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JPS5336223A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5336223A
JPS5336223A JP10977977A JP10977977A JPS5336223A JP S5336223 A JPS5336223 A JP S5336223A JP 10977977 A JP10977977 A JP 10977977A JP 10977977 A JP10977977 A JP 10977977A JP S5336223 A JPS5336223 A JP S5336223A
Authority
JP
Japan
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10977977A
Other languages
English (en)
Other versions
JPS6046700B2 (ja
Inventor
Shiyutaaruhoofuen Pauru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5336223A publication Critical patent/JPS5336223A/ja
Publication of JPS6046700B2 publication Critical patent/JPS6046700B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP52109779A 1976-09-13 1977-09-12 感光性組成物 Expired JPS6046700B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2641100.7 1976-09-13
DE2641100A DE2641100C2 (de) 1976-09-13 1976-09-13 Lichtempfindliches Gemisch

Publications (2)

Publication Number Publication Date
JPS5336223A true JPS5336223A (en) 1978-04-04
JPS6046700B2 JPS6046700B2 (ja) 1985-10-17

Family

ID=5987764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52109779A Expired JPS6046700B2 (ja) 1976-09-13 1977-09-12 感光性組成物

Country Status (13)

Country Link
US (1) US4160671A (ja)
JP (1) JPS6046700B2 (ja)
AT (1) AT354477B (ja)
AU (1) AU515457B2 (ja)
BE (1) BE858621A (ja)
BR (1) BR7706068A (ja)
CA (1) CA1094379A (ja)
CH (1) CH628446A5 (ja)
DE (1) DE2641100C2 (ja)
FR (1) FR2364489A1 (ja)
GB (1) GB1591113A (ja)
NL (1) NL7709936A (ja)
SE (1) SE417873B (ja)

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
JPS6088942A (ja) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS6144472U (ja) * 1984-08-27 1986-03-24 住友重機械工業株式会社 吊上げ電磁石
JPS62134649A (ja) * 1985-12-09 1987-06-17 Konishiroku Photo Ind Co Ltd 感光性平版印刷版材料
JPS62276536A (ja) * 1986-05-26 1987-12-01 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPS63311247A (ja) * 1987-06-12 1988-12-20 Konica Corp 感光性組成物
JPH01108543A (ja) * 1987-10-22 1989-04-25 Fuji Photo Film Co Ltd パターン形成方法
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition
EP1627732A1 (en) 2004-08-18 2006-02-22 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
WO2007136005A1 (ja) 2006-05-18 2007-11-29 Fujifilm Corporation 被乾燥物の乾燥方法及び装置
EP1872943A2 (en) 1999-05-21 2008-01-02 FUJIFILM Corporation Photosensitive composition and planographic printing plate base using same
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2357530A2 (en) 2010-02-17 2011-08-17 Fujifilm Corporation Method for producing a planographic printing plate
WO2011102485A1 (ja) 2010-02-19 2011-08-25 富士フイルム株式会社 平版印刷版の作製方法
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2005855A (en) * 1977-10-03 1979-04-25 Polychrome Corp Lithographic imaging composition having improved image visibility
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
US4350753A (en) * 1981-06-15 1982-09-21 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
US4348471A (en) * 1981-06-15 1982-09-07 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd 5―置換―2―ハロメチル―1,3,4―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
DE3473359D1 (de) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd Photosolubilizable composition
US4758497A (en) * 1985-08-22 1988-07-19 Polychrome Corporation Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds
JPH0766185B2 (ja) * 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
JPS6358440A (ja) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd 感光性組成物
DE3727443A1 (de) * 1987-08-18 1989-03-02 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes kopiermaterial
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
JPH01229003A (ja) * 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
CA2034623A1 (en) * 1990-02-16 1991-08-17 Ming Tara Photoimageable compositions containing fugitive colorants
CA2085868A1 (en) * 1991-12-25 1993-06-26 Mitsubishi Chemical Corporation Photosensitive composition
US5529885A (en) * 1993-06-04 1996-06-25 Mitsubishi Chemical Corporation Negative photosensitive composition and method for forming patterns using the composition
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
JP3506295B2 (ja) * 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
TW466382B (en) * 1997-11-17 2001-12-01 Sumitomo Chemical Co A method for forming a resist pattern and a positive resist composition used for the same
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
JP4570857B2 (ja) 2003-03-31 2010-10-27 富士フイルム株式会社 感光性組成物及び平版印刷版原版
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
US20080311524A1 (en) * 2004-07-08 2008-12-18 Agfa Graphics N.V. Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
EP1952998B1 (en) 2007-02-01 2011-04-06 FUJIFILM Corporation Ink-jet recording device
US8541063B2 (en) 2007-02-06 2013-09-24 Fujifilm Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
DE602008006279D1 (de) 2007-02-07 2011-06-01 Fujifilm Corp Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf
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JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
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JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
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US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
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KR102659284B1 (ko) * 2017-02-16 2024-04-19 에이치엘만도 주식회사 브레이크 시스템용 액압 발생 장치

Citations (2)

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JPS4836281A (ja) * 1971-09-03 1973-05-28
JPS5036209A (ja) * 1973-06-20 1975-04-05

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Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0128369B2 (ja) * 1979-03-22 1989-06-02 Fuji Photo Film Co Ltd
JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS58211141A (ja) * 1982-06-02 1983-12-08 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
JPS6088942A (ja) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPH042179B2 (ja) * 1983-10-21 1992-01-16
JPS6144472U (ja) * 1984-08-27 1986-03-24 住友重機械工業株式会社 吊上げ電磁石
JPS62134649A (ja) * 1985-12-09 1987-06-17 Konishiroku Photo Ind Co Ltd 感光性平版印刷版材料
JPS62276536A (ja) * 1986-05-26 1987-12-01 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPS63311247A (ja) * 1987-06-12 1988-12-20 Konica Corp 感光性組成物
JPH01108543A (ja) * 1987-10-22 1989-04-25 Fuji Photo Film Co Ltd パターン形成方法
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP1314552A2 (en) 1998-04-06 2003-05-28 Fuji Photo Film Co., Ltd. Photosensitive resin composition
EP1872943A2 (en) 1999-05-21 2008-01-02 FUJIFILM Corporation Photosensitive composition and planographic printing plate base using same
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
EP1627732A1 (en) 2004-08-18 2006-02-22 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
WO2007136005A1 (ja) 2006-05-18 2007-11-29 Fujifilm Corporation 被乾燥物の乾燥方法及び装置
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2357530A2 (en) 2010-02-17 2011-08-17 Fujifilm Corporation Method for producing a planographic printing plate
WO2011102485A1 (ja) 2010-02-19 2011-08-25 富士フイルム株式会社 平版印刷版の作製方法
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Also Published As

Publication number Publication date
AT354477B (de) 1979-01-10
AU2868677A (en) 1979-03-15
DE2641100C2 (de) 1987-02-26
DE2641100A1 (de) 1978-03-16
BR7706068A (pt) 1978-07-04
GB1591113A (en) 1981-06-17
CA1094379A (en) 1981-01-27
JPS6046700B2 (ja) 1985-10-17
BE858621A (fr) 1978-03-13
SE417873B (sv) 1981-04-13
US4160671A (en) 1979-07-10
SE7710118L (sv) 1978-03-14
CH628446A5 (de) 1982-02-26
AU515457B2 (en) 1981-04-02
FR2364489A1 (fr) 1978-04-07
ATA656477A (de) 1979-06-15
NL7709936A (nl) 1978-03-15
FR2364489B1 (ja) 1983-03-11

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