JPS56160743A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- JPS56160743A JPS56160743A JP6388980A JP6388980A JPS56160743A JP S56160743 A JPS56160743 A JP S56160743A JP 6388980 A JP6388980 A JP 6388980A JP 6388980 A JP6388980 A JP 6388980A JP S56160743 A JPS56160743 A JP S56160743A
- Authority
- JP
- Japan
- Prior art keywords
- ion chamber
- out electrode
- electrodes
- lead
- permanent magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To produce a plasma beam having small divergence angle by locating a magnetic member on the outer wall of an ion chamber located at the nearest position to the load-out electrode in the ion chamber while reducing the leakage flux into the ion chamber. CONSTITUTION:Lead-out electrode group comprising acceleration electrodes 18, deceleration electrodes 20 and ground electrodes 22 are arranged in an ion chamber 14 formed by a square wall 12. Square frame permanent magnets 16 are arranged on the outer face of the ion chamber 12 while surrounding the circumferential face, while a magnetic members 24 are arranged at the nearest position to the acceleration electrode 18 in the ion chamber 14 in similar shape with said permanent magnet 16. Then the permanent magnet 16 and the magnetic member 24 are surrounded by a frame member 26 of high permeability material having C-shaped cross-section. Consequently the leakage flux in the proximity of the lead-out electrode group is reduced considerably to bring the flux density at this portion high, thereby the shutting effect of plasma is increased to reduce the beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6388980A JPS56160743A (en) | 1980-05-16 | 1980-05-16 | Ion source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6388980A JPS56160743A (en) | 1980-05-16 | 1980-05-16 | Ion source |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56160743A true JPS56160743A (en) | 1981-12-10 |
JPS6311741B2 JPS6311741B2 (en) | 1988-03-15 |
Family
ID=13242304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6388980A Granted JPS56160743A (en) | 1980-05-16 | 1980-05-16 | Ion source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56160743A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6166869A (en) * | 1984-09-11 | 1986-04-05 | Toshiba Corp | Rf type ion engine |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS539993A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Ion producing device |
-
1980
- 1980-05-16 JP JP6388980A patent/JPS56160743A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS539993A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Ion producing device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6166869A (en) * | 1984-09-11 | 1986-04-05 | Toshiba Corp | Rf type ion engine |
Also Published As
Publication number | Publication date |
---|---|
JPS6311741B2 (en) | 1988-03-15 |
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