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JPS5639538A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5639538A
JPS5639538A JP11418579A JP11418579A JPS5639538A JP S5639538 A JPS5639538 A JP S5639538A JP 11418579 A JP11418579 A JP 11418579A JP 11418579 A JP11418579 A JP 11418579A JP S5639538 A JPS5639538 A JP S5639538A
Authority
JP
Japan
Prior art keywords
high molecular
photosensitive composition
compound
bisazide
bisazide compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11418579A
Other languages
Japanese (ja)
Other versions
JPS628777B2 (en
Inventor
Takao Iwayagi
Yukio Hatano
Takahiro Kobashi
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11418579A priority Critical patent/JPS5639538A/en
Priority to DE2948324A priority patent/DE2948324C2/en
Publication of JPS5639538A publication Critical patent/JPS5639538A/en
Priority to US06/484,847 priority patent/US4469778A/en
Publication of JPS628777B2 publication Critical patent/JPS628777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To form a minute pattern of several mum width by using a specified bisazide compound having photosensitivity to ultraviolet light of 200-300nm shorter wavelengths as a component of a photosensitive composition. CONSTITUTION:A photosensitive composition consisting of a bisazide compound represented by the formula (where A is O, S, CH2, CH2CH2, SO2 or S2, X is H or N3, and Z is N3 and H or Cl when X is H and N3, respectively) and a high molecular compound which is crosslinked with the photoreaction product of the bisazide compound is applied to a substrate and patternwise exposed to ultraviolet light of 200-300nm shorter wavelengths. Thus, for example, patterns of 1mum width can be formed at 2mum intervals. The above-mentioned high molecular compound includes natural rubber, modified rubber, synthetic rubber and synthetic high molecular compounds such as polystyrene and nylon. Especially, a photosensitive composition contg. a bisazide compound, as a crosslinking agent, in which A in the formula is SO2 shows no oxygen desensitization.
JP11418579A 1978-12-01 1979-09-07 Pattern forming method Granted JPS5639538A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP11418579A JPS5639538A (en) 1979-09-07 1979-09-07 Pattern forming method
DE2948324A DE2948324C2 (en) 1978-12-01 1979-11-30 Photosensitive composition containing a bisazide compound and method for forming patterns
US06/484,847 US4469778A (en) 1978-12-01 1983-04-14 Pattern formation method utilizing deep UV radiation and bisazide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11418579A JPS5639538A (en) 1979-09-07 1979-09-07 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5639538A true JPS5639538A (en) 1981-04-15
JPS628777B2 JPS628777B2 (en) 1987-02-24

Family

ID=14631315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11418579A Granted JPS5639538A (en) 1978-12-01 1979-09-07 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5639538A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
JPS5853136U (en) * 1981-10-06 1983-04-11 株式会社東芝 Liquid phase epitaxial growth equipment
JPS58203438A (en) * 1982-05-24 1983-11-26 Hitachi Ltd Formation of fine pattern
JPS5923341A (en) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd Resin composition
JPH01201093A (en) * 1988-02-04 1989-08-14 Hitachi Cable Ltd Method for liquid-phase epitaxial growth

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
JPS5853136U (en) * 1981-10-06 1983-04-11 株式会社東芝 Liquid phase epitaxial growth equipment
JPH023620Y2 (en) * 1981-10-06 1990-01-29
JPS58203438A (en) * 1982-05-24 1983-11-26 Hitachi Ltd Formation of fine pattern
JPS5923341A (en) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd Resin composition
JPH01201093A (en) * 1988-02-04 1989-08-14 Hitachi Cable Ltd Method for liquid-phase epitaxial growth

Also Published As

Publication number Publication date
JPS628777B2 (en) 1987-02-24

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