JPS5928713Y2 - cleaning equipment - Google Patents
cleaning equipmentInfo
- Publication number
- JPS5928713Y2 JPS5928713Y2 JP1977099512U JP9951277U JPS5928713Y2 JP S5928713 Y2 JPS5928713 Y2 JP S5928713Y2 JP 1977099512 U JP1977099512 U JP 1977099512U JP 9951277 U JP9951277 U JP 9951277U JP S5928713 Y2 JPS5928713 Y2 JP S5928713Y2
- Authority
- JP
- Japan
- Prior art keywords
- water
- nozzle
- substrate
- cleaning equipment
- fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
【考案の詳細な説明】
本考案は、写真工程を経り重板を洗浄するのに用Ｌ・て
好適な洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cleaning device suitable for cleaning heavy plates that have undergone a photographic process.
一般に、半導体装置の製造過程で半導体基板上にパター
ンを形成したり、そのパターン形成に用いるフォト・マ
スクの製造過程で基板上にパターンに形成する場合、エ
ツチング・マスクとしてフォト・レジスト・マスクを用
いることが多い。Generally, when forming a pattern on a semiconductor substrate during the manufacturing process of semiconductor devices, or when forming a pattern on the substrate during the manufacturing process of the photo mask used for pattern formation, a photoresist mask is used as an etching mask. There are many things.
フ第１・・レジスト・マスクは、パターン音形成スヘき
基板上にフォト・レジスｌ−ｋ塗布して形成した膜に露
光、現像、定着等の一連の写真工程全適用して作成する
ものである。First, a resist mask is created by applying a series of photographic processes such as exposure, development, and fixing to a film formed by coating a photoresist l-k on a patterned sound forming substrate. be.
そして、現体後の定着の過程では、基板に附渚している
現像液を洗い流す７ｊめの水洗が行なわれる。In the fixing process after development, a 7j water wash is performed to wash away the developing solution adhering to the substrate.
従来、前記の如き水洗會行なうには、スプレィ式ノスル
を用い、該ノズルより水を粒滴状にして噴出させ、それ
で幕板を洗い流すようにしている。Conventionally, in order to perform the above-mentioned water washing, a spray nozzle is used to spray water in the form of droplets from the nozzle, and the curtain plate is washed away with the spray nozzle.
しかしながら、そのような水洗を行なった場合、（１）
水が粒滴状である為、乾燥後、その粒滴がシミのような
痕になることが多い。However, if such washing is performed, (1)
Since water is in the form of droplets, the droplets often leave stain-like marks after drying.
（２）スプレィ時間として最低５分間は必要である。(2) A minimum spray time of 5 minutes is required.
（３） スプレィの水圧で微小パターンのフォト・レ
ジスト膜が剥離する場合がある。(3) The water pressure of the spray may cause the micro-patterned photoresist film to peel off.
等の問題を生じる。This causes problems such as:
本考案は、スプレィ式ノズル會用いることなく、従って
、圧力の加わった水を用いることなく基板の水洗を行な
うようにして前記の如き問題を解消し、しかも良好な水
洗が可能であるようにするものであり、以下これ乞詳細
に説明する。The present invention solves the above-mentioned problems by washing the substrate without using a spray nozzle and therefore without using water under pressure, and also enables good washing. This will be explained in detail below.
第１図は本考案−実施例の要部正面図、第２図は同じく
その要部側面図である。FIG. 1 is a front view of the main part of the present invention--an embodiment, and FIG. 2 is a side view of the main part.
図に於いて、１は給水口、２は貯水室、２Ａは支持部材
、３はノズル、４はガイド、５は水幕、６は洗浄すべき
基板をそれぞれ示す。In the figure, 1 is a water supply port, 2 is a water storage chamber, 2A is a support member, 3 is a nozzle, 4 is a guide, 5 is a water screen, and 6 is a substrate to be cleaned.
本実施例に於いて、給水口１からはポンプ等で加圧しな
い通常の水道程度の圧力４持った水が供給される。In this embodiment, water is supplied from the water supply port 1 at a pressure 4 equal to that of normal tap water, which is not pressurized by a pump or the like.
貯水室２は給水口１から流入する水の勢いを緩和し、且
つ、水がノズル３の全体に均等に行渡るようにするもの
である。The water storage chamber 2 is intended to reduce the force of water flowing in from the water supply port 1 and to allow the water to spread evenly throughout the nozzle 3.
ノズル３は先端に向うにつれて細く絞られていて、しか
も横方向に長くなっている。The nozzle 3 becomes narrower toward the tip and becomes longer in the lateral direction.
ガイド４はノズル３で形成されｆｒｃ水幕５を維持する
ものである。The guide 4 is formed by the nozzle 3 and maintains the FRC water screen 5.
尚、実施例では、距離ｌが約２００ｍｍである。In the example, the distance l is approximately 200 mm.
本実施例に依す基板６の洗浄を行なう場合、基板６に対
してノズル３を傾斜させるか、逆にノズル３に対して基
板６を傾斜させて水幕５をあてれば良Ｌ・。When cleaning the substrate 6 according to this embodiment, it is sufficient to apply the water curtain 5 by tilting the nozzle 3 with respect to the substrate 6, or conversely by tilting the substrate 6 with respect to the nozzle 3.
その際、支持部材２Ａｋ利用して装置全体を図の矢印Ｑ
に見られる如く揺動自在に支持し、例えば適当なりラン
ク機構に結合して揺動させると、水幕５會基板６上にて
うねらせることができ、洗浄はより効果的に行なわれる
。At that time, use the support member 2Ak to move the entire device as shown by the arrow Q in the figure.
If the water curtain 5 is swingably supported as shown in FIG. 2, and is oscillated by being coupled to a suitable rank mechanism, the water curtain 5 can be undulated on the substrate 6, and cleaning can be performed more effectively.
本考案に依れば次のような効果が得られる。According to the present invention, the following effects can be obtained.
（１）ノズルから出た水は暮秋になって基板にかけられ
、薬液を洗い流すので、スプレィ式ノズルを用いた場合
のように、水滴に依るシミのような痕は残らない。(1) The water coming out of the nozzle is applied to the substrate in late autumn to wash away the chemical solution, so unlike when a spray nozzle is used, there are no stains left by water droplets.
（２）水洗に要する時間は１分程度で充分であり、作業
は短時間で終了する。(2) The time required for washing with water is about 1 minute, and the work can be completed in a short time.
（３）基板面全水流がなめるような状態で洗い流すので
、微細パターンのフォト・レジスト膜でも剥離を生ずる
ことはない。(3) Since the entire surface of the substrate is washed away in a licking state, peeling does not occur even with a finely patterned photoresist film.
（４）水流を広い面積に亘り均一にあてることができる
ので水洗のムラは生じない。(4) Since the water stream can be uniformly applied over a wide area, uneven washing will not occur.
第１図及び第２図は本考案−実施例の要部正面図及び要
部側面図をそれぞれ表わす。
図に於いて、１は給水口、２は貯水室、２Ａは支持部材
、３はノズル、４はガイド、５は水幕、６は基板をそれ
ぞれ示す。FIGS. 1 and 2 show a front view and a side view of the main parts of the present invention-embodiment, respectively. In the figure, 1 is a water supply port, 2 is a water storage chamber, 2A is a support member, 3 is a nozzle, 4 is a guide, 5 is a water curtain, and 6 is a substrate.
Claims (1)
るノズルと、このノズルの両側に形成され該ノズルから
流出する流体幕を導くガイドと、該流体幕を斜め方向に
送出する揺動機構を設けた事を特徴とする洗浄装置。A nozzle whose tip is constricted into a long line in the horizontal direction and sends out fluid in late autumn, guides formed on both sides of this nozzle to guide the fluid curtain flowing out from the nozzle, and a rocker that sends out the fluid curtain in an oblique direction. A cleaning device characterized by being equipped with a moving mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977099512U JPS5928713Y2 (en) | 1977-07-26 | 1977-07-26 | cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977099512U JPS5928713Y2 (en) | 1977-07-26 | 1977-07-26 | cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5426875U JPS5426875U (en) | 1979-02-21 |
| JPS5928713Y2 true JPS5928713Y2 (en) | 1984-08-18 |
Family
ID=29036298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1977099512U Expired JPS5928713Y2 (en) | 1977-07-26 | 1977-07-26 | cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5928713Y2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS521747Y2 (en) * | 1973-06-08 | 1977-01-14 |
-
1977
- 1977-07-26 JP JP1977099512U patent/JPS5928713Y2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5426875U (en) | 1979-02-21 |
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