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JPS5724944A - Printing plate making method - Google Patents

Printing plate making method

Info

Publication number
JPS5724944A
JPS5724944A JP9942280A JP9942280A JPS5724944A JP S5724944 A JPS5724944 A JP S5724944A JP 9942280 A JP9942280 A JP 9942280A JP 9942280 A JP9942280 A JP 9942280A JP S5724944 A JPS5724944 A JP S5724944A
Authority
JP
Japan
Prior art keywords
irradiation
base
coated
printing
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9942280A
Other languages
Japanese (ja)
Other versions
JPH0579978B2 (en
Inventor
Takayoshi Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP9942280A priority Critical patent/JPS5724944A/en
Publication of JPS5724944A publication Critical patent/JPS5724944A/en
Publication of JPH0579978B2 publication Critical patent/JPH0579978B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain a printing plate directly from the output of a layout scanner without passing through a step regarding a lithographic film, by scanning a printing base coated with an electron beam-hardenable composition by irradiation of electron beams. CONSTITUTION:A grained board plated with aluminum, zinc, chromium, or the like is roughened extremely finely on its surface is used for a base. On this base is coated an electron beam-hardenable composition containing a resin having ethylenically unsaturated bonds and causing radical polymerization on irradiation of electron beams. This coated printing base is scanned by irradiation of electron beams controlled by output of image information converted into an electric signal and obtained from a layout scanner, and then it is developed with an organic solvent derived from a ketone, ester, or aromatic compound. A desirable quantity of electron beam irradiation is 1-20 mega radons viewed from the points of image reproductivity precision and printing resistance.
JP9942280A 1980-07-22 1980-07-22 Printing plate making method Granted JPS5724944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9942280A JPS5724944A (en) 1980-07-22 1980-07-22 Printing plate making method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9942280A JPS5724944A (en) 1980-07-22 1980-07-22 Printing plate making method

Publications (2)

Publication Number Publication Date
JPS5724944A true JPS5724944A (en) 1982-02-09
JPH0579978B2 JPH0579978B2 (en) 1993-11-05

Family

ID=14247022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9942280A Granted JPS5724944A (en) 1980-07-22 1980-07-22 Printing plate making method

Country Status (1)

Country Link
JP (1) JPS5724944A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6181296U (en) * 1984-11-01 1986-05-29
JPS6181297U (en) * 1984-11-01 1986-05-29
JP2001288204A (en) * 2000-04-05 2001-10-16 Arakawa Chem Ind Co Ltd Preparation method of acrylic polymer composition and acrylic polymer composition obtained by preparation method
JP2017136591A (en) * 2008-03-11 2017-08-10 イミュノライト・エルエルシー Plasmonic assisted systems and methods for interior energy-activation from exterior radiation source

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5071407A (en) * 1973-08-09 1975-06-13
JPS5150747A (en) * 1974-08-29 1976-05-04 Grace W R & Co
JPS5369702A (en) * 1976-11-30 1978-06-21 Hitachi Ltd Device for etching by laser

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5071407A (en) * 1973-08-09 1975-06-13
JPS5150747A (en) * 1974-08-29 1976-05-04 Grace W R & Co
JPS5369702A (en) * 1976-11-30 1978-06-21 Hitachi Ltd Device for etching by laser

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6181297U (en) * 1984-11-01 1986-05-29
JPS6181296U (en) * 1984-11-01 1986-05-29
JP2001288204A (en) * 2000-04-05 2001-10-16 Arakawa Chem Ind Co Ltd Preparation method of acrylic polymer composition and acrylic polymer composition obtained by preparation method
US10213763B2 (en) 2007-04-08 2019-02-26 Immunolight, Llc. Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US10029117B2 (en) 2007-04-08 2018-07-24 Immunolight, Llc Systems and methods for interior energy-activation from an exterior source
US10201796B2 (en) 2007-04-08 2019-02-12 Immunolight, Llc. Plasmonic assisted systems and methods for interior energy-activation from an exterior source
JP2017136591A (en) * 2008-03-11 2017-08-10 イミュノライト・エルエルシー Plasmonic assisted systems and methods for interior energy-activation from exterior radiation source
JP2019104012A (en) * 2008-03-11 2019-06-27 イミュノライト・エルエルシー Plasmonic assisted systems and methods for interior energy-activation from exterior radiation source
US10363541B2 (en) 2008-03-11 2019-07-30 Immunolight, Llc. Systems and methods for interior energy-activation from an exterior source
US10682624B2 (en) 2008-03-11 2020-06-16 Immunolight, Llc Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US10717062B2 (en) 2008-03-11 2020-07-21 Immunolight, Llc Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US11173467B2 (en) 2008-03-11 2021-11-16 Immunolight, Llc Systems and methods for interior energy-activation from an exterior source
US11278861B2 (en) 2008-03-11 2022-03-22 Immunolight, Llc Plasmonic assisted systems and methods for interior energy-activation from an exterior source

Also Published As

Publication number Publication date
JPH0579978B2 (en) 1993-11-05

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