JPS5845972A - Themal printer head and manufacture thereof - Google Patents
Themal printer head and manufacture thereofInfo
- Publication number
- JPS5845972A JPS5845972A JP56144348A JP14434881A JPS5845972A JP S5845972 A JPS5845972 A JP S5845972A JP 56144348 A JP56144348 A JP 56144348A JP 14434881 A JP14434881 A JP 14434881A JP S5845972 A JPS5845972 A JP S5845972A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductive
- base plate
- glaze
- dissolving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 10
- 239000010408 film Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000011800 void material Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 10
- 239000011241 protective layer Substances 0.000 abstract 1
- 238000004090 dissolution Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 210000003128 head Anatomy 0.000 description 3
- 210000000554 iris Anatomy 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 239000005355 lead glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 241000220450 Cajanus cajan Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000009089 cytolysis Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 230000036651 mood Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
との発@紘ナーマルグννタヘッドとそ1)@速流に関
する。DETAILED DESCRIPTION OF THE INVENTION Concerning the originator head and the 1) rapid flow.
この種サー!ル11ンタ^ツドにお−て、セツミック劇
の着板0表面にグレーズ層を設け、ζOII幽に一対O
導電層を、叉両−導電層にまたがってIi熱体となる抵
抗層をそれぞれ漆虞しえIImはよ(知られて−る。し
かしこのよう1に卿率によゐと抵抗層で発生し良熱がダ
レーズJ11.基板を過って外部に逃げるO″e%e%
プvytt必散発生に−して紘、外部に逃ける5vtJ
L越して斃生畜せる必費があ)、それだけ多量のエネル
ギーを供給髪なけれ&ftkらない0、
ミれを改善する丸めに、−熱体?1&胃と基板とO闘に
!間を微砂て#に抗層)シO熱が基板に向けて遣t’7
K(いようにすることが考えられて−る。This kind sir! At the 11th stage, a glaze layer was applied to the surface of the set plate 0, and a pair of O
It is well known that the conductive layer is coated with a resistive layer that serves as a heating element, spanning both conductive layers. The heat escapes to the outside through the Daleze J11 board. O″e%e%
5vtJ is bound to occur and Hiro escapes to the outside.
There is a necessary cost to survive over L), and there is no hair to supply that much energy & ftk 0, to improve the roundness, - heat body? 1 & Stomach and board and O battle! The heat is directed towards the board (t'7).
K (I'm thinking of doing something like that.
その丸めの構成として基板の表面に′I74絨点鉛ガラ
スからなる板を円弧状に形成した台を伏せるようKt置
し、その両側を低融点鉛ガラスによって基板の表面に同
着し、この台の円弧表面に沿って抵抗層を、又その両1
1に一110導電層を形成するととによって構成し九4
0#ある。これによれば台の内面と基板表面との関に空
洞が形成されるようKtゐOで、抵抗層から0IIIk
が基板に逃けに〈(なり好都合である。As for its rounded configuration, a table made of an arc-shaped plate made of I74 lead glass is placed face down on the surface of the substrate, and both sides of the plate are attached to the surface of the substrate with low melting point lead glass. a resistive layer along the arcuate surface of the
Forming a conductive layer on 1 and 94
There is 0#. According to this, KtO is used so that a cavity is formed between the inner surface of the stand and the substrate surface, and 0IIIk is removed from the resistive layer.
This is convenient because it escapes to the board.
しかしこのような構成によゐと、高蒙点鋤ガラスからな
る板を円弧状に加工成形しなければならない不便がある
。しかもその大きさ#i^さa5〜1111B、 $
5− i Qw、馬と−9え極めて叡細なものであるか
ら、そO成形加工を更に一層一一とする。However, with this configuration, there is an inconvenience that the plate made of high-temperature glass must be processed and formed into an arc shape. Moreover, its size #i^sa A5 ~ 1111B, $
5-i Qw, since the horse and -9 are extremely detailed, the O molding process is made even more precise.
この発明線抵抗J11の1iIIIk体部分の下方に簡
単な空所を^偏せしめてなるナーマルプリンタヘッド及
び七oH速流を提供することを1的とする。One object of the present invention is to provide a thermal printer head and a 7oH high speed flow formed by biasing a simple space below the 1iIIIk body portion of the wire resistor J11.
こOI!明a轟板の表面に央条状のダレーズ層を設け、
その表面に抵抗層及び通電用O導電層を設置するととも
に、前記ダV−ズJllO底真と基板と01141に薄
い空所を設は良ととを特徴とする%Oである。This OI! A central strip-shaped dalese layer is provided on the surface of the Mei-a Todoro board,
This %O is characterized by having a resistive layer and an O conductive layer for current-carrying on its surface, as well as providing a thin void between the bottom of the DAV and the substrate and 01141.
この発明の実施例をIIIIIKよって説明すると1紘
セラ々ツク傘どか4′&るII板、2妹そ0表面に央条
状に廖威畜れえグレーズjilt (jlみ約50−箇
)で、これaS晶質ボツス或いは結晶化ガラス勢からな
)、ζζで嬬スタ9−ン印刷による厚*によ厚膜(厚S
約S酪11)Thらな)、4妹両導電層5にまえがうて
その表11に設置られた1鶴02勢O厚展4jl14約
Bosm ) h h t hllNIL層、5嬬九と
え鉱崖ツス等から1にゐ保−II(厚み約10鶴襲)で
ある。An embodiment of the present invention will be described in terms of IIIK: 1. A ceramic umbrella board, 4'& 2 II plates, 2. A central strip of glaze on the surface (approximately 50 sections). , this is from aS crystalline botts or crystallized glass), and a thick film (thick S
Approximately S 11) Th), 4 layers, 5 layers, 5 layers, 5 layers, 4 layers, 5 layers, From the mineral cliff tsuss, etc., it is 1 to Iho-II (approximately 10 pieces thick).
こO発ijIにし丸がい、ダレーズ層20底函のうちt
% R島体−分七なる両導電層関O抵抗崩部分4AO下
方Oi繭部分が、基板10表両と祭しないように空所感
を形成する。!2!所空所1m1k示すように断画が細
長O直方形となりて)伽、単に前記Oようにlレーズ層
20底IjがI&板10表貢に接しなiようにする九#
!LIIlけO%Oであるから、そO厚し−×M#2の
鷹me基板10表−と接触しない部分線抵抗層部分44
t)下方のみであ勤、かつダレーズ層20厚与拡空所
40$40約10倍もあるからグレーズ層2の機械的強
度株充分維持されるように&る。From this O ij I Nishi Marugai, t out of 20 bottom boxes of Dalles layer
% R Island body - A void is formed so that the conductive layer O resistance collapse portion 4AO lower Oi cocoon portion does not overlap with the front and back sides of the substrate 10. ! 2! As shown in the space of 1m1k, the cross-section becomes an elongated O rectangular parallelepiped). Simply make it so that the bottom Ij of the lasing layer 20 does not touch the top surface of the I & plate 10 as shown above.
! Since LIIl is O%O, the part line resistive layer part 44 that does not come in contact with the 10th surface of the hawk me board of M#2 is thicker.
t) The glaze layer 2 is operated only from below, and the thickness of the glaze layer 20 is approximately 10 times greater than the glaze layer 20, so the mechanical strength of the glaze layer 2 is maintained sufficiently.
仁のように空所6を形成して訃〈と、抵抗JII44か
らOSmダレーズ層2を違って基板1に向かって逃けに
<<1*、これkよりて挺掟層部分4AからO熱紘表菖
に接する感熱祇を加熱するぺ(有効K141用されるこ
とKする。し九がうて空所6を形成し1に%/−h場合
よ勤も供給電力を低減させることがで龜るようKなる。In order to form a void 6 as shown in FIG. Heating the heat-sensitive material in contact with the irises (effective K141 is used).If the space 6 is formed by heating the heat-sensitive material in contact with the irises, the power supply can also be reduced. It's like K.
りtK仁OIi明によるt−マルプリンタヘッドOII
速流にりいて嬉2図以眸04)−を参照して説明する。t-Mulprinter Head OII by RitKen OIi Akira
This will be explained with reference to Fig. 2 from Figure 04).
tずセラζツタ基板1011&に纂2図のように九とえ
ばAx (X線そO合金)ペーストを印刷鋒威して厚
み約5 s+a e Ay O@ icよる溶解層7を
形成する。i1解層7が後記するように油解され、そO
溶解し大あとに前記し大空所6が形成されるo−eある
。ついで嬉S図O断画図、菖4−わ千画図に示すようK
117をt九ぐようにしてダシーズ層2を印刷論成して
厚み約505m 0jlllKよって形成する。そして
このダレーズ層20両側kmsime*iim、嬉6図
の平1iisuc=すX 5 pc JIB等による一
対の導電層5を厚膜によって形成する。As shown in FIG. 2, for example, Ax (X-ray SO alloy) paste is printed on the Tzucera ζ ivy substrate 1011& to form a melted layer 7 having a thickness of about 5 s + a e Ay O @ ic. The i1 dissolved layer 7 is dissolved in oil as described later, and its O
After melting, the large cavity 6 described above is formed. Next, K as shown in Kashi S diagram O cross-cut diagram and Iris 4-wa thousand picture diagram.
The doss layer 2 is formed by printing with a thickness of about 505 m and a thickness of about 505 m. Then, a pair of conductive layers 5 made of a thick film such as kmsime*iim on both sides of the dalese layer 20 and JIB are formed.
そのあと抵抗層4を導電層300表面nえがりてj14
30m++aIimOjlliE!2?形威t! (1
1711゜第8−参照。)、そしてζ01hとIIk杭
層40表真を覆うようにslIImsを厚膜によりて1
119図、第10−に示すように形成する。After that, the surface of the conductive layer 300 is etched into the resistive layer 4.
30m++aIimOjlliE! 2? Form power! (1
1711° No. 8-Reference. ), and slIIms was coated with a thick film to cover the ζ01h and IIk pile layer 40 surfaces.
It is formed as shown in FIG. 119, No. 10-.
以上Oようにして令層又a換を浄戚し九あと、溶鍔層7
を溶解する。10と自O溶解波として鉱港解鵬の番をi
lsし、sea:x線層を溶解し1い%のが必要でhゐ
。叉溶解層70表面にダレーズ鋤そ04111が印刷鉤
威によって形成されるので、溶解層上して耐層性で番為
ことが要求1れる。そ0意味では溶解1117をAy
X紘そO会食によって形成した部会はこれは耐鵬性を^
倫しているので部会がよく、叉こOときOIl解筐七し
てはえとえdHNO3が適轟である。この溶解液は導電
層であるjs抵抗層である1@02を溶解し1いので都
合がよい。In the above manner, after purifying the Rei layer and the a change, after nine steps, the Futsuba layer 7
dissolve. 10 and the turn of the mining port opening as an auto-O dissolution wave i
ls and sea: 1% is required to dissolve the x-ray layer. Since the dales 04111 is formed on the surface of the dissolving layer 70 by printing, it is required that the coating be coated on the dissolving layer with good layer resistance. So0 meaning is lysis 1117 Ay
The committee formed by the
Since I'm in a good mood, I often have meetings with the subcommittee, and when I get into trouble with OIl, I'm very happy with dHNO3. This solution is convenient because it dissolves the conductive layer 1@02 which is the js resistance layer.
なお各平自図に示すように溶解層0IiIl1部7ノは
ダレーズ1mの両側から外部Kjl出するように形成さ
れていることが必要である。もしh出していないと溶解
11kK授漬しても溶解層は溶解液に嫉しない丸め溶解
されないからである。As shown in each plan view, it is necessary that the molten layer 0IiIl1 portion 7 is formed so as to come out from both sides of the Dalese 1m. This is because if the temperature is not exceeded, the dissolved layer will not be dissolved into a round shape that does not interfere with the solution even if the solution is immersed at 11 kK.
溶解層7の溶解層、保111w1.5を形成しfcあと
で行なう必要はない、少くともグレーズ層2を形成した
あとであれにいつでもよい。It is not necessary to form the melting layer 111w1.5 of the melting layer 7 after fc, but it can be done at any time after forming the glaze layer 2 at least.
溶解層7の溶解によって、溶解層7の位置に第1図に示
すような空所6がグレーズ層2の底面に形成されるよう
に′&る。By dissolving the dissolving layer 7, a void 6 as shown in FIG. 1 is formed at the position of the dissolving layer 7 on the bottom surface of the glaze layer 2.
以上の実施例は導電層、抵抗層を厚膜とした構成であつ
えが、これらを薄膜とし九場合でもこの鉛明は適用され
る。籐11−に示す実凰飼はその例を示し、基板10表
面に厚膜<*−S約50e諺)のダレーズJ#2を形成
し、その表面にまたがって厚さ約α1−鴎の薄mによる
抵抗Jm14を、又その両稠に厚さ約1本m1OII験
による導電層15の一対をそれぞれ形成する。そしてこ
れら0表1iiK厚さ約5−111011−による保−
験(えとえd TmzQ5.5402等)1st形威す
る。これら04)薄11[蒸着又轄スパッタ曽ンダによ
伽行なうむとれ周知Oとs?伽である。この実施例にお
いても、ダレーズ屓20廠1ift!N4を形成する。Although the above embodiments have a structure in which the conductive layer and the resistive layer are made of thick films, this principle can also be applied even if these are made into thin films. An example of this is shown in Fig. 11, in which a thick film <*-S approximately 50e proverb) is formed on the surface of the substrate 10, and a thin film of approximately α1-S is spread over the surface. A resistor Jm14 with a thickness of m1 is formed on both sides thereof, and a pair of conductive layers 15 with a thickness of about 1 m1 and a conductive layer 15 with a thickness of about 1 m1 are formed on both sides thereof. And protection by these 0 table 1iiK thickness approximately 5-111011-
Test (etoed TmzQ5.5402 etc.) 1st form is used. These 04) Thin 11 [vapor deposition and sputtering process are well known as O and S? It is a fairy tale. In this example as well, 20 units of Dale's 1 if! Forms N4.
第12−以降O各Ilによって第11園O構威O良めO
製造法をWR−すると、竜2電ツタ基板10表函に厚み
約55w5OAy@から傘る溶解層7を形成(第121
1参照、)シ、りいで嬉15図のように溶解層7をまえ
−でグレーズ層2を厚膜によシ形成する。そOあとクレ
ーズm2o*
又その両側に導電層13をそれぞれIII馴によ伽影成
(無1411. m1slil#蝋.)シてからその表
両を保1111115で暑う(總1611参照。)、そ
してiI解層7ti11[−ejlllllk*すれ紘
よー。12th and onwards O by each Il 11th garden O structure O good O
When the manufacturing method is WR-, a dissolving layer 7 with a thickness of approximately 55w5OAy@ is formed on the Ryu 2D Tsuta board 10 (121st
1)) As shown in Figure 15, a thick glaze layer 2 is formed in front of the dissolving layer 7. Then, apply a conductive layer 13 on each side of the craze m2o*, and then heat both surfaces at 1111115 (see 1611), and iI solution layer 7ti11 [-ejllllllk*Sure Hiroyo.
&訃以上04に実施例において溶解層7として110代
わIIにCIIX紘その台金が4Il用で亀,仁の場合
の溶解波として例え杖Fac15が使用で自る・以上評
遠しえようにこ0発l11によれ式、ダレーズ@0底面
に空所を設は丸ので、既提案とは異な伽機械的強力が充
分維持されえ状履で、基板へO20遣けを防止すること
がで龜るようになに、又そOえめの製造法も予め溶解層
を形成し、グレーズ層t)l/II成以4kKこれを溶
解するたうKしたので極めて簡単に空所を形成する仁と
ができる効果を奏する。&More than 04, in the example, the dissolution layer 7 is used as 110 substitute II, CIIX Hiro, its base metal is for 4Il, and as a dissolution wave in the case of turtle and jin, the cane Fac15 is used as the dissolution wave. Since this 0-shot L11 type has a round hole on the bottom, the mechanical strength is sufficiently maintained, which is different from the existing proposals, and it is possible to prevent O20 from being applied to the board. In addition, the production method for O-Eme also involves forming a dissolved layer in advance, and melting the glaze layer (t)l/II by 4kK, which makes it extremely easy to form voids. It has the effect of being able to.
第1図嬬この発#40一実施例を示すkT面図,第2図
乃至第10図れこO発明の一実施例の工程を示す断′W
i図及び平面図、第11 wJ41この発明O他O実施
例を示す断面図、第12図乃至無16図紘ζO斃@0@
0夾施例の工程を示す断自図でるる。
1 、、、、基板% 2 、a # @グレーズ層、5
. 13 、、、。
導電層、4. 14 、、、、抵抗層% 6 m@@@
空所、7 、、、。
溶解崩
第13図
λ
先15図Figure 1 is a kT view showing an embodiment of the invention #40, Figures 2 to 10 are cross sections showing the steps of an embodiment of the invention.
Figure i and plan view, No. 11 wJ41 Cross-sectional views showing embodiments of this invention O and others, Figures 12 to 16 HiroζO@0@
A self-diagram showing the process of the 0-examination example. 1,,,substrate%2,a#@glaze layer,5
.. 13. conductive layer, 4. 14,,,,resistance layer% 6 m@@@
Blank space, 7. Dissolution and collapse Fig. 13 λ Previous Fig. 15
Claims (1)
なるグレーズMO表藺に発熱体となる抵抗層と過電用の
一対の導電層とを備え、前記グレーズ層の置部と前記I
&板OII画との閾に薄い空所を設けてなるす一マルプ
νンタヘッド (粉 基板OII!雨に溶解液によって溶解可能な溶解
層を厚111によシ形成し、そのあと前記溶解層O端I
Iが露出するように前記溶解層をま良いで突条状・0j
IEWI!よりな今グレーズ層を形成し、更に前記グレ
ーズ層0111jK発熱体となる抵抗層及び−電層〇一
対O導電層とを形成して亀や、前記グレーズ層を形成し
九以余に前記溶解層を溶解液で溶解して七Oあとに9所
!彫成することを特徴とすそナマルプリンタヘッドの製
造法 (鴫 抵抗層、導電層を厚緘によって彫皐、シてなる特
許請求O馳S亀2項記軌Oナーマルプリンタヘツドos
in法 。 (4抵抗層、導電mを薄膜に本9て廖威してなる特許M
求011&f1mZ項記載Oナーマルプνンタヘッドt
)@Q* 。[Claims] -(1) II of the substrate! In this example, a glazed MO surface made of a Daito strip-shaped O4 film is provided with a resistance layer serving as a heating element and a pair of conductive layers for overcurrent, and a portion where the glaze layer is placed and a pair of conductive layers for overcurrent.
A thin void is provided at the threshold between the plate OII image and the substrate OII! End I
The dissolving layer is covered with a protruding stripe shape so that I is exposed.
IEWI! Next, a glaze layer is formed, and a resistive layer and a conductive layer, which will become a heating element, are further formed to form the glaze layer, and a conductive layer is formed, and the glaze layer is formed, and the dissolving layer is Dissolve it with a dissolving solution and 9 places after 7 O! A method for manufacturing a natural printer head characterized by engraving a resistive layer and a conductive layer by engraving and engraving them.
in law. (Patent M made by applying 4 resistive layers and a conductive layer to a thin film)
Request 011&f1m
) @Q*.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56144348A JPS5845972A (en) | 1981-09-12 | 1981-09-12 | Themal printer head and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56144348A JPS5845972A (en) | 1981-09-12 | 1981-09-12 | Themal printer head and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5845972A true JPS5845972A (en) | 1983-03-17 |
JPH0321352B2 JPH0321352B2 (en) | 1991-03-22 |
Family
ID=15360008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56144348A Granted JPS5845972A (en) | 1981-09-12 | 1981-09-12 | Themal printer head and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5845972A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6283155A (en) * | 1985-10-08 | 1987-04-16 | Rohm Co Ltd | Thermal printing head |
US4917719A (en) * | 1983-03-30 | 1990-04-17 | E. I. Du Pont De Nemours And Company | Herbicidal isothiazole derivatives |
JP2007083532A (en) * | 2005-09-22 | 2007-04-05 | Seiko Instruments Inc | Heating resistor element, thermal head, printer, and method for manufacturing heating resistor element |
JP2011116136A (en) * | 2011-03-14 | 2011-06-16 | Seiko Instruments Inc | Heating resistor element, thermal head, and printer |
JP2011121337A (en) * | 2009-12-14 | 2011-06-23 | Seiko Instruments Inc | Thermal head and printer |
JP2012206298A (en) * | 2011-03-29 | 2012-10-25 | Toshiba Hokuto Electronics Corp | Thermal head, and manufacturing method therefor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101056716B1 (en) | 2007-03-16 | 2011-08-16 | 가부시키가이샤 리코 | Imaging device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS585278A (en) * | 1981-07-01 | 1983-01-12 | Nec Corp | Heat-sensitive recording head |
-
1981
- 1981-09-12 JP JP56144348A patent/JPS5845972A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS585278A (en) * | 1981-07-01 | 1983-01-12 | Nec Corp | Heat-sensitive recording head |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4917719A (en) * | 1983-03-30 | 1990-04-17 | E. I. Du Pont De Nemours And Company | Herbicidal isothiazole derivatives |
JPS6283155A (en) * | 1985-10-08 | 1987-04-16 | Rohm Co Ltd | Thermal printing head |
JP2007083532A (en) * | 2005-09-22 | 2007-04-05 | Seiko Instruments Inc | Heating resistor element, thermal head, printer, and method for manufacturing heating resistor element |
JP2011121337A (en) * | 2009-12-14 | 2011-06-23 | Seiko Instruments Inc | Thermal head and printer |
JP2011116136A (en) * | 2011-03-14 | 2011-06-16 | Seiko Instruments Inc | Heating resistor element, thermal head, and printer |
JP2012206298A (en) * | 2011-03-29 | 2012-10-25 | Toshiba Hokuto Electronics Corp | Thermal head, and manufacturing method therefor |
Also Published As
Publication number | Publication date |
---|---|
JPH0321352B2 (en) | 1991-03-22 |
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