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JPS53127723A - Image formation method - Google Patents

Image formation method

Info

Publication number
JPS53127723A
JPS53127723A JP4147177A JP4147177A JPS53127723A JP S53127723 A JPS53127723 A JP S53127723A JP 4147177 A JP4147177 A JP 4147177A JP 4147177 A JP4147177 A JP 4147177A JP S53127723 A JPS53127723 A JP S53127723A
Authority
JP
Japan
Prior art keywords
image formation
formation method
light irradiation
chemical reaction
prevent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4147177A
Other languages
Japanese (ja)
Other versions
JPS5946380B2 (en
Inventor
Atsushi Saiki
Saburo Nonogaki
Takahiro Kobashi
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52041471A priority Critical patent/JPS5946380B2/en
Publication of JPS53127723A publication Critical patent/JPS53127723A/en
Publication of JPS5946380B2 publication Critical patent/JPS5946380B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent a heat resistant polymer for use in semiconductive elements, or the like from producing corrosive ions, by adding an aromatic bisazide compound to a specified polyamide-acid polymer, and by causing chemical reaction due to light irradiation.
COPYRIGHT: (C)1978,JPO&Japio
JP52041471A 1977-04-13 1977-04-13 How to form an image Expired JPS5946380B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52041471A JPS5946380B2 (en) 1977-04-13 1977-04-13 How to form an image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52041471A JPS5946380B2 (en) 1977-04-13 1977-04-13 How to form an image

Publications (2)

Publication Number Publication Date
JPS53127723A true JPS53127723A (en) 1978-11-08
JPS5946380B2 JPS5946380B2 (en) 1984-11-12

Family

ID=12609270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52041471A Expired JPS5946380B2 (en) 1977-04-13 1977-04-13 How to form an image

Country Status (1)

Country Link
JP (1) JPS5946380B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622428A (en) * 1979-08-01 1981-03-03 Toray Ind Inc Polyimide pattern forming method
JPS5635131A (en) * 1979-08-21 1981-04-07 Siemens Ag Producing high heattstability relief structure
JPS58191747A (en) * 1982-04-21 1983-11-09 チバ−ガイギ−・アクチエンゲゼルシヤフト Radiation ray sensitive painting agent and use
JPS59100135A (en) * 1982-11-30 1984-06-09 Japan Synthetic Rubber Co Ltd Resin composition
JPS6026033A (en) * 1983-07-01 1985-02-08 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Photosensitive polyamide acid derivative and method of forming polyimide pattern on substrate therewith
JPS60100143A (en) * 1983-08-29 1985-06-04 マイクロサイ，インコーポレイテッド Optically patternizable dielectric composition and method ofmanufacturing and using same
JPS60198537A (en) * 1984-01-24 1985-10-08 ゼネラル・エレクトリツク・カンパニイ Photopatternable dielectric composition and methods of manufacturing and using the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622428A (en) * 1979-08-01 1981-03-03 Toray Ind Inc Polyimide pattern forming method
JPS5635131A (en) * 1979-08-21 1981-04-07 Siemens Ag Producing high heattstability relief structure
JPH0368374B2 (en) * 1979-08-21 1991-10-28 Siemens Ag
JPS58191747A (en) * 1982-04-21 1983-11-09 チバ−ガイギ−・アクチエンゲゼルシヤフト Radiation ray sensitive painting agent and use
JPH0553834B2 (en) * 1982-04-21 1993-08-11 Ciba Geigy
JPS59100135A (en) * 1982-11-30 1984-06-09 Japan Synthetic Rubber Co Ltd Resin composition
JPH0350787B2 (en) * 1982-11-30 1991-08-02 Japan Synthetic Rubber Co Ltd
JPS6026033A (en) * 1983-07-01 1985-02-08 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Photosensitive polyamide acid derivative and method of forming polyimide pattern on substrate therewith
JPS60100143A (en) * 1983-08-29 1985-06-04 マイクロサイ，インコーポレイテッド Optically patternizable dielectric composition and method ofmanufacturing and using same
JPS60198537A (en) * 1984-01-24 1985-10-08 ゼネラル・エレクトリツク・カンパニイ Photopatternable dielectric composition and methods of manufacturing and using the same

Also Published As

Publication number Publication date
JPS5946380B2 (en) 1984-11-12

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