd Forming method of positioning mark

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6365621A (en) * 1986-09-05 1988-03-24 Nec Corp Mask for x-ray exposure
JPS63104327A (en) * 1986-10-20 1988-05-09 Mitsubishi Electric Corp X-ray mask and manufacture thereof

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