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JPS5654040A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5654040A
JPS5654040A JP13068979A JP13068979A JPS5654040A JP S5654040 A JPS5654040 A JP S5654040A JP 13068979 A JP13068979 A JP 13068979A JP 13068979 A JP13068979 A JP 13068979A JP S5654040 A JPS5654040 A JP S5654040A
Authority
JP
Japan
Prior art keywords
exposed
location
mark
beams
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13068979A
Other languages
Japanese (ja)
Inventor
Hideo Kusakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13068979A priority Critical patent/JPS5654040A/en
Publication of JPS5654040A publication Critical patent/JPS5654040A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To conduct positioning accurately by simple constitution by a method wherein a mark location put on a material to be exposed is precisely detected without depending upon the accuracy of a deflection system of electron beams with regard to the patterning, etc. of a semiconductor substrate. CONSTITUTION:The material to be exposed 13 is moved against electron beams 11 fixed. The scanning width of the beams 11 is precisely prescribed according to the quantity of the base moved, and obtained by means of a measuring unit 15. A location where a mark 13C of the material to be exposed is put is subject to the irradiation of beams to generate reflected electrons. The electrons are detected 16, and A/D converted 17. Measured pulses 15 are inputted to the converter 17, and the number of measured pulses at a point of time of the rise and fall of mark detecting signals 16 is extracted, A/D converted and inputted to an arithmetic unit 18. The unit 18 calculates a mark location of the material to be exposed 13, and puts out the location as positioning information. The same applies in the Y direction. Thus, positioning can be conducted extremely accurate using a unit distance of the laser measuring unit as the reference from the quantity of the base moved directly corresponding to the scanning width of the electron beams.
JP13068979A 1979-10-09 1979-10-09 Electron beam exposure device Pending JPS5654040A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13068979A JPS5654040A (en) 1979-10-09 1979-10-09 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13068979A JPS5654040A (en) 1979-10-09 1979-10-09 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5654040A true JPS5654040A (en) 1981-05-13

Family

ID=15040259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13068979A Pending JPS5654040A (en) 1979-10-09 1979-10-09 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5654040A (en)

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