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JPS5763677A - Continuous vacuum treating device - Google Patents

Continuous vacuum treating device

Info

Publication number
JPS5763677A
JPS5763677A JP13780380A JP13780380A JPS5763677A JP S5763677 A JPS5763677 A JP S5763677A JP 13780380 A JP13780380 A JP 13780380A JP 13780380 A JP13780380 A JP 13780380A JP S5763677 A JPS5763677 A JP S5763677A
Authority
JP
Japan
Prior art keywords
chamber
substrates
auxiliary container
rack
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13780380A
Other languages
Japanese (ja)
Inventor
Hideki Tateishi
Tsuneaki Kamei
Katsuo Abe
Hide Kobayashi
Susumu Aiuchi
Masashi Nakatsuka
Nobuyuki Takahashi
Ryuji Sugimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Hitachi Ltd
Original Assignee
Hitachi Ltd
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Anelva Corp filed Critical Hitachi Ltd
Priority to JP13780380A priority Critical patent/JPS5763677A/en
Publication of JPS5763677A publication Critical patent/JPS5763677A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To smooth the flow processes of vacuum treatment such as sputtering and the treatments before and after the same by providing an inserting chamber installed with an auxiliary container, a vacuum treating chamber and a take-out chamber installed with an auxiliary container. CONSTITUTION:The inside of a take-out chamber 7 is evacuated to prescribed pressure by an evacuating pump 8 and after the respective chambers attain prescribed pressure, substrates 4 are fed successively from an inserting chamber 5 to a sputtering chamber 1 by a conveying mechanism. The substrates 4 are sputtered in this chamber 1, after which they are contained in the vessel 14 in the chamber 7, thence they are delivered to the atmospheric side of the chamber 7. During this time, the pretreated substrates 4 are contained in the 2nd rack 23 in the empty state of an auxiliary container 20 on the atmospheric side of the force-stage of the chamber 5, and at the stage when prescribed number of the substrates 4 are stacked in the 2nd rack 23, a revolving shaft 21 is rotated half. When prescribed number of the treated substrates 4' are stacked in the 2nd rack 27 in the empty state of an auxiliary container 24 on the atmospheric side of the post-stage of the chamber 7, a revolving shaft 5 is rotated half. The above-mentioned operations are carried out repeatedly.
JP13780380A 1980-10-03 1980-10-03 Continuous vacuum treating device Pending JPS5763677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13780380A JPS5763677A (en) 1980-10-03 1980-10-03 Continuous vacuum treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13780380A JPS5763677A (en) 1980-10-03 1980-10-03 Continuous vacuum treating device

Publications (1)

Publication Number Publication Date
JPS5763677A true JPS5763677A (en) 1982-04-17

Family

ID=15207208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13780380A Pending JPS5763677A (en) 1980-10-03 1980-10-03 Continuous vacuum treating device

Country Status (1)

Country Link
JP (1) JPS5763677A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4498832A (en) * 1982-05-21 1985-02-12 The Boc Group, Inc. Workpiece accumulating and transporting apparatus
EP0206180A2 (en) * 1985-06-17 1986-12-30 Fujitsu Limited A means for loading or unloading workpiece into or from a vacuum processing chamber
JPS6364770U (en) * 1986-10-15 1988-04-28
JPS63303060A (en) * 1987-05-30 1988-12-09 Tokuda Seisakusho Ltd Vacuum treatment equipment
US6533534B2 (en) * 1993-05-03 2003-03-18 Unaxis Balzers Aktiengesellschaft Method for improving the rate of a plasma enhanced vacuum treatment
WO2022095718A1 (en) * 2020-11-04 2022-05-12 江苏菲沃泰纳米科技股份有限公司 Continuous coating apparatus and continuous coating method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3131819A (en) * 1961-04-14 1964-05-05 Clark Aiken Company Shuttle piler
JPS506195A (en) * 1972-11-21 1975-01-22
JPS5336478A (en) * 1976-09-17 1978-04-04 Hitachi Ltd Automatic lead-out device for wafer from cartridge
JPS5513902A (en) * 1978-07-17 1980-01-31 Hitachi Ltd Device for feeding article

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3131819A (en) * 1961-04-14 1964-05-05 Clark Aiken Company Shuttle piler
JPS506195A (en) * 1972-11-21 1975-01-22
JPS5336478A (en) * 1976-09-17 1978-04-04 Hitachi Ltd Automatic lead-out device for wafer from cartridge
JPS5513902A (en) * 1978-07-17 1980-01-31 Hitachi Ltd Device for feeding article

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4498832A (en) * 1982-05-21 1985-02-12 The Boc Group, Inc. Workpiece accumulating and transporting apparatus
EP0206180A2 (en) * 1985-06-17 1986-12-30 Fujitsu Limited A means for loading or unloading workpiece into or from a vacuum processing chamber
JPS6364770U (en) * 1986-10-15 1988-04-28
JPS63303060A (en) * 1987-05-30 1988-12-09 Tokuda Seisakusho Ltd Vacuum treatment equipment
JPH0138872B2 (en) * 1987-05-30 1989-08-16 Tokuda Seisakusho
US6533534B2 (en) * 1993-05-03 2003-03-18 Unaxis Balzers Aktiengesellschaft Method for improving the rate of a plasma enhanced vacuum treatment
WO2022095718A1 (en) * 2020-11-04 2022-05-12 江苏菲沃泰纳米科技股份有限公司 Continuous coating apparatus and continuous coating method

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