JPS571287A - Basic lateral mode semiconductor laser and manufacture thereof - Google Patents
Basic lateral mode semiconductor laser and manufacture thereofInfo
- Publication number
- JPS571287A JPS571287A JP7448180A JP7448180A JPS571287A JP S571287 A JPS571287 A JP S571287A JP 7448180 A JP7448180 A JP 7448180A JP 7448180 A JP7448180 A JP 7448180A JP S571287 A JPS571287 A JP S571287A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- mesa
- grown
- lateral mode
- blocking layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2237—Buried stripe structure with a non-planar active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/24—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a grooved structure, e.g. V-grooved, crescent active layer in groove, VSIS laser
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain the stable, basic, lateral mode laser by providing a current blocking layer on both sides of a belt shaped mesa structure on an N type substrate so that said blocking layer is higher than said mesa structure, and embedding an active layer which is surrounded by a P layer characterized by a low refractive index and large inhibition handwidth in the groove formed by the mesa top and the blocking layer. CONSTITUTION:A belt shaped mesa 10, whose cross sectional area is of a trapezoidal shape and top side is of 4mum or less is formed in the (01-1) direction on the (001) surface of an N type InP substrate 1. A P<->GaP current blocking layer 2 is formed by reducing the temperature from 630 deg.C at a rate of 0.7 deg.C/min. for 120sec or less, in accordance with a liquid phase epitaxial method. At this time, nothing is grown on the top of the mesa, but, the layer 2 is grown on the surrounding surface so that the layer 2 is higher than the mesa 10. Then, an N<->InP clad 3, a nonadded InGaAsP active layer 4, a P<->InP clad 5, and a P<->InGaAsP can layer 6 are epitaxially grown consecutively. The compositions of the layer 4 and 6 are the same. Before the layer 3 is embedded in the groove 11 completely, the growing is stopped, the layer 4 and layer 5 are grown and embedded. In this constitution, light is confined in the layer 4, and the stable, basic, lateral mode oscillation can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7448180A JPS571287A (en) | 1980-06-03 | 1980-06-03 | Basic lateral mode semiconductor laser and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7448180A JPS571287A (en) | 1980-06-03 | 1980-06-03 | Basic lateral mode semiconductor laser and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS571287A true JPS571287A (en) | 1982-01-06 |
Family
ID=13548500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7448180A Pending JPS571287A (en) | 1980-06-03 | 1980-06-03 | Basic lateral mode semiconductor laser and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS571287A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6014486A (en) * | 1983-07-04 | 1985-01-25 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
-
1980
- 1980-06-03 JP JP7448180A patent/JPS571287A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6014486A (en) * | 1983-07-04 | 1985-01-25 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
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