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JPS57147616A - Formation of substrate for liquid crystal cell - Google Patents

Formation of substrate for liquid crystal cell

Info

Publication number
JPS57147616A
JPS57147616A JP3225281A JP3225281A JPS57147616A JP S57147616 A JPS57147616 A JP S57147616A JP 3225281 A JP3225281 A JP 3225281A JP 3225281 A JP3225281 A JP 3225281A JP S57147616 A JPS57147616 A JP S57147616A
Authority
JP
Japan
Prior art keywords
mask
thin film
insulation characteristic
film
characteristic thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3225281A
Other languages
Japanese (ja)
Other versions
JPH035564B2 (en
Inventor
Akira Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Original Assignee
Citizen Holdings Co Ltd
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Holdings Co Ltd, Citizen Watch Co Ltd filed Critical Citizen Holdings Co Ltd
Priority to JP3225281A priority Critical patent/JPS57147616A/en
Publication of JPS57147616A publication Critical patent/JPS57147616A/en
Publication of JPH035564B2 publication Critical patent/JPH035564B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To make the sticking of an insulation characteristic thin film formed on an org. high polymer mask having hydroxyl groups of epoxy type and methacrylic type thin and easy to penetrate by using said mask and making the film on the mask exceedingly thick. CONSTITUTION:In the stage of forming an insulation characteristic thin film 6 on a glass plate provided with transparent conductive films 2 and a part of the said transparent conductive films, the areas where the formation of the insulation characteristic thin film are not required beforehand formed with an org. high polymer mask 7 having hydroxyl groups of epoxy type and methacrylate ester, and the mark is so formed that particularly in the sealing parts the insulation characteristic thin film is extended to the 1/3-1/2 area of the width of the sealing part. The film thickness of the mask is set at 10-100mum, and the insulation characteristic thin film is formed thereon to 800-2,000Angstrom film thicknesses. After this is calcined temporarily at 140-180 deg.C, the mask is swollen and dissolved with methylene chloride or trichloroethylene, and is ultrasonically treated in a triethane soln., whereby the mask is stripped off.
JP3225281A 1981-03-06 1981-03-06 Formation of substrate for liquid crystal cell Granted JPS57147616A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3225281A JPS57147616A (en) 1981-03-06 1981-03-06 Formation of substrate for liquid crystal cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3225281A JPS57147616A (en) 1981-03-06 1981-03-06 Formation of substrate for liquid crystal cell

Publications (2)

Publication Number Publication Date
JPS57147616A true JPS57147616A (en) 1982-09-11
JPH035564B2 JPH035564B2 (en) 1991-01-25

Family

ID=12353818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3225281A Granted JPS57147616A (en) 1981-03-06 1981-03-06 Formation of substrate for liquid crystal cell

Country Status (1)

Country Link
JP (1) JPS57147616A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6177032A (en) * 1984-09-25 1986-04-19 Seikosha Co Ltd Production of liquid crystal panel substrate
JP2011081179A (en) * 2009-10-07 2011-04-21 Lg Display Co Ltd Method for forming liquid crystal alignment layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6177032A (en) * 1984-09-25 1986-04-19 Seikosha Co Ltd Production of liquid crystal panel substrate
JP2011081179A (en) * 2009-10-07 2011-04-21 Lg Display Co Ltd Method for forming liquid crystal alignment layer

Also Published As

Publication number Publication date
JPH035564B2 (en) 1991-01-25

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