JPS5654040A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS5654040A JPS5654040A JP13068979A JP13068979A JPS5654040A JP S5654040 A JPS5654040 A JP S5654040A JP 13068979 A JP13068979 A JP 13068979A JP 13068979 A JP13068979 A JP 13068979A JP S5654040 A JPS5654040 A JP S5654040A
- Authority
- JP
- Japan
- Prior art keywords
- exposed
- location
- mark
- beams
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To conduct positioning accurately by simple constitution by a method wherein a mark location put on a material to be exposed is precisely detected without depending upon the accuracy of a deflection system of electron beams with regard to the patterning, etc. of a semiconductor substrate. CONSTITUTION:The material to be exposed 13 is moved against electron beams 11 fixed. The scanning width of the beams 11 is precisely prescribed according to the quantity of the base moved, and obtained by means of a measuring unit 15. A location where a mark 13C of the material to be exposed is put is subject to the irradiation of beams to generate reflected electrons. The electrons are detected 16, and A/D converted 17. Measured pulses 15 are inputted to the converter 17, and the number of measured pulses at a point of time of the rise and fall of mark detecting signals 16 is extracted, A/D converted and inputted to an arithmetic unit 18. The unit 18 calculates a mark location of the material to be exposed 13, and puts out the location as positioning information. The same applies in the Y direction. Thus, positioning can be conducted extremely accurate using a unit distance of the laser measuring unit as the reference from the quantity of the base moved directly corresponding to the scanning width of the electron beams.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13068979A JPS5654040A (en) | 1979-10-09 | 1979-10-09 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13068979A JPS5654040A (en) | 1979-10-09 | 1979-10-09 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5654040A true JPS5654040A (en) | 1981-05-13 |
Family
ID=15040259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13068979A Pending JPS5654040A (en) | 1979-10-09 | 1979-10-09 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5654040A (en) |
-
1979
- 1979-10-09 JP JP13068979A patent/JPS5654040A/en active Pending
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