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JPS5341982A - Wafer holder for ion implantation processing - Google Patents

Wafer holder for ion implantation processing

Info

Publication number
JPS5341982A
JPS5341982A JP11586176A JP11586176A JPS5341982A JP S5341982 A JPS5341982 A JP S5341982A JP 11586176 A JP11586176 A JP 11586176A JP 11586176 A JP11586176 A JP 11586176A JP S5341982 A JPS5341982 A JP S5341982A
Authority
JP
Japan
Prior art keywords
wafer holder
ion implantation
implantation processing
wafer
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11586176A
Other languages
Japanese (ja)
Inventor
Takashi Ishikawa
Shuichi Nakamura
Masami Kanegae
Yoichi Takehana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11586176A priority Critical patent/JPS5341982A/en
Publication of JPS5341982A publication Critical patent/JPS5341982A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the metallic pollution of a wafer effictively by constituting the circumference of a wafer holder by nonmetallic materials.
COPYRIGHT: (C)1978,JPO&Japio
JP11586176A 1976-09-29 1976-09-29 Wafer holder for ion implantation processing Pending JPS5341982A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11586176A JPS5341982A (en) 1976-09-29 1976-09-29 Wafer holder for ion implantation processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11586176A JPS5341982A (en) 1976-09-29 1976-09-29 Wafer holder for ion implantation processing

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP58177950A Division JPS5994414A (en) 1983-09-28 1983-09-28 Holder for wafer
JP58177949A Division JPS5986147A (en) 1983-09-28 1983-09-28 Wafer holder

Publications (1)

Publication Number Publication Date
JPS5341982A true JPS5341982A (en) 1978-04-15

Family

ID=14672953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11586176A Pending JPS5341982A (en) 1976-09-29 1976-09-29 Wafer holder for ion implantation processing

Country Status (1)

Country Link
JP (1) JPS5341982A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57173701A (en) * 1981-04-21 1982-10-26 Japanese National Railways<Jnr> Eddy current type device and method for measuring rail displacement
JPS5845548A (en) * 1981-09-11 1983-03-16 Nikka Densoku Kk Detection of conductive object and device for embodying said detection
JPH0443990A (en) * 1990-06-08 1992-02-13 Anritsu Corp In-liquid foreign matter inspection device
JP2013171637A (en) * 2012-02-17 2013-09-02 Ulvac Japan Ltd Ion implantation device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57173701A (en) * 1981-04-21 1982-10-26 Japanese National Railways<Jnr> Eddy current type device and method for measuring rail displacement
JPS6344161B2 (en) * 1981-04-21 1988-09-02 Tetsudo Sogo Gijutsu Kenkyusho
JPS5845548A (en) * 1981-09-11 1983-03-16 Nikka Densoku Kk Detection of conductive object and device for embodying said detection
JPH0443990A (en) * 1990-06-08 1992-02-13 Anritsu Corp In-liquid foreign matter inspection device
JP2013171637A (en) * 2012-02-17 2013-09-02 Ulvac Japan Ltd Ion implantation device

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