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JPS5760620B2 - - Google Patents

Info

Publication number
JPS5760620B2
JPS5760620B2 JP51061021A JP6102176A JPS5760620B2 JP S5760620 B2 JPS5760620 B2 JP S5760620B2 JP 51061021 A JP51061021 A JP 51061021A JP 6102176 A JP6102176 A JP 6102176A JP S5760620 B2 JPS5760620 B2 JP S5760620B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51061021A
Other languages
Japanese (ja)
Other versions
JPS51145313A (en
Inventor
Henrii Ingeburechetsuto Ronarudo
Reimondo Girudo Jon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JPS51145313A publication Critical patent/JPS51145313A/en
Publication of JPS5760620B2 publication Critical patent/JPS5760620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
JP51061021A 1975-05-27 1976-05-26 Photosensitive composition* photosensitive element and method of forming image Granted JPS51145313A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58084575A 1975-05-27 1975-05-27

Publications (2)

Publication Number Publication Date
JPS51145313A JPS51145313A (en) 1976-12-14
JPS5760620B2 true JPS5760620B2 (en) 1982-12-20

Family

ID=24322804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51061021A Granted JPS51145313A (en) 1975-05-27 1976-05-26 Photosensitive composition* photosensitive element and method of forming image

Country Status (5)

Country Link
JP (1) JPS51145313A (en)
CA (1) CA1085212A (en)
DE (1) DE2623790C3 (en)
FR (1) FR2312799A1 (en)
GB (1) GB1546633A (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS58152236A (en) * 1982-03-05 1983-09-09 Toray Ind Inc Photosensitive composition
JPS5986046A (en) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS5988734A (en) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd Photosensitive composition
JPS62123444A (en) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd Radiation sensitive resinous composition
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JP2719912B2 (en) * 1987-05-07 1998-02-25 コニカ株式会社 Photosensitive lithographic printing plate
JPS63276047A (en) * 1987-05-07 1988-11-14 Konica Corp Photosensitive composition and photosensitive planographic printing plate
JP2806474B2 (en) * 1987-07-28 1998-09-30 三菱化学株式会社 Photosensitive composition
KR950000482B1 (en) * 1991-04-30 1995-01-20 가부시키가이샤 도시바 Resist for patterning
DE69700397T2 (en) 1996-04-23 2000-04-13 Kodak Polychrome Graphics Co. Ltd., Norwalk PRECURSOR OF A LITHOGRAPHIC PRINTING FORM AND THEIR USE IN IMAGING THROUGH HEAT
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP1449655A1 (en) 1997-10-17 2004-08-25 Fuji Photo Film Co., Ltd. A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6939663B2 (en) 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510152A (en) * 1949-07-23
BE506677A (en) * 1950-10-31
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate

Also Published As

Publication number Publication date
CA1085212A (en) 1980-09-09
GB1546633A (en) 1979-05-31
DE2623790A1 (en) 1976-12-23
DE2623790B2 (en) 1978-03-09
FR2312799A1 (en) 1976-12-24
JPS51145313A (en) 1976-12-14
DE2623790C3 (en) 1984-10-25
FR2312799B1 (en) 1978-11-17

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