JPS5636653A - Photosensitive resin plate for relief - Google Patents
Photosensitive resin plate for reliefInfo
- Publication number
- JPS5636653A JPS5636653A JP11215979A JP11215979A JPS5636653A JP S5636653 A JPS5636653 A JP S5636653A JP 11215979 A JP11215979 A JP 11215979A JP 11215979 A JP11215979 A JP 11215979A JP S5636653 A JPS5636653 A JP S5636653A
- Authority
- JP
- Japan
- Prior art keywords
- relief
- photosensitive resin
- film
- thick
- resin plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To control side etching, provide mechanical strength to a relief and enable minute clear printing by using relief printing composed of a matted polyester film as a support layer. CONSTITUTION:A negative is laid on a glass plate and covered with an about 12mu thick polyester film, and a photosensitive unsatd. polyester resing soln. is squeezed on the film in 700mu thickness with a doctor. A 250mu thick matted polyester film with an about 40mu thick EVA adhesive applied to the surface is then allowed to contact with the photosensitive resin layer as a support film to obtain a photosensitive resin plate. This resin plate is irradiated with ultraviolet rays for 3min from the glass plate side at 50cm distance from a 4kW high voltage mercury lamp, and the unexposed part is removed with an air knife to maunfacture a Mt. Fuji type relief faithfully following the negative and having 700mu relief height and 65 deg. shoulder angle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11215979A JPS5636653A (en) | 1979-08-31 | 1979-08-31 | Photosensitive resin plate for relief |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11215979A JPS5636653A (en) | 1979-08-31 | 1979-08-31 | Photosensitive resin plate for relief |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5636653A true JPS5636653A (en) | 1981-04-09 |
Family
ID=14579706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11215979A Pending JPS5636653A (en) | 1979-08-31 | 1979-08-31 | Photosensitive resin plate for relief |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5636653A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59501611A (en) * | 1982-09-06 | 1984-09-06 | ブダペステイ ミユスザキ エギエテム | A circuit device that compensates for rapidly changing reactive currents in customer bus lines, especially those that generate upper harmonics. |
JPS63121849A (en) * | 1986-11-12 | 1988-05-25 | Asahi Chem Ind Co Ltd | Improved masking exposing method |
JPH0253234U (en) * | 1988-09-30 | 1990-04-17 | ||
JPH05195472A (en) * | 1992-01-14 | 1993-08-03 | Ookurashiyou Insatsu Kyokucho | Device for preventing dew condensation on back surface of shower save-all and work scaffold disposed on produced paper in paper machine |
EP2577400A1 (en) * | 2010-06-04 | 2013-04-10 | MacDermid Printing Solutions, LLC | Method of producing a relief image from a liquid photopolymer resin |
-
1979
- 1979-08-31 JP JP11215979A patent/JPS5636653A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59501611A (en) * | 1982-09-06 | 1984-09-06 | ブダペステイ ミユスザキ エギエテム | A circuit device that compensates for rapidly changing reactive currents in customer bus lines, especially those that generate upper harmonics. |
JPS63121849A (en) * | 1986-11-12 | 1988-05-25 | Asahi Chem Ind Co Ltd | Improved masking exposing method |
JPH0253234U (en) * | 1988-09-30 | 1990-04-17 | ||
JPH05195472A (en) * | 1992-01-14 | 1993-08-03 | Ookurashiyou Insatsu Kyokucho | Device for preventing dew condensation on back surface of shower save-all and work scaffold disposed on produced paper in paper machine |
EP2577400A1 (en) * | 2010-06-04 | 2013-04-10 | MacDermid Printing Solutions, LLC | Method of producing a relief image from a liquid photopolymer resin |
EP2577400A4 (en) * | 2010-06-04 | 2013-06-12 | Macdermid Printing Solutions | Method of producing a relief image from a liquid photopolymer resin |
US8476000B2 (en) | 2010-06-04 | 2013-07-02 | Ryan Vest | Method of producing a relief image from a liquid photopolymer resin |
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