JPS59167085A - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- JPS59167085A JPS59167085A JP4178483A JP4178483A JPS59167085A JP S59167085 A JPS59167085 A JP S59167085A JP 4178483 A JP4178483 A JP 4178483A JP 4178483 A JP4178483 A JP 4178483A JP S59167085 A JPS59167085 A JP S59167085A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- semiconductor layer
- semiconductor laser
- semiconductor
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/1064—Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
Landscapes
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】 産業上の利用分野 本発明は半導体レーザに関するものである。[Detailed description of the invention] Industrial applications The present invention relates to a semiconductor laser.
従来例の構成とその問題点
半導体レーザは、小形でかつ効率が高く、駆動電流によ
る直接変調が可能であるなど多くの長所を有しており、
光通信、光情報処理用の光源として有用である。Conventional configurations and their problems Semiconductor lasers have many advantages, such as being small, highly efficient, and capable of direct modulation by drive current.
It is useful as a light source for optical communication and optical information processing.
これらの目的に使用するためには、半導体レーザの発振
において横モードが安定であると同時に、光強度雑音が
少ないことが必要である。In order to use the semiconductor laser for these purposes, it is necessary that the transverse mode in oscillation of the semiconductor laser is stable, and at the same time, the optical intensity noise is low.
従来の半導体レーザー、例えば第1図に示すようなG
a A s基板1に溝を設け、この上にn −Ga1−
yAlyAs(y=o、4)層2 、 n−Ga1−x
AlxAs(x=o、os)活性層3 + p G
a 1.A l y A 5(y=0.4)層4を備え
た半導体レーザでは、活性層3で発生した光が溝の両側
で吸収されるため実効的複素屈折率差が生じ、光の閉じ
込めがおこり、横モードは安定化されている。Conventional semiconductor lasers, such as the one shown in FIG.
a A s A groove is provided in the substrate 1, and n -Ga1- is formed on the groove.
yAlyAs (y=o, 4) layer 2, n-Ga1-x
AlxAs (x=o, os) active layer 3 + p G
a1. In the semiconductor laser equipped with the A ly A 5 (y=0.4) layer 4, the light generated in the active layer 3 is absorbed on both sides of the groove, resulting in an effective complex refractive index difference and light confinement. The occurrence and transverse modes are stabilized.
しかし、このような半導体レーザを数ミリワットの光出
力で動作させると、2本の縦モードで発振することがあ
り、このとき非常に大きな低周波雑音が発生し、実用上
問題となる。However, when such a semiconductor laser is operated with an optical output of several milliwatts, it may oscillate in two longitudinal modes, which generates extremely large low-frequency noise, which poses a practical problem.
発明の目的
本発明は、上酋己従来の欠点を除去するものであシ、2
本の縦モードが共存する状態を抑制し単−縦モードで発
振し、低雑音である半導体レーザを擢供することを目的
とする。OBJECTS OF THE INVENTION The present invention obviates the drawbacks of the prior art.
The purpose of this invention is to provide a semiconductor laser that suppresses the coexistence of the longitudinal mode, oscillates in a single longitudinal mode, and has low noise.
発明の構成 上記目的を達するため次のような構造とする。Composition of the invention In order to achieve the above purpose, the following structure is adopted.
第1の半導体層、およびこれを挾み、前記第1の半導体
層よりも禁制帯幅が大きくかつ屈折率の小きい第2およ
び第3の半導体層をもち、これら第2あるいは第3の半
導体層に接して、禁制帯幅が第1の半導体層よりも小さ
い第4の半導体層をもち、ある一方向、例えばレーザー
共振器端面に垂直方向の帯状部の中央で、第1の半導体
層と第4の半導体層の距離が、前記帯状部の他の部分よ
りも接近するように配置した構造とする。A first semiconductor layer, and second and third semiconductor layers sandwiching the first semiconductor layer and having a larger forbidden band width and a smaller refractive index than the first semiconductor layer, and these second or third semiconductor layers. A fourth semiconductor layer is in contact with the first semiconductor layer and has a forbidden band width smaller than that of the first semiconductor layer. The structure is such that the fourth semiconductor layer is arranged closer to each other than the other portions of the band-shaped portion.
実施例の説明
以下に本発明の実施例の半導体レーザについて説明する
。なお、以下の実施例では従来例を示す第1図と同一箇
所には同一番号を付している。DESCRIPTION OF EMBODIMENTS A semiconductor laser according to an embodiment of the present invention will be described below. In the following embodiments, the same parts as in FIG. 1 showing the conventional example are given the same numbers.
(実施例1)
n−GaAs基板1に第2図に示すように中央部で浅く
なった溝を形成する。次に第3図に示すようにこの上に
溝を埋めつくすようにn−Ga1−yAll As層
2 、n−Ga1−xAlxAs層3 、 p −Ga
1y A 6 yA s層4 、p−GaAs層5.を
形成する。(Example 1) As shown in FIG. 2, a groove that becomes shallower in the center is formed in an n-GaAs substrate 1. Next, as shown in FIG. 3, an n-Ga1-yAll As layer 2, an n-Ga1-xAlxAs layer 3, a p-Ga
1yA6yAs layer 4, p-GaAs layer 5. form.
次に電極を形成しく図示せず)半導体レーザとする。Next, electrodes (not shown) are formed to form a semiconductor laser.
(実施例2)
第4図に示すようにn−GaAs基板1に溝を形成する
。この上に溝を埋めつくすようにn −G al−yA
i、As層2 r n G a I x A l
x A s層3゜p G a 1−アAl y A
s層4を順次形成する。次にp G a 1−アAl
、As層4の溝の中央部の真上の部分をn G a 1
−xA ll xA s層が露出しない程度に除去する
。この除去した部分を埋めつくすようにp−GaAs層
5を形成し、最後に電極をっけ、半導体レーザを完成す
る。(Example 2) As shown in FIG. 4, a groove is formed in an n-GaAs substrate 1. On top of this, n -Gal-yA so as to completely fill the groove.
i, As layer 2 r n Ga I x A l
x As s layer 3゜p Ga 1-A Al y A
S-layers 4 are sequentially formed. Next, p G a 1-A Al
, the part directly above the center of the groove of the As layer 4 is n Ga 1
-xA ll xA s layer is removed to the extent that it is not exposed. A p-GaAs layer 5 is formed to completely fill the removed portion, and finally electrodes are placed to complete the semiconductor laser.
なお、第6図aは第5図におけるB面での断面図、第6
図すは第5図におけるA面または0面での断面図、第6
図Cは第5図におけるD面での断面図を示している。Note that FIG. 6a is a sectional view taken on plane B in FIG.
The figure is a cross-sectional view of plane A or plane 0 in figure 5, and figure 6.
Figure C shows a sectional view taken along plane D in Figure 5.
発明の効果
このような本発明の半導体レーザの構造では、基板の溝
の中央部近傍では、活性層で発生し伝ばんする光の吸収
が大きくなる。一方、@接する2本の縦モードの共存状
態、即ちうなりの振幅は、共振器中央部で最大となる。Effects of the Invention In the structure of the semiconductor laser of the present invention, absorption of light generated and transmitted in the active layer is large in the vicinity of the center of the groove of the substrate. On the other hand, the coexistence state of two longitudinal modes in contact with each other, ie, the amplitude of the beat, is maximum at the center of the resonator.
従って、本発明の構造では、この共存状態の吸収損失が
大きくなり共存状態の発振が抑制され、常に単−縦モー
ド発振となり、低雑゛音動作となる効果が得られる。Therefore, in the structure of the present invention, the absorption loss of this coexisting state becomes large and the oscillation of the coexisting state is suppressed, resulting in constant single-longitudinal mode oscillation and low noise operation.
第1図は従来の半導体レーザの斜視図、第2図は本発明
の一実施例にかかる半導体レーザの基板の斜視図、第3
図は同基板上に各層を形成した半導体レーザの斜視図、
第4図は本発明の他の実施例の半導体レーザの基板の斜
視図、第5図は同基板に各層を形成した半導体レーザの
斜視図、第6図(a)は、第5図におけるB面での断面
図、第6図(blは、第5図におけるA面、0面での断
面図、第6図(C)は第5図におけるD面での断面図で
ある。
1−−−n−GaAs基板、2・・・・・・n−Ga1
−yAlyAs 、 3−・・・・n −Ga1−XA
lxAs 、、 4 ・−p−Ga1 、AdyA
s、5−−−−p−GaAs、6−正電極、7・ ・負
電極。
代理人の氏名 弁理士 中 尾 敏 男 はが1名第1
図
第2図
第3図
第4図
第5図FIG. 1 is a perspective view of a conventional semiconductor laser, FIG. 2 is a perspective view of a substrate of a semiconductor laser according to an embodiment of the present invention, and FIG.
The figure is a perspective view of a semiconductor laser with each layer formed on the same substrate.
FIG. 4 is a perspective view of a substrate of a semiconductor laser according to another embodiment of the present invention, FIG. 5 is a perspective view of a semiconductor laser in which each layer is formed on the same substrate, and FIG. FIG. 6 is a cross-sectional view on plane A and zero in FIG. 5, and FIG. 6(C) is a cross-sectional view on plane D in FIG. 5. 1-- -n-GaAs substrate, 2...n-Ga1
-yAlyAs, 3-...n -Ga1-XA
lxAs, 4・-p-Ga1, AdyA
s, 5----p-GaAs, 6-positive electrode, 7. - negative electrode. Name of agent: Patent attorney Toshio Nakao (1st person)
Figure 2 Figure 3 Figure 4 Figure 5
Claims (1)
より禁制帯幅が大きくかつ屈折率が小さい第2および第
3の半導体層を前記第1の半導体層をはさんで形成して
なシ、前記第2あるいは第3の半導体層に接して第4の
半導体層が形成され、少なくともある一方向の中央近傍
で前記第4の半導体層が前記一方向の他の部分よりも前
記第1の半導体層に接近して形成されていることを特徴
とする半導体レーザ。a first semiconductor layer, and second and third semiconductor layers having a larger forbidden band width and a smaller refractive index than the first semiconductor layer are formed sandwiching the first semiconductor layer. , a fourth semiconductor layer is formed in contact with the second or third semiconductor layer, and at least near the center in one direction, the fourth semiconductor layer is more in contact with the first semiconductor layer than in other parts in the one direction. A semiconductor laser characterized by being formed close to a semiconductor layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4178483A JPS59167085A (en) | 1983-03-14 | 1983-03-14 | Semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4178483A JPS59167085A (en) | 1983-03-14 | 1983-03-14 | Semiconductor laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59167085A true JPS59167085A (en) | 1984-09-20 |
JPH0416957B2 JPH0416957B2 (en) | 1992-03-25 |
Family
ID=12617977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4178483A Granted JPS59167085A (en) | 1983-03-14 | 1983-03-14 | Semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59167085A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5519886A (en) * | 1978-07-28 | 1980-02-12 | Matsushita Electric Ind Co Ltd | Apparatus and manufacturing method of semiconductor laser |
JPS57211791A (en) * | 1981-06-24 | 1982-12-25 | Sharp Corp | Semiconductor laser element |
-
1983
- 1983-03-14 JP JP4178483A patent/JPS59167085A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5519886A (en) * | 1978-07-28 | 1980-02-12 | Matsushita Electric Ind Co Ltd | Apparatus and manufacturing method of semiconductor laser |
JPS57211791A (en) * | 1981-06-24 | 1982-12-25 | Sharp Corp | Semiconductor laser element |
Also Published As
Publication number | Publication date |
---|---|
JPH0416957B2 (en) | 1992-03-25 |
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