JPS5729600A - Method for adjusting ph value of electroplating bath - Google Patents
Method for adjusting ph value of electroplating bathInfo
- Publication number
- JPS5729600A JPS5729600A JP10291480A JP10291480A JPS5729600A JP S5729600 A JPS5729600 A JP S5729600A JP 10291480 A JP10291480 A JP 10291480A JP 10291480 A JP10291480 A JP 10291480A JP S5729600 A JPS5729600 A JP S5729600A
- Authority
- JP
- Japan
- Prior art keywords
- value
- tank
- plating
- plating liquid
- electrolyte
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
PURPOSE: To made the pH value of an electrolyte constant, in an electroplating tank using an insoluble electrode as an anode, by subjecting the electrolyte to diffusion dialysis under a specific condition to remove a free acid.
CONSTITUTION: A pH value of a plating bath 3 in a plating tank 2 having an insoluble electrode 4 is lowered as electrolysis is advanced. Then, said electrolyte whose pH value is lowered is supplied to a diffusion dialysis tank 7 through a plating liquid recirculating pipe 6. Next, a free acid of the plating liquid in he dyalysis tank 7 is subjected to the dialysis to adjust a salt concn. of the residual liquid in a membrane to 10W80g/l and the pH value to 6.5 or below. Subsequently, this dialyzed plating liquid is returned to the plating tank 2 to be recirculated. As described above, because the plating liquid is recirculated through the diffusion dialysis apparatus, a pH value of the plating liquid is controlled.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10291480A JPS5940239B2 (en) | 1980-07-26 | 1980-07-26 | How to adjust the pH of an electroplating bath |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10291480A JPS5940239B2 (en) | 1980-07-26 | 1980-07-26 | How to adjust the pH of an electroplating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5729600A true JPS5729600A (en) | 1982-02-17 |
JPS5940239B2 JPS5940239B2 (en) | 1984-09-28 |
Family
ID=14340115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10291480A Expired JPS5940239B2 (en) | 1980-07-26 | 1980-07-26 | How to adjust the pH of an electroplating bath |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5940239B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05171499A (en) * | 1991-12-20 | 1993-07-09 | Nippon Riironaale Kk | Method and device for electroplating with tin or tin-lead alloy using insoluble anode |
EP2664692A2 (en) | 2012-05-15 | 2013-11-20 | Ebara Corporation | Plating apparatus and plating solution management method |
JP2014034691A (en) * | 2012-08-07 | 2014-02-24 | Mitsubishi Materials Corp | Recycling method and apparatus of plating solution |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6160540A (en) * | 1984-08-28 | 1986-03-28 | Fuji Xerox Co Ltd | Cabinet for copying machine |
CN105149610B (en) * | 2015-09-10 | 2018-05-22 | 舒城联科环境科技有限公司 | A kind of chemical nickeling ageing liquid treatment process |
-
1980
- 1980-07-26 JP JP10291480A patent/JPS5940239B2/en not_active Expired
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05171499A (en) * | 1991-12-20 | 1993-07-09 | Nippon Riironaale Kk | Method and device for electroplating with tin or tin-lead alloy using insoluble anode |
EP2664692A2 (en) | 2012-05-15 | 2013-11-20 | Ebara Corporation | Plating apparatus and plating solution management method |
JP2013237894A (en) * | 2012-05-15 | 2013-11-28 | Ebara Corp | Plating apparatus and plating solution management method |
EP2664692A3 (en) * | 2012-05-15 | 2017-02-15 | Ebara Corporation | Plating apparatus and plating solution management method |
JP2014034691A (en) * | 2012-08-07 | 2014-02-24 | Mitsubishi Materials Corp | Recycling method and apparatus of plating solution |
Also Published As
Publication number | Publication date |
---|---|
JPS5940239B2 (en) | 1984-09-28 |
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