JPS5950435U

JPS5950435U - CVD equipment

Info

Publication number: JPS5950435U
Application number: JP14472382U
Authority: JP
Inventors: 「よし」丸　正樹
Original assignee: 沖電気工業株式会社
Priority date: 1982-09-27
Filing date: 1982-09-27
Publication date: 1984-04-03

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of the drawing]

第１図は従来の減圧ＣＶＤ装置の断面図、第２図は従来
の減圧ＣＶＤ装置の正面図、第３図は従来およびこの考
案のＣＶＤ装置のウェハ間膜厚分布を対比して示す図、
第４図は従来およびこの考案のＣＶＤ装置の代表的ウェ
ハ内膜厚分布を示す図、第５図はこの考案のＣＶＤ装置
の一実施例の構成を示す断面図、第６図はこの考案のＣ
ＶＤ装置の正面図、第７図は同上ＣＶＤ装置の外観斜視
図、第８図はこの考案のＣＶＤ装置の他の実施例の構成
を示す断面図、第９図は同上他の実施例の正面図である
。２１・・・円筒形反応管、２２・・・ウェハ、２３・・
・ボート、２４・・・ガス導入口、２５・・・ガス排気
口、２６・・・発光体、２７・・・扉。（−円箇升′３反凪Ｖ車自方向−ノ２．６ −２′３凰第７図第９図FIG. 1 is a cross-sectional view of a conventional low-pressure CVD device, FIG. 2 is a front view of a conventional low-pressure CVD device, and FIG. 3 is a diagram showing a comparison of the inter-wafer film thickness distribution of the conventional and inventive CVD devices.
FIG. 4 is a diagram showing typical intra-wafer film thickness distributions of conventional and inventive CVD apparatuses, FIG. 5 is a sectional view showing the configuration of an embodiment of the inventive CVD apparatus, and FIG. 6 is an inventive one. C
A front view of the VD device, FIG. 7 is an external perspective view of the same CVD device, FIG. 8 is a sectional view showing the configuration of another embodiment of the CVD device of this invention, and FIG. 9 is a front view of another embodiment of the same. It is a diagram. 21... Cylindrical reaction tube, 22... Wafer, 23...
- Boat, 24...Gas inlet, 25...Gas exhaust port, 26...Light emitter, 27...Door. (-Yen kasho'3 anti-nagi V vehicle's own direction-ノ2.6 -2'3 凰Fig. 7 Fig. 9

Claims

[Scope of utility model registration request]

(1) A cylindrical reaction tube, a gas inlet that is installed perpendicular to the axis of the cylindrical reaction tube and is made of a row of slits or a large number of small holes parallel to this axis, and the gas inlet A gas exhaust port which is provided in the cylindrical reaction tube and consists of a slit or a row of many small holes that are parallel to the axis; A CVD apparatus comprising a boat on which the wafer is placed parallel to a line connecting the ports, and a light emitter placed on the outer peripheral surface of the cylindrical reaction tube.

(2) The CVD according to claim 1 of the utility model registration claim, characterized in that the wafer is supported vertically on a boat.
Device.

(3) The CV according to claim 1 of the utility model registration claim, characterized in that the wafer is supported horizontally on a boat by a bed.
D device.