JPS58120599A - Production of beta-silicon carbide whisker - Google Patents
Production of beta-silicon carbide whiskerInfo
- Publication number
- JPS58120599A JPS58120599A JP57002304A JP230482A JPS58120599A JP S58120599 A JPS58120599 A JP S58120599A JP 57002304 A JP57002304 A JP 57002304A JP 230482 A JP230482 A JP 230482A JP S58120599 A JPS58120599 A JP S58120599A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- carbon
- mixture
- silicon carbide
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229910010271 silicon carbide Inorganic materials 0.000 title description 6
- 239000002994 raw material Substances 0.000 claims abstract description 76
- 239000000203 mixture Substances 0.000 claims abstract description 43
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 10
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 10
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 10
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 10
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical class [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000012298 atmosphere Substances 0.000 claims abstract description 7
- 230000001590 oxidative effect Effects 0.000 claims abstract description 6
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 7
- 239000000843 powder Substances 0.000 abstract description 13
- 239000003575 carbonaceous material Substances 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 2
- 150000007513 acids Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000006229 carbon black Substances 0.000 description 5
- 239000008187 granular material Substances 0.000 description 4
- 239000012300 argon atmosphere Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/005—Growth of whiskers or needles
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はβ−炭化珪素ウィスカーを効率良く製造する方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for efficiently producing β-silicon carbide whiskers.
従来β−炭化珪素ウィスカーの製造方法として珪酸物質
と炭素質物質とをモル比で0.8〜2.6程度になるよ
う混合し、これを団塊状に成形し、非酸化性雰囲気ぐ灼
熱してIIる方法が行われている。この場合生成するS
IGウィスカーは混合原料の団塊物の表面や団塊物の間
に生成するが、その収率が悪いので、ウィスカーの製造
方法としては経済的でない。A conventional method for producing β-silicon carbide whiskers involves mixing a silicic acid substance and a carbonaceous substance at a molar ratio of about 0.8 to 2.6, forming the mixture into a nodule shape, and scorching it in a non-oxidizing atmosphere. The following method is being used. In this case, the generated S
IG whiskers are produced on the surface of or between the aggregates of the mixed raw materials, but the yield is poor, so this is not an economical method for producing whiskers.
本発明者等はこの欠点を克服し、ウィスカーを経済的に
製造する方法について種々研究したところ、微粉の珪酸
物質と炭素または含炭素物質とを特定割合に混合した混
合物Aと微粉の炭素または含炭素物質を、原料混合物A
中のSiO2に対し特定割合になるようにした原料Bと
を作り、これら両者を近接して配置し、両者を1300
〜1600℃に加熱すると原料混合物A内での反祐によ
り生成するSiOは原料混合物Aよりガス化揮敗して原
料B中の炭素と反応し針状のウィスカーが原料B内に収
率良く生成することを知見した。The present inventors overcame this drawback and conducted various research on methods for producing whiskers economically, and found that a mixture A, which is a mixture of a finely divided silicic acid material and carbon or a carbon-containing material in a specific ratio, and a finely divided carbon or carbon-containing material are mixed together. Carbon material, raw material mixture A
Raw material B is made to have a specific ratio to SiO2 in the material, and both are placed close to each other.
When heated to ~1600°C, SiO produced by reaction in raw material mixture A is gasified and volatilized from raw material mixture A, reacts with carbon in raw material B, and acicular whiskers are generated in raw material B with good yield. I found out that.
β−炭化珪素ウィスカーの生成機構の詳細は未だ完全に
解明されていないが、本発明においては、原料混合物A
において
Si 02 +C→ SiO+GO(1)の反応により
SiOが生成する。このSiOガスは混合物Aに近接し
て配置した原料Bに達し、原料Bにおいて
St O+ 20 −+ Si C+CO■の反応に
よりSICが生成し、次第にウィスカーに成長するもの
と考えられる。Although the details of the formation mechanism of β-silicon carbide whiskers have not yet been completely elucidated, in the present invention, the raw material mixture A
In this step, SiO is generated by the reaction of Si 02 +C→SiO+GO (1). It is thought that this SiO gas reaches the raw material B placed close to the mixture A, and in the raw material B, SIC is generated by the reaction of St O+ 20 −+ Si C + CO, and gradually grows into whiskers.
本発明はこの知見に基づくものであって、5i02:C
のモル比が1:1〜1:2になるように微粉の珪酸物質
と炭素または含炭素物質とを混合した原料混合物Aと微
粉の炭素または含炭素物質よりなる原料Bとを、原料混
合物A中のSiO2モル数:原料B中のCモル数の比が
1:2〜1:10になるように両原料を近接して配置し
、両者を1300〜1600℃の温度範囲で′非酸化性
雰囲気中において加熱し、原料B内に炭化珪素ウィスカ
ーを生成させることを特徴とするβ−炭化珪素ウィスカ
ーの製造方法である。The present invention is based on this knowledge, and 5i02:C
Raw material mixture A, which is a mixture of a finely divided silicic acid material and carbon or a carbon-containing material such that the molar ratio of Both raw materials are placed close to each other so that the ratio of SiO2 moles in raw material B to C moles in raw material B is 1:2 to 1:10, and both are heated in a temperature range of 1300 to 1600°C to make them non-oxidizing. This is a method for producing β-silicon carbide whiskers, which is characterized by heating in an atmosphere to generate silicon carbide whiskers in raw material B.
本発明において珪酸物質はアモルファス質珪酸でも結晶
質珪酸でも使用されるが何れの場合でも良質のものが好
ましくζ粒度は10μ以下程度のものが望ましい。また
含炭素物質としては樹脂、樹脂炭化物、セルローズなど
の含炭素物質が使用される。これらの含炭素物質は非酸
化性雰囲気における1300℃以上の加熱により何れも
炭化されるので、この場合における炭素−モル数は加熱
後得られた炭化物のモル数より計眸する。In the present invention, the silicic acid substance used may be either amorphous silicic acid or crystalline silicic acid, but in either case, it is preferably of good quality and preferably has a ζ particle size of about 10 μm or less. Further, as the carbon-containing substance, carbon-containing substances such as resin, resin carbide, cellulose, etc. are used. Since all of these carbon-containing substances are carbonized by heating at 1300° C. or higher in a non-oxidizing atmosphere, the number of moles of carbon in this case is calculated from the number of moles of carbide obtained after heating.
本発明において原料混合物A中のSiO2とCとの混合
割合は、SiO2:Cのモル比が1未満のときは未反応
の3i02が残り、モル比が2を越えるとSiOの生成
よりもSiC粉末の生成が顕著になるので、1:1〜1
:2とするのが好ましい。In the present invention, the mixing ratio of SiO2 and C in the raw material mixture A is such that when the molar ratio of SiO2:C is less than 1, unreacted 3i02 remains, and when the molar ratio exceeds 2, SiC powder is produced more than SiO2. Since the formation of
:2 is preferable.
本発明において原料混合物Aおよび原料Bは粉末状態に
おい−でも、また種々の形状に成形したものでも差支え
ない。次に原料混合物Aと原料Bとを近接して配置する
とは例えば後述の実施例1および2に示すように成形し
た原料混合物へと成形した原料Bとを混合する場合また
は実施例3で示すように原料混合物Aに近接して原料B
を層状に交互に配置する場合、さらにまた原料混合物A
と原料Bとを数C−程度離して配置しても良いという意
味である。要するに、SiO2とCとの混合物から成る
部分と、Cから成る部分が必ず存在する必要がある。In the present invention, the raw material mixture A and the raw material B may be in a powder state or molded into various shapes. Next, placing raw material mixture A and raw material B close to each other means, for example, when mixing molded raw material B into a molded raw material mixture as shown in Examples 1 and 2 below, or as shown in Example 3. In the vicinity of raw material mixture A, raw material B
When the raw material mixture A is arranged alternately in layers, the raw material mixture A
This means that the raw material B and the raw material B may be placed apart from each other by about several C-. In short, there must always be a portion consisting of a mixture of SiO2 and C and a portion consisting of C.
このように原料をAとBとの2つに分けた理由は、Si
C+Si 02→2 Si o+cなるSiCの分解
反応を防ぎ、SiCの生成効率を高めるためである。The reason why we divided the raw materials into two, A and B, is that Si
This is to prevent the decomposition reaction of SiC, ie, C+Si 02→2 Si o+c, and to increase the production efficiency of SiC.
原料混合物へと原料Bとの割合は、原料混合物Aから生
成する810の捕集を効果的にするため原料混合物A中
の5i02のモル数と原料B中のCのモル数ど−の比が
1:2〜1:10になるように配置することが好ましい
。何故なら、原料混合物A中のSiO2のモル数に対す
る原料B中のCのモル比が2未満になると原料混合物A
から生成するSiOが原料BのCに対して過剰になるた
め、SiOの捕集効果が低下する。またこのモル比が1
0を越えると残留するCが多くなる割りには捕集効果が
上がらないため、経済的でない。The ratio of raw material B to raw material mixture is such that the number of moles of 5i02 in raw material mixture A and the number of moles of C in raw material B are the same in order to effectively collect 810 generated from raw material mixture A. Preferably, the ratio is 1:2 to 1:10. This is because if the molar ratio of C in raw material B to the number of moles of SiO2 in raw material mixture A is less than 2, raw material mixture A
Since the SiO produced from the raw material B becomes excessive with respect to the C of the raw material B, the SiO trapping effect decreases. Also, this molar ratio is 1
If it exceeds 0, the trapping effect will not increase even though the amount of residual C increases, which is not economical.
本発明において加熱は急激に行ってもまた緩かに行って
もよいが、加熱温度は1300〜1600℃程度で、加
熱時間は例えば加熱温度が1500℃のとき数10分程
度で充分である。また加熱は炭素物質の酸化を防止する
ためアルゴン、水素な2のような非酸化性雰囲気で行う
。In the present invention, the heating may be performed rapidly or slowly, but the heating temperature is about 1300 to 1600°C, and the heating time is, for example, about several tens of minutes when the heating temperature is 1500°C. Further, the heating is performed in a non-oxidizing atmosphere such as argon or hydrogen 2 to prevent oxidation of the carbon material.
本発明によれば反応終了後は原料混合物、A中にはSi
Cはほとんど生成されず、原料B中にのみβ−8iCウ
イスカーが生成される。本発明により得られるβ−8i
Cウイスカーは炭素物質と共存した状態で得られ、また
不純物を含有しているのが普通であるので、得られたβ
−8iCウイスカーを空気中で加熱して炭素物質を除去
した後、更に酸処理すればより高純度のものを得ること
ができる。According to the present invention, after the reaction is completed, the raw material mixture, A contains Si
Almost no C is produced, and β-8iC whiskers are produced only in raw material B. β-8i obtained by the present invention
Since C whiskers are obtained in the coexistence of carbon substances and usually contain impurities, the obtained β
-8iC whiskers can be heated in air to remove carbon substances and then further treated with an acid to obtain higher purity whiskers.
本発明によれば簡単な操作で純度99%以上のβ−8t
Cウィスカーを50%以上の収率で得ることができる
。According to the present invention, β-8t with a purity of 99% or more can be obtained by simple operation.
C whiskers can be obtained with a yield of more than 50%.
実施例 1
アモルファスシリカ(純度99%)とカーボンブラック
粉末(純度99%、粒度10μ以下)をポットミル中で
モル比1:1の割合に、30分間混合したものを粒径3
−程度に造粒し、原料混合物Aを造るた。これとは別に
カーボンブラックを造粒し粒径3−一程度の原料Bを造
った。Example 1 Amorphous silica (purity 99%) and carbon black powder (purity 99%, particle size 10μ or less) were mixed in a pot mill at a molar ratio of 1:1 for 30 minutes, and the mixture was mixed with a particle size of 3.
- to produce raw material mixture A. Separately, carbon black was granulated to produce raw material B having a particle size of approximately 3-1.
このようにして得た造粒物を第1図に示す′ように、反
応容器に原料混合物A1.5に対し原料B1の重量比で
装入し、アルゴン雰囲気下で1500℃で1時間加熱し
たところ原料B中のみにβ−8ICウイスカーが生成し
た。得られたβ−8iCウイスカーを空気中で100℃
で30分間加熱して炭素を消失せしめた後、塩酸処理し
たところ、純度99%頃上のβ−8iCウイスカーを6
5%の収率で得た。The granules thus obtained were charged into a reaction vessel at a weight ratio of 1.5 of the raw material mixture A to 1 of the raw material B, as shown in Figure 1', and heated at 1500°C for 1 hour under an argon atmosphere. However, β-8IC whiskers were produced only in raw material B. The obtained β-8iC whiskers were heated at 100°C in air.
After heating for 30 minutes to eliminate carbon, treatment with hydrochloric acid resulted in β-8iC whiskers with a purity of about 99%.
Obtained with a yield of 5%.
比較例
上記実施例1で造った原料混合物A造粒物と原料B造粒
物とを重量比で1.5:1に混合したものをボットミル
で1時間粉砕し、5iOzとCとの均一混合物からなる
粉体を得た。この粉体をアルゴン雰囲気下で1500℃
で1時間加熱処理して得た反応生成物を空気中で600
℃、30分間加熱後、塩酸処理して得たものはβ−3i
C’フイス力−を約10%含んだ主にβ−8iC微粉
からなるもので、SiC全体としての収率は52%、ウ
ィスカーのみの収率は約5%であった。Comparative Example A mixture of raw material mixture A granules prepared in Example 1 and raw material B granules at a weight ratio of 1.5:1 was ground in a bot mill for 1 hour to form a homogeneous mixture of 5 iOz and C. A powder consisting of was obtained. This powder was heated to 1500℃ under an argon atmosphere.
The reaction product obtained by heat treatment for 1 hour at
After heating at ℃ for 30 minutes, the product obtained by treatment with hydrochloric acid is β-3i.
It was mainly composed of β-8iC fine powder containing about 10% of C' strength, and the overall yield of SiC was 52%, and the yield of only whiskers was about 5%.
実施例 2
アモルファスシリカ(純度99%)とカーボンブラック
粉末(純度99%、粒度10μ以下)をボットミル中で
モル比1:1.2の割合に1時間混合したものを粒径5
−程度に造粒し、原料混合物Aを造った。またこれとは
別にカーボンブラックを造粒し、粒径5−鶴程麿の原料
Bを造った。Example 2 Amorphous silica (purity 99%) and carbon black powder (purity 99%, particle size 10μ or less) were mixed in a bot mill at a molar ratio of 1:1.2 for 1 hour, and the mixture was mixed with a particle size of 5.
- granulation to produce raw material mixture A. Separately, carbon black was granulated to produce a raw material B having a particle size of 5-1.
このようにして造った造粒物を原料混合物A中の5IC
)+のモル比と原料B中のCのモル数とが1=4になる
ように実施例1と同核に反応容器に装入し、水素雰囲気
下で1480℃で 100分間加熱したところ、原料B
中のみにβ−8iCウイスカーが生成した。得られたβ
−8iCウイスカーを空気中で750℃で40分間加熱
して炭素を消失せしめた後、塩酸処理したところ、純度
98%以上のβ−8iCウイスカーを68%の収率で得
た。The granules produced in this way are added to 5IC of raw material mixture A.
)+ and the number of moles of C in raw material B were 1=4, and the same nucleus as in Example 1 was charged into a reaction vessel and heated at 1480°C for 100 minutes in a hydrogen atmosphere. Raw material B
β-8iC whiskers were generated only in the inside. The obtained β
-8iC whiskers were heated in air at 750° C. for 40 minutes to eliminate carbon, and then treated with hydrochloric acid to obtain β-8iC whiskers with a purity of 98% or higher at a yield of 68%.
実施例 3
アモルファスシリカ(純度99%)とカーボンブラック
粉末(純度98.5%、粒度10μ以下)をモル比で1
=1の割合に配合し、ボットミルで30分間混合して原
料混合物Aの粉末を造った。これとは別に無定形炭素(
純度98.5%)の粉末(粒度10μ以下)の原料Bを
造った。Example 3 Amorphous silica (purity 99%) and carbon black powder (purity 98.5%, particle size 10μ or less) were mixed in a molar ratio of 1
= 1 and mixed in a bot mill for 30 minutes to produce a powder of raw material mixture A. Apart from this, amorphous carbon (
Raw material B was prepared as a powder (particle size of 10 μm or less) with a purity of 98.5%.
このようにして造った原料混合物Aと原料Bとを原料混
合物A中の8102のモル数と原料B中のCのモル数の
比が1:5になるように実施例1と同じ反応容器中に第
2図に示す如く層状に交互に配置し、アルゴン雰囲気下
で1550℃で40分間加熱したところ、原料B中のみ
にβ−8ICウイスカーが生成した。得られたβ−8i
Cウイスカーを空気中で800℃で1時間加熱して炭素
を消失せしめたところβ−8iCウイスカーの収率は6
1%で純度は98%であった。次にこのSiCウィスカ
ーを弗酸処理したところ純度99.5%のβ−8iCウ
イスカーが得られた。The thus prepared raw material mixture A and raw material B were placed in the same reaction vessel as in Example 1 so that the ratio of the number of moles of 8102 in raw material mixture A to the number of moles of C in raw material B was 1:5. When the materials were arranged alternately in layers as shown in FIG. 2 and heated at 1550 DEG C. for 40 minutes in an argon atmosphere, β-8IC whiskers were formed only in raw material B. Obtained β-8i
When C whiskers were heated in air at 800°C for 1 hour to eliminate carbon, the yield of β-8iC whiskers was 6.
The purity was 98% at 1%. Next, when this SiC whisker was treated with hydrofluoric acid, β-8iC whisker with a purity of 99.5% was obtained.
第1図は実施例1および2における反応容器の原料混合
物Aと原料Bの装入状態を示す模式断面図であり、第2
図は実施例3における反応容器の原料混合物Aと原料B
の装入状態を示す模式断面図である。
図において、1・・・・・・原料混合物A、2・・・・
・・原料Bである。FIG. 1 is a schematic cross-sectional view showing the charged state of raw material mixture A and raw material B in the reaction vessels in Examples 1 and 2;
The figure shows raw material mixture A and raw material B in the reaction vessel in Example 3.
FIG. In the figure, 1... Raw material mixture A, 2...
...Raw material B.
Claims (1)
粉の珪酸物質と炭素または含炭素物質とを混合した原料
混合物へと、微粉の炭素または含炭素物質よりなる原料
Bとを、原料混合物A中の8102モル数:原料B中の
Cモル数の比が1:2〜1:10になるように近接して
配置し、両者を1300〜1600℃の温度範囲で非酸
化性雰囲気中において加熱し、原料B内に炭化珪素ウィ
スカーを生成させることを特徴とするβ−炭化珪素ウィ
スカーの製造方法。Raw material B consisting of finely powdered carbon or carbon-containing material is added to a raw material mixture in which finely powdered silicic acid material and carbon or carbon-containing material are mixed so that the molar ratio of SiO2:C is 1:1 to 1:2. , are placed close together so that the ratio of 8102 moles in raw material mixture A to C moles in raw material B is 1:2 to 1:10, and both are non-oxidizing in the temperature range of 1300 to 1600°C. A method for producing β-silicon carbide whiskers, which comprises heating in an atmosphere to generate silicon carbide whiskers in raw material B.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57002304A JPS58120599A (en) | 1982-01-12 | 1982-01-12 | Production of beta-silicon carbide whisker |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57002304A JPS58120599A (en) | 1982-01-12 | 1982-01-12 | Production of beta-silicon carbide whisker |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58120599A true JPS58120599A (en) | 1983-07-18 |
JPH0253400B2 JPH0253400B2 (en) | 1990-11-16 |
Family
ID=11525617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57002304A Granted JPS58120599A (en) | 1982-01-12 | 1982-01-12 | Production of beta-silicon carbide whisker |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58120599A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62212300A (en) * | 1986-03-11 | 1987-09-18 | Shin Etsu Chem Co Ltd | Production of silicon carbide whisker |
JPS63156100A (en) * | 1986-12-17 | 1988-06-29 | Kobe Steel Ltd | Production of silicon carbide whisker |
JPS63156099A (en) * | 1986-12-17 | 1988-06-29 | Kobe Steel Ltd | Production of silicon carbide whisker |
JPS63159299A (en) * | 1986-12-20 | 1988-07-02 | Kobe Steel Ltd | Production of silicon carbide whisker |
US4873070A (en) * | 1986-12-17 | 1989-10-10 | Kabushiki Kaisha Kobe Seiko Sho | Process for producing silicon carbide whiskers |
US4917866A (en) * | 1987-11-12 | 1990-04-17 | Toyota Jidosha Kabushiki Kaisha | Production process of silicon carbide short fibers |
US5021230A (en) * | 1987-04-22 | 1991-06-04 | Krstic Vladimir D | Method of making silicon carbide |
US5116679A (en) * | 1988-07-29 | 1992-05-26 | Alcan International Limited | Process for producing fibres composed of or coated with carbides or nitrides |
KR20040034968A (en) * | 2002-10-17 | 2004-04-29 | 장영철 | Method for Manufacturing Silicon Carbide Whisker Using Disposed Silicon Slurgy |
JP2016098162A (en) * | 2014-11-26 | 2016-05-30 | 太平洋セメント株式会社 | Production method of reclaimed silicon carbide powder, and production method of silicon carbide single crystal |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4932719A (en) * | 1972-07-27 | 1974-03-26 | ||
JPS5016760A (en) * | 1973-06-14 | 1975-02-21 |
-
1982
- 1982-01-12 JP JP57002304A patent/JPS58120599A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4932719A (en) * | 1972-07-27 | 1974-03-26 | ||
JPS5016760A (en) * | 1973-06-14 | 1975-02-21 |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0329040B2 (en) * | 1986-03-11 | 1991-04-22 | Shinetsu Chem Ind Co | |
JPS62212300A (en) * | 1986-03-11 | 1987-09-18 | Shin Etsu Chem Co Ltd | Production of silicon carbide whisker |
JPH0351678B2 (en) * | 1986-12-17 | 1991-08-07 | Kobe Seikosho Kk | |
US4873070A (en) * | 1986-12-17 | 1989-10-10 | Kabushiki Kaisha Kobe Seiko Sho | Process for producing silicon carbide whiskers |
JPS63156099A (en) * | 1986-12-17 | 1988-06-29 | Kobe Steel Ltd | Production of silicon carbide whisker |
JPH0351680B2 (en) * | 1986-12-17 | 1991-08-07 | Kobe Seikosho Kk | |
JPS63156100A (en) * | 1986-12-17 | 1988-06-29 | Kobe Steel Ltd | Production of silicon carbide whisker |
JPS63159299A (en) * | 1986-12-20 | 1988-07-02 | Kobe Steel Ltd | Production of silicon carbide whisker |
JPH0351679B2 (en) * | 1986-12-20 | 1991-08-07 | Kobe Seikosho Kk | |
US5021230A (en) * | 1987-04-22 | 1991-06-04 | Krstic Vladimir D | Method of making silicon carbide |
US4917866A (en) * | 1987-11-12 | 1990-04-17 | Toyota Jidosha Kabushiki Kaisha | Production process of silicon carbide short fibers |
US5116679A (en) * | 1988-07-29 | 1992-05-26 | Alcan International Limited | Process for producing fibres composed of or coated with carbides or nitrides |
KR20040034968A (en) * | 2002-10-17 | 2004-04-29 | 장영철 | Method for Manufacturing Silicon Carbide Whisker Using Disposed Silicon Slurgy |
JP2016098162A (en) * | 2014-11-26 | 2016-05-30 | 太平洋セメント株式会社 | Production method of reclaimed silicon carbide powder, and production method of silicon carbide single crystal |
Also Published As
Publication number | Publication date |
---|---|
JPH0253400B2 (en) | 1990-11-16 |
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