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JPS5746456A - Ion injector - Google Patents

Ion injector

Info

Publication number
JPS5746456A
JPS5746456A JP55121160A JP12116080A JPS5746456A JP S5746456 A JPS5746456 A JP S5746456A JP 55121160 A JP55121160 A JP 55121160A JP 12116080 A JP12116080 A JP 12116080A JP S5746456 A JPS5746456 A JP S5746456A
Authority
JP
Japan
Prior art keywords
disc
housing
tube
chamber
supporting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55121160A
Other languages
English (en)
Inventor
Kiyoshi Yoshida
Masayuki Shimizu
Seiichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55121160A priority Critical patent/JPS5746456A/ja
Publication of JPS5746456A publication Critical patent/JPS5746456A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP55121160A 1980-09-03 1980-09-03 Ion injector Pending JPS5746456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55121160A JPS5746456A (en) 1980-09-03 1980-09-03 Ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55121160A JPS5746456A (en) 1980-09-03 1980-09-03 Ion injector

Publications (1)

Publication Number Publication Date
JPS5746456A true JPS5746456A (en) 1982-03-16

Family

ID=14804326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55121160A Pending JPS5746456A (en) 1980-09-03 1980-09-03 Ion injector

Country Status (1)

Country Link
JP (1) JPS5746456A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6418631A (en) * 1987-07-15 1989-01-23 Diafoil Co Ltd Polyester film having coated layer and containing fine air bubble
EP0306960A2 (en) 1987-09-10 1989-03-15 Diafoil Hoechst Co., Ltd Magnetic card
JPH02266911A (ja) * 1989-04-07 1990-10-31 Sekisui Plastics Co Ltd 耐熱性熱可塑性ポリエステル系樹脂発泡体の製造法
EP1583133A2 (en) * 2004-03-31 2005-10-05 Sumitomo Eaton Nova Corporation Wafer scanning device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6418631A (en) * 1987-07-15 1989-01-23 Diafoil Co Ltd Polyester film having coated layer and containing fine air bubble
EP0306960A2 (en) 1987-09-10 1989-03-15 Diafoil Hoechst Co., Ltd Magnetic card
JPH02266911A (ja) * 1989-04-07 1990-10-31 Sekisui Plastics Co Ltd 耐熱性熱可塑性ポリエステル系樹脂発泡体の製造法
EP1583133A2 (en) * 2004-03-31 2005-10-05 Sumitomo Eaton Nova Corporation Wafer scanning device
EP1583133A3 (en) * 2004-03-31 2006-07-26 Sumitomo Eaton Nova Corporation Wafer scanning device

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