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JPS51129190A - Manufacturing method of semiconductor - Google Patents

Manufacturing method of semiconductor

Info

Publication number
JPS51129190A
JPS51129190A JP5373075A JP5373075A JPS51129190A JP S51129190 A JPS51129190 A JP S51129190A JP 5373075 A JP5373075 A JP 5373075A JP 5373075 A JP5373075 A JP 5373075A JP S51129190 A JPS51129190 A JP S51129190A
Authority
JP
Japan
Prior art keywords
semiconductor
manufacturing
shiftresister
pohto
partitional
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5373075A
Other languages
Japanese (ja)
Inventor
Masao Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5373075A priority Critical patent/JPS51129190A/en
Publication of JPS51129190A publication Critical patent/JPS51129190A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent disconnection by painting the plural kinds of pohto resister which have different residual membrane characteristics as a poly stratum, and developing after exposuring through a mask, and desired reshaping of partitional vertical section of which shiftresister is selectively removed.
COPYRIGHT: (C)1976,JPO&Japio
JP5373075A 1975-05-02 1975-05-02 Manufacturing method of semiconductor Pending JPS51129190A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5373075A JPS51129190A (en) 1975-05-02 1975-05-02 Manufacturing method of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5373075A JPS51129190A (en) 1975-05-02 1975-05-02 Manufacturing method of semiconductor

Publications (1)

Publication Number Publication Date
JPS51129190A true JPS51129190A (en) 1976-11-10

Family

ID=12950934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5373075A Pending JPS51129190A (en) 1975-05-02 1975-05-02 Manufacturing method of semiconductor

Country Status (1)

Country Link
JP (1) JPS51129190A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5623746A (en) * 1979-08-01 1981-03-06 Matsushita Electronics Corp Manufacture of semiconductor device
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
JPS5691428A (en) * 1979-11-27 1981-07-24 Western Electric Co Composite resist and method of forming pattern in composite resist
JPS57118641A (en) * 1981-01-16 1982-07-23 Matsushita Electronics Corp Lifting-off method
JPS58171818A (en) * 1982-03-31 1983-10-08 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing semiconductor device
JPS58218119A (en) * 1982-06-14 1983-12-19 Hitachi Ltd Pattern forming method
JPS59155932A (en) * 1983-02-25 1984-09-05 Mitsubishi Electric Corp Forming method of minute pattern
US5273328A (en) * 1990-09-27 1993-12-28 Nifco Inc. Lock mechanism and latch device
US5292158A (en) * 1990-09-27 1994-03-08 Nifco, Inc. Lock mechanism and latch device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5623746A (en) * 1979-08-01 1981-03-06 Matsushita Electronics Corp Manufacture of semiconductor device
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
JPS5691428A (en) * 1979-11-27 1981-07-24 Western Electric Co Composite resist and method of forming pattern in composite resist
JPH0468769B2 (en) * 1979-11-27 1992-11-04 Ei Teii Ando Teii Tekunorojiizu Inc
JPS57118641A (en) * 1981-01-16 1982-07-23 Matsushita Electronics Corp Lifting-off method
JPS58171818A (en) * 1982-03-31 1983-10-08 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing semiconductor device
JPH0419697B2 (en) * 1982-03-31 1992-03-31 Matsushita Electric Ind Co Ltd
JPS58218119A (en) * 1982-06-14 1983-12-19 Hitachi Ltd Pattern forming method
JPS59155932A (en) * 1983-02-25 1984-09-05 Mitsubishi Electric Corp Forming method of minute pattern
US5273328A (en) * 1990-09-27 1993-12-28 Nifco Inc. Lock mechanism and latch device
US5292158A (en) * 1990-09-27 1994-03-08 Nifco, Inc. Lock mechanism and latch device

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