JPS56157034A - Usage of resist mask - Google Patents
Usage of resist maskInfo
- Publication number
- JPS56157034A JPS56157034A JP6142380A JP6142380A JPS56157034A JP S56157034 A JPS56157034 A JP S56157034A JP 6142380 A JP6142380 A JP 6142380A JP 6142380 A JP6142380 A JP 6142380A JP S56157034 A JPS56157034 A JP S56157034A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- electron beam
- pattern
- mask
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 abstract 6
- 238000010894 electron beam technology Methods 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To enhance the withstanding property against etching of a resist layer and to enable to be used as the mask for etching by a method wherein the resist pattern exposed to an electron beam is irradiated again with the electron beam. CONSTITUTION:The surface of an Si substrate 1 is covered with polyglycidyl metaacrylate 2, and is exposed to the irradiation of an electron beam 3 forming a pattern. It is developed to obtain the pattern 20. The whole surface thereof is irradiated again with the electron beam to obtain a degenerated pattern layer 21. When etching is performed using this layer as the mask, because etching speed at the layer 21 is slow, so that the pattern form of the etched silicon becomes vertical. Accordingly the withstanding property against etching of the resist mask for exposure in the electron beam is enhanced enabling to be used as the etching mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6142380A JPS56157034A (en) | 1980-05-09 | 1980-05-09 | Usage of resist mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6142380A JPS56157034A (en) | 1980-05-09 | 1980-05-09 | Usage of resist mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56157034A true JPS56157034A (en) | 1981-12-04 |
Family
ID=13170654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6142380A Pending JPS56157034A (en) | 1980-05-09 | 1980-05-09 | Usage of resist mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56157034A (en) |
-
1980
- 1980-05-09 JP JP6142380A patent/JPS56157034A/en active Pending
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