JPS5929424A - Semiconductor wafer manufacturing apparatus - Google Patents

Abstract

PURPOSE:To mechanize and automatize a chemical compounding operation, by a method wherein quantitative tanks whose quantitative level can be adjusted are provided in number equal to that of chemicals to be compounded, and the chemicals are automatically quantitatively compounded and fed to an etching bath. CONSTITUTION:From storage tanks 14, 19 for respectively storing a chemical liquid A 13 and a chemical liquid B 18, the liquids are fed to quantitative tanks 22, 23 by means of liquid feed pumps 24, 25 for a predetermined period of time. The chemical liquids 13, 18 overflowing the quantitative tanks 22, 23 are returned to the storage tanks 14, 19, respectively. A fixed quantity of the chemical liquid A 13 is stored in the quantitative tank 22, and a fixed quantity of the chemical liquid B 18 is stored in the quantitative tank 23. To feed the liquid to an etching bath 1, an A-liquid feed solenoid valve 26 and a B-liquid feed solenoid valve 27 are independently actuated to feed the liquids A, B to the etching bath 1 from the quantitative tanks 22, 23 through pipings 32, 33, respectively. These liquid A, B are quantitatively compounded in the etching bath 1. When the quantitative level in each of the of the quantitative tanks 22, 23 is to be adjusted associated nuts 40 are loosened to vertically move overflow pipings 30, 31 for adjusting the positions of the respective open ends of the pipings, thereby to vary the heights of the overflow surfaces.

Description

[Detailed Description of the Invention] In a semiconductor manufacturing apparatus that performs an etching process, it is possible to use a plurality of quantitative tanks in which the quantitative level of chemicals can be arbitrarily adjusted. This article relates to a semiconductor sea urchin manufacturing device that is capable of automatically dispensing a fixed amount of chemicals (acids, alkalines, etc.).

The wafer etching process is a process in which the wafer is etched with a chemical (acid, alkali, etc.), and then the chemicals adhering to the sea urchin are washed away with pure water and dried.

FIG. 1 shows a process diagram for performing etching, washing and drying on a wafer, and the wafer processing steps will be explained. Immediately, the wafer 3 is supported on a semiconductor urchin carrier (hereinafter referred to as carrier) 2, and the carrier 2 is placed in the etching bath 1 containing the etching solution 4 to perform etching. 2 is placed in a washing tank 5 and washed with pure water 6 from a supply pipe 8. After washing with water, the carrier is taken out and set in the wafer centrifugal dryer 9, and the turntable 11 is rotated by the motor 10, and the wafer 6 is dried by the centrifugal force. 7 is the drain pipe of the washing tank 5. By the way, the etching solution 4 is often used by mixing two or more types of chemicals in fixed quantities depending on the quality of the film to be etched. Conventionally, an operator mixes two or more types of chemicals in advance using a graduated cylinder, etc. This prepared solution was used by supplying it to an etching tank. The work of mixing this chemical is extremely dangerous, and workers must wear safety protective equipment (safety glasses, rubber gloves, etc.) during the work. Furthermore, since it is difficult to mix and store large amounts of chemicals at once, the work of mixing chemicals has to be repeated by workers.

The present invention solves the above-mentioned problems, and is used in a wafer manufacturing apparatus that etches urethane with chemicals such as acid and alkali. The device is characterized in that it is equipped with the same number of etching tanks and automatically performs quantitative preparation and supply of liquid to the etching tank.

Hereinafter, embodiments of the present invention will be described with reference to FIG.

As shown in FIG. 2, a semiconductor urchin manufacturing apparatus for etching a wafer 3 is equipped with a plurality of (two in the embodiment) quantitative tanks 22 and 25 that house chemicals to be quantitatively prepared. Overflow pipes 3o and 31 for draining excess liquid are installed in each tank 22.23, and each tank 22.25 is connected to a solenoid valve 2 as an opening/closing control valve.
6.27 and piping 62.53 to the etching tank 1. In addition, each overflow pipe 3o, si is connected to the liquid storage tank 14.19, and each overflow pipe 3o, si is connected to the liquid storage tank 14.
, 19 are connected to a metering tank 22.25 via piping 28.29 and a liquid supply pop 24.25, respectively. -1, each storage tank 14.19 has a chemical container 12.
17, and a pipe 16 is provided between the two.
21, and drug pressure feed pipes 15, 20 are piped to each drug container 12,17.

Furthermore, each metering tank 22,23 is provided with a metering level adjustment mechanism. That is, as shown in FIG. 3, a retainer 4° is fixed to the bottom of the metering tank 22, 23. 1-1 The overflow pipe 50 is inserted into the tank 22 through the retainer 40, and the retainer is tightened with a nut 41. 40
Overflow/173.

and place the open end of the tube at the level of the liquid at the quantitative level. Note that a quantitative level adjustment mechanism is similarly installed in the other quantitative tank 23.

As shown in FIG. 2, in the embodiment, a liquid A storage tank 14 is previously supplied with liquid A from a chemical container 12 containing liquid A 16. Similarly, the chemical B liquid 18 is also supplied to the B liquid storage tank 19. From each liquid storage tank 14.19 for liquid A and B liquid, the liquid is supplied to the liquid A metering tank 22 by a liquid supply pump 24.25. Supply liquid for a certain period of time. Each quantitative tank 2
The chemical liquid 13.18 that overflowed in 2.25 is transferred from each overflow pipe 30.31 to each liquid storage tank 14.
．． 19, and add a fixed amount of chemical A liquid 13 to A liquid metering tank 2.
In the same way, the quantitative chemical B liquid 18 is placed in the B liquid quantitative tank 23.
Store them in each. To supply liquid to the etching tank 1, the A liquid supply solenoid valve 26 and the B liquid supply solenoid valve 27 are operated respectively, and A liquid is supplied from the metering tank 22 through the piping 32, and B liquid is supplied from the metering tank 26 through the piping 66. The liquid is supplied to the etching tank 1, and a fixed amount is prepared in the etching tank 1.

Next, when adjusting the metering level in the metering tank 22.23, loosen the nut 40 and tighten the overflow pipe 30.31.
This is done by raising and lowering the pipe and adjusting the position of the opening end of the pipe to change the height of the overflow surface.

Therefore, according to the present invention, the work that was conventionally performed by an operator wearing protective equipment can be performed automatically, so that the work can be performed safely and labor-saving can be achieved. Furthermore, since liquid supply and quantitative determination can be performed automatically, it is possible to reduce operational errors in compounding chemicals. By arbitrarily adjusting the quantitative level in each quantitative metering tank, the mixing ratio of each chemical can be arbitrarily selected.

As described above, according to the present invention, it is possible to mechanize and automate the drug compounding work.

[Brief explanation of drawings]

Fig. 1 is a schematic diagram showing the steps of etching, rinsing, and drying a wafer, Fig. 2 is a piping system diagram for quantitatively mixing each chemical into the etching tank in an embodiment of the present invention, and Fig. 3 is FIG. 3 is a sectional view of a metering tank. 1... Etching tank, 6... Semiconductor sea urchin...-14
...Etching liquid, 13...Chemical A solution, 14...
Liquid storage tank, 18... Chemical B liquid, 22... Metering tank, 25-゛° quantitative tank, 26... Solenoid valve, 27...
...Solenoid valve, 30...Overflow piping, 61...
・Overflow piping. Patent applicant: NEC Corporation Figure 1

Claims (1)

[Claims] (1) Semiconductor wafer manufacturing equipment that etches semiconductor wafers is equipped with multiple quantitative tanks that contain chemicals to be mixed in a fixed amount, and each tank is equipped with an overflow pipe for draining excess chemicals. A semiconductor wafer manufacturing apparatus characterized in that the plurality of metering tanks are connected to an etching tank via piping equipped with a control valve. .