JPS5933679B2 - Anode plating equipment for strips - Google Patents
Anode plating equipment for stripsInfo
- Publication number
- JPS5933679B2 JPS5933679B2 JP9754481A JP9754481A JPS5933679B2 JP S5933679 B2 JPS5933679 B2 JP S5933679B2 JP 9754481 A JP9754481 A JP 9754481A JP 9754481 A JP9754481 A JP 9754481A JP S5933679 B2 JPS5933679 B2 JP S5933679B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- granular
- anodes
- strips
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】
本発明は走行するストリップに連続して電気メッキを施
すアノードメッキ装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an anode plating apparatus for continuously electroplating a traveling strip.
従来の水平型アノードメッキ装置は第1、2図に示すよ
うに、電解槽(図示省略)内にセットしたL字型をした
アノード支持台A、Aの傾斜した支持面B、B上に棒型
アノードCl、C2、・・・(30〜80に9/ケ)を
複数本乗せ、棒型アノードCl、C2、・・・上方にス
トリップDを位置させ、棒型アノードCl、C2、・・
・に(+)電流を流すことにより棒型アノードCl、C
2、・・・を溶解させて金属イオンとなし電解液を介し
てストリップDのメッキ面に電着させるようになつてい
る。As shown in Figures 1 and 2, a conventional horizontal anode plating apparatus has an L-shaped anode support A set in an electrolytic bath (not shown), an inclined support surface B of A, and a rod on B. A plurality of rod-type anodes Cl, C2, .
・By applying a (+) current to the rod-shaped anodes Cl, C
2, . . . are dissolved to form metal ions, which are electrodeposited on the plated surface of the strip D via an electrolytic solution.
又、縦型アノードメッキ装置は、第3、4図に示すよう
に、逆L字形をしたアノード支持台Nに逆L字形の棒型
アノードC’1、C日・・・を複数個乗架し、棒型アノ
ードC?、C’2・・・の表面にストリップDを垂直方
向に位置させたもので、作用は水平型アノードメッキ装
置と同様である。Moreover, as shown in FIGS. 3 and 4, the vertical anode plating apparatus has a plurality of inverted L-shaped rod-shaped anodes C'1, C', etc. mounted on an inverted L-shaped anode support N. And rod-shaped anode C? , C'2, .
前記従来のアノードメッキ装置においては棒型アノード
Cl、・・・Clは溶解速度の差により、アノード厚さ
が違い被メッキ面とアノード面に図示のような凹凸が生
じるため不均一なメッキ厚を生じる。In the conventional anode plating apparatus, the rod-shaped anodes Cl,...Cl have different anode thicknesses due to the difference in dissolution rate, and unevenness as shown in the figure occurs on the plated surface and the anode surface, resulting in uneven plating thickness. arise.
又、運転中に棒型アノードを交換する際は、一本の棒型
アノードは30〜80に’もの重量を有するため、クレ
ーン等で吊る必要があり非常に作業性が悪かつた。本発
明は前記従来の欠点に鑑み、アノード補充を容易に行つ
て均一なメッキ厚を得ることができるストリップ用アノ
ードメッキ装置を提供するのが目的である。Furthermore, when replacing the rod-shaped anode during operation, since one rod-shaped anode weighs 30 to 80 mm, it is necessary to lift it with a crane or the like, resulting in very poor work efficiency. SUMMARY OF THE INVENTION In view of the above-mentioned drawbacks of the prior art, it is an object of the present invention to provide an anode plating apparatus for strips that can easily replenish the anode and obtain a uniform plating thickness.
本発明の構成を第5図乃至第1図に示す第1実施例に基
き詳細に説明すると、粒状アノード1を収納する密閉さ
れた断面方形をしたアノードタンク2のストリップD側
に格子3を有する開口部4を設け、この開口部4の内側
に電解液を自由に通す例えば布地、半透膜等から成る膜
5を固定している。The structure of the present invention will be explained in detail based on a first embodiment shown in FIGS. 5 to 1. A closed anode tank 2 having a rectangular cross section and containing a granular anode 1 has a grid 3 on the strip D side. An opening 4 is provided, and a membrane 5 made of, for example, cloth, a semipermeable membrane, etc., through which the electrolyte can freely pass, is fixed inside the opening 4.
アノードタンク2は外面にメッキに対して十分な耐食性
及び絶縁性を有するライニング(ゴム、合成樹脂等)を
施こし、内面に導電性のライニング(カーボン等)を施
こししてる。The anode tank 2 has a lining (rubber, synthetic resin, etc.) having sufficient corrosion resistance and insulation properties against plating on its outer surface, and a conductive lining (carbon, etc.) on its inner surface.
そして、上面両端には導入管6、6’を設け、両導入管
6、6’は絶縁体7、T’を介して分配支管8、8’に
接続されている。又、一方の導入管6には通電端子9を
固定している。前記のように構成したアノードタンク2
は電解僧10内に第□図に示すように、開口部4を対向
させて4個設置している。Introductory pipes 6, 6' are provided at both ends of the upper surface, and both introductory pipes 6, 6' are connected to distribution branch pipes 8, 8' via insulators 7, T'. Further, a current-carrying terminal 9 is fixed to one of the introduction tubes 6. Anode tank 2 configured as described above
As shown in Fig. □, four openings 4 are installed in the electrolyzer 10 so as to face each other.
そして、前記分配支管8,8′は一つの分配管11に夫
々接続し、合計4個の分配管11は一本の接続管12を
介してアノード貯蔵タンク13に接続されている。又、
電解槽10には上下にストリツプDを案内する複数個の
コンダクタロール14,・・・を配設している。The distribution branch pipes 8 and 8' are each connected to one distribution pipe 11, and a total of four distribution pipes 11 are connected to an anode storage tank 13 via one connection pipe 12. or,
The electrolytic cell 10 is provided with a plurality of conductor rolls 14, . . . for guiding the strip D upward and downward.
第1実施例は前記のように構成したもので、各通電端子
9に(+)電流を流すことによりアノードタンク2内の
粒状アノード1は電気化学的に溶解し、金属イオンとな
つて膜5を通過してストリツプDのメツキ面に電着する
。The first embodiment is constructed as described above, and when a (+) current is passed through each current-carrying terminal 9, the granular anode 1 in the anode tank 2 is electrochemically dissolved and becomes metal ions to form a film 5. It passes through and is electrodeposited on the plating surface of the strip D.
この粒状アノード1は電気化学的な溶解により次第に小
さくなつてやがて消滅する。This granular anode 1 gradually becomes smaller and disappears due to electrochemical dissolution.
溶解面の粒状アノード1は消滅の進行過程において、粒
子アノード1同志間に隙間が発生するが、この隙間の近
傍に位置した粒状アノード1が自重により隙間を埋め、
新たな粒状アノード1がアノード貯蔵タンク13から自
動的に供給され、隨時充填される。したがつて、被メツ
キ面とアノード面との極間は常時一定に保たれ、均一な
メツキ厚が得られる。次に第2実施例を第8図以下に示
す図面に基づき詳細に説明すると、本実施例は水平型ア
ノードメツキ装置である。アノードタンク2は底壁14
を中央に向つて傾斜した形状に形成し、4隔に支持脚1
5,・・・を設けている。During the process of dissolution of the granular anodes 1 on the melting surface, gaps are created between the granular anodes 1, but the granular anodes 1 located near these gaps fill the gaps with their own weight.
Fresh granular anode 1 is automatically supplied from the anode storage tank 13 and filled from time to time. Therefore, the distance between the surface to be plated and the anode surface is always kept constant, and a uniform plating thickness can be obtained. Next, the second embodiment will be explained in detail based on the drawings shown in FIG. 8 and below. This embodiment is a horizontal type anodizing apparatus. The anode tank 2 has a bottom wall 14
is formed in a shape that is inclined towards the center, and one support leg is placed at every four intervals.
5,... are provided.
そして上面両端には導人管6,6′を設け、絶縁体7,
7″を介して接続管12,1Zと連通し、図示を省略し
たアノード貯蔵タンク13,13に接続されている。ア
ノードタンク2内には第9図に示すように、夫々両側に
2個の軸受具16,16″を設けて攪拌羽根17,・・
・を多数固定した攪拌シヤフト18,18′を100〜
700の角度で傾斜させて軸支している。Conductor tubes 6, 6' are provided at both ends of the upper surface, and insulators 7,
7'' to connecting pipes 12 and 1Z, and are connected to anode storage tanks 13 and 13 (not shown).Inside the anode tank 2, as shown in FIG. Bearings 16, 16'' are provided and stirring blades 17,...
- Stirring shaft 18, 18' with a large number of fixed
It is pivoted at an angle of 700°.
両撹拌シヤフト18,18′はユニバーサルカツプリン
グ19,19′を介して導入管6,6′及び接続管12
,12′内に位置した垂直軸20,20″と接続されて
おり、垂直軸20,2σの上端はユニバーサルカツプリ
ング21,2Yを介して接続管12,12″外に設置し
た1駆動軸22,2Zと接続している。この駆動軸22
,2Zはカツプリング23,23′及び減速機24,2
1を介して駆動モータ25,25′で駆動される。他は
第1実施例と同様なので、同一符号を付し説明を省略す
る。Both stirring shafts 18, 18' are connected via universal couplings 19, 19' to the inlet pipes 6, 6' and the connecting pipe 12.
, 12', and the upper end of the vertical shaft 20,2σ is connected to the 1 drive shaft 22 installed outside the connecting pipe 12, 12' through a universal coupling 21, 2Y. , 2Z. This drive shaft 22
, 2Z are coupling rings 23, 23' and reducers 24, 2
1 by drive motors 25, 25'. Since the other parts are the same as those in the first embodiment, the same reference numerals are given and the explanation will be omitted.
第2実施例においては駆動モータ25,25′の駆動に
より攪拌シヤフト18,18′が回転し、粒状アノード
1はアノードボツクス2の中心方向に移動し、粒状アノ
ード間の隙間を埋め、被メツキ面と粒状アノード間の極
間を一定に保つしたがつて、第2実施例においては粒状
アノード1を強制的に攪拌移動させて、溶解して小さく
なつた粒状アノード同志間の隙間を確実に埋めて被メツ
キ面との極間を一定に保ち、どんな形の被メツキ面に対
しても均一なメツキ厚を得ることができる。In the second embodiment, the stirring shafts 18, 18' are rotated by the driving of the drive motors 25, 25', and the granular anodes 1 move toward the center of the anode box 2, filling the gaps between the granular anodes and displacing the surface to be plated. In order to maintain a constant distance between the granular anodes and the granular anodes, in the second embodiment, the granular anodes 1 are forcibly stirred and moved to reliably fill the gaps between the granular anodes that have become smaller due to melting. By keeping the distance between the electrodes and the surface to be plated constant, it is possible to obtain a uniform plating thickness for any shape of the surface to be plated.
本発明は前記実施例のような構成、作用を有するので、
粒状アノードを用いているので被メツキ面に対して一定
の距離を有するアノード溶解面に常に粒状アノードを位
置させることができ、均一なメツキ厚を得ることができ
る。Since the present invention has the configuration and operation as in the above embodiment,
Since a granular anode is used, the granular anode can always be positioned on the anode melting surface having a certain distance from the surface to be plated, and a uniform plating thickness can be obtained.
又、粒状アノードは自動的にアノード溶解面に供給する
ことができるので、非常に能率的であり、従来のように
アノードを交換する必要がないので非常に便利である。Also, the granular anode can be automatically fed to the anode melting surface, which is very efficient, and it is very convenient because there is no need to replace the anode as in the conventional method.
第1図は従来の水平型アノードメツキ装置の斜視図、第
2図はその側面図、第3図は従来の縦型アノードメツキ
装置の斜視図、第4図はその横断平面図、第5図は本発
明に係るストリツプ用アノードメツキ装置の第1実施例
を示す要部の正面図、第6図は第5図の一線で切析した
斜視図、第7図は配置図、第8図は第2実施例の縦断面
図、第9図は要部の斜視図を夫々示ず。
尚、図中1は粒状アノード、2はアノードボツクス、4
は開口部、5は膜である。Fig. 1 is a perspective view of a conventional horizontal anode plating device, Fig. 2 is a side view thereof, Fig. 3 is a perspective view of a conventional vertical anode plating device, Fig. 4 is a cross-sectional plan view thereof, and Fig. 5 6 is a front view of the main parts showing the first embodiment of the anodizing device for strips according to the present invention, FIG. 6 is a perspective view taken along the line in FIG. 5, FIG. 7 is a layout diagram, and FIG. The longitudinal cross-sectional view of the second embodiment and FIG. 9 do not show perspective views of essential parts, respectively. In the figure, 1 is a granular anode, 2 is an anode box, and 4 is a granular anode.
is an opening, and 5 is a membrane.
Claims (1)
端に通電端子9を固定し、粒状アノード1を導入する導
入管6を設け、メッキ面側に格子3により平面状に開口
した開口部4を設け、この開口部4の内面に粒状アノー
ド1を平面にそろえ、かつ電解液を通すように形成した
膜5を取付けたことを特徴とするストリップ用アノード
メッキ装置。1. A current-carrying terminal 9 is fixed to one end of the anode box 2 to be filled with the granular anode 1, an introduction tube 6 is provided for introducing the granular anode 1, and a planar opening 4 is provided with a grid 3 on the plating surface side. An anode plating apparatus for a strip, characterized in that the granular anode 1 is arranged in a plane on the inner surface of the opening 4, and a membrane 5 formed to allow the electrolyte to pass therethrough is attached.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9754481A JPS5933679B2 (en) | 1981-06-25 | 1981-06-25 | Anode plating equipment for strips |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9754481A JPS5933679B2 (en) | 1981-06-25 | 1981-06-25 | Anode plating equipment for strips |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS581099A JPS581099A (en) | 1983-01-06 |
JPS5933679B2 true JPS5933679B2 (en) | 1984-08-17 |
Family
ID=14195178
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9754481A Expired JPS5933679B2 (en) | 1981-06-25 | 1981-06-25 | Anode plating equipment for strips |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5933679B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605890A (en) * | 1983-06-23 | 1985-01-12 | Sumitomo Metal Mining Co Ltd | Electrolytic refining method of metal |
JPS6293377U (en) * | 1985-11-28 | 1987-06-15 | ||
FR2918674B1 (en) * | 2007-07-12 | 2010-10-01 | Siemens Vai Metals Tech Sas | INSTALLATION AND METHOD FOR THE ELECTROLYTIC SHIELDING OF STEEL BANDS USING A SOLUBLE ANODE |
-
1981
- 1981-06-25 JP JP9754481A patent/JPS5933679B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS581099A (en) | 1983-01-06 |
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