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JPS5251874A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5251874A
JPS5251874A JP12714675A JP12714675A JPS5251874A JP S5251874 A JPS5251874 A JP S5251874A JP 12714675 A JP12714675 A JP 12714675A JP 12714675 A JP12714675 A JP 12714675A JP S5251874 A JPS5251874 A JP S5251874A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
electron beams
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12714675A
Other languages
Japanese (ja)
Inventor
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP12714675A priority Critical patent/JPS5251874A/en
Publication of JPS5251874A publication Critical patent/JPS5251874A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To adjust the relations in position between electron beams and the position mark on target surface and accurately align their positions by using the electron beams passed through the small holes of a pattern mask and adjusting mask.
COPYRIGHT: (C)1977,JPO&Japio
JP12714675A 1975-10-22 1975-10-22 Electron beam exposure device Pending JPS5251874A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12714675A JPS5251874A (en) 1975-10-22 1975-10-22 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12714675A JPS5251874A (en) 1975-10-22 1975-10-22 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5251874A true JPS5251874A (en) 1977-04-26

Family

ID=14952744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12714675A Pending JPS5251874A (en) 1975-10-22 1975-10-22 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5251874A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638475A (en) * 1979-09-05 1981-04-13 Fujitsu Ltd Fabrication of photomask
JPS6236820A (en) * 1985-08-12 1987-02-17 Canon Inc Alignment device and its mask
JPH01243422A (en) * 1988-03-25 1989-09-28 Hitachi Ltd Arbitrary figure exposing method
JPH04177348A (en) * 1990-11-13 1992-06-24 Nec Yamaguchi Ltd Reticule for reduction projection aligner
JPH055981A (en) * 1991-06-27 1993-01-14 Ushio Inc Method for measuring accuracy of mask in film exposing device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638475A (en) * 1979-09-05 1981-04-13 Fujitsu Ltd Fabrication of photomask
JPS636862B2 (en) * 1979-09-05 1988-02-12 Fujitsu Ltd
JPS6236820A (en) * 1985-08-12 1987-02-17 Canon Inc Alignment device and its mask
JPH01243422A (en) * 1988-03-25 1989-09-28 Hitachi Ltd Arbitrary figure exposing method
JPH04177348A (en) * 1990-11-13 1992-06-24 Nec Yamaguchi Ltd Reticule for reduction projection aligner
JPH055981A (en) * 1991-06-27 1993-01-14 Ushio Inc Method for measuring accuracy of mask in film exposing device

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