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JPS57210630A - Removing device for dust - Google Patents

Removing device for dust

Info

Publication number
JPS57210630A
JPS57210630A JP56095203A JP9520381A JPS57210630A JP S57210630 A JPS57210630 A JP S57210630A JP 56095203 A JP56095203 A JP 56095203A JP 9520381 A JP9520381 A JP 9520381A JP S57210630 A JPS57210630 A JP S57210630A
Authority
JP
Japan
Prior art keywords
gas
dust
carrying system
resist
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56095203A
Other languages
Japanese (ja)
Inventor
Hiroyuki Funatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56095203A priority Critical patent/JPS57210630A/en
Publication of JPS57210630A publication Critical patent/JPS57210630A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To remove the dust adhering on the surface of a photo-resist on a wafer easily before exposure by mounting a gas forwarding means to the section of a carrying system and forming a suction port inside the carrying system. CONSTITUTION:The ejecting ports 3 of a gas connected to a pipe with a valve 4 are disposed to the upper section of the carrying system 2, and the suction ports 6 are shaped into the carrying system 2 through a pipe 8 with a valve 7. The gas is ejected onto the surface of the photo-resist on the wafer 1 through the valve 4 and the pipe 5 from the gas forward means, the dust on the surface of the photo-resist is blown off and the dust is discharged to the outside from the suction ports 6 together with the gas.
JP56095203A 1981-06-22 1981-06-22 Removing device for dust Pending JPS57210630A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56095203A JPS57210630A (en) 1981-06-22 1981-06-22 Removing device for dust

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56095203A JPS57210630A (en) 1981-06-22 1981-06-22 Removing device for dust

Publications (1)

Publication Number Publication Date
JPS57210630A true JPS57210630A (en) 1982-12-24

Family

ID=14131186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56095203A Pending JPS57210630A (en) 1981-06-22 1981-06-22 Removing device for dust

Country Status (1)

Country Link
JP (1) JPS57210630A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62198122A (en) * 1986-02-26 1987-09-01 Hitachi Ltd Semiconductor processor
JPH01254952A (en) * 1988-04-05 1989-10-11 Konica Corp Manufacture of mohair plush for cartridge
JPH0615776U (en) * 1992-07-31 1994-03-01 ソニック・フエロー株式会社 Gas nozzle structure
US5370709A (en) * 1990-07-18 1994-12-06 Kabushiki Kaisha Toshiba Semiconductor wafer processing apparatus having a Bernoulli chuck
WO2011111139A1 (en) * 2010-03-08 2011-09-15 シャープ株式会社 Cleaning instrument, and instrument having polarizing plate attached thereto
JP2017092488A (en) * 2016-12-28 2017-05-25 大日本印刷株式会社 Imprint device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62198122A (en) * 1986-02-26 1987-09-01 Hitachi Ltd Semiconductor processor
JPH01254952A (en) * 1988-04-05 1989-10-11 Konica Corp Manufacture of mohair plush for cartridge
US5370709A (en) * 1990-07-18 1994-12-06 Kabushiki Kaisha Toshiba Semiconductor wafer processing apparatus having a Bernoulli chuck
JPH0615776U (en) * 1992-07-31 1994-03-01 ソニック・フエロー株式会社 Gas nozzle structure
WO2011111139A1 (en) * 2010-03-08 2011-09-15 シャープ株式会社 Cleaning instrument, and instrument having polarizing plate attached thereto
JP2017092488A (en) * 2016-12-28 2017-05-25 大日本印刷株式会社 Imprint device

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