JPS50150501A - - Google Patents
Info
- Publication number
- JPS50150501A JPS50150501A JP5827074A JP5827074A JPS50150501A JP S50150501 A JPS50150501 A JP S50150501A JP 5827074 A JP5827074 A JP 5827074A JP 5827074 A JP5827074 A JP 5827074A JP S50150501 A JPS50150501 A JP S50150501A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5827074A JPS50150501A (de) | 1974-05-23 | 1974-05-23 | |
DE19752522784 DE2522784A1 (de) | 1974-05-23 | 1975-05-22 | Lichtempfindliche druckplatte |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5827074A JPS50150501A (de) | 1974-05-23 | 1974-05-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50150501A true JPS50150501A (de) | 1975-12-03 |
Family
ID=13079473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5827074A Pending JPS50150501A (de) | 1974-05-23 | 1974-05-23 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS50150501A (de) |
DE (1) | DE2522784A1 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5619055A (en) * | 1979-06-01 | 1981-02-23 | Hoechst Co American | Proof sheet having increased exposure speed |
JPS59177544A (ja) * | 1983-03-29 | 1984-10-08 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5506090A (en) * | 1994-09-23 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Process for making shoot and run printing plates |
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1974
- 1974-05-23 JP JP5827074A patent/JPS50150501A/ja active Pending
-
1975
- 1975-05-22 DE DE19752522784 patent/DE2522784A1/de active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5619055A (en) * | 1979-06-01 | 1981-02-23 | Hoechst Co American | Proof sheet having increased exposure speed |
JPH0146860B2 (de) * | 1979-06-01 | 1989-10-11 | Hoechst Celanese Corp | |
JPS59177544A (ja) * | 1983-03-29 | 1984-10-08 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
JPH0368378B2 (de) * | 1983-03-29 | 1991-10-28 | Nippon Synthetic Chem Ind | |
US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
Also Published As
Publication number | Publication date |
---|---|
DE2522784A1 (de) | 1975-12-04 |