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JPS56120128A - Matching mark for electronic beam exposure - Google Patents

Matching mark for electronic beam exposure

Info

Publication number
JPS56120128A
JPS56120128A JP2483080A JP2483080A JPS56120128A JP S56120128 A JPS56120128 A JP S56120128A JP 2483080 A JP2483080 A JP 2483080A JP 2483080 A JP2483080 A JP 2483080A JP S56120128 A JPS56120128 A JP S56120128A
Authority
JP
Japan
Prior art keywords
matching mark
region
silicon
mark
matching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2483080A
Other languages
Japanese (ja)
Inventor
Yasuo Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2483080A priority Critical patent/JPS56120128A/en
Priority to US06/237,049 priority patent/US4356223A/en
Publication of JPS56120128A publication Critical patent/JPS56120128A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To make high-precision matching of a mark by forming a region where an electronic beam matching mark is formed surrounded by a silicon removed part in such manner that a region for forming a device body is formed may be isolated with regard to an automatic matching mark when a semiconductor device is directly exposed by means of an electronic beam. CONSTITUTION:The point is such that a region where a matching mark for exposure with an electronic beam, is formed surrounded by a silicon removed part in such manner that said region may be isolated from a region where a device body is formed. For instance, a cavity formed on the surface of silicon itself is an isolation region for forming a matching mark and a silicon protrusion formed independently in said isolation region in an islandlike pattern, is a matching mark. In this case, a protruded matching mark 502 is formed like an island in a silicon cavity 502. The step of silicon is preferably equivalent to, for instance, 0.5-5mum. The distance l from the matching mark to a surrounding wall drawing the isolation region shall be free from any influence of the wall when the matching mark is scanned.
JP2483080A 1980-02-28 1980-02-28 Matching mark for electronic beam exposure Pending JPS56120128A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2483080A JPS56120128A (en) 1980-02-28 1980-02-28 Matching mark for electronic beam exposure
US06/237,049 US4356223A (en) 1980-02-28 1981-02-23 Semiconductor device having a registration mark for use in an exposure technique for micro-fine working

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2483080A JPS56120128A (en) 1980-02-28 1980-02-28 Matching mark for electronic beam exposure

Publications (1)

Publication Number Publication Date
JPS56120128A true JPS56120128A (en) 1981-09-21

Family

ID=12149104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2483080A Pending JPS56120128A (en) 1980-02-28 1980-02-28 Matching mark for electronic beam exposure

Country Status (1)

Country Link
JP (1) JPS56120128A (en)

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