JPS5336223A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5336223A JPS5336223A JP10977977A JP10977977A JPS5336223A JP S5336223 A JPS5336223 A JP S5336223A JP 10977977 A JP10977977 A JP 10977977A JP 10977977 A JP10977977 A JP 10977977A JP S5336223 A JPS5336223 A JP S5336223A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2641100.7 | 1976-09-13 | ||
DE2641100A DE2641100C2 (de) | 1976-09-13 | 1976-09-13 | Lichtempfindliches Gemisch |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5336223A true JPS5336223A (en) | 1978-04-04 |
JPS6046700B2 JPS6046700B2 (ja) | 1985-10-17 |
Family
ID=5987764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52109779A Expired JPS6046700B2 (ja) | 1976-09-13 | 1977-09-12 | 感光性組成物 |
Country Status (13)
Country | Link |
---|---|
US (1) | US4160671A (ja) |
JP (1) | JPS6046700B2 (ja) |
AT (1) | AT354477B (ja) |
AU (1) | AU515457B2 (ja) |
BE (1) | BE858621A (ja) |
BR (1) | BR7706068A (ja) |
CA (1) | CA1094379A (ja) |
CH (1) | CH628446A5 (ja) |
DE (1) | DE2641100C2 (ja) |
FR (1) | FR2364489A1 (ja) |
GB (1) | GB1591113A (ja) |
NL (1) | NL7709936A (ja) |
SE (1) | SE417873B (ja) |
Cited By (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55126235A (en) * | 1979-03-22 | 1980-09-29 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS58211141A (ja) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | ネガ型感光性平版印刷版 |
JPS6088942A (ja) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS6144472U (ja) * | 1984-08-27 | 1986-03-24 | 住友重機械工業株式会社 | 吊上げ電磁石 |
JPS62134649A (ja) * | 1985-12-09 | 1987-06-17 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版材料 |
JPS62276536A (ja) * | 1986-05-26 | 1987-12-01 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
JPS63311247A (ja) * | 1987-06-12 | 1988-12-20 | Konica Corp | 感光性組成物 |
JPH01108543A (ja) * | 1987-10-22 | 1989-04-25 | Fuji Photo Film Co Ltd | パターン形成方法 |
EP0410606A2 (en) | 1989-07-12 | 1991-01-30 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1627732A1 (en) | 2004-08-18 | 2006-02-22 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1640173A1 (en) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1690685A2 (en) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1705004A1 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
WO2007136005A1 (ja) | 2006-05-18 | 2007-11-29 | Fujifilm Corporation | 被乾燥物の乾燥方法及び装置 |
EP1872943A2 (en) | 1999-05-21 | 2008-01-02 | FUJIFILM Corporation | Photosensitive composition and planographic printing plate base using same |
EP1925447A1 (en) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Image forming material |
EP2036721A1 (en) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042310A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042305A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042308A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042306A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor and method of producing a copolymer used therein |
EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
WO2009063824A1 (ja) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | 塗布膜の乾燥方法及び平版印刷版原版の製造方法 |
EP2105690A2 (en) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Method and apparatus for drying |
EP2106907A2 (en) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2161129A2 (en) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Photosensitive lithographic printing plate precursor for infrared laser |
EP2236293A2 (en) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Lithographic printing plate precursor |
WO2011037005A1 (ja) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | 平版印刷版原版 |
EP2357530A2 (en) | 2010-02-17 | 2011-08-17 | Fujifilm Corporation | Method for producing a planographic printing plate |
WO2011102485A1 (ja) | 2010-02-19 | 2011-08-25 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
WO2011125913A1 (ja) | 2010-03-31 | 2011-10-13 | 富士フイルム株式会社 | 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法 |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP2641738A2 (en) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Method of producing planographic printing plate and planographic printing plate |
EP2644379A1 (en) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Method of producing a planographic printing plate |
Families Citing this family (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2005855A (en) * | 1977-10-03 | 1979-04-25 | Polychrome Corp | Lithographic imaging composition having improved image visibility |
JPS6053300B2 (ja) * | 1978-08-29 | 1985-11-25 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
DE3039926A1 (de) * | 1980-10-23 | 1982-05-27 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
US4350753A (en) * | 1981-06-15 | 1982-09-21 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff |
US4348471A (en) * | 1981-06-15 | 1982-09-07 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff |
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
JPS59148784A (ja) * | 1983-02-10 | 1984-08-25 | Konishiroku Photo Ind Co Ltd | 5―置換―2―ハロメチル―1,3,4―オキサジアゾール化合物及び該化合物を含有する光反応開始剤 |
DE3473359D1 (de) * | 1983-06-29 | 1988-09-15 | Fuji Photo Film Co Ltd | Photosolubilizable composition |
US4758497A (en) * | 1985-08-22 | 1988-07-19 | Polychrome Corporation | Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds |
JPH0766185B2 (ja) * | 1985-09-09 | 1995-07-19 | 富士写真フイルム株式会社 | 感光性組成物 |
NL8601096A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak. |
JPS6358440A (ja) * | 1986-08-29 | 1988-03-14 | Fuji Photo Film Co Ltd | 感光性組成物 |
DE3727443A1 (de) * | 1987-08-18 | 1989-03-02 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes kopiermaterial |
JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
JPH01229003A (ja) * | 1988-03-09 | 1989-09-12 | Fuji Photo Film Co Ltd | 光重合性組成物 |
CA2034623A1 (en) * | 1990-02-16 | 1991-08-17 | Ming Tara | Photoimageable compositions containing fugitive colorants |
CA2085868A1 (en) * | 1991-12-25 | 1993-06-26 | Mitsubishi Chemical Corporation | Photosensitive composition |
US5529885A (en) * | 1993-06-04 | 1996-06-25 | Mitsubishi Chemical Corporation | Negative photosensitive composition and method for forming patterns using the composition |
EP0672954B1 (en) * | 1994-03-14 | 1999-09-15 | Kodak Polychrome Graphics LLC | Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates |
JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
JP3506295B2 (ja) * | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
TW466382B (en) * | 1997-11-17 | 2001-12-01 | Sumitomo Chemical Co | A method for forming a resist pattern and a positive resist composition used for the same |
JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
JP4570857B2 (ja) | 2003-03-31 | 2010-10-27 | 富士フイルム株式会社 | 感光性組成物及び平版印刷版原版 |
JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
US20080311524A1 (en) * | 2004-07-08 | 2008-12-18 | Agfa Graphics N.V. | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor |
EP1701213A3 (en) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
JP5276264B2 (ja) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
EP1952998B1 (en) | 2007-02-01 | 2011-04-06 | FUJIFILM Corporation | Ink-jet recording device |
US8541063B2 (en) | 2007-02-06 | 2013-09-24 | Fujifilm Corporation | Undercoat solution, ink-jet recording method and ink-jet recording device |
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US20090214797A1 (en) | 2008-02-25 | 2009-08-27 | Fujifilm Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
JP5583329B2 (ja) | 2008-03-11 | 2014-09-03 | 富士フイルム株式会社 | 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体 |
JP4914862B2 (ja) | 2008-03-26 | 2012-04-11 | 富士フイルム株式会社 | インクジェット記録方法、及び、インクジェット記録装置 |
JP5414367B2 (ja) | 2008-06-02 | 2014-02-12 | 富士フイルム株式会社 | 顔料分散物及びそれを用いたインク組成物 |
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JP5980702B2 (ja) | 2013-03-07 | 2016-08-31 | 富士フイルム株式会社 | インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法 |
JP5939644B2 (ja) | 2013-08-30 | 2016-06-22 | 富士フイルム株式会社 | 画像形成方法、インモールド成型品の製造方法、及び、インクセット |
KR102659284B1 (ko) * | 2017-02-16 | 2024-04-19 | 에이치엘만도 주식회사 | 브레이크 시스템용 액압 발생 장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4836281A (ja) * | 1971-09-03 | 1973-05-28 | ||
JPS5036209A (ja) * | 1973-06-20 | 1975-04-05 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE510563A (ja) * | 1949-07-23 | |||
BE508664A (ja) * | 1951-02-02 | |||
DE1447592A1 (de) * | 1964-12-24 | 1969-02-13 | Agfa Gevaert Ag | Lichtvernetzbare Schichten |
DE1668358C3 (de) * | 1968-01-17 | 1980-04-03 | Hoechst Ag, 6000 Frankfurt | 6-Phenyl- a -Pyrone als Absorptionsmittel für UV-Strahlung |
US3779761A (en) * | 1972-01-17 | 1973-12-18 | Minnesota Mining & Mfg | Presensitized light-sensitive letterpress printing makeready |
US3775113A (en) * | 1972-02-09 | 1973-11-27 | Minnesota Mining & Mfg | Positive image transfer |
US4009033A (en) * | 1975-09-22 | 1977-02-22 | International Business Machines Corporation | High speed positive photoresist composition |
-
1976
- 1976-09-13 DE DE2641100A patent/DE2641100C2/de not_active Expired
-
1977
- 1977-09-08 CH CH1103177A patent/CH628446A5/de not_active IP Right Cessation
- 1977-09-09 US US05/831,935 patent/US4160671A/en not_active Expired - Lifetime
- 1977-09-09 CA CA286,370A patent/CA1094379A/en not_active Expired
- 1977-09-09 NL NL7709936A patent/NL7709936A/xx not_active Application Discontinuation
- 1977-09-09 AU AU28686/77A patent/AU515457B2/en not_active Expired
- 1977-09-09 SE SE7710118A patent/SE417873B/xx unknown
- 1977-09-12 GB GB37897/77A patent/GB1591113A/en not_active Expired
- 1977-09-12 BE BE180844A patent/BE858621A/xx not_active IP Right Cessation
- 1977-09-12 JP JP52109779A patent/JPS6046700B2/ja not_active Expired
- 1977-09-12 AT AT656477A patent/AT354477B/de active
- 1977-09-12 BR BR7706068A patent/BR7706068A/pt unknown
- 1977-09-12 FR FR7727435A patent/FR2364489A1/fr active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4836281A (ja) * | 1971-09-03 | 1973-05-28 | ||
JPS5036209A (ja) * | 1973-06-20 | 1975-04-05 |
Cited By (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0128369B2 (ja) * | 1979-03-22 | 1989-06-02 | Fuji Photo Film Co Ltd | |
JPS55126235A (en) * | 1979-03-22 | 1980-09-29 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS58211141A (ja) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | ネガ型感光性平版印刷版 |
JPS6088942A (ja) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH042179B2 (ja) * | 1983-10-21 | 1992-01-16 | ||
JPS6144472U (ja) * | 1984-08-27 | 1986-03-24 | 住友重機械工業株式会社 | 吊上げ電磁石 |
JPS62134649A (ja) * | 1985-12-09 | 1987-06-17 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版材料 |
JPS62276536A (ja) * | 1986-05-26 | 1987-12-01 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
JPS63311247A (ja) * | 1987-06-12 | 1988-12-20 | Konica Corp | 感光性組成物 |
JPH01108543A (ja) * | 1987-10-22 | 1989-04-25 | Fuji Photo Film Co Ltd | パターン形成方法 |
EP0410606A2 (en) | 1989-07-12 | 1991-01-30 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
EP1872943A2 (en) | 1999-05-21 | 2008-01-02 | FUJIFILM Corporation | Photosensitive composition and planographic printing plate base using same |
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Also Published As
Publication number | Publication date |
---|---|
AT354477B (de) | 1979-01-10 |
AU2868677A (en) | 1979-03-15 |
DE2641100C2 (de) | 1987-02-26 |
DE2641100A1 (de) | 1978-03-16 |
BR7706068A (pt) | 1978-07-04 |
GB1591113A (en) | 1981-06-17 |
CA1094379A (en) | 1981-01-27 |
JPS6046700B2 (ja) | 1985-10-17 |
BE858621A (fr) | 1978-03-13 |
SE417873B (sv) | 1981-04-13 |
US4160671A (en) | 1979-07-10 |
SE7710118L (sv) | 1978-03-14 |
CH628446A5 (de) | 1982-02-26 |
AU515457B2 (en) | 1981-04-02 |
FR2364489A1 (fr) | 1978-04-07 |
ATA656477A (de) | 1979-06-15 |
NL7709936A (nl) | 1978-03-15 |
FR2364489B1 (ja) | 1983-03-11 |
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