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JPS52143769A - Removing method of positive type photo resist - Google Patents

Removing method of positive type photo resist

Info

Publication number
JPS52143769A
JPS52143769A JP6001376A JP6001376A JPS52143769A JP S52143769 A JPS52143769 A JP S52143769A JP 6001376 A JP6001376 A JP 6001376A JP 6001376 A JP6001376 A JP 6001376A JP S52143769 A JPS52143769 A JP S52143769A
Authority
JP
Japan
Prior art keywords
positive type
type photo
photo resist
removing method
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6001376A
Other languages
Japanese (ja)
Inventor
Toshiharu Matsuzawa
Hiroshi Yanagisawa
Kikuo Doda
Nobuo Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6001376A priority Critical patent/JPS52143769A/en
Publication of JPS52143769A publication Critical patent/JPS52143769A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To remove resist simply and safely by developing positive type photo resist, then applying thereto ultraviolet exposure and using a basic solution.
COPYRIGHT: (C)1977,JPO&Japio
JP6001376A 1976-05-26 1976-05-26 Removing method of positive type photo resist Pending JPS52143769A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6001376A JPS52143769A (en) 1976-05-26 1976-05-26 Removing method of positive type photo resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6001376A JPS52143769A (en) 1976-05-26 1976-05-26 Removing method of positive type photo resist

Publications (1)

Publication Number Publication Date
JPS52143769A true JPS52143769A (en) 1977-11-30

Family

ID=13129747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6001376A Pending JPS52143769A (en) 1976-05-26 1976-05-26 Removing method of positive type photo resist

Country Status (1)

Country Link
JP (1) JPS52143769A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410248A (en) * 1987-07-03 1989-01-13 Fuji Xerox Co Ltd Method for removing resist in chrome photolithoetching
JPH0529127U (en) * 1991-09-24 1993-04-16 凸版印刷株式会社 Exposure system for positive resist stripping
WO1996024888A1 (en) * 1995-02-10 1996-08-15 Fujitsu Limited Resist pattern forming method
WO2022230910A1 (en) * 2021-04-30 2022-11-03 日東電工株式会社 Method for manufacturing wiring circuit board

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410248A (en) * 1987-07-03 1989-01-13 Fuji Xerox Co Ltd Method for removing resist in chrome photolithoetching
JPH0529127U (en) * 1991-09-24 1993-04-16 凸版印刷株式会社 Exposure system for positive resist stripping
WO1996024888A1 (en) * 1995-02-10 1996-08-15 Fujitsu Limited Resist pattern forming method
US5879851A (en) * 1995-02-10 1999-03-09 Fujitsu Limited Method for forming resist patterns by using an ammonium or morpholine compound as a developer
WO2022230910A1 (en) * 2021-04-30 2022-11-03 日東電工株式会社 Method for manufacturing wiring circuit board

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