JPS5713758A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5713758A JPS5713758A JP8740980A JP8740980A JPS5713758A JP S5713758 A JPS5713758 A JP S5713758A JP 8740980 A JP8740980 A JP 8740980A JP 8740980 A JP8740980 A JP 8740980A JP S5713758 A JPS5713758 A JP S5713758A
- Authority
- JP
- Japan
- Prior art keywords
- region
- collector
- impurity density
- withstand voltage
- amplification factor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 239000012535 impurity Substances 0.000 abstract 3
- 230000003321 amplification Effects 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 238000003199 nucleic acid amplification method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To provide sufficient collector withstand voltage and current amplification factor at a semiconductor device by forming a high density region in the emitter region of a lateral transistor and setting low collector region impurity density in the vicinity of the base and collector junction. CONSTITUTION:Two P type low impurity density regions are formed as an emitter region 13 and a collector region 14 in an N type semiconductor substrate 11. The same conductive type high density diffused layer 6 is formed within the region 13, and an oxidized film 12 and a metallic electrode 15 are formed. Since the impurity density of the collector region 14 can be decreased and a depletion layer can be sufficiently extended to the inside of the collector region, the semiconductor region 11 becoming a base can be reduced in width, and the current amplification factor hFE can be increased without decreasing the collector withstand voltage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8740980A JPS5713758A (en) | 1980-06-27 | 1980-06-27 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8740980A JPS5713758A (en) | 1980-06-27 | 1980-06-27 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5713758A true JPS5713758A (en) | 1982-01-23 |
Family
ID=13914074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8740980A Pending JPS5713758A (en) | 1980-06-27 | 1980-06-27 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5713758A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61216469A (en) * | 1985-03-22 | 1986-09-26 | Nec Corp | Lateral transistor |
JPS6394676A (en) * | 1986-10-09 | 1988-04-25 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6394677A (en) * | 1986-10-09 | 1988-04-25 | Pioneer Electronic Corp | Manufacture of semiconductor element |
JPH01128463A (en) * | 1987-11-12 | 1989-05-22 | Sanyo Electric Co Ltd | Semiconductor integrated circuit |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5240077A (en) * | 1975-09-26 | 1977-03-28 | Hitachi Ltd | Process for production of lateral transistor |
JPS5265679A (en) * | 1975-11-27 | 1977-05-31 | Mitsubishi Electric Corp | Semiconductor device |
JPS54137283A (en) * | 1978-04-17 | 1979-10-24 | Mitsubishi Electric Corp | Lateral pnp transistor |
-
1980
- 1980-06-27 JP JP8740980A patent/JPS5713758A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5240077A (en) * | 1975-09-26 | 1977-03-28 | Hitachi Ltd | Process for production of lateral transistor |
JPS5265679A (en) * | 1975-11-27 | 1977-05-31 | Mitsubishi Electric Corp | Semiconductor device |
JPS54137283A (en) * | 1978-04-17 | 1979-10-24 | Mitsubishi Electric Corp | Lateral pnp transistor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61216469A (en) * | 1985-03-22 | 1986-09-26 | Nec Corp | Lateral transistor |
JPS6394676A (en) * | 1986-10-09 | 1988-04-25 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6394677A (en) * | 1986-10-09 | 1988-04-25 | Pioneer Electronic Corp | Manufacture of semiconductor element |
JPH01128463A (en) * | 1987-11-12 | 1989-05-22 | Sanyo Electric Co Ltd | Semiconductor integrated circuit |
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