JPS51137384A - Semi conductor device manufacturing method - Google Patents
Semi conductor device manufacturing methodInfo
- Publication number
- JPS51137384A JPS51137384A JP6108575A JP6108575A JPS51137384A JP S51137384 A JPS51137384 A JP S51137384A JP 6108575 A JP6108575 A JP 6108575A JP 6108575 A JP6108575 A JP 6108575A JP S51137384 A JPS51137384 A JP S51137384A
- Authority
- JP
- Japan
- Prior art keywords
- device manufacturing
- conductor device
- semi conductor
- manufacturing
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: A manufacturing method for MOS transistor having source or drain domain providing a suitable electric contact.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6108575A JPS51137384A (en) | 1975-05-23 | 1975-05-23 | Semi conductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6108575A JPS51137384A (en) | 1975-05-23 | 1975-05-23 | Semi conductor device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51137384A true JPS51137384A (en) | 1976-11-27 |
Family
ID=13160904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6108575A Pending JPS51137384A (en) | 1975-05-23 | 1975-05-23 | Semi conductor device manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51137384A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5574175A (en) * | 1978-11-29 | 1980-06-04 | Nec Corp | Preparing interpolation type mos semiconductor device |
JPS5756927A (en) * | 1981-07-28 | 1982-04-05 | Hitachi Ltd | Electrode structure for semiconductor device and manufacture thereof |
JPS592320A (en) * | 1982-06-28 | 1984-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5975669A (en) * | 1982-10-25 | 1984-04-28 | Seiko Epson Corp | Thin film semiconductor device and manufacture thereof |
JPS6187375A (en) * | 1985-10-18 | 1986-05-02 | Nec Corp | Manufacture of semiconductor device |
JPS61114524A (en) * | 1984-11-09 | 1986-06-02 | Nec Corp | Manufacture of semiconductor device |
JPH01103874A (en) * | 1988-05-20 | 1989-04-20 | Matsushita Electric Ind Co Ltd | Mos type semiconductor device and manufacture thereof |
JPH03101264A (en) * | 1990-05-07 | 1991-04-26 | Nec Corp | Manufacture of complementary field effect transistor |
JPH07106563A (en) * | 1994-04-15 | 1995-04-21 | Toshiba Corp | Manufacture of semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4911583A (en) * | 1972-06-01 | 1974-02-01 | ||
JPS49105490A (en) * | 1973-02-07 | 1974-10-05 |
-
1975
- 1975-05-23 JP JP6108575A patent/JPS51137384A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4911583A (en) * | 1972-06-01 | 1974-02-01 | ||
JPS49105490A (en) * | 1973-02-07 | 1974-10-05 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5574175A (en) * | 1978-11-29 | 1980-06-04 | Nec Corp | Preparing interpolation type mos semiconductor device |
JPH0127589B2 (en) * | 1978-11-29 | 1989-05-30 | Nippon Electric Co | |
JPS5756927A (en) * | 1981-07-28 | 1982-04-05 | Hitachi Ltd | Electrode structure for semiconductor device and manufacture thereof |
JPS592320A (en) * | 1982-06-28 | 1984-01-07 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5975669A (en) * | 1982-10-25 | 1984-04-28 | Seiko Epson Corp | Thin film semiconductor device and manufacture thereof |
JPS61114524A (en) * | 1984-11-09 | 1986-06-02 | Nec Corp | Manufacture of semiconductor device |
JPS6187375A (en) * | 1985-10-18 | 1986-05-02 | Nec Corp | Manufacture of semiconductor device |
JPH01103874A (en) * | 1988-05-20 | 1989-04-20 | Matsushita Electric Ind Co Ltd | Mos type semiconductor device and manufacture thereof |
JPH0618214B2 (en) * | 1988-05-20 | 1994-03-09 | 松下電器産業株式会社 | Method for manufacturing MOS semiconductor device |
JPH03101264A (en) * | 1990-05-07 | 1991-04-26 | Nec Corp | Manufacture of complementary field effect transistor |
JPH07106563A (en) * | 1994-04-15 | 1995-04-21 | Toshiba Corp | Manufacture of semiconductor device |
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