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JPS5734324A - Manufacture of vertically magnetized film - Google Patents

Manufacture of vertically magnetized film

Info

Publication number
JPS5734324A
JPS5734324A JP10819580A JP10819580A JPS5734324A JP S5734324 A JPS5734324 A JP S5734324A JP 10819580 A JP10819580 A JP 10819580A JP 10819580 A JP10819580 A JP 10819580A JP S5734324 A JPS5734324 A JP S5734324A
Authority
JP
Japan
Prior art keywords
target
holder
substrate
plasma
bias
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10819580A
Other languages
Japanese (ja)
Other versions
JPS6367328B2 (en
Inventor
Takashi Tomie
Sadao Kadokura
Kazuhiko Honjo
Shigenobu Sobajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP10819580A priority Critical patent/JPS5734324A/en
Publication of JPS5734324A publication Critical patent/JPS5734324A/en
Publication of JPS6367328B2 publication Critical patent/JPS6367328B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To fom a magnetic film having predetermined characteristics at high speed by sputtering, by a method wherein plasma density around a target is increased by magnetic field and electric field permitting induced acceleration of positive charge particles in plasma toward a substrate is applied. CONSTITUTION:A powerful permanent magnet 2 and a yoke 13 are positioned at the rear of a Co-Cr alloy target 1 for water cooling. Plasma is generated at the target front only by shielding plates 12. One end of a substrate 3 is hooked 5 and the other end is closely contacted with a holder 4 arranged by facing to the target 1 through a spring 7. The holder 4 is composed of a semicylindrical copper block 4b containing a main body (a) and a heater 8 and a temperature detecting end is mounted on the holder 4 and an annular positive electrode 11 is placed in front of one shielding plate 12 along the external circumference of the target and bias E2 is applied across the positive electrode 11 and the holder main body 4a. Plasma density around the front of the target increases by capture through magnetic field to increase film formation speed and the film formation is accelerated by the bias E2 and the particles perform proper ion impact to the substrate 3 and a magnetic film having good vertical characteristics is formed.
JP10819580A 1980-08-08 1980-08-08 Manufacture of vertically magnetized film Granted JPS5734324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10819580A JPS5734324A (en) 1980-08-08 1980-08-08 Manufacture of vertically magnetized film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10819580A JPS5734324A (en) 1980-08-08 1980-08-08 Manufacture of vertically magnetized film

Publications (2)

Publication Number Publication Date
JPS5734324A true JPS5734324A (en) 1982-02-24
JPS6367328B2 JPS6367328B2 (en) 1988-12-26

Family

ID=14478413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10819580A Granted JPS5734324A (en) 1980-08-08 1980-08-08 Manufacture of vertically magnetized film

Country Status (1)

Country Link
JP (1) JPS5734324A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968825A (en) * 1982-10-14 1984-04-18 Teijin Ltd Manufacture of magnetic recording medium
JPS62266731A (en) * 1986-05-15 1987-11-19 Tohoku Metal Ind Ltd Manufacturing device for perpendicular magnetic recording medium
JPS6326827A (en) * 1986-07-21 1988-02-04 Hitachi Ltd Production of magnetic recording medium
JPH02289923A (en) * 1990-04-20 1990-11-29 Seiko Epson Corp Production of magnetic recording medium
US5494722A (en) * 1992-01-29 1996-02-27 Mitsubishi Chemical Corporation Magnetic recording medium and method for its production

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5451804A (en) * 1977-09-30 1979-04-24 Shiyunichi Iwasaki Magnetic recording medium
JPS5512732A (en) * 1978-07-14 1980-01-29 Anelva Corp Sputtering apparatus for making thin magnetic film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5451804A (en) * 1977-09-30 1979-04-24 Shiyunichi Iwasaki Magnetic recording medium
JPS5512732A (en) * 1978-07-14 1980-01-29 Anelva Corp Sputtering apparatus for making thin magnetic film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968825A (en) * 1982-10-14 1984-04-18 Teijin Ltd Manufacture of magnetic recording medium
JPH0217848B2 (en) * 1982-10-14 1990-04-23 Teijin Ltd
JPS62266731A (en) * 1986-05-15 1987-11-19 Tohoku Metal Ind Ltd Manufacturing device for perpendicular magnetic recording medium
JPS6326827A (en) * 1986-07-21 1988-02-04 Hitachi Ltd Production of magnetic recording medium
JPH02289923A (en) * 1990-04-20 1990-11-29 Seiko Epson Corp Production of magnetic recording medium
US5494722A (en) * 1992-01-29 1996-02-27 Mitsubishi Chemical Corporation Magnetic recording medium and method for its production

Also Published As

Publication number Publication date
JPS6367328B2 (en) 1988-12-26

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