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JPS5220294A - Method of and apparatus for manufacturing compound thin film - Google Patents

Method of and apparatus for manufacturing compound thin film

Info

Publication number
JPS5220294A
JPS5220294A JP9693275A JP9693275A JPS5220294A JP S5220294 A JPS5220294 A JP S5220294A JP 9693275 A JP9693275 A JP 9693275A JP 9693275 A JP9693275 A JP 9693275A JP S5220294 A JPS5220294 A JP S5220294A
Authority
JP
Japan
Prior art keywords
thin film
compound thin
manufacturing compound
manufacturing
subject
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9693275A
Other languages
Japanese (ja)
Inventor
Yasuhiro Shimizu
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9693275A priority Critical patent/JPS5220294A/en
Publication of JPS5220294A publication Critical patent/JPS5220294A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:To provide a means for compound thin film, which is stable over a long period of time and is subject to less fluctuations.
JP9693275A 1975-08-08 1975-08-08 Method of and apparatus for manufacturing compound thin film Pending JPS5220294A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9693275A JPS5220294A (en) 1975-08-08 1975-08-08 Method of and apparatus for manufacturing compound thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9693275A JPS5220294A (en) 1975-08-08 1975-08-08 Method of and apparatus for manufacturing compound thin film

Publications (1)

Publication Number Publication Date
JPS5220294A true JPS5220294A (en) 1977-02-16

Family

ID=14178106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9693275A Pending JPS5220294A (en) 1975-08-08 1975-08-08 Method of and apparatus for manufacturing compound thin film

Country Status (1)

Country Link
JP (1) JPS5220294A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55133703A (en) * 1979-04-06 1980-10-17 Nippon Electric Co Method of producing transparent conductive film
US5039376A (en) * 1989-09-19 1991-08-13 Stefan Zukotynski Method and apparatus for the plasma etching, substrate cleaning, or deposition of materials by D.C. glow discharge

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55133703A (en) * 1979-04-06 1980-10-17 Nippon Electric Co Method of producing transparent conductive film
US5039376A (en) * 1989-09-19 1991-08-13 Stefan Zukotynski Method and apparatus for the plasma etching, substrate cleaning, or deposition of materials by D.C. glow discharge

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